| MKS Instruments, Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20120123583 | Controlling a Discrete-Type Manufacturing Process with a Multivariate Model - Described are methods, systems, and a computer-readable storage medium for controlling a discrete-type manufacturing process (e.g., an injection molding process) with a multivariate model. Data representing process parameters, operating parameters, or both of the manufacturing process are received. The received data is compared with a multivariate model that approximates the manufacturing process to provide a result. Upon the result of the comparing satisfying a condition, one or more values for a set of operating parameters for the manufacturing process are determined. When the one or more determined values for the set of operating parameters satisfies a criterion, at least one operating parameter of the manufacturing process is updated. | 05-17-2012 |
| 20120118067 | Capacitive Pressure Sensor with Improved Electrode Structure - An improved capacitive manometer comprises a diaphragm that is constrained relative to an electrode structure spaced from the diaphragm. An electrode support structure is arranged to support the electrode structure and comprises a compliant ring including at least three flexures integrally formed in the ring and angularly spaced around the alignment axis. The electrode support is clamped in place relative to the diaphragm at the locations of the compliant ring flexures. | 05-17-2012 |
| 20120099684 | Frequency Interference Detection And Correction - A system for detecting and correcting for spurious frequencies that may coincide in a bandwidth of interest in an RF metrology system. The system can (1) utilize a deterministic scheme to detect an interference by a spurious frequency and correct the distortion effect or (2) utilize a mixed signal processing architecture to avoid the occurrence of spurious frequency contamination. A detection scheme identifies the event of distortion and triggers either (a) a shift in the analog to digital convert sample rate or (b) a mathematical vector manipulation. The shift of the analog to digital convert sample rate moves an aliased image of the spurious frequency outside of the frequency of interest. The mathematical vector correction removes the distortion and restores the signal of interest. | 04-26-2012 |
| 20120086434 | WIDE-DYNAMIC RANGE ELECTROMETER WITH A FAST RESPONSE - A method and apparatus for measuring current includes sensing a first voltage at the output of an amplifier and computing a current based on the first voltage and the resistance of a first resistive element, which is electrically coupled between an inverting input of the amplifier and the output of the amplifier, if the first voltage is below a predetermined level. The method also includes sensing a second voltage at the output of a buffer and computing a current based on the first and second voltages and the resistances of the first resistive element and a second resistive element, which is electrically coupled between the inverting input of the amplifier and an input of the buffer and is also electrically coupled to the output of the amplifier through a at least one diode, if the voltage output from the amplifier is above the predetermined level. | 04-12-2012 |
| 20120081132 | Measuring Minority Carrier Lifetime - An apparatus includes a member including a ferromagnetic material, an inductance-capacitance resonant circuit, a substrate disposed relative to the member, and a plurality of radiation sources. The member includes a post disposed at its center and a surface extending to an outer wall. The member defines a gap between the post and the outer wall. The inductance-capacitance resonant circuit is configured to resonate at a measurement frequency. The circuit includes an inductor disposed relative to the post. The substrate is disposed relative to the member. The substrate is electromagnetically coupled to the inductor. The plurality of radiation sources is disposed radially outward from and circumferentially around the post of the member. The apparatus can be used to simultaneously measure conductance (inverse sheet resistance), steady state photoconductance, true steady state minority carrier lifetime, photoconductance build-up and photoconductance decay lifetime. | 04-05-2012 |
| 20120065948 | Monitoring, Detecting and Quantifying Chemical Compounds in a Sample - Described are computer-based methods and apparatuses, including computer program products, for monitoring, detecting, and quantifying chemical compounds in a sample. A sample measurement comprising a digitized spectroscopic profile is received. A multivariate multistage background model comprising a first model that models a first time effect, a second model that models a second time effect that is different than the first time effect, or both is calculated. A background corrected sample measurement based on the sample measurement and the multivariate multistage background model is generated. A multivariate multistage library search, fault detection, and quantification algorithm is executed to identify one or more primary chemicals in the background corrected sample measurement. The search, detection, and quantification algorithm includes identifying one or more candidate chemicals in the background corrected sample measurement based on a multivariate statistical process control and identifying and quantifying a first primary chemical based on a focused chemical evaluation of the one or more candidate chemicals. | 03-15-2012 |
