| JSR Corporation Patent applications |
| Patent application number | Title | Published |
|---|
| 20120135146 | METHODS OF FORMING TOPOGRAPHICAL FEATURES USING SEGREGATING POLYMER MIXTURES - Methods are disclosed for forming topographical features. In one method, a pre-patterned structure is provided which comprises i) a support member having a surface and ii) an element for topographically guiding segregation of a polymer mixture including a first polymer and a second polymer, the element comprising a feature having a sidewall adjoined to the surface. The polymer mixture is disposed on the pre-patterned structure, wherein the disposed polymer mixture has contact with the sidewall and the surface. The first polymer and the second polymer are segregated in a plane parallel to the surface, thereby forming a segregated structure comprising a first polymer domain and a second polymer domain. The first polymer domain and/or the second polymer domain are lithographically patterned, thereby forming topographical features comprising at least one of i) a first feature comprising a lithographically patterned first polymer domain and ii) a second feature comprising a lithographically patterned second polymer domain. | 05-31-2012 |
| 20120129353 | METHOD FOR PATTERN FORMATION, METHOD AND COMPOSITION FOR RESIST UNDERLAYER FILM FORMATION, AND RESIST UNDERLAYER FILM - Provided by the present invention is a method including: (1) forming a resist underlayer film on the upper face side of a substrate to be processed using a composition for forming a resist underlayer film, the composition containing (A) a compound having a group represented by the following formula (1); (2) forming a resist coating film by applying a resist composition on the resist underlayer film; (3) exposing the resist coating film by selectively irradiating the resist coating film with a radiation; (4) forming a resist pattern by developing the exposed resist coating film; and (5) forming a predetermined pattern on the substrate to be processed by sequentially dry etching the resist underlayer film and the substrate using the resist pattern as a mask. | 05-24-2012 |
| 20120129352 | SILICON-CONTAINING FILM, RESIN COMPOSITION, AND PATTERN FORMATION METHOD - A pattern-forming method includes forming a silicon-containing film on a substrate, the silicon-containing film having a mass ratio of silicon atoms to carbon atoms of 2 to 12. A shape transfer target layer is formed on the silicon-containing film. A fine pattern is transferred to the shape transfer target layer using a stamper that has a fine pattern to form a resist pattern. The silicon-containing film and the substrate are dry-etched using the resist pattern as a mask to form a pattern on the substrate in nanoimprint lithography. According to another aspect of the invention, a silicon-containing film includes silicon atoms and carbon atoms. A mass ratio of silicon atoms to carbon atoms is 2 to 12. The silicon-containing film is used for a pattern-forming method employed in nanoimprint lithography. | 05-24-2012 |
| 20120122036 | PATTERN FORMING METHOD - A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed. | 05-17-2012 |
| 20120115130 | METHOD FOR DETECTING TARGET CELL - A target cell detection method includes performing a test measurement on a dispersion to obtain a measurement result 1, the test measurement being an optical or electromagnetic measurement, and the dispersion including labeled particles and target cells, the labeled particles being particles on each of which a substance that specifically binds to a specific molecule present on a surface of each of the target cells is immobilized, performing measurement that is identical with the test measurement on a dispersion that includes the target cells, but does not include the labeled particles to obtain a measurement result 2, and comparing the measurement result 1 with the measurement result 2. | 05-10-2012 |
| 20120108737 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, AND RUBBER COMPOSITION - The method for producing a modified conjugated diene based (co)polymer, according to the present invention comprises a step of reacting a conjugated diene based (co)polymer with a metal halide compound to obtain a modified conjugated diene based (co)polymer, the conjugated diene based (co)polymer having a weight-average molecular weight of 150,000 to 2,000,000 and being obtained by bonding, to a polymer having at least a conjugated diene unit, an alkoxysilyl group and an optionally protected primary amino group. The method can satisfactorily produce a conjugated diene based (co)polymer which has a high Mooney viscosity, excellent shape stability and good processability. | 05-03-2012 |
| 20120103935 | METHOD FOR IMPROVING SELF-ASSEMBLED POLYMER FEATURES - A method for processing a structure. The structure is formed and includes a substrate, a substructure having a sidewall and disposed on the substrate, a first polymer structure disposed on the substrate, and a second polymer structure disposed on the substrate such that the first polymer structure is disposed between the sidewall and the second polymer structure. An aspect ratio of the first polymer structure, the second polymer structure, or both is reduced in a reducing step. One polymer structure (i.e., the first polymer structure or the second polymer structure) is selectively removed from the structure such that a remaining polymer structure (i.e., the second polymer structure or the first polymer structure) remains disposed on the external surface of the substrate after the one polymer structure has been selectively removed, wherein the aspect ratio of the remaining polymer structure was reduced in the reducing step. | 05-03-2012 |
| 20120101290 | METHOD FOR PRODUCING RUTHENIUM COMPOUND - A method for producing ruthenium compound including the step of reacting a compound represented by General Formula (1): RuL | 04-26-2012 |
| 20120101205 | COPOLYMER AND TOP COATING COMPOSITION - A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which includes at least one recurring unit (I) selected from the group consisting of a recurring unit having a group shown by the following formula (1), a recurring unit having a group shown by the following formula (2), and a recurring unit having a carboxyl group, and a recurring unit (II) having a sulfo group, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000. | 04-26-2012 |
| 20120100480 | COMPOUND, FLUORINE-CONTAINING POLYMER, RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR PRODUCING COMPOUND - A compound has a following general formula (1). | 04-26-2012 |
| 20120094234 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN - The radiation-sensitive resin composition includes a first polymer, a second polymer and a radiation sensitive acid generator. The first polymer includes a repeating unit represented by formula (1). The second polymer includes an acid labile group and is dissociated by an action of acid so that alkali solubility is given by dissociation of said acid labile group. R | 04-19-2012 |
| 20120083187 | POLYURETHANE, COMPOSITION FOR FORMATION OF POLISHING LAYERS THAT CONTAINS SAME, PAD FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD USING SAME - A polyurethane is produced by reacting a mixture including at least (A) a diisocyanate, (B) a polyol, and (C) a chain extender, the polyol (B) having the number average molecular weight of 400 to 5000, the chain extender (C) including (C1) a compound shown by the following general formula (1) and (C2) a compound shown by the following general formula (2), the compound (C1) and the compound (C2) having a number average molecular weight of less than 400, and a ratio “M | 04-05-2012 |
| 20120083125 | Chemical Mechanical Planarization With Overburden Mask - Planarization methods include depositing a mask material on top of an overburden layer on a semiconductor wafer. The mask material is planarized to remove the mask material from up areas of the overburden layer to expose the overburden layer without removing the mask material from down areas. The exposed overburden layer is wet etched and leaves a thickness remaining over an underlying layer. Remaining portions of the mask layer and the exposed portions of the overburden layer are planarized to expose the underlying layer. | 04-05-2012 |
| 20120083123 | Chemical Mechanical Planarization Processes For Fabrication of FINFET Devices - A planarization method includes planarizing a semiconductor wafer in a first chemical mechanical polish step to remove overburden and planarize a top layer leaving a thickness of top layer material over underlying layers. The top layer material is planarized in a second chemical mechanical polish step to further remove the top layer and expose underlying layers of a second material and a third material such that a selectivity of the top layer material to the second material to the third material is between about 1:1:1 to about 2:1:1 to provide a planar topography. | 04-05-2012 |
| 20120083122 | Shallow Trench Isolation Chemical Mechanical Planarization - A polishing method includes polishing, in a first polish, a wafer to remove overburden and planarize a top layer leaving a portion remaining on an underlying layer. A second polishing step includes two phases. In a first phase, the top layer is removed and the underlying layer is exposed, with a top layer to underlying layer selectivity of between about 1:1 to about 2:1 to provide a planar topography. In a second phase, residual portions of the top layer are removed from a top of the underlying layer to ensure complete exposure of an underlying layer surface. | 04-05-2012 |
| 20120083121 | Fabrication of Replacement Metal Gate Devices - Methods for polishing multiple dielectric layers to form replacement metal gate structures include a first chemical mechanical polish step to remove overburden and planarize a top layer to leave a planarized thickness over a gate structure. A second chemical mechanical polish step includes removal of the thickness to expose an underlying covered surface of a dielectric of the gate structure with a slurry configured to polish the top layer and the underlying covered surface substantially equally to accomplish a planar topography. A third chemical mechanical polish step is employed to remove the dielectric of the gate structure and expose a gate conductor. | 04-05-2012 |
| 20120082936 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes an acid-labile group-containing resin, and a compound shown by the following general formula (i). R | 04-05-2012 |
| 20120082935 | RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM FORMED USING THE SAME - [Problem] To provide a resist film that exhibits high surface hydrophobicity during liquid immersion lithography, suppresses occurrence of defects due to development failure, and exhibits excellent lithographic performance | 04-05-2012 |
| 20120082934 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER AND COMPOUND - [Problem] To reduce the time required for a film to exhibit decreased hydrophobicity after liquid immersion lithography while allowing the surface of a film to exhibit high hydrophobicity during liquid immersion lithography. | 04-05-2012 |
| 20120077124 | RESIST LOWER LAYER FILM-FORMING COMPOSITION, POLYMER, RESIST LOWER LAYER FILM, PATTERN-FORMING METHOD, AND METHOD OF PRODUCING SEMICONDUCTOR DEVICE - A resist lower layer film-forming composition includes (A) a polymer that includes a cyclic carbonate structure. The polymer (A) includes a structural unit (I) shown by the following formula (1). | 03-29-2012 |
