| Lasertec Corporation Patent applications |
| Patent application number | Title | Published |
|---|
| 20120026578 | RADIATION SOURCE APPARATUS AND DUV BEAM GENERATION METHOD - The present invention provides a radiation source apparatus which can generate a DUV radiation beam having a wavelength of 193.4 nm efficiently. The radiation source apparatus according to the invention has first wavelength conversion means arranged to receive a first laser beam of a first fundamental wavelength and to generate a fourth-harmonic wavelength of the first fundamental wavelength, second wavelength conversion means arranged to receive the beam of the fourth-harmonic wavelength of the first fundamental wavelength (266 nm) and a second laser beam of a second fundamental wavelength and to sum-frequency mix the fourth-harmonic with the second fundamental wavelength radiation to generate a beam of second DUV radiation having a wavelength between approximately 232 nm and 237 nm, and third wavelength conversion means arranged to receive the beam of second DUV radiation and the third laser beam of a third fundamental wavelength and to sum-frequency mix the second DUV radiation with the third fundamental wavelength radiation to generate third DUV radiation having a wavelength between approximately 192.5 nm and 194.5 nm. | 02-02-2012 |
| 20110242312 | INSPECTION SYSTEM AND INSPECTION METHOD - According to the invention, the surface of the Sic substrate or the epitaxial layer formed on the Sic substrate using the optical apparatus including the differential interference optical system. The reflected light from the surface of the Sic substrate or the epitaxial layer is received by the line sensor ( | 10-06-2011 |
| 20110220815 | LIGHT SOURCE APPARATUS - The invention is directed to the provision of a wavelength conversion-type ultraviolet light source apparatus that can obtain a stable output. A light source apparatus according to one mode of the invention includes: a laser light source | 09-15-2011 |
| 20110134944 | EFFICIENT PULSE LASER LIGHT GENERATION AND DEVICES USING THE SAME - A time delay is introduced in the optical path of the light pulse at fundamental wavelength relative to that for the fourth harmonic light pulse in a set up for generating the 5 | 06-09-2011 |
| 20090187378 | Depth measurement apparatus and depth measurement method - A depth measurement apparatus and a method capable of measuring a via hole having a high aspect ratio with a high resolution is provided. The depth measurement apparatus in accordance with the present invention is provided with means ( | 07-23-2009 |