| 20120062322 | Power Amplifier With Transistor Input Mismatching - A power amplifier includes an input module. The input module includes a transformer and is configured to receive a radio frequency signal and generate output signals. Impedance transformation modules each of which having an output impedance and configured to receive a respective one of the output signals from the transformer. Switch modules each of which comprising a transistor and connected to an output of one of the impedance transformation modules. The transistor has an input impedance and outputs an amplified signal. Each of the output impedances is mismatched relative to a respective one of the input impedances. | 03-15-2012 |
| 20120061369 | MULTIPLE HEATER CONTROL SYSTEM WITH EXPANDABLE MODULAR FUNCTIONALITY - A multiple heater control system includes cables, connectors, and junction boxes for user-friendly daisy chain connections of heater controllers and heaters in various configurations or combinations of individually controlled heater series and/or master and slave heater series. The heater controllers include process control of AC power to the heaters and upper-limit safety shutoff that is substantially independent from the process control. The heater controllers also have variable levels of control, adjustment, display, and communications functionality in a base module that is expandable to various levels with expansion modules that are attachable to and detachable from the base module. Connector, cable, and junction configurations, adapters, and latch features enhance user friendliness. | 03-15-2012 |
| 20120056658 | LCL High Power Combiner - A combiner includes N coaxial cables each configured to connect to a respective output of N radio frequency power amplifiers, where N is an integer greater than one. Each of the N coaxial cables is configured to receive an amplified radio frequency signal from a respective one of the N radio frequency power amplifiers. A board includes capacitances and is configured to connect to each of the N coaxial cables and combine the radio frequency signals. The N coaxial cables and the capacitances provide N inductance and capacitance combinations. A connector is configured to connect an output of the board to a load. | 03-08-2012 |
| 20120035755 | PROCESS CONTROL USING PROCESS DATA AND YIELD DATA - A method for monitoring a manufacturing tool features acquiring metrology data (“Step a”). Data is acquired for process variables for a first process step performed by the manufacturing tool (“Step b”). A mathematical model of the first process step based on the metrology data and the acquired data is created (“Step c”). Steps b and c are repeated for at least a second process step (“Step d”). An nth mathematical model is created based on the metrology data and the data for the process variables for each of the n process steps (“Step e”). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (“Step f”). A multivariate metric is calculated based on the top level model of step f and data from subsequent runs of the manufacturing tool. Service is performed if the metric satisfies a condition. | 02-09-2012 |
| 20120031190 | CAPACITIVE PRESSURE SENSOR - An improved capacitive manometer, the manometer comprises: a diaphragm including (a) a common electrode and (b) an electrode structure including a center electrode and ring electrode, wherein the diaphragm is movable between (i) a zero position when the pressure on each side of the diaphragm is the same and (ii) a maximum differential position when the maximum measurable differential pressure is applied to the diaphragm, and a support structure arranged so as to support the diaphragm so that the diaphragm is constrained relative to the electrode structure, and the common electrode is spaced from and axially aligned with the center and ring electrodes relative to an alignment axis of the manometer: wherein the electrode structure is secured relative to the diaphragm at at least three clamping locations angularly spaced around the alignment axis; and wherein the angle defined within each right plane containing a point of constraint of the diaphragm and the point of each clamping location relative to the plane of the diaphragm in the zero position is between 60° and 90° so as to reduce changes in electrode disk support height, enable smaller gaps and improved stability between the diaphragm and electrode structure. An additional improvement is provided by including a spacer ring including a plurality of tabs; and a clamp arranged to clamp the electrode structure to the spacer ring at the location of each of the tabs so as to define a plurality of equiangularly spaced, clamped locations around the alignment axis, so as to eliminate the possibility of an occasional spacer induced radial shear force and subsequent potential stick slip condition that could impact repeatability and stability. | 02-09-2012 |
| 20120013352 | Multipoint Voltage And Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 01-19-2012 |
| 20120013253 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 01-19-2012 |
| 20120003748 | Chemical Ionization Reaction or Proton Transfer Reaction Mass Spectrometry - A system and methods are described for generating reagent ions and product ions for use in a mass spectrometry system. Applications for the system and method are also disclosed for detecting volatile organic compounds in trace concentrations. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass and peak intensity values for ion species during spectrometry and faults within the system. | 01-05-2012 |
| 20110297319 | Reduction of Copper or Trace Metal Contaminants in Plasma Electrolytic Oxidation Coatings - A method for creating an oxide layer having a reduced copper concentration over a surface of an object comprising aluminum and copper for use in a semiconductor processing system. The oxide layer produced using a plasma electrolytic oxidation process has a reduced copper peak concentration, which decreases a risk of copper contamination, and includes magnesium oxides that can be converted to magnesium halide upon exposure to an excited halogen-comprising gas or halogen-comprising plasma to increase the erosion/corrosion resistance of the oxide layer. | 12-08-2011 |