| 20120070783 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND METHOD FOR FORMING RESIST PATTERN - A radiation sensitive resin composition capable of forming a photoresist film which has excellent basic resist performances concerning sensitivity, LWR, development defects, etc., gives a satisfactory pattern shape, has an excellent depth of focus, is reduced in the amount of components dissolving in a liquid for immersion exposure which is in contact with the film during immersion exposure, has a large receding contact angle with the liquid for immersion exposure, and is capable of forming a microfine resist pattern with high accuracy. The radiation sensitive resin composition contains (A) a polymer that comprises a repeating unit represented by formula (1) and a repeating unit having a fluorine atom and has an acid dissociable group in the side chain, and (B) a solvent. [In the formula (1), R | 03-22-2012 |
| 20120065291 | RADIATION-SENSITIVE RESIN COMPOSITION, POLYMER, AND COMPOUND - A radiation-sensitive resin composition includes a first polymer including a repeating unit represented by a following formula (I). X | 03-15-2012 |
| 20120058429 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer that includes at least one repeating unit (i) selected from a repeating unit shown by a formula (1), (2), and (3); and a repeating unit (ii) shown by a formula (4). | 03-08-2012 |
| 20120055693 | KIT FOR PREPARING WATER-SEALING MATERIAL FOR ELECTRICAL WIRE, WATER-SEALING MATERIAL FOR ELECTRICAL WIRE, WATER-SEALING MEMBER, WATER-SEALED ELECTRICAL WIRE, AND WATER-SEALING METHOD - A kit for preparing a water-sealing agent, a water-sealing material for an electrical wire, a water-sealed electrical wire, and a water-sealing method, which are used for insulated wires and the like. | 03-08-2012 |
| 20120045719 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND - A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, and a compound shown by the following general formula (1). | 02-23-2012 |
| 20120041091 | Radioactive ray-curable liquid resin composition for use in optical stereolithography, and optically shaped article produced by curing the composition - The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound. | 02-16-2012 |
| 20120040271 | ELECTRODE ELECTROLYTE FOR SOLID POLYMER-TYPE FUEL CELL - An electrode electrolyte for a solid polymer electrolyte-type fuel cell contains a polymer, which has a polyphenylene structure as a main chain and both a sulfonic acid group and a nitrogen-containing heterocyclic group as a side chain. A side chain having the nitrogen-containing heterocyclic group has a structure represented by the following general formula (D). | 02-16-2012 |
| 20120034560 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN AND POLYMER - A radiation-sensitive resin composition includes (A) a polymer that includes a structural unit (I) including a group shown by the following formula (i), (B) a photoacid generator, and (C) a polymer that has a fluorine atom content lower than that of the polymer (A), and includes an acid-labile group. The polymer (A) preferably includes a structural unit shown by the following formula (1) as the structural unit (I). It is preferable that X in the formula (1) represent a divalent or trivalent chain-like hydrocarbon group or alicyclic hydrocarbon group. | 02-09-2012 |
| 20120028198 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition includes a resin, and a solvent. The resin is dissolvable in a developer for a photoresist film which is to be covered by the upper layer-forming composition to form a pattern by exposure to radiation. The solvent dissolves the resin in the solvent. The solvent includes a compound shown by a formula (1). Each of R | 02-02-2012 |
| 20120028189 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING RESIST PATTERN, POLYMER AND COMPOUND - A radiation-sensitive resin composition includes (A) a fluorine-containing compound that includes a group shown by the following formula (1), and (B) a photoacid generator. | 02-02-2012 |
| 20120021359 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD - A liquid immersion lithography upper-layer film-forming composition includes (A) a polymer that includes a structural unit (I) shown by the following formula (1), and (S) a solvent. R | 01-26-2012 |
| 20110319519 | RUBBER COMPOSITION AND PNEUMATIC TIRE - A rubber composition from which a vulcanized rubber suitable for producing, for example, a pneumatic tire having excellent abrasion resistance, breaking strength, rolling resistance, wet skid resistance, and the like can be prepared. The rubber composition comprises a rubber component (A) comprising a diene rubber comprising 20 mass % or more of a modified styrene-butadiene copolymer (a1) and 5 mass % or more of a modified conjugated diene polymer (a2), and a filler (B), wherein the modified conjugated diene polymer (a2) is a conjugated diene polymer obtained by modifying the active terminals of a conjugated diene polymer having a cis-1,4 bond content of 80% or higher, with an alkoxysilane compound, and the filler (B) comprises at least either of 2 to 100 mass parts, relative to 100 mass parts of the rubber component (A), of carbon black (b1) and 30 to 100 mass parts, relative to 100 mass parts of the rubber component (A), of silica (b2). | 12-29-2011 |
| 20110311824 | NON-SPECIFIC ADSORPTION INHIBITOR, PROBE-BONDED PARTICLES, AND METHOD FOR PRODUCING THE SAME - A non-specific adsorption inhibitor of formula (1), | 12-22-2011 |
| 20110281040 | LIQUID CRYSTAL DISPLAY ELEMENT, POSITIVE TYPE RADIATION SENSITIVE COMPOSITION, INTERLAYER INSULATING FILM FOR LIQUID CRYSTAL DISPLAY ELEMENT, AND FORMATION METHOD THEREOF - Provided by the present invention is a liquid crystal display element including:
| 11-17-2011 |
| 20110266037 | ELECTRONIC PART, ELECTRONIC MEMBER CONNECTION METHOD, AND CIRCUIT CONNECTION MEMBER - An electronic part includes a first electronic member having a wiring side. An anisotropic conductive sheet has a first side and a second side opposite to the first side and is disposed on the first electronic member so that the wiring side contacts the first side. A second electronic member has a third side and a fourth side opposite to the third side and is disposed on the anisotropic conductive sheet so that the second side contacts the third side. The second electronic member is electrically connected to the first electronic member through the anisotropic conductive sheet. An elastic body has a fifth side and a sixth side opposite to the fifth side and is disposed on the second electronic member so that the fourth side contacts the fifth side. A pressing member is disposed on the sixth side of the elastic body. | 11-03-2011 |
| 20110262865 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a resin and a photoacid generator. The resin includes a polymer including a first repeating unit shown by a following formula (1) and an acid-dissociable group-containing repeating unit, | 10-27-2011 |
| 20110262859 | UPPER LAYER-FORMING COMPOSITION AND RESIST PATTERNING METHOD - An upper-layer film-forming composition includes (A) a resin that is soluble in an alkaline aqueous solution, and includes a fluorine atom, and (B) a solvent component that includes (B1) a solvent having a boiling point at 101.3 kPa of 150° C. or more and a static surface tension of 23.0 mN/m or less, the upper-layer film-forming composition being used to form an upper-layer film on a photoresist film. | 10-27-2011 |
| 20110262748 | PACKING MATERIAL FOR AFFINITY CHROMATOGRAPHY - An affinity chromatography packing material includes porous mother particles that include a copolymer of a monomer mixture including a crosslinkable vinyl monomer and an epoxy group-containing vinyl monomer, a ligand being bound to the porous mother particles, and the porous mother particles including a ring-opening epoxy group produced by ring-opening of the epoxy group included in the porous mother particles. | 10-27-2011 |
| 20110250756 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, KIT FOR CHEMICAL MECHANICAL POLISHING, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING - A chemical mechanical polishing aqueous dispersion comprises (A) abrasive grains, (B) at least one of quinolinecarboxylic acid and pyridinecarboxylic acid, (C) an organic acid other than quinolinecarboxylic acid and pyridinecarboxylic acid, (D) an oxidizing agent, and (E) a nonionic surfactant having a triple bond, the mass ratio (WB/WC) of the amount (WB) of the component (B) to the amount (WC) of the component (C) being 0.01 or more and less than 2, and the component (E) being shown by the following general formula (1), | 10-13-2011 |
| 20110236583 | CONTAINER CONTAINING A COBALT CARBONYL COMPLEX AND COBALT CARBONYL COMPLEX COMPOSITION - A container containing a cobalt carbonyl complex and a gas that contains carbon monoxide, and a cobalt carbonyl complex composition comprising a cobalt carbonyl complex and a solvent, wherein the concentration of carbon monoxide dissolved in the solvent is 0.001 to 1 wt %. | 09-29-2011 |
| 20110233454 | ORGANIC POLYMER PARTICLES AND PROCESS FOR PRODUCING SAME - Organic polymer particles having a structure shown by the following formula (1) are disclosed. | 09-29-2011 |
| 20110229654 | COMPOSITION AND METHOD FOR FORMING AN ALUMINUM FILM - A composition for forming an aluminum film, comprising a complex represented by the following formula (1) and a complex represented by the following formula (2), the molar ratio of the complex represented by the following formula (1) and the complex represented by the following formula (2) being 40:60 to 85:15: | 09-22-2011 |
| 20110223744 | METHOD FOR MANUFACTURING AN OPTICAL SEMICONDUCTOR DEVICE AND COMPOSITION FOR FORMING A PROTECTIVE LAYER OF AN OPTICAL SEMICONDUCTOR DEVICE - Provided is a composition for forming a protective layer which has an excellent acid resistance, an excellent cracking resistance and does not adversely affect semiconductor layers even when acid is used to remove deposits that arise during formation of separation trenches for separating a substrate into device units. Also provided is a method for manufacturing an optical semiconductor device using such a composition. The composition for forming a protective layer includes a siloxane polymer and an organic solvent. The method for manufacturing an optical semiconductor device includes the steps of: forming a protective layer | 09-15-2011 |
| 20110223544 | RESIST PATTERN COATING AGENT AND RESIST PATTERN FORMING METHOD USING THE SAME - A resist pattern coating agent includes a hydroxyl group-containing resin and a solvent. The solvent includes an alcohol shown by a following formula (1) in an amount of about 30 mass % or more, | 09-15-2011 |
| 20110223537 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer, a photoacid generator, and an acid diffusion controller. The polymer includes a first repeating unit shown by a following formula (a-1). The acid diffusion controller includes at least one of a base shown by a following formula (C-1) and a photodegradable base, | 09-15-2011 |
