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METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM

METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM Patent applications
Patent application numberTitlePublished
20110244140METHOD OF MANUFACTURING TRANSPARENT CONDUCTIVE FILM - An atmospheric-pressure plasma-enhanced MOCVD (metal organic chemical vapor deposition) uses a power circuit for supplying power for plasma generation, including a pulse control circuit provided inside in order to form a transparent conductive film on the surface of the substrate, the transparent conductive film having a low resistivity, excellent optical characteristics and a good texture formed on the surface using dielectric barrier discharge.10-06-2011