| 20110241781 | Variable Class Characteristic Amplifier - A power amplifier (PA) adjustably operable between two classes of operation. The range of operation lies in a range of operation between a conventional, linear, conjugately matched Class AB characteristic amplifier and a higher efficiency switching Class E characteristic amplifier. A circuit topology having a push-pull configuration that allows a Class E characteristic of operation. | 10-06-2011 |
| 20110241773 | Multi-Channel Radio Frequency Generator - A multi-channel radio frequency (RF) generator module includes N power amplifiers, M drivers, a power supply module, and a control module. The N power amplifiers generate N RF outputs, respectively. The M drivers drive the N power amplifiers based on M driver control signals, respectively. The power supply module receives alternating current (AC) input power and applies L rail voltages to the N power amplifiers based on L rail voltage setpoints, respectively. The control module sets the L rail voltage setpoints and the M driver control signals. N is an integer greater than one, L and M are integers greater than zero, and M and L are less than or equal to N. | 10-06-2011 |
| 20110228274 | Ozone Concentration Sensor - An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute. | 09-22-2011 |
| 20110169520 | APPARATUS FOR MEASURING MINORITY CARRIER LIFETIME AND METHOD FOR USING THE SAME - An apparatus for measuring minority carrier lifetime is provided. The apparatus includes a resonant circuit having an inductor and a capacitor and configured to resonate at a measurement frequency. The apparatus also includes a ferromagnetic core having a first portion and a second portion. The first portion defines a gap and can be configured to direct therealong a magnetic field established by the inductor, such that lateral spreading of the magnetic field outside of the first portion is inhibited, and to direct the magnetic field generally uniformly across the gap. The second portion can be configured to direct the magnetic field therealong and, in conjunction with the first portion, into a closed loop. A radiation source can be configured to irradiate an area proximal to the gap defined by the first portion of the ferromagnetic core. | 07-14-2011 |
| 20110134716 | DEVICES, SYSTEMS, AND METHODS FOR CARBONATION OF DEIONIZED WATER - Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided. | 06-09-2011 |
| 20110012588 | Wide-Dynamic Range Electrometer with a Fast Response - A method and apparatus for measuring current includes sensing a first voltage at the output of an amplifier and computing a current based on the first voltage and the resistance of a first resistive element, which is electrically coupled between an inverting input of the amplifier and the output of the amplifier, if the first voltage is below a predetermined level. The method also includes sensing a second voltage at the output of a buffer and computing a current based on the first and second voltages and the resistances of the first resistive element and a second resistive element, which is electrically coupled between the inverting input of the amplifier and an input of the buffer and is also electrically coupled to the output of the amplifier through a at least one diode, if the voltage output from the amplifier is above the predetermined level. | 01-20-2011 |
| 20110005922 | Methods and Apparatus for Protecting Plasma Chamber Surfaces - A method for creating a protective layer over a surface of an object comprising aluminum and magnesium for use in a semiconductor processing system, which includes oxidizing the surface of the object using a plasma electrolytic oxidation process. The method also includes generating a halogen-comprising plasma by exciting a gas comprising a halogen. The method also includes exposing the oxidized surface to the halogen-comprising plasma or excited gas. | 01-13-2011 |
| 20100327927 | METHOD AND SYSTEM FOR CONTROLLING RADIO FREQUENCY POWER - A method for controlling pulsed power that includes measuring a first pulse of power from a power amplifier to obtain data. The method also includes generating a first signal to adjust a second pulse of delivered power, the first signal correlated to the data to minimize a power difference between a power set point and a substantially stable portion of the second pulse. The method also includes generating a second signal to adjust the second pulse of delivered power, the second signal correlated to the data to minimize an amplitude difference between a peak of the second pulse and the substantially stable portion of the second pulse. | 12-30-2010 |
| 20100292812 | METHODS AND APPARATUS FOR AUTOMATED PREDICTIVE DESIGN SPACE ESTIMATION - Described are computer-based methods and apparatuses, including computer program products, for automated predictive design space estimation. A design space of input factors and output responses is estimated for a physical process. Data is received for one or more input factors for a physical process, one or more output responses for the process, and criteria. For each of the one or more input factors, a calculated range of input values within the corresponding experimented range of input values is calculated. A modified range of input values is calculated for each of the one or more input factors. A design space estimate is predicted based at least on the modified ranges of input values, wherein the modified ranges of input values each comprise a largest region of variability for one or more of the input factors where the criteria are fulfilled. | 11-18-2010 |
