KLEO Maschinenbau AG Patent applications |
Patent application number | Title | Published |
20090296063 | Exposure apparatus - In order that an exposure apparatus for producing exposed structures in a photosensitive layer arranged on an object, comprising an object carrier and an exposure device, wherein the object carrier and the exposure device can be moved relative to one another in an advance direction and wherein exposure spots can be produced on the photosensitive layer in a position-controlled manner by means of the exposure device transversely with respect to the advance direction, is improved in such a way that a highest possible exposure power is available, i.e. a largest possible number of exposure spots can be produced per unit time, it is proposed that the exposure device has at least one exposure unit with a series of radiation exit regions which are arranged successively in a series direction and from which exposure beams emerge, by means of each of which, passed through an imaging optical system, an exposure spot can be produced on the photosensitive layer and each of which can be deflected by a deflection unit in a deflection direction running transversely with respect to the series direction, such that each exposure beam can produce exposure spots that at least partly overlap one another in a multiplicity of successive exposure spot positions in the deflection direction. | 12-03-2009 |
20080316454 | Exposure system - In the case of an exposure system for substrate bodies which carry a photosensitive coating on a substrate surface, comprising a machine frame, a substrate carrier which carries the substrate body and has a substrate carrier surface, and an exposure device with an optics unit, the optics unit and the machine frame being movable relative to one another in a first direction and in a second direction, so that the photosensitive coating can be exposed by this relative movement in the first direction and in the second direction, in order to improve said system in such a way that a compact configuration is possible, despite in this case a substrate body with a very large extent in the first and the second direction, it is proposed that the exposure device has a guide cross-member for at least one guide carriage of the exposure device, the guide carriage carrying the optics unit, in that the guide carriage is guided on the guide cross-member to be movable in the first direction, and in that the guide cross-member is arranged on the machine frame to be movable in the second direction. | 12-25-2008 |