MACRONIX Industrial Co., Ltd.
|MACRONIX Industrial Co., Ltd. Patent applications|
|Patent application number||Title||Published|
|20090299668||APC SYSTEM AND MULTIVARIATE MONITORING METHOD FOR PLASMA PROCESS MACHINE - An advance process control (APC) system for a plasma process machine is provided, which includes at least an optical emission spectroscopy (OES) system and an APC analysis apparatus. The OES system is used for monitoring a testing object in the plasma process machine. The APC analysis apparatus is used for analyzing the data received from the OES system.||12-03-2009|