| 20100235690 | BITMAP CLUSTER ANALYSIS OF DEFECTS IN INTEGRATED CIRCUITS - A system and method for defect analysis are disclosed wherein a defect data set is input into the system. A radius value is selected by a user, which is the maximum number of bits that bit failures can be separated from one another to be considered a bit cluster. When a defect data set is received, the system and method start with a fail bit and search for neighboring fail bits. The specified radius is used to qualify the found fail bits to be part of the bit cluster or not. If a minimum count of fail bits is not met, the system and method will stop searching and move to the next fail bit. If a minimum count of fail bits is met, the search continues for the next fail bit until the maximum fail bit count specified by the user is reached. Aggregation is provided such that once bit clusters have been classified, the number of clusters that have the exact match or partial match to each other is counted. The user may set the partial match as a threshold count to establish a match. | 09-16-2010 |
| 20100231296 | Radio Frequency Power Delivery System - A system and method are provided for delivering power to a dynamic load. The system includes a power supply providing DC power having a substantially constant power open loop response, a power amplifier for converting the DC power to RF power, a sensor for measuring voltage, current and phase angle between voltage and current vectors associated with the RF power, an electrically controllable impedance matching system to modify the impedance of the power amplifier to at least a substantially matched impedance of a dynamic load, and a controller for controlling the electrically controllable impedance matching system. The system further includes a sensor calibration measuring module for determining power delivered by the power amplifier, an electronic matching system calibration module for determining power delivered to a dynamic load, and a power dissipation module for calculating power dissipated in the electrically controllable impedance matching system. | 09-16-2010 |
| 20100223015 | METHOD AND APPARATUS FOR SILOXANE MEASUREMENTS IN A BIOGAS - A method for monitoring of siloxane compounds in a biogas includes the step of generating a first absorption spectrum based on a ratio of a first spectral measurement and a second spectral measurement. The first spectral measurement is from a non-absorptive gas having substantially no infrared absorptions in a specified wavelength range of interest and the second spectral measurement is from a sample gas comprising the biogas. The method also includes the step of calculating a concentration of at least one siloxane compound in the biogas using a second absorption spectrum based on, at least, a first individual absorption spectrum for a known concentration of the at least one siloxane compound. | 09-02-2010 |
| 20100201371 | Harmonic Derived Arc Detector - An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber. | 08-12-2010 |
| 20100201370 | Arc Detection - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-12-2010 |
| 20100194195 | Radio Frequency Power Control System - A radio frequency (RF) system includes a control module that allocates M predetermined frequency intervals. The system also includes N RF sources that each applies first RF power to electrodes within a plasma chamber at frequencies within an assigned respective one of the M predetermined frequency intervals. The N RF sources also each respond to second RF power including feedback from the plasma chamber. The N RF sources each include a processing module that adjusts the first RF power based on the second RF power and the respective one of the M predetermined frequency intervals. M and N are integers greater than 1. | 08-05-2010 |
| 20100191361 | Controlling a Manufacturing Process with a Multivariate Model - A method, controller, and system for controlling a manufacturing process (batch-type or continuous-type) with a multivariate model are described. Dependent variable data and manipulated variable data are received. Dependent variable data represents values of uncontrolled process parameters from a plurality of sensors. Manipulated variable data represents controlled or setpoint values of controllable process parameters of a plurality of process tools. A predicted operational value, multivariate statistic, or both are determined based on the received data, and operating parameters of the manufacturing process are determined based on the predicted score, multivariate statistic, or both. | 07-29-2010 |
| 20100176858 | Signal oversampling for improved S:N in reflector movement system - Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships. | 07-15-2010 |
| 20100166630 | REACTIVE CHEMICAL CONTAINMENT SYSTEM - A small scale, but effective, reactive chemical containment system includes apparatus and methods for reaction of process gases exhausted from reaction furnaces with a reactant gas in a non-combustible manner to produce and contain particulate or powder byproducts, thereby removing the process gas from the exhaust gas flow. The apparatus provides process gas inlet, treatment reactive gas diffusion, process gas and treatment reactive gas pre-mixing, primary containment, secondary containment, and outlet zones. | 07-01-2010 |
| 20100148874 | METHODS AND SYSTEMS FOR STABILIZING AN AMPLIFIER - The invention generally relates to stabilizing an MRI power delivery system. In one aspect, a stabilization module that is in electrical communication with the MRI power delivery system is provided. The stabilization module includes a closed loop control system. The closed loop control system is used to modify the at least one characteristic of the input signal. The modified input signal is provided to the MRI power delivery system. | 06-17-2010 |
