Kikusui Chemical Industries Co., Ltd.
Kikusui Chemical Industries Co., Ltd. Patent applications | ||
Patent application number | Title | Published |
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20130017511 | IMPLANT FIXTUREAANM Kashiwabara; TatekiAACI Kakamigahara-shiAACO JPAAGP Kashiwabara; Tateki Kakamigahara-shi JPAANM Goto; TetsuroAACI Kakamigahara-shiAACO JPAAGP Goto; Tetsuro Kakamigahara-shi JPAANM Deguchi; MikitoAACI Kyoto-shiAACO JPAAGP Deguchi; Mikito Kyoto-shi JPAANM Yoshimoto; RyuichiAACI Kyoto-shiAACO JPAAGP Yoshimoto; Ryuichi Kyoto-shi JPAANM Hori; KojiAACI Kyoto-shiAACO JPAAGP Hori; Koji Kyoto-shi JPAANM Ito; MichioAACI NaganoAACO JPAAGP Ito; Michio Nagano JP - An implant fixture is made from ceramics containing zirconia. The implant fixture has monoclinic percentage of 1 volume % or less. The implant fixture includes a buried portion having an arithmetic average roughness Ra in the range of 1 to 5 μm. The zirconia content accounts for 86 mass % or more in the implant fixture. The implant fixture contains alumina and/or yttria. Further, the implant fixture has a sintered grain size of 0.45 μm or less. | 01-17-2013 |
20080274160 | Implant material - An implant material includes a base material that includes, as a main component, a partially stabilized zirconia having an average crystal particle diameter of 0.3 μm or less and a porous covering layer that includes ceramic as a main component and has a center pore diameter within a range of 10-100 μm. The covering layer | 11-06-2008 |