| 20110212401 | RADIATION-SENSITIVE RESIN COMPOSITION, AND RESIST PATTERN FORMATION METHOD - A radiation-sensitive resin composition includes a resin, a photoacid generator, a fluorine-containing resin, and a lactone compound. The resin does not include a first fluorine-containing repeating unit. The resin includes a first repeating unit that becomes alkali-soluble due to an acid. The fluorine-containing resin includes a second fluorine-containing repeating unit and a second repeating unit that becomes alkali-soluble due to an acid. A content of the lactone compound in the radiation-sensitive resin composition is about 31 to about 200 parts by mass based on 100 parts by mass of the resin. | 09-01-2011 |
| 20110184155 | CARRIER POLYMER PARTICLE, PROCESS FOR PRODUCING THE SAME, MAGNETIC PARTICLE FOR SPECIFIC TRAPPING, AND PROCESS FOR PRODUCING THE SAME - Carrier polymer particles comprising organic polymer particles having a particle diameter of 0.1 to 20 micrometers and a saccharide with which the surface of the organic polymer particles is covered, the organic polymer particles and the saccharide being chemically bonded. | 07-28-2011 |
| 20110184141 | POLYMER PRODUCTION PROCESS - A polymer production process comprising reacting a compound represented by the following formula (1) in the presence of a binuclear metal complex represented by the following formula (2). | 07-28-2011 |
| 20110172349 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT THEREOF AND ABA BLOCK COPOLYMER - A photosensitive insulating resin composition includes a block copolymer, a crosslinking agent, a photosensitive compound, and a solvent. The block copolymer includes a first structural unit shown by a following formula (1) and a second structural unit shown by a following formula (2), | 07-14-2011 |
| 20110158886 | POLYSILANE PRODUCTION PROCESS - A polysilane production process comprising reacting a specific silane compound typified by a cyclic silane compound represented by the following formula (2) in the presence of a binuclear metal complex represented by the following formula (4). | 06-30-2011 |
| 20110152561 | METHOD FOR PRODUCTION OF N-CARBOXY AMINO ACID ANHYDRIDE AND AMINO ACID CARBAMATE COMPOUND - A method for production of an N-carboxy amino acid anhydride with efficiency is provided. The method for production of an N-carboxy amino acid anhydride includes a step of reaction of an amino acid organic salt compound with a carbonic acid diester. | 06-23-2011 |
| 20110151378 | RADIATION-SENSITIVE RESIN COMPOSITION FOR LIQUID IMMERSION LITHOGRAPHY, POLYMER, AND RESIST PATTERN-FORMING METHOD - A radiation-sensitive resin composition for liquid immersion lithography includes a resin component, a photoacid generator and a solvent. The resin component includes an acid-dissociable group-containing resin in an amount of more than 50% by mass. The acid-dissociable group-containing resin includes a repeating unit that includes a fluorine atom and an acid-dissociable group in a side chain of the repeating unit. | 06-23-2011 |
| 20110150410 | Curable liquid composition, cured layer and coated optical fiber - A curable liquid resin optical fiber coating composition comprising 0.1 to 10 wt %, relative to the total weight of the composition, of an alkoxysilane compound (A) which does not contain a radically polymerizable functional group, and 0.01 to 1 wt %, relative to the total weight of the composition, of a hindered amine compound (B). This curable liquid resin composition produces a cured product that ensures a high n-value of the coated optical fiber and an excellent fiber strength after coating removal. | 06-23-2011 |
| 20110144271 | RADIOACTIVE RAY-CURABLE LIQUID RESIN COMPOSITION FOR USE IN OPTICAL STEREOLITHOGRAPHY, AND OPTICALLY SHAPED ARTICLE PRODUCED BY CURING THE COMPOSITION - The present invention aims to provide a radiation-curing liquid resin composition for optical tridimensional modeling having good storage stability. The suitable radiation-curing liquid resin composition for optical tridimensional modeling of the present invention includes a compound represented by the below general formula (1), a compound having phenolic hydroxyl group, a cationic polymerizable compound, a radical polymerization initiator, a radical polymerizable compound, one or more sulfur compound selected from the group consisting of 2-mercaptobenzothiazole, 2-(4-morpholinodithiobenzothiazole, diisopropylxantogendisulfide and diphenyldisulfide, a polyether polyol compound. | 06-16-2011 |
| 20110143279 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a sulfonate or sulfonic acid group-containing photoacid generator and a resin. The sulfonate or sulfonic acid group-containing photoacid generator includes a partial structure shown by a following formula (1), | 06-16-2011 |
| 20110129602 | DIRUTHENIUM COMPLEX, AND MATERIAL AND METHOD FOR CHEMICAL VAPOR DEPOSITION - A diruthenium complex such as tetra(μ-formato)diruthenium(II,II) or tetra(μ-formato)(dehydrate)diruthenium(II,II), a material for chemical vapor deposition which comprises the complex, and a method of forming a ruthenium film from the material by chemical vapor deposition. | 06-02-2011 |
| 20110123936 | RESIST PATTERN COATING AGENT AND RESIST PATTERN-FORMING METHOD - A resist pattern coating agent includes a hydroxyl group-containing resin, a solvent, and at least two compounds including at least two groups shown by a following formula (1), compounds including a group shown by a following formula (2), and compounds including a group shown by a following formula (4). | 05-26-2011 |
| 20110118422 | LIQUID CRYSTAL ALIGNING AGENT, METHOD OF PRODUCING A LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention relates to a liquid crystal aligning agent which contains at least one selected from the group consisting of a polysiloxane having a structure represented by the following formula (S-0) and synthesized through the step of hydrolyzing or hydrolyzing/condensing a silane compound in the presence of an alkali metal compound or an organic base, a hydrolysate thereof and a condensate of the hydrolysate: | 05-19-2011 |
| 20110117821 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD USING THE SAME, AND METHOD OF RECYCLING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION - A chemical mechanical polishing aqueous dispersion includes (A) abrasive grains, (B) an organic acid, and (C1) copper ions or (C2) at least one kind of metal atoms selected from Ta, Ti, and Rb, the chemical mechanical polishing aqueous dispersion including the copper ions (C1) at a concentration of 1×10 | 05-19-2011 |
| 20110117489 | COMPOUND AND RADIATION-SENSITIVE COMPOSITION - A compound shown by the following formula (1). | 05-19-2011 |
| 20110111349 | RESIN COMPOSITION FOR MAKING RESIST PATTERN INSOLUBLE, AND METHOD FOR FORMATION OF RESIST PATTERN BY USING THE SAME - A resist pattern-insolubilizing resin composition is used in a resist pattern-forming method. The resist pattern-insolubilizing resin composition includes solvent and a resin. The resin includes a first repeating unit that includes a hydroxyl group in its side chain and at least one of a second repeating unit derived from a monomer shown by a following formula (1-1) and a third repeating unit derived from a monomer shown by a following formula (1-2), | 05-12-2011 |
| 20110105700 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention relates to a liquid crystal aligning agent containing a radiation sensitive polyorganosiloxane which is obtained by reacting at least one selected from the group consisting of a polyorganosiloxane having a recurring unit represented by the following formula (1), a hydrolysate thereof and a condensate of the hydrolysis with a cinnamic acid derivative having at least one group selected from the group consisting of a carboxyl group, a hydroxyl group, —SH, —NCO, —NHR (R is a hydrogen atom or an alkyl group having 1 to 6 carbon atoms), —CH═CH | 05-05-2011 |
| 20110104612 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, AND RESIST PATTERN FORMATION METHOD - A positive-tone radiation-sensitive composition is used in a resist pattern-forming method as a first positive-tone radiation-sensitive composition. A positive-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer includes an acid-labile group and a crosslinkable group. The resist pattern-forming method includes providing the first positive-tone radiation-sensitive composition on a substrate to form a first resist pattern on the substrate. The first resist pattern is made to be inactive to light or heat so that the first resist pattern is insoluble in a second positive-tone radiation-sensitive composition. The second positive-tone radiation-sensitive composition is provided on the substrate to form a second resist pattern on the substrate on which the first resist pattern is formed. | 05-05-2011 |
| 20110104611 | NOVEL COMPOUND, POLYMER, AND RADIATION-SENSITIVE COMPOSITION - A compound is shown by a following formula (1), | 05-05-2011 |
| 20110086938 | NEGATIVE RADIATION-SENSITIVE RESIN COMPOSITION - A negative-tone radiation-sensitive resin composition includes an alkali-soluble resin, a radically polymerizable compound, a radiation-sensitive radical initiator, and an organic solvent. The alkali-soluble resin includes a phenolic hydroxyl group. The radically polymerizable compound includes an ethylenically unsaturated double bond. The organic solvent includes an ethylene glycol organic solvent having a saturation vapor pressure of 3 mmHg or less at 20° C. and 1 atmosphere. | 04-14-2011 |
| 20110082309 | METHOD OF PRODUCING ORGANOSILICON COMPOUND - A simple method of producing an organosilicon compound of a formula R | 04-07-2011 |
| 20110081780 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion includes (A) silica particles, and (B1) an organic acid, the number of silanol groups included in the silica particles (A) calculated from a signal area of a | 04-07-2011 |
| 20110077364 | COMPOSITION CONTAINING SILICON-CONTAINING POLYMER, CURED PRODUCT OF THE COMPOSITION, SILICON-CONTAINING POLYMER, AND METHOD OF PRODUCING THE SILICON-CONTAINING POLYMER - A composition includes a curing agent and a silicon-containing polymer. The silicon-containing polymer includes a structural unit (A1) and a structural unit (A2). The structural unit (A1) is shown by a formula (1), in which each of R | 03-31-2011 |
| 20110076619 | METHOD FOR MODIFYING FIRST FILM AND COMPOSITION FOR FORMING ACID TRANSFER RESIN FILM USED THEREFOR - A first film-modifying method includes forming a second film on a first film that includes an acid-dissociable group. The second film is an acid transfer resin film that includes a photoacid generator. The second film is exposed via a mask so that the second film generates an acid. The acid generated by the second film is transferred to the first film. The second film is removed | 03-31-2011 |
| 20110068301 | LIQUID CRYSTAL ALIGNING AGENT, METHOD OF PRODUCING A LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE - The present invention relates to a liquid crystal aligning agent which contains a reaction product of at least one selected from the group consisting of a polysiloxane having a structure represented by the following formula (S-1), a hydrolysate thereof and a condensate of the hydrolysate and a compound represented by the following formula (1): | 03-24-2011 |
| 20110059680 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion includes (A) a graft polymer that includes an anionic functional group in a trunk polymer, and (B) abrasive grains. | 03-10-2011 |