| 20100125424 | Dual-Mode Mass Flow Verification and Mass Flow Delivery System and Method - A system performs mass flow delivery of a fluid, and also performs mass flow verification of the fluid. The system includes an inlet valve that controls flow of the fluid into a chamber, an outlet valve that controls flow of the fluid out of the chamber, a pressure transducer that measures the pressure of the fluid within the chamber, a temperature sensor that measures the temperature of the fluid within the chamber, and a controller. The controller is configured to control opening and closing of the inlet and outlet valves, using the measurements of the pressure and the temperature change within the chamber, so as to verify, when in a first mode, a measurement of the flow rate of the fluid by a device, and so as to deliver, when in a second mode, a desired amount of the fluid from the chamber into a processing facility. | 05-20-2010 |
| 20100100223 | PROCESS CONTROL USING PROCESS DATA AND YIELD DATA - A method for monitoring a manufacturing process features acquiring metrology data for semiconductor wafers at the conclusion of a final process step for the manufacturing process (“Step a”). Data is acquired for a plurality of process variables for a first process step for manufacturing semiconductor wafers (“Step b”). A first mathematical model of the first process step is created based on the metrology data and the acquired data for the plurality of process variables for the first process step (“Step c”). Steps b and c are repeated for at least a second process step for manufacturing the semiconductor wafers (“Step d”). An nth mathematical model is created based on the metrology data and the data for the plurality of process variables for each of the n process steps ('Step e“). A top level mathematical model is created based on the metrology data and the models created by steps c, d and e (”Step f'). The top level mathematical model of Step f is based on those process variables that have a substantial effect on the metrology data. | 04-22-2010 |
| 20100079764 | Multigas Monitoring and Detection System - A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices. | 04-01-2010 |
| 20100073104 | Tune Range Limiter - An impedance matching network includes a first input port that receives radio frequency (RF) power and includes an input impedance, an output port that provides the RF power and includes an output impedance, and a variable capacitance module that varies the output impedance. The variable capacitance module includes a first variable capacitor, a second variable capacitor, a first motor, and a second motor that adjusts a capacitance of the second variable capacitor. A relationship between a desired value of the capacitance and an actual value of the capacitance is dependent on a capacitance of the first variable capacitor. | 03-25-2010 |
| 20100063614 | VERSATILE SEMICONDUCTOR MANUFACTURING CONTROLLER WITH STATISTICALLY REPEATABLE RESPONSE TIMES - The present invention relates to process I/O controllers for semiconductor manufacturing to which a tool host can delegate data collection, monitoring and control tasks. In particular, it relates to process I/O controllers that can perform more than one of data collection, monitoring, control and response to commands from a tool host with statistically repeatable performance and precision. Embodiments described use prioritized real time operating systems to control of semiconductor manufacturing tools and data collection from tool associated with the sensors. Statistically repeatable responsiveness to selected commands and to sensor inputs during selected recipe steps effectively reduces jitter. | 03-11-2010 |
| 20100057237 | AUTOMATED MODEL BUILDING AND BATCH MODEL BUILDING FOR A MANUFACTURING PROCESS, PROCESS MONITORING, AND FAULT DETECTION - A method for creating a new model of a manufacturing process according to a multivariate analysis including selecting a set of data representative of multidimensional data measured during a step or phase of a manufacturing process. The method also includes determining a set of model generation conditions based on the set of data and generating the new model specifying intervals for the multidimensional data measured during a future manufacturing process based on the set of model generation conditions. | 03-04-2010 |
| 20100027017 | Ozone Concentration Sensor - An apparatus and method provide measurement of a constituent of a fluid, such as ozone in ozonated water. The apparatus includes a vessel to contain the fluid, a light source configured to direct a first band of light and a second band of light along a substantially shared path though the fluid, and a photosensor that senses the first band of light and the second band of light. The constituent has a greater absorption associated with the first band of light than with the second band of light. The method includes modification of a measured attribute of the component in response to the sensed second band of light to improve the accuracy of the measured attribute. | 02-04-2010 |
| 20100012482 | SPUTTERING SYSTEM AND METHOD INCLUDING AN ARC DETECTION - A sputtering system that includes a sputtering chamber having a target material serving as a cathode, and an anode and a work piece. A direct current (DC) power supply supplies electrical power to the anode and the cathode sufficient to generate a plasma within the sputtering chamber. A detection module detects the occurrence of an arc in the sputtering chamber by monitoring an electrical characteristic of the plasma. In one embodiment the electrical characteristic monitored is the impedance of the plasma. In another embodiment the electrical characteristic is the conductance of the plasma. | 01-21-2010 |
