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KYOWA HAKKO CHEMICAL CO., LTD.

KYOWA HAKKO CHEMICAL CO., LTD. Patent applications
Patent application numberTitlePublished
20110172468METHOD FOR PRODUCING ALCOHOL, METHOD FOR PRODUCING HYDROGEN OR SYNTHESIS GAS USING THE METHOD FOR PRODUCING ALCOHOL, AND ALCOHOL - One object of the present invention is to provide a method for producing an alcohol which can produce a target alcohol containing a remarkably low content of the sulfur compound(s), and the present invention provides a method for producing an alcohol comprising a separation process which reduces the content of sulfur compound(s) in a crude alcohol containing at least the sulfur compound(s) through desulfurization treatment in which the crude alcohol is contacted with a separation membrane based on a pervaporation method, thereby a content of the sulfur composition in the crude alcohol is decreased.07-14-2011
20100298183ADDITIVE FOR OILS AND LUBRICANT COMPRISING THE SAME - An additive for oils that is capable of imparting oils such as lubricant base oils with superior wear resistance properties or friction resistance properties, and a lubricant. An additive for oils that includes a compound represented by formula (I) is used. A and B each represents a single bond or hydrocarbylene or the like, X and Y each represents a sulfur atom or single bond, and W and Z each represents a hydrogen atom or —NR11-25-2010
20100286008ADDITIVE FOR OILS AND LUBRICANT CONTAINING THE SAME - An additive for oils that is capable of imparting oils such as lubricant base oils or fuel oils with superior wear resistance properties or superior friction resistance properties and the like are provided. The additive for oils comprising a compound represented by formula (I):11-11-2010
20100272633METHOD FOR PRODUCING ALCOHOL, METHOD FOR PRODUCING HYDROGEN OR SYNTHESIS GAS USING THE METHOD FOR PRODUCING ALCOHOL, AND ALCOHOL - A method for producing an alcohol of the present invention provides an alcohol having the total sulfur content of 10 ppm by weight or less, by subjecting an alcohol having the total sulfur content of 30 ppm by weight or more and the propanols content of 200 ppm to at least one desulfurization treatment selected from at least one of a desulfurization treatment by a reaction process, a desulfurization treatment with a physical adsorbent, and a desulfurization treatment with a chemical adsorbent.10-28-2010
20100246363SQUARYLIUM COMPOUND, OPTICAL RECORDING MEDIUM USING THE SAME, RECORDING/REPRODUCTION METHOD AND OPTICAL RECORDING APPARATUS - To provide a squarylium compound forming a metal complex, expressed by the general formula (I): where R09-30-2010
20090156856LUBRICATING OIL - The present invention provides a lubricating oil comprising an alicyclic compound represented by a general formula (I):06-18-2009
20090074373OPTICAL FILTER - The present invention provides optical filters comprising a squarylium compound represented by General Formula (I):03-19-2009
20090054697METHOD FOR PRODUCING UNSATURATED ETHER COMPOUND - The present invention provides a method for producing an unsaturated ether compound represented by general formula (2) below, the method comprising reacting an acetal represented by general formula (1) below in the presence of an aliphatic or aromatic sulfonic acid and an organic base having a total carbon number of 3 to 7.02-26-2009
20090035702PROCESS FOR PRODUCING COMPOUND HAVING ACID-LABILE GROUP - The present invention provides a process for producing a compound having a group represented by general formula (II):02-05-2009
20090035696PHOTORESIST COMPOSITION - Disclosed are a photoresist composition characterized by containing a polymer (A) containing a carboxyl group or a hydroxyl group, a polyfunctional alkenyl ether (B) represented by the general formula (I) below, and a photoacid generator (C) and the like. (In the formula, R02-05-2009

Patent applications by KYOWA HAKKO CHEMICAL CO., LTD.