| 20110053799 | METHOD OF PRODUCING MICROARRAY SUBSTRATE, RADIATION-SENSITIVE COMPOSITION, PARTITION OF MICROARRAY SUBSTRATE, METHOD OF PRODUCING BIOCHIP, AND BIOCHIP - A method is of producing a microarray substrate that includes a substrate, a partition that is formed on a surface of the substrate, and an area that is positioned over the substrate and defined by the partition. The method includes forming a first film on the substrate using a radiation-sensitive composition. The radiation-sensitive composition includes a coloring agent (A) including at least one of a violet pigment (a2) and a compound (a1) shown by a formula (1) in which each of R | 03-03-2011 |
| 20110053462 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion including (A) silica particles, and (B1) an organic acid, the sodium content, the potassium content, and the ammonium ion content of the silica particles (A) determined by ICP atomic emission spectrometry, ICP mass spectrometry, or ammonium ion quantitative analysis using ion chromatography having a relationship in which the sodium content is 5 to 500 ppm and at least one of the potassium content and the ammonium ion content is 100 to 20,000 ppm. | 03-03-2011 |
| 20110053340 | METHOD OF FORMING A TRENCH ISOLATION - A method of forming a trench isolation, comprising the steps of:
| 03-03-2011 |
| 20110043739 | LIQUID CRYSTAL ALIGNING AGENT, LIQUID CRYSTAL ALIGNMENT FILM AND LIQUID CRYSTAL DISPLAY DEVICE - Disclosed is a liquid crystal orientating agent which contains a liquid crystal orientating polyorganosiloxane obtained by reacting a specified reactive polyorganosiloxane typified by the hydrolysis condensate of 2-(3,4-epoxycyclohexyl)ethyltrimethoxysilane and a reactive compound which includes a specified compound typified by stearic acid. The liquid crystal orientating agent of this invention can form liquid crystal orientating films which have excellent liquid crystal orientating properties, a high level of heat resistance and light resistance, exhibit little reduction of voltage retention even in high temperature environments and when irradiated with light of high intensity, and excellent residual image characteristics, and it also has excellent storage stability. | 02-24-2011 |
| 20110042789 | MATERIAL FOR CHEMICAL VAPOR DEPOSITION, SILICON-CONTAINING INSULATING FILM AND METHOD FOR PRODUCTION OF THE SILICON-CONTAINING INSULATING FILM - A chemical vapor deposition material includes an organosilane compound shown by the following general formula (1). | 02-24-2011 |
| 20110027718 | RADIATION-SENSITIVE RESIN COMPOSITION AND COMPOUND - A radiation-sensitive resin composition includes a compound shown by a formula (1) in which R | 02-03-2011 |
| 20110015302 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER, AND RUBBER COMPOSITION - A method for producing a modified conjugated diene polymer includes a modification step (A) that subjects a conjugated diene polymer having a cis-1,4-bond content of 98.5% or more and possessing an active end to a modification reaction to introduce an alkoxysilane compound having two or more reactive groups including an alkoxysilyl group into the active end of the conjugated diene polymer, and a condensation step (B) that subjects the residue of the alkoxysilane compound introduced into the active end to a condensation reaction in the presence of a condensation catalyst that includes at least one element among the elements of the groups 4A, 2B, 3B, 4B, and 5B in the periodic table. The method can produce a modified conjugated diene polymer that exhibits low heat build-up and excellent wear resistance. | 01-20-2011 |
| 20110014569 | RADIATION-SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a solvent and a polymer. The polymer includes a first repeating unit shown by a general formula (1) in which R | 01-20-2011 |
| 20110008730 | POSITIVE-TYPE RADIATION-SENSITIVE COMPOSITION, CURED FILM, INTERLAYER INSULATING FILM, METHOD OF FORMING INTERLAYER INSULATING FILM, DISPLAY DEVICE, AND SILOXANE POLYMER FOR FORMING INTERLAYER INSULATING FILM - The present invention provides a positive-type radiation-sensitive composition containing (A) a siloxane polymer, and (B) a quinone diazide compound, in which the content of aryl groups relative to Si atoms in the siloxane polymer (A) is greater than 60% by mole and no greater than 95% by mole. | 01-13-2011 |
| 20100331440 | RADIATION-SENSITIVE COMPOSITION, POLYMER AND MONOMER - A polymer includes a repeating unit shown by a general formula (1) in which R | 12-30-2010 |
| 20100324329 | COMPOUND - A compound is shown by the following formula (5) in which at least one of R | 12-23-2010 |
| 20100323292 | RESIST PATTERN FORMATION METHOD, AND RESIN COMPOSITION CAPABLE OF INSOLUBILIZING RESIST PATTERN - A resist pattern formation method includes (1) a step of forming a first resist pattern which includes forming a first resist layer on a substrate, selectively exposing the first resist layer to radiation through a mask, and developing the exposed first resist layer, (2) a step of insolubilizing the first resist pattern by coating the first resist pattern with a resist pattern insolubilizing resin composition, baking or curing with UV, and developing the resist pattern insolubilizing resin composition, (3) a step of forming a second resist layer on the insolubilized resist pattern and selectively exposing the second resist layer to radiation through a mask, and (4) a step of developing the exposed second resist layer to form a second resist pattern. | 12-23-2010 |
| 20100317794 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER, AND RUBBER COMPOSITION - A method for producing a modified conjugated diene polymer includes carrying out a modification reaction that reacts a modifier that includes a specific compound with a conjugated diene polymer having a cis-1,4-bond content of 98.5% or more and possessing an active end to introduce the modifier into the active end of the conjugated diene polymer to obtain a modified conjugated diene polymer. The modified conjugated diene polymer that exhibits excellent wear resistance, excellent mechanical properties, and reduced cold flow can be obtained by the method. | 12-16-2010 |
| 20100311630 | SURFACE TREATMENT COMPOSITION, SURFACE TREATMENT METHOD, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE - A surface treatment composition of this invention is a composition for treating a metal wiring-including surface of a semiconductor substrate, which includes a compound (A) represented by a specific structural formula and a solvent (B) having a boiling point at one atmospheric pressure of 50 to 300° C., and has a pH of 4 to 11. | 12-09-2010 |
| 20100310988 | RESIST PATTERN-FORMING METHOD AND RESIST PATTERN MINIATURIZING RESIN COMPOSITION - A resist pattern-forming method includes forming a first resist pattern using a first positive-tone radiation-sensitive resin composition. A resist pattern-miniaturizing resin composition is applied to the first resist pattern. The resist pattern-miniaturizing resin composition applied to the first resist pattern is baked and developed to form a second resist pattern that is miniaturized from the first resist pattern. A resist pattern-insolubilizing resin composition is applied to the second resist pattern. The resist pattern-insolubilizing resin composition applied to the second resist pattern is baked and washed to form a third resist pattern that is insoluble in a developer and a second positive-tone radiation-sensitive resin composition. A second resist layer is formed on the third resist pattern using the second positive-tone radiation-sensitive resin composition. The second resist layer is exposed and developed to form a fourth resist pattern. | 12-09-2010 |
| 20100310987 | POLYMER, RADIATION-SENSITIVE COMPOSITION, MONOMER, AND METHOD OF PRODUCING COMPOUND - A radiation-sensitive composition includes (A) an acid-dissociable group-containing polymer, and (B) a radiation-sensitive acid generator. The acid-dissociable group-containing polymer (A) includes a polymer that includes a repeating unit shown by a general formula (1) in which R | 12-09-2010 |
| 20100285405 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin, a radiation-sensitive acid generator, an acid diffusion controller, and a mixed solvent. The radiation-sensitive acid generator includes a compound (I) shown by a following general formula (I). The mixed solvent includes about 50 mass % to about 90 mass % of propylene glycol monomethyl ether acetate, | 11-11-2010 |
| 20100276186 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, HARDENING PRODUCT THEREOF, AND CIRCUIT BOARD EQUIPPED THEREWITH - A photosensitive insulating resin composition capable of forming an interlayer insulating film, or planarized film, or surface protective film, or insulating film for high-density mount substrate excelling in properties, such as resolution, adherence, thermal impact, electrical insulation, patterning performance and elongation; a hardening product thereof; and a circuit board equipped with the hardening product. There is provided a positive photosensitive insulating resin composition comprising an alkali-soluble resin; a compound having a quinonediazido group; and crosslinked resin particles of a particulate copolymer whose 20 to 90 mol % constituent is derived from a hydroxylated and/or carboxylated monomer. | 11-04-2010 |
| 20100273976 | POLYIMIDE-BASED MATERIAL, COMPOSITION AND FILM, AND MANUFACTURING METHOD THEREOF - A polyimide-type material that exhibits an excellent heat resistance and moldability such as easiness of molding into a film configuration and low process load, and a film made from this polyimide-type material are provided. The polyimide-type material contains a polyamic acid and/or polyimide obtained by reacting (A) at least one acyl compound selected from the group consisting of 1-cis-2-cis-3-trans-4-trans-cyclopentanetetracarboxylic acid, 1-cis-2-cis-3-trans-4-trans-cyclopentanetetracarboxylic acid dianhydride, and reactive derivatives thereof, with (B) an imino-forming compound. | 10-28-2010 |
| 20100267918 | AMINO GROUP-CONTAINING CONJUGATED DIENE POLYMER AND METHOD FOR PRODUCING THE SAME, AND BLOCK COPOLYMER AND METHOD FOR PRODUCING THE SAME - A method for producing an amino group-containing conjugated diene polymer includes polymerizing a conjugated diene compound in the presence of a reaction product of 1,3-bis(diphenylethenyl)benzene or a derivative thereof and an organolithium compound to obtain a conjugated diene polymer, and reacting the conjugated diene polymer with a modifier. | 10-21-2010 |
| 20100266953 | COPOLYMER AND TOP COATING COMPOSITION - A resin composition for forming a top coat which can be formed on a photoresist film without causing intermixing with the photoresist film, can maintain a stable film coating which is not eluted into a medium during immersion lithography, does not impair pattern profiles during dry exposure (which is not immersion lithography), and can be easily dissolved in an alkaline developer. The resin is a copolymer which has a recurring unit (I) having a carboxyl group, a recurring unit (II) having a sulfo group and a recurring unit obtained by copolymerizing fluoroalkyl(meth)acrylates having 1 to 20 carbon atoms in a fluoroalkyl group thereof other than a recurring unit having a side chain that includes an alcoholic hydroxyl group having a fluoroalkyl group at least in an α-position thereof, the copolymer having a weight average molecular weight determined by gel permeation chromatography of 2,000 to 100,000. | 10-21-2010 |