| 20100001796 | Radio Frequency (RF) Envelope Pulsing Using Phase Switching of Switch-Mode Power Amplifiers - A radio frequency (RF) power generator includes a first switch-mode amplifier that generates a first RF signal in accordance with a first control signal and a second switch-mode amplifier that generates a second RF signal in accordance with a second control signal. The first and second control signals determine a phase difference between the first and second RF signals. An output signal envelope is based on the first and second RF signals and the phase difference. The first control and second control signals alternate phases of the first and second RF signals. | 01-07-2010 |
| 20090320677 | PARTICLE TRAP FOR A PLASMA SOURCE - A particle trap for a remote plasma source includes a body structure having an inlet for coupling to a chamber of a remote plasma source and an outlet for coupling to a process chamber inlet. The particle trap for a remote plasma source also includes a gas channel formed in the body structure and in fluid communication with the body structure inlet and the body structure outlet. The gas channel can define a path through the body structure that causes particles in a gas passing from a first portion of the channel to strike a wall that defines a second portion of the gas channel at an angle relative to a surface of the wall. A coolant member can be in thermal communication with the gas channel. | 12-31-2009 |
| 20090315463 | Phase And Frequency Control Of A Radio Frequency Generator From An External Source - Controlling a phase and/or a frequency of a RF generator. The RF generator includes a power source, a sensor, and a sensor signal processing unit. The sensor signal processing unit is coupled to the power source and to the sensor. The sensor signal processing unit controls the phase and/or the frequency of a RF generator. | 12-24-2009 |
| 20090288772 | Method and Apparatus for Processing Metal Bearing Gases - A method and apparatus for processing metal bearing gases involves generating a toroidal plasma in a plasma chamber. A metal bearing gas is introduced into the plasma chamber to react with the toroidal plasma. The interaction between the toroidal plasma and the metal bearing gas produces at least one of a metallic material, a metal oxide material or a metal nitride material. | 11-26-2009 |
| 20090256580 | ORTHOGONAL RADIO FREQUENCY VOLTAGE/CURRENT SENSOR WITH HIGH DYNAMIC RANGE - A radio frequency (RF) sensor that measures RF current includes a substrate that has an inner perimeter that defines an aperture. A conductor extends through the aperture. Sensor pads are arranged on the aperture and are connected to form two sensor loops. The loops generate an electrical signal that represents RF current flow through the center conductor. Additionally, a plurality of circular conductive rings may be included in the RF sensor to generate a signal representing the voltage of the conductor. | 10-15-2009 |
| 20090255342 | Capacitance Manometers and Methods of Making Same - A capacitance manometer comprises: a flexible diaphragm including a first electrode structure; an electrode structure including second and third spaced-apart electrode structures secured relative to the diaphragm so as to establish a capacitance between the first electrode structure and the second electrode structure and a capacitance between the first electrode structure and the third spaced-apart electrode structure, wherein the capacitances between the first electrode structure and each of the second and third electrode structures change with changes in differential pressure placed on opposite sides of the flexible diaphragm; and a thick film dielectric material disposed between the first electrode and each of the second and third spaced-apart electrode structures so as to increase the gain in capacitance of the manometer without decreasing the distance between the first electrode structure and each of the second and third electrode structures and without increasing the stroke of the flexible diaphragm, while preventing the first electrode structure from shorting with either the second or third electrode structure in response to over pressurization conditions. | 10-15-2009 |
| 20090210086 | SYSTEMS AND METHODS FOR SORTING IRREGULAR OBJECTS - A system and method is provided for computerized sorting irregular objects. The method includes receiving a representative set of irregular objects comprising at least two types of user-specified qualities. The method also includes receiving at least two types of measured data for the representative set of irregular objects. The method also includes generating at least one of a PCA model or a PLS model based on at least two user-specified qualities of the irregular objects and the at least two types of measured data for the representative set of irregular objects, and sorting a second set of irregular objects based on the at least one of the PCA model or the PLS model. | 08-20-2009 |
| 20090207537 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
| 20090206822 | Application Of Wideband Sampling For Arc Detection With A Probabilistic Model For Quantitatively Measuring Arc Events - An arc detection system for a plasma generation system includes a radio frequency (RF) sensor that generates first and second signals based on a respective electrical properties of (RF) power that is in communication with a plasma chamber. A correlation module generates an arc detect signal based on the first and second signals. The arc detect signal indicates whether an arc is occurring in the plasma chamber and is employed to vary an aspect of the RF power to extinguish the arc. | 08-20-2009 |
