Mitsubishi Electric Coporation Patent applications |
Patent application number | Title | Published |
20110140776 | VARIABLE FREQUENCY AMPLIFIER - A variable frequency amplifier includes a main amplifier system | 06-16-2011 |
20100147805 | Power-Supply Control Device for Electrical Discharge Machining Apparatus - A power-supply control device includes a high-frequency component detecting unit, a machining voltage level detecting device, a no-load time detecting device, and a pulse control device. The high-frequency component detecting unit detects a high-frequency component of discharge voltage at a machining gap. The machining voltage level detecting device detects a discharge voltage level at the machining gap. The no-load time detecting device detects delay time of discharge of the discharge voltage at the machining gap. The high-frequency component is compared with a reference value to obtain a first comparison result. The discharge voltage level is compared with a reference level to obtain a second comparison result. The pulse control device controls pulse off time based on the first comparison result and the detected delay time, and cuts off a discharge pulse based on the second comparison result. | 06-17-2010 |
20090129329 | SCHEDULING METHOD AND COMMUNICATION APPARATUS - The present invention provides a scheduling method in which a communication apparatus belonging to an OFDMA-based wireless communication system communicates data with a plurality of users by preferentially allocating a data sequence to a default subchannel segment that is different from other-cell allocation subchannel segment that is preferentially used for data communication by adjacent communication terminal. The scheduling method includes a data sequence selection-allocation step including selecting as many data sequences as can be allocated to the default subchannel segment and allocating (scheduling) selected data sequences to the default subchannel segment, wherein in downlink scheduling, the data sequence selection-allocation step including selecting the data sequences in order from a data sequence subjected to a maximum level of interference from an adjacent other base station (adjacent base station), and in uplink scheduling, the data sequence selection-allocation step including selecting the data sequences in order from a data sequence that causes a maximum level of interference to the adjacent base station because of data communication; and a remaining data sequence allocation step including allocating a data sequence that has not allocated to the default subchannel segment to the other-cell allocation subchannel segment when allocation of all the data sequences to the default subchannel segment fails. | 05-21-2009 |
20080230118 | Printing Mask and Solar Cell - A printing mask includes a mask frame and a mesh extended on the mask frame, in which a mask portion is formed by filling the mesh with resin to leave a pattern forming portion in a region corresponding to an electrode pattern to be formed on a printing object. The mask portion has a raised part on a surface of the mesh to be opposed to the printing object. The thickness of the raised part is such that a difference in average film thickness between the end and other parts of the electrode pattern formed with the printing mask is equal to or less than 5 micrometers. | 09-25-2008 |