| 20100261925 | METHOD FOR PRODUCING SILICON COMPOUND - A method of producing a silicon compound shown by the following general formula (7) includes reacting an organomagnesium compound shown by the following general formula (1) with an organosilane compound shown by the following general formula (2) in a solvent that contains at least one compound selected from a compound shown by the following general formula (3), a compound shown by the following general formula (4), a compound shown by the following general formula (5), and a compound shown by the following general formula (6). | 10-14-2010 |
| 20100255420 | RADIATION SENSITIVE RESIN COMPOSITION AND POLYMER - A radiation-sensitive resin composition includes a polymer, an acid-labile group-containing resin, a radiation-sensitive acid generator, and a solvent, the polymer including repeating units shown by following general formulas (1) and (2). | 10-07-2010 |
| 20100255416 | COMPOSITION FOR FORMING UPPER LAYER FILM FOR IMMERSION EXPOSURE, UPPER LAYER FILM FOR IMMERSION EXPOSURE, AND METHOD OF FORMING PHOTORESIST PATTERN - The object of the invention is to provide a composition for forming an upper layer film for immersion exposure capable of forming an upper layer film effectively inhibited from developing defects through an immersion exposure process, such as a watermark defect and dissolution residue defect. Also provided are an upper layer film for immersion exposure and a method of forming a resist pattern. The composition for forming an upper layer film includes a resin ingredient and a solvent. The resin ingredient includes a resin (A) having at least one kind of repeating units selected among those represented by the formulae (1-1) to (1-3) and at least either of the two kinds of repeating units represented by the formulae (2-1) and (2-2). (1-1) (1-2) (1-3) (2-1) (2-2) [In the formulae, R | 10-07-2010 |
| 20100252774 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, METHOD OF PREPARING THE SAME, CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION PREPARATION KIT, AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion that is used to polish a polishing target that includes a wiring layer that contains tungsten, the chemical mechanical polishing aqueous dispersion including: (A) a cationic water-soluble polymer; (B) an iron (III) compound; and (C) colloidal silica having an average particle diameter calculated from a specific surface area determined by the BET method of 10 to 60 nm, the content (M | 10-07-2010 |
| 20100248167 | PATTERN-FORMING METHOD - A pattern-forming method includes selectively exposing a resist layer formed using a positive-tone radiation-sensitive resin composition including a resin component and an acid generator. The resist layer is developed to form a first pattern. An uncrosslinked embedded section is formed adjacent the first the pattern using a pattern-forming resin composition including a polymer. The polymer has a carbon content higher than that of the resin component, does not include silicon atom in a molecule, and is crosslinkable due to an acid generated from the acid generator. The uncrosslinked embedded section is crosslinked in an area around an interface with the first pattern to form an array structure. The first pattern, a first crosslinked section, the uncrosslinked embedded section, and a second crosslinked section are repeatedly arranged in the array structure in this order. The first pattern and the uncrosslinked embedded section are removed to form a second pattern. | 09-30-2010 |
| 20100239981 | POLYMER AND POSITIVE-TONE RADIATION-SENSITIVE RESIN COMPOSITION - A polymer includes a repeating unit (a-1) shown by a following formula (a-1), a repeating unit (a-2) shown by a following formula (a-2), and a GPC weight average molecular weight of about 1000 to about 100,000, | 09-23-2010 |
| 20100233635 | METHOD OF FORMING PATTERN AND COMPOSITION FOR FORMING OF ORGANIC THIN-FILM FOR USE THEREIN - A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion. | 09-16-2010 |
| 20100233632 | SILICON-CONTAINING FILM-FORMING COMPOSITION, SILICON-CONTAINING FILM, AND PATTERN FORMING METHOD - A silicon-containing film-forming composition includes a polysiloxane and organic solvent. The polysiloxane includes a first structural unit, a second structural unit, and a third structural unit. The first structural unit is derived from a tetraalkoxysilane. The second structural unit is derived from a compound shown by a formula (1), wherein R | 09-16-2010 |
| 20100227941 | STEREOLITHOGRAPHY RESIN COMPOSITIONS AND THREE-DIMENSIONAL OBJECTS MADE THEREFROM - A photocurable resin composition for three-dimensional photofabrication operations, including stereolithography, comprising (A) a cationically polymerizable compound having two or more bisphenol structures and one or more hydroxyl groups, (B) a cationically polymerizable compound other than the component (A), (C) a cationic photoinitiator, (D) a radically polymerizable compound, (E) a radical photoinitiator, and (F) multilayer polymer particles having a core and a shell layer, the shell layer containing functional group-modified rubber polymer particles having at least one reactive functional group. | 09-09-2010 |
| 20100222502 | PROCESS FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER OBTAINED BY THE PROCESS, AND RUBBER COMPOSITION CONTAINING THE SAME - A process for producing a modified conjugated diene polymer includes subjecting an active terminal of a conjugated diene polymer having a vinyl content of less than 10% and a cis-1,4 bond content of 75% or more to a modification reaction with an alkoxysilane compound, and subjecting the alkoxysilane compound (residue) to a condensation reaction in an aqueous solution at a pH of 9 to 14 and a temperature of 85 to 180° C. in the presence of a condensation accelerator including a compound containing titanium. The modified conjugated diene polymer exhibits low heat build-up and increased reinforcing properties when used for a rubber composition, and exhibits excellent wear resistance, mechanical characteristics, and processability. | 09-02-2010 |
| 20100221918 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING AND METHOD FOR PREPARING THE SAME, KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE - A chemical mechanical polishing aqueous dispersion includes (A) a sulfonic acid group-containing water-soluble polymer, (B) an amino acid, (C) abrasive grains, and (D) an oxidizing agent. | 09-02-2010 |
| 20100221664 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition includes (A) a first polymer which becomes alkali-soluble by the action of an acid and does not contain a fluorine atom, (B) a second polymer having a repeating unit (b1) shown by the following formula (1) and a fluorine-containing repeating unit (b2), and (C) a radiation-sensitive acid generator, the content of the second polymer (B) in the composition being 0.1 to 20 parts by mass relative to 100 parts by mass of the first polymer (A). | 09-02-2010 |
| 20100221659 | COMPOUND, SALT, AND RADIATION-SENSITIVE RESIN COMPOSITION - A compound has a partial structure shown by a following formula (1), | 09-02-2010 |
| 20100216959 | PROCESS FOR PRODUCTION OF PHOTORESIST RESINS - The object of the present invention is to provide a method for production of a photoresist resin which enables to reduce the amount of solvent used, to remove effectively impurities such as low molecular components and metal components and to prepare easily a resin having a narrow molecular weight distribution. The present invention is a method for production of a photoresist resin by polymerizing a polymerizable compound in the presence of a solvent and the method comprises (1) a resin solution preparation process in which a resin solution containing a photoreist resin is prepared, and (2) a purification process in which the resin solution is purified using a ultrafilter membrane. | 08-26-2010 |
| 20100204424 | NON-SPECIFIC ADSORPTION INHIBITOR - A non-specific adsorption inhibitor includes a water-soluble polymer obtained by polymerizing a monomer unit that includes a monomer (A) that forms a polymer that has a lower critical solution temperature (LCST) of 80° C. or less in an aqueous solution under normal pressure when subjected to homopolymerization, and a monomer (B) that forms a polymer that does not have the LCST in an aqueous solution under normal pressure when subjected to homopolymerization. | 08-12-2010 |
| 20100203452 | RADIATION-SENSITIVE COMPOSITION - A radiation-sensitive composition includes a polymer (A) which includes a repeating unit (1) shown by the following formula (1) and a repeating unit (2) shown by the following formula (2), and a radiation-sensitive acid generator (B). | 08-12-2010 |
| 20100203447 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes (A) an acid labile group-containing resin which becomes alkali-soluble by an action of an acid, (B) a radiation-sensitive acid generator, and (C) a solvent. The resin (A) includes repeating units shown by formulas (1) and (2), wherein R | 08-12-2010 |
| 20100196822 | PHOTOSENSITIVE INSULATING RESIN COMPOSITION, CURED PRODUCT OF THE COMPOSITION, AND METHOD OF PRODUCING INSULATING FILM - A photosensitive insulating resin composition includes (A) an alkali-soluble resin that contains (a1) a structural unit derived from a crosslinkable monomer and (a2) a structural unit having a phenolic hydroxyl group, (B) a crosslinking agent, (C) a photosensitive compound, and (D) a solvent. | 08-05-2010 |
| 20100190109 | ACID TRANSFER COMPOSITION, ACID TRANSFER FILM, AND PATTERN FORMING METHOD - The acid transfer composition of the invention comprises a radiation-sensitive acid generator, a polymer having a nitrogen-containing group and a ketone-based solvent. The composition may comprise further a sensitizer. The pattern forming method of the invention comprises a second resin film formation process in which the acid transfer composition is used to form a second resin film (acid transfer film) on a first resin film containing an acid-dissociable group-containing resin, but not containing a radiation-sensitive acid generator, an exposure process for exposing the second resin film to a light through a mask to generate an acid in the second resin film, an acid transfer process for transferring the acid generated in the second resin film to the first resin film, and a second resin film removing process. | 07-29-2010 |
| 20100190104 | METHOD FOR PATTERN FORMATION AND RESIN COMPOSITION FOR USE IN THE METHOD - A pattern forming method includes (1) selectively exposing a first resist layer, and developing the exposed first resist layer to form a first pattern, (2) applying a resin composition containing a hydroxyl group-containing resin and a solvent to the first pattern, baking the applied resin composition, and developing the baked resin composition to form a second pattern, the hydroxyl group-containing resin becoming insoluble or scarcely soluble in a developer when baked, and (3) totally or selectively exposing the second pattern to make the second pattern partly soluble in the developer, and developing the exposed second pattern to form a third pattern in which at least a hole or a groove is formed in the second pattern. | 07-29-2010 |
| 20100178620 | INVERTED PATTERN FORMING METHOD AND RESIN COMPOSITION - A method for forming an inverted pattern includes forming a photoresist pattern on a substrate, filling a space formed by the photoresist pattern with a resin composition including a polysiloxane and a solvent, and removing the photoresist pattern to form an inverted pattern. The resin composition includes (A) a polysiloxane obtained by hydrolysis and condensation of two types of hydrolysable silane compounds having a specific structure, and (B) an organic solvent containing an alcohol or ether having a specific structure. | 07-15-2010 |