| 20090137192 | MULTI-ZONE PRESSURE CONTROL SYSTEM - A pressure control system that controls the pressure of a fluid in a plurality of zones includes a distribution manifold, at least one main manifold connected to the distribution manifold, and at least one disposable manifold connected to the distribution manifold and the main manifold. The disposable manifold is adapted to be replaced independent of the distribution manifold and the main manifold, and is connected to each zone and to at least one vacuum source. The distribution manifold distributes the fluid to the plurality of zones, so as to cause flow of the fluid into and out of a measurement chamber located within each zone. The main manifold includes, for each zone, a pressure sensor configured to measure pressure in the measurement chamber in that zone, and a control valve configured to regulate the flow of the fluid through that zone. | 05-28-2009 |
| 20090095902 | CHEMICAL IONIZATION REACTION OR PROTON TRANSFER REACTION MASS SPECTROMETRY WITH A TIME-OF-FLIGHT MASS SPECTROMETER - A system, components thereof, and methods are described for time-of-flight mass spectrometry. A microwave or high-frequency RF energy source is used to ionize a reagent vapor to form reagent ions. The reagent ions enter a chamber and interact with a fluid sample to form product ions. The reagent ions and product ions are directed to a time-of-flight mass spectrometer module for detection and determination of a mass value for the ions. The time-of-flight mass spectrometer module can include an optical system and an ion beam adjuster for focusing, interrupting, or altering a flow of reagent and product ions according to a specified pattern. The time-of-flight mass spectrometer module can include signal processing techniques to collect and analyze an acquired signal, for example, using statistical signal processing, such as maximum likelihood signal processing. | 04-16-2009 |
| 20090095901 | CHEMICAL IONIZATION REACTION OR PROTON TRANSFER REACTION MASS SPECTROMETRY WITH A QUADRUPOLE MASS SPECTROMETER - A system and methods are described for generating reagent ions and product ions for use in a quadrupole mass spectrometry system. A microwave or high-frequency RF energy source ionizes particles of a reagent vapor to form reagent ions. The reagent ions enter a chamber, such as a drift chamber, to interact with a fluid sample. An electric field directs the reagent ions and facilitates an interaction with the fluid sample to form product ions. The reagent ions and product ions then exit the chamber under the influence of an electric field for detection by a quadrupole mass spectrometer module. The system includes various control modules for setting values of system parameters and analysis modules for detection of mass values for ion species during spectrometry and faults within the system. | 04-16-2009 |
| 20090055140 | MULTIVARIATE MULTIPLE MATRIX ANALYSIS OF ANALYTICAL AND SENSORY DATA - A system and method is provided for predicting consumer behavior for selected products. The method includes providing a first matrix associated with N products evaluated by a plurality of consumers, providing a second matrix associated with the N products characterized by at least one of an analytical profile or an evaluation by a plurality of experts and correlating the first matrix to the second or/and the third matrix to produce a relationship model. | 02-26-2009 |
| 20090039934 | Signal Oversampling for Improved S:N in Reflector Movement System - Eight or more transition points are generated during a given period, and are used in tracking movement of an interferometer reflector. Duty cycles of generated square waves are used to establish precise intervals between the transition points, and precise wave-phase relationships. | 02-12-2009 |
| 20090037013 | Automated Model Building and Model Updating - A system and computer-implemented method for creating a new model or updating a previously-created model based on a template are described. A template is generated from a previously-created model. The previously-created model specifies a set of parameters associated with a manufacturing process, a process tool or chamber. Variables associated with the manufacturing process are acquired, monitored, and analyzed. A statistical analysis (or multivariate statistical analysis) is employed to analyze the monitored variables and the set of parameters. When any of the monitored variables satisfy a threshold condition, a new model is created or the parameters of the previously-created model are updated, adjusted, or modified based on the template and the monitored variables. A user interface facilitating communication between a user and the systems and display of information is also described. | 02-05-2009 |
| 20080316773 | High Voltage Power Supply for Static Neutralizers - A high voltage power supply for a static neutralizer is disclosed. The high voltage power supply includes a resonant converter and a load with an emitter module having an emitter, reference electrode, and a capacitance value. The resonant converter is disposed to have a resonant frequency and an output coupled to the load. The resonant converter generates an output waveform with an amplitude sufficient for generating to ions by corona discharge when the load receives the output waveform. The load is predominantly capacitive when the resonant converter is operating at the resonant frequency. | 12-25-2008 |
