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MACRONIX Industrial Co., Ltd.
| MACRONIX Industrial Co., Ltd. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090299668 | APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE - An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system. | 12-03-2009 |