| 20100178608 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin (A1) that includes a repeating unit shown by the following formula (1-1) and a repeating unit shown by the following formula (1-2), and a radiation-sensitive acid generator (B). The radiation-sensitive resin composition exhibits excellent sensitivity, and can reduce a mask error factor (MEEF). | 07-15-2010 |
| 20100174103 | MATERIAL FOR FORMING SILICON-CONTAINING FILM, AND SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME - A silicon-containing film-forming material includes at least one organosilane compound shown by the following general formula (1). | 07-08-2010 |
| 20100174042 | AROMATIC COMPOUND AND SULFONATED POLYARYLENE POLYMER - Sulfonated polymers have excellent processability and methanol resistance. | 07-08-2010 |
| 20100173196 | POLYMER COMPOSITION, PASTE FOR USE IN ELECTRODE FOR SECONDARY BATTERY, AND ELECTRODE FOR SECONDARY BATTERY - A paste for a secondary battery electrode, comprising an electrode active material and a polymer composition comprising (a) a fluorine-containing polymer and (b) a functional group-containing polymer which contains a structural unit originating from an alkyl (meth)acrylate and a structural unit originating from at least one monomer selected from the group consisting of a sulfonic acid group-containing unsaturated monomer, an amide group-containing unsaturated monomer, and a sulfonic acid group and amide group-containing unsaturated monomer is provided. | 07-08-2010 |
| 20100168327 | POLYMER AND PROCESS FOR PRODUCING THE SAME, COMPOSITION FOR FORMING INSULATING FILM, AND INSULATING FILM AND METHOD OF FORMING THE SAME - A process for producing a polymer includes mixing (A) a polysiloxane compound and (B) a polycarbosilane compound in the presence of a catalyst, water, and an organic solvent, and heating the mixture. | 07-01-2010 |
| 20100167204 | RADIATION-SENSITIVE INSULATION RESIN COMPOSITION, CURED ARTICLE, AND ELECTRONIC DEVICE - A radiation-sensitive insulation resin composition contains (A) an alkali-soluble resin, (B) a crosslinking agent, (C) a radiation-sensitive acid generator, (D) an inorganic filler, and (E) crosslinked rubber particles. The composition can be developed using an alkali developer, does not incur damages in insulating properties and resolution properties, suppresses thermal deformation, and can produce a layer exhibiting excellent adhesion to conductor wiring layers. | 07-01-2010 |
| 20100167024 | NEGATIVE-TONE RADIATION-SENSITIVE COMPOSITION, CURED PATTERN FORMING METHOD, AND CURED PATTERN - A negative-tone radiation-sensitive composition includes a polymer, a photoacid generator, and a solvent. The polymer has a polystyrene-reduced weight average molecular weight of 4000 to 200,000, and is obtained by hydrolysis and condensation of at least one hydrolyzable silane compound among compounds shown by R | 07-01-2010 |
| 20100152369 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, AND RUBBER COMPOSITION - The method for producing a modified conjugated diene based (co)polymer, according to the present invention comprises a step of reacting a conjugated diene based (co)polymer with a metal halide compound to obtain a modified conjugated diene based (co)polymer, the conjugated diene based (co)polymer having a weight-average molecular weight of 150,000 to 2,000,000 and being obtained by bonding, to a polymer having at least a conjugated diene unit, an alkoxysilyl group and an optionally protected primary amino group. The method can satisfactorily produce a conjugated diene based (co)polymer which has a high Mooney viscosity, excellent shape stability and good processability. | 06-17-2010 |
| 20100152308 | NOVEL AROMATIC COMPOUND AND POLYARYLENE COPOLYMER HAVING NITROGEN-CONTAINING HETEROCYCLE INCLUDING SULFONIC ACID GROUP IN SIDE CHAIN - Provided is a solid polymer electrolyte having increased heat resistance and high proton conductivity and a proton conductive membrane composed of the electrolyte. Also provided is a copolymer having a sulfonic acid group. The copolymer includes a repeating unit represented by Formula (1): | 06-17-2010 |
| 20100151384 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME - A composition for a resist underlayer film is provided. The composition has excellent storage stability and can form a resist underlayer film which has excellent adhesion to a resist film, can improve reproducibility of a resist pattern and is resistant to an alkaline liquid used in development and to oxygen asking during the removal of a resist. The composition comprises a hydrolyzate and/or a condensate of a silane compound of the following formula (A), | 06-17-2010 |
| 20100140754 | FILM-FORMING MATERIAL, SILICON-CONTAINING INSULATING FILM AND METHOD FOR FORMING THE SAME - Disclosed is a silicon-containing film-forming material which contains an organosilane compound represented by the following general formula (1). (In the formula, R1-R4 may be the same or different and represent a hydrogen atom, an alkyl group having 1-4 carbon atoms, a vinyl group or a phenyl group; R5 represents an alkyl group having 1-4 carbon atoms, an acetyl group or a phenyl group; n represents an integer of 1-3; and m represents an integer of 1-2.) | 06-10-2010 |
| 20100137490 | RESIN COMPOSITION, CURED PRODUCT AND OPTICAL PARTS - It is provided for a resin composition including (A) at least one polyamic acid having the structure represented by the following formula (1): | 06-03-2010 |
| 20100130671 | CONJUGATED DIOLEFIN COPOLYMER RUBBER, METHOD FOR PRODUCING THE SAME, RUBBER COMPOSITION AND TIRE - A conjugated diolefin copolymer rubber is produced by copolymerization of a conjugated diolefin and an aromatic vinyl compound and has a primary amino group and an alkoxysilyl group bonded to the copolymer chain. The conjugated diolefin copolymer rubber contains the aromatic vinyl compound in an amount of 5 to 60 wt %. The aromatic vinyl compound is densely distributed in one terminal of the copolymer chain, and is scarcely distributed in the other terminal. The conjugated diolefin copolymer rubber has a temperature difference (ΔTg) of 25° C. or more. The conjugated diolefin copolymer rubber has low hysteresis loss properties as well as improved abrasion resistance, rupture characteristics, and road grip characteristics without impairing wet skid characteristics. A method for producing the conjugated diolefin copolymer rubber is also disclosed. | 05-27-2010 |
| 20100130669 | MODIFIED HYDROGENATED DIENE POLYMER COMPOSITION - A modified hydrogenated diene polymer composition includes (A) a modified hydrogenated diene polymer obtained by hydrogenating a diene polymer having a vinyl bond content of 20 to 70%, the modified hydrogenated diene polymer having a weight average molecular weight (Mw) of 100,000 to 1,700,000, a molecular weight distribution (Mw/Mn) of 1.0 to 3.0, and a hydrogenation rate of 72 to 96%, and containing a functional group, and (B) a diene rubber, the modified hydrogenated diene polymer composition containing the modified hydrogenated diene polymer (A) and the diene rubber (B) in an amount of 100 parts by mass in total, the amount of the modified hydrogenated diene polymer (A) being 60 to 95 parts by mass, and the amount of the diene rubber (B) being 5 to 40 parts by mass. | 05-27-2010 |
| 20100127724 | ANISOTROPIC CONDUCTIVE CONNECTOR, PROBE MEMBER AND WAFER INSPECTION SYSTEM - Provided is an anisotropic conductive connector and a prove member, each of which ensures that all of the conductive parts exhibit uniform conductivity when a pressing force is applied, even when the inspection target wafer has a large area and total number of inspection target electrodes of integrated circuits is 10,000 or more, and a wafer inspection system including the probe member. The anisotropic conductive connector includes a frame plate in which a plurality of anisotropic conductive film placement holes are formed, and elastic anisotropic conductive films respectively disposed in the anisotropic conductive film placement holes in the frame plate and supported by a peripheral part of the frame plate around the corresponding anisotropic conductive film placement hole, each of the elastic anisotropic conductive films includes a plurality of connection conductive parts each extending in a thicknesswise direction of the elastic anisotropic conductive film, being disposed corresponding to a connection target electrode, and comprising an elastic polymer substance and magnetic conductive particles densely contained in the elastic polymer substance; and an insulating part that insulates the connection conductive parts to one another, and the connection conductive parts of the elastic anisotropic conductive films disposed in a peripheral area of the frame plate having a thickness smaller than that of the connection conductive parts of the elastic anisotropic conductive films disposed in a center area of the frame plate. | 05-27-2010 |
| 20100113683 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, MODIFIED CONJUGATED DIENE BASED (CO)POLYMER, AND RUBBER COMPOSITION - The method for producing a modified conjugated diene based (co)polymer, according to the present invention comprises
| 05-06-2010 |
| 20100112475 | RESIN FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, COMPOSITION FOR FORMATION OF UPPER ANTIREFLECTIVE FILM, AND RESIST PATTERN FORMATION METHOD - The objective of the present invention is to provide a resin for forming an upper antireflective film and a composition for forming an upper antireflective film that can reduce a standing wave effect satisfactorily and lead excellent solubility in an alkaline developer in lithography and a method for forming a resist pattern. Specifically, the resin for forming an upper antireflective film has at least one unit selected from a repeating unit represented by the formula (1) and a repeating unit represented by the formula (2), has a weight average molecular weight of 1,000 to 100,000 as measured by GPC method, and is soluble in an alkaline developer. (In the formulae (1) and (2), R | 05-06-2010 |
| 20100105879 | SUPPORT HAVING PROTEIN IMMOBILIZED THEREON AND METHOD OF PRODUCING THE SAME - A method of producing a protein-immobilized support includes immobilizing a protein having a tag sequence on a support, the tag sequence including a sequence that includes three or more consecutive basic amino acids. | 04-29-2010 |
| 20100105827 | METHOD FOR PRODUCING MODIFIED CONJUGATED DIENE POLYMER, MODIFIED CONJUGATED DIENE POLYMER, AND RUBBER COMPOSITION - A method for producing a modified conjugated diene polymer includes a step (A) carrying out a primary modification reaction that reacts a heterocumulene compound having two or more specific functional groups with a conjugated diene polymer having a vinyl content of below 10% and a cis-1,4-bond content of 75% or more and possessing an active end to obtain a primary-modified conjugated diene polymer, and a step (B) carrying out a secondary modification reaction that reacts an active hydrogen-containing compound that includes one or more functional groups selected from the group consisting of an amino group, an imino group, a mercapto group, and a hydroxyl group with the primary-modified conjugated diene polymer to obtain a secondary-modified conjugated diene polymer. The method can produce a modified conjugated diene polymer that exhibits low heat build-up (low fuel consumption) and excellent wear resistance. | 04-29-2010 |