| 20080302652 | Particle Reduction Through Gas and Plasma Source Control - A system for producing excited gases for introduction to a semiconductor processing chamber. The system includes a plasma source for generating a plasma. The plasma source includes a plasma chamber and a gas inlet for receiving process gases from a gas source. A gas flow rate controller is coupled to the gas inlet for controlling an inlet flow rate of the process gases from the gas source to the plasma chamber via the gas inlet. The system includes a control loop for detecting a transition from a first process gas to a second process gas and for adjusting the inlet flow rate of the second process gas from about 0 sccm to about 10,000 sccm over a period of time greater than about 300 milliseconds to maintain transient heat flux loads applied by the plasma to an inner surface of the plasma chamber below a vaporization temperature of the plasma chamber. | 12-11-2008 |
| 20080257738 | Devices, Systems, and Methods for Carbonation of Deionized Water - Devices, systems, and methods employed in wet cleaning semiconductor devices are provided. In particular, systems that can deliver deionized water with the desired concentration of CO2 and methods of generating deionized water with a desired concentration of CO2 for use in wet cleaning of semiconductor devices are provided. | 10-23-2008 |
| 20080251727 | Multigas Monitoring and Detection System - A spectroscopic detection system is described for monitoring ambient air for toxic chemical substances. The system can be a compact, portable multiple gas analyzer capable of detecting and discriminating a broad range of chemical constituents including various nerve and blister agents as well as toxic industrial chemicals at low or sub part per billion (ppb) levels. The system minimizes false alarms (e.g., false positives or negatives), features high specificity, and can operate with response times on the order of a few seconds to a few minutes, depending on the application. The system can be an entirely self-contained analyzer, with a Fourier Transform Infrared (FTIR) spectrometer, a gas sample cell, a detector, an embedded processor, a display, power supplies, an air pump, heating elements, and other components onboard the unit with an air intake to collect a sample and an electronic communications port to interface with external devices. | 10-16-2008 |
| 20080232021 | Low Maintenance AC Gas Flow Driven Static Neutralizer and Method - A low maintenance AC gas-flow driven static neutralizer, comprising at least one emitter and at least one reference electrode; a power supply having an output electrically coupled to the emitter(s) and a reference terminal electrically coupled to the reference electrode(s) with the power supply disposed to produce an output waveform that creates ions by corona discharge and to produce an electrical field when this output waveform is applied to the emitter(s); a gas flow source disposed to produce a gas flow across a first region that includes these generated ions and the emitter(s), the gas flow including a flow velocity; and wherein, during a first time duration, the output waveform decreases an electrical force created by the electrical field, enabling the gas flow to carry away from the emitter(s) a contamination particle that may be located within a second region surrounding the emitter(s), and to minimize a likelihood of the contamination particle from accumulating on the emitter(s). The first region may include the second region. | 09-25-2008 |
| 20080227420 | Multipoint Voltage and Current Probe System - A metrology system monitors radio frequency (RF) power at a plurality of locations in a circuit. The system includes a plurality of RF sensors that generate respective analog signals based on electrical properties of the RF power, a multiplexing module that generates an output signal based on the analog signals, and an analysis module that generates messages based on the output signal. The messages contain information regarding the electrical properties that are sensed by the plurality of RF sensors. | 09-18-2008 |
| 20080221720 | Manufacturing Process End Point Detection - A method for identifying a predetermined state of a manufacturing process by monitoring the process which involves, monitoring a plurality of variables that vary in value during the manufacturing process. The method also involves mapping as points in a hyperspace the values of each variable at a plurality of times, where the hyperspace has a number of dimensions equal to the number of variables and the number of points is equal to the plurality of times. The method also involves identifying that a manufacturing process has reached the predetermined state when one of the points reaches a closed volume in the hyperspace that is located within a predefined distance from a predefined location in the hyperspace. | 09-11-2008 |
| 20080216901 | Pressure control for vacuum processing system - A pressure control system includes a digital communication network between a pressure sensor and a pressure controller. The digital communication network is configured to communicate signals between the pressure sensor and the pressure controller. The pressure sensor is configured to measure pressure within a vacuum chamber in a processing tool. The pressure controller is responsive to pressure measurements made by the pressure sensor and communicated to the pressure controller through the digital communication network, to control the pressure within the vacuum chamber so as to maintain the pressure in the vacuum chamber at a pressure set point received from the tool. | 09-11-2008 |
| 20080197854 | Harmonic Derived Arc Detector - An arc detection system includes a radio frequency (RF) signal probe that senses a RF signal at an input of a RF plasma chamber and that generates a signal based on at least one of the voltage, current, and power of the RF signal. A signal analyzer receives the signal, monitors the signal for frequency components that have a frequency greater than or equal to a fundamental frequency of the RF signal, and generates an output signal based on the frequency components. The output signal indicates that an arc is occurring in the RF plasma chamber. | 08-21-2008 |