| 20100099260 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHNG AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE - A chemical mechanical polishing aqueous dispersion includes (A) colloidal silica having an average particle size calculated from the specific surface area determined by the BET method of 10 to 60 nm, (B) an organic acid having two or more carboxyl groups and one or more hydroxyl groups in one molecule, and (C) a quaternary ammonium compound shown by the following general formula (1), | 04-22-2010 |
| 20100081082 | COMPOSITION FOR RESIST UNDER LAYER FILM FORMATION AND METHOD FOR PATTERN FORMATION - A resist under layer film-forming composition comprises (A) an aminated fullerene having at least one amino group bonded to a fullerene skeleton, and (B) a solvent. The composition exhibits excellent etching resistance, causes an under layer film pattern to bend only with difficulty in a dry etching process, and can transfer a resist pattern faithfully onto a substrate to be processed with high reproducibility. | 04-01-2010 |
| 20100075501 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD - A chemical mechanical polishing aqueous dispersion is used to polish a polishing target that includes an interconnect layer that contains tungsten. The chemical mechanical polishing aqueous dispersion includes: (A) a cationic water-soluble polymer; (B) an iron (III) compound; and (C) colloidal silica particles. The content (M | 03-25-2010 |
| 20100068647 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes an acid-dissociable group-containing resin, a radiation-sensitive acid generator, and a solvent. The acid-dissociable group-containing resin includes a copolymer containing a repeating unit. The reparing unit includes an acid-dissociable group-containing repeating unit in an amount of more than about 55 mol % of a total amount of the repeating units in the copolymer. A content of the copolymer in the acid-dissociable group-containing resin is about 90 mass % or more of a total amount of the acid-dissociable group-containing resin. | 03-18-2010 |
| 20100063232 | POLYMERIZABLE SULFONIC ACID ONIUM SALT AND RESIN - A resin that includes a repeating unit shown by the following formula (10) has an excellent performance as a radiation sensitive acid generator, and exhibits only a small adverse effect on the environment and a human body. | 03-11-2010 |
| 20100048803 | METHOD FOR PRODUCING POLYMER FOR OIL-RESISTANT RUBBER, POLYMER FOR OIL-RESISTANT RUBBER, COMPOSITION FOR OIL-RESISTANT WEATHER-RESISTANT RUBBER, AND RUBBER MOLDED BODY - A method for producing a polymer for oil-resistant rubber, which comprises adding, to an aqueous dispersion of an unsaturated nitrile-conjugated diene copolymer (component A), a monomer composition (component B) containing at least one kind of monomer selected from the group consisting of a nitrile group-containing monomer (component B-1), a (meth)acrylic acid ester monomer (component B-2) and an aromatic vinyl compound monomer (component B-3), and conducting a polymerization reaction in a state that the ratio of the conjugated diene monomer present in the system, to the total monomers present in the system is controlled at 10 mol % or less. | 02-25-2010 |
| 20100040977 | RADIATION-SENSITIVE RESIN COMPOSITION - A radiation-sensitive resin composition includes a resin that includes a repeating unit shown by the following formula (1) and a solvent. The radiation-sensitive resin composition has an excellent performance as a radiation-sensitive acid generator, includes a resin that adversely affects the environment and a human body to only a small extent, and can form a resist film that has a high resolution and forms an excellent resist pattern. | 02-18-2010 |
| 20100040974 | UPPER LAYER FILM FORMING COMPOSITION AND METHOD OF FORMING PHOTORESIST PATTERN - An upper layer film forming composition for forming an upper layer film on the surface of a photoresist film includes (A) a resin dissolvable in a developer for the photoresist film and (B) a compound having a sulfonic acid residue group, the composition forming an upper layer film with a receding contact angle to water of 70° or more. The upper layer film forming composition of the present invention can form an upper layer film which has a sufficient transparency and is stably maintained without eluting the components into a medium without being intermixed with a photoresist film, can form a resist pattern with high resolution while effectively suppressing a defect, and can suppress a blob defect. | 02-18-2010 |
| 20100029057 | SILICONE RESIN COMPOSITION AND METHOD OF FORMING A TRENCH ISOLATION - A silicone resin which is represented by the following rational formula (1) and solid at 120° C.: | 02-04-2010 |
| 20100028802 | METHOD FOR RESIST UNDER LAYER FILM FORMATION, COMPOSITION FOR RESIST UNDER LAYER FILM FOR USE IN THE METHOD, AND METHOD FOR PATTERN FORMATION - This invention provides a method for resist under layer film formation, which can form a resist under layer film which can function as an anti-reflection film, is excellent in pattern transfer properties and etching resistance, and does not cause bending of a pattern even in the transfer of a fined pattern, and a composition for the resist under layer film for use in the method, and a method for pattern formation. The method for resist under layer film formation comprises the steps of coating a composition for resist under layer film formation (for example, a composition comprising a compound having a phenolic hydroxyl group, a solvent, and an accelerator) onto a substrate to be processed, and treating the formed coating film under an oxidizing atmosphere having an oxygen concentration of not less than 1% by volume and a temperature of 300° C. or higher to form a resist under layer film. | 02-04-2010 |
| 20100021852 | COMPOSITION FOR FORMATION OF UPPER LAYER FILM, AND METHOD FOR FORMATION OF PHOTORESIST PATTERN - A composition for formation of upper layer film, which is used for forming an upper layer film on the surface of a photoresist film and which comprises
| 01-28-2010 |
| 20100021707 | CYCLIC OLEFIN ADDITION COPOLYMER, METHOD FOR PRODUCING THE SAME, AND RETARDATION FILM OBTAINED FROM THE COPOLYMER - A cyclic olefin addition copolymer includes a structural unit (1) derived from a cyclic olefin compound with a C4 alkyl substituent group and a structural unit (2) derived from a cyclic olefin compound with a C5-12 alkyl substituent group, and optionally includes a structural unit (3) derived from another cyclic olefin compound. The novel cyclic olefin addition copolymers according to the present invention are excellent in melt-formability, transparency and heat resistance, have low water absorption properties, low dielectric constant and low metal content, and are suitably used in optical parts such as optical films. Processes according to the present invention produce the cyclic olefin addition copolymers at high yield with small amounts of catalysts. | 01-28-2010 |
| 20100016506 | PROTEIN STABILIZING AGENT - A method for stabilizing a protein by adding a copolymer to a composition containing the protein where the copolymer has: a repeating unit (A) represented by the following formula (1) and a repeating unit (B) represented by the following formula (2): | 01-21-2010 |
| 20100016500 | PROCESS FOR PRODUCING MODIFIED POLYMER, MODIFIED POLYMER OBTAINED BY THE PROCESS, AND RUBBER COMPOSITION CONTAINING THE SAME - A process for producing a modified polymer that exhibits low rolling resistance, excellent mechanical properties (e.g., tensile strength), high wet-skid resistance, and excellent wear resistance when vulcanized, a modified polymer obtained by the process, and a rubber composition containing the same. The process includes subjecting an alkali metal active end of a conjugated diene polymer to a modification reaction with an alkoxysilane compound, the conjugated diene polymer being produced by subjecting a diene monomer or a diene monomer and a monomer other than the diene monomer to anionic polymerization in a hydrocarbon solvent using an alkali metal initiator, and subjecting the resulting product to a condensation reaction in the presence of a condensation accelerator that includes a compound of at least one element among the elements of the groups 4A (excluding Ti), 2B, 3B, and 5B of the periodic table. | 01-21-2010 |
| 20100015442 | ADHESIVE COMPOSITION, METHOD FOR PRODUCING THE SAME AND ADHESIVE BODY - A pressure-sensitive adhesive composition includes a component (i) and a component (ii) and a component (i), the component (i) being a copolymer (I) obtained by hydrogenating a copolymer (I′) having a structure shown by [A-B] | 01-21-2010 |
| 20100009292 | RESIN COMPOSITION FOR MICROPATTERN FORMATION AND METHOD OF MICROPATTERN FORMATION - A resin composition which can increase the pattern shrink rate while maintaining the advantages of capability of effectually and precisely micronizing the resist pattern gaps irrespective of the surface conditions of the substrate and forming resist patterns exceeding the wavelength limit economically at low cost in a good condition having only small defects, and a method of efficiently forming a micropattern using the resin composition are disclosed. The resin composition for forming a micropattern includes a hydroxyl group-containing resin, a crosslinking component, and an alcohol solvent which contains an alcohol and not more than 10 mass % of water relative to the total solvent. The crosslinking component includes a compound having two or more acryloyloxy groups in the molecule. | 01-14-2010 |
| 20100007025 | ORGANIC SILICA FILM AND METHOD FOR FORMING SAME, COMPOSITION FOR FORMING INSULATING FILM OF SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING SAME, WIRING STRUCTURE AND SEMICONDUCTOR DEVICE - An insulating-film-forming composition for a semiconductor device comprising an organic silica sol with a carbon atom content of 11 to 17 atom % and an organic solvent is disclosed. The organic silica sol comprises a hydrolysis-condensation product P1 and a hydrolysis-condensation product P2. The hydrolysis-condensation product P1 is obtained by hydrolyzing and condensing (A) a silane monomer comprising a hydrolyzable group and (B) a polycarbosilane comprising a hydrolyzable group in the presence of (C) a basic catalyst, and the hydrolysis-condensation product P2 is obtained by hydrolyzing and condensing (D) a silane monomer comprising a hydrolyzable group. | 01-14-2010 |
| 20100003615 | UPPER LAYER-FORMING COMPOSITION AND PHOTORESIST PATTERNING METHOD - An upper layer-forming composition formed on a photoresist while causing almost no intermixing with the photoresist film and a photoresist patterning method are provided. The upper layer-forming composition is stably maintained without being eluted in a medium such as water during liquid immersion lithography and is easily dissolved in an alkaline developer. The upper layer-forming composition covers a photoresist film for forming a pattern by exposure to radiation. The composition comprises a resin dissolvable in a developer for the photoresist film and a solvent in which the resin is dissolved. The solvent has a viscosity of less than 5.2×10 | 01-07-2010 |
| 20090325383 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION AND CHEMICAL MECHANICAL POLISHING METHOD FOR SEMICONDUCTOR DEVICE - A chemical mechanical polishing aqueous dispersion according to the invention includes (A) 0.1 to 4 mass % of colloidal silica having an average particle diameter of 10 to 100 nm, and (B) 0.1 to 3 mass % of at least one ammonium salt selected from ammonium phosphate, diammonium phosphate, and ammonium hydrogen sulfate, the chemical mechanical polishing aqueous dispersion having a mass ratio (A)/(B) of the component (A) to the component (B) of 1 to 3 and a pH of 4 to 5 and being able to simultaneously polish at least two films that form a polishing target surface and are selected from a polysilicon film, a silicon nitride film, and a silicon oxide film. | 12-31-2009 |
| 20090325323 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, PRODUCTION METHOD THEREOF, AND CHEMICAL MECHANICAL POLISHING METHOD - There is provided an aqueous dispersion for chemical mechanical polishing that comprises abrasives comprising:
| 12-31-2009 |
| 20090318652 | NOVEL COMPOUND, POLYMER, AND RESIN COMPOSITION - A radiation-sensitive resin composition which has high transparency to radiation, excelling in basic properties as a resist such as sensitivity, resolution, and pattern shape, and, in particular, exhibiting high resolution performance, excellent DOF and LER, and high resistance to a liquid medium used in liquid immersion lithography is provided. Also provided are a polymer which can be used in the composition, a novel compound useful for synthesizing the polymer, and a method of producing the composition. A radiation-sensitive resin composition having an excellent resistance to a liquid medium can be obtained by using the novel compound shown by the following formula (1), | 12-24-2009 |
| 20090318618 | POLYMER COMPOSITION FOR AQUEOUS BINDER - A polymer composition for aqueous binders includes (1) a polymer obtained by emulsion polymerization of (b) a first monomer having one ethylenically unsaturated bond in the molecule and (c) a second monomer having two or more ethylenically unsaturated bonds in the molecule in the presence of (a) an emulsifier, and (2) a wax. | 12-24-2009 |
| 20090317043 | DRY FILM FOR OPTICAL WAVEGUIDE AND METHOD FOR MANUFACTURING OPTICAL WAVEGUIDE BY USING THE DRY FILM - Provided is an optical waveguide manufacturing method that makes the thickness of a clad layer in the vicinity of a core portion uniform. A first lamination film is fabricated by forming a clad layer by forming a first curable resin layer for clad formation on a first base film and curing the first curable resin layer, and forming a core portion by forming a second curable resin layer for core formation having a higher refractive index than that of the clad layer after cured on the clad layer and selectively curing the second curable resin layer. A second lamination film is fabricated by forming a clad layer by forming a third curable resin layer for clad formation on a second base film and curing the third curable resin layer. In the optical waveguide manufacturing method, the first lamination film in which the core portion is formed and the second lamination film are bonded together with a fourth curable resin layer for clad formation interposed therebetween, and the curable resin layer interposed between the first lamination film and the second lamination film is cured to form a clad layer. | 12-24-2009 |
| 20090312487 | OXIDE FINE PARTICLE-CONTAINING RESIN COMPOSITION AND PROCESS FOR PRODUCTION THEREOF - An oxide fine particle-containing resin composition is produced by mixing: (A) silicon oxide fine particles and/or metal oxide fine particles; and (B) an organic polymer having a silyl group in which a hydrolyzable group and/or a hydroxyl group is bonded to the silicon atom, in an organic solvent in the presence of a basic compound, an acidic compound or a metal chelate compound, thereby dispersing the oxide fine particles (A) in the organic solvent. The oxide fine particle-containing resin composition is a silyl group-containing resin composition in which the oxide fine particles are highly dispersed and gives a silyl group-containing resin cured product excellent in transparency and resistant to yellowing discoloration. | 12-17-2009 |
| 20090311622 | METHOD OF FORMING PATTERN, COMPOSITION FOR FORMING UPPER-LAYER FILM, AND COMPOSITION FOR FORMING UNDER-LAYER FILM - A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated. | 12-17-2009 |
| 20090305161 | LIQUID IMMERSION LITHOGRAPHY - A radiation-sensitive resin composition for liquid immersion lithography which produces an excellent pattern profile, exhibits excellent resolution, provides sufficient focal depth allowance, and elutes only the minimal amount in the liquid when brought in contact with the liquid during exposure to radiation. The radiation-sensitive resin composition forms a photoresist film in liquid immersion lithography, in which radiation is emitted through a liquid for use in liquid immersion lithography having a refractive index larger than 1.44 and smaller than 1.85 at a wavelength of 193 nm, existing between a lens and a photoresist, the composition comprising a resin having a recurring unit with a lactone structure, which is insoluble or scarcely soluble in alkali, but becomes soluble in alkali by the action of an acid, and a radiation-sensitive acid generator. | 12-10-2009 |
| 20090302266 | AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING AQUEOUS DISPERSION FOR CHEMICAL MECHANICAL POLISHING - A chemical mechanical polishing aqueous dispersion comprises (A) abrasive grains, (B) an organic acid, (C) a water-soluble polymer, (D) an oxidizing agent, and (E) water, the water-soluble polymer (C) having a weight average molecular weight of 50,000 to 5,000,000. | 12-10-2009 |
| 20090299086 | METHOD OF PRODUCING ORGANOSILICON COMPOUND - A method of producing an organosilicon compound includes substituting at least an OR | 12-03-2009 |
| 20090292088 | PROCESS FOR PRODUCTION OF CYCLIC OLEFIN ADDITION POLYMER - A process is provided whereby cycloolefin addition (co)polymers having excellent heat resistance, transparency and toughness and having a molecular weight adjusted such that the copolymers can form films, sheets and the like, are produced simply by using small amounts of a palladium catalyst and a molecular weight modifier without steps for removing the catalyst residues and unreacted monomers. The process for producing cycloolefin addition (co)polymers includes addition (co)polymerizing monomers including a cycloolefin compound as a main monomer, in the presence of ethene and catalysts including (a) an organic acid salt of palladium or a β-diketonate compound of palladium; (b) a cyclopentylphosphine compound; and (c) an ionic boron compound or an ionic aluminum compound. | 11-26-2009 |
| 20090291620 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD, AND CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION PREPARATION KIT - A chemical mechanical polishing aqueous dispersion includes: (A) an amino acid, (B) abrasive grains, (C) a surfactant, (D) an oxidizing agent, and (E) ammonia, the ratio (W | 11-26-2009 |
| 20090288855 | POSITIVE-TYPE RADIATION-SENSITIVE RESIN COMPOSITION FOR PRODUCING A METAL-PLATING FORMED MATERIAL, TRANSCRIPTION FILM AND PRODUCTION METHOD OF A METAL-PLATING FORMED MATERIAL - The positive-type radiation-sensitive resin composition for producing a metal-plating formed material relating to the present invention comprises (A) a polymer containing a structural unit having an acid-dissociative functional group, which is dissociated in the presence of an acid to generate an acidic functional group, and a crosslinking structure; (B) a radiation-sensitive acid generator; and (C) an organic solvent. The positive-type radiation-sensitive resin composition is excellent in sensitivity and resolution, exhibits excellent adhesion to a substrate, leaves no residue at an opening after development, and is capable of preventing occurrence of crack in the resin film after metal plating and push-in of plated metal into the resin film. | 11-26-2009 |
| 20090281237 | POLYCARBOSILANE, METHOD FOR PRODUCING SAME, SILICA COMPOSITION FOR COATING APPLICATION, AND SILICA FILM - A polycarbosilane has a main chain in which silicon atoms and carbon atoms are alternately repeated, and includes a structural unit shown by the following general formula (1), a structural unit shown by the following general formula (2), a structural unit shown by the following general formula (3), and a structural unit shown by the following general formula (4). | 11-12-2009 |
| 20090280433 | RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING LOW-MOLECULAR COMPOUND FOR USE THEREIN - A radiation-sensitive composition contains (A) a low-molecular-weight compound having one or more acid-dissociable groups which decompose by the action of an acid to enhance solubility in an alkaline developing solution and one or more radiation-sensitive acid-generating groups which generate an acid upon application of an active ray or radiation per molecule, and having a polystyrene-reduced number-average molecular weight (Mn) measured by gel permeation chromatography (GPC) of 500 to 4,000, and (B) a solvent. | 11-12-2009 |
| 20090272726 | Method for Manufacturing Display Apparatus and Manufacturing Apparatus of the Display Apparatus - [PROBLEM] A thin film laminated substrate is cut by a laser beam under certain conditions, so that a cut surface which is sufficient for a display apparatus can be obtained without damaging the thin film laminated substrate, and the cutting is enabled by a low-output inexpensive apparatus, so that a reduction in cost can be expected. | 11-05-2009 |
| 20090270525 | THERMOPLASTIC ELASTOMER COMPOSITION, FOAM PRODUCT, AND PROCESS FOR PRODUCTION OF THE COMPOSITION OR FOAM PRODUCT - A thermoplastic elastomer composition having a melt tension of 5.0 cN or more at 210° C. and a pulling rate of 2.0 m/min and a compression set of 80% or less when measured according to JIS K6262 at 70° C. and 22 hours is provided. The composition is obtained by dynamically treating a mixture of (A) a rubber and (B) a thermoplastic resin (B-1) and/or a thermoplastic resin composition (B-2) with heat in the presence of (C) a crosslinking agent. | 10-29-2009 |
| 20090269683 | RADIATION-SENSITIVE RESIN COMPOSITION AND COLOR FILTERS - A radiation sensitive resin composition comprising (A) a colorant, (B) an alkali-soluble resin, (C) a polyfunctional monomer and (D) a radiation sensitive radical generator, wherein
| 10-29-2009 |
| 20090264608 | METHOD FOR PRODUCING NORBORNENE BASED ADDITION (CO)POLYMER - By specifying a catalyst system (combination of catalyst and cocatalyst) which has high polymerization activity, a norbornene based addition (co)polymer is efficiently produced. Specifically, C | 10-22-2009 |
| 20090264604 | Metallocene Complex and Polymerization Catalyst Composition Containing the Same - Disclosed are a metallocene complex represented by the general formula (I), (II) or (III), and a polymerization catalyst composition containing such a metallocene complex. In the formulae (I), (II) and (III), M represents a lanthanoid element, scandium or yttrium; Cp | 10-22-2009 |
| 20090264591 | THERMOPLASTIC RESIN COMPOSITION AND MOLDED ARTICLE OBTAINED FROM THE SAME - A thermoplastic resin composition contains (i) a polylactic acid, (ii) a polyolefin, and (iii) a compatibilizer (functional group-containing polymer that includes a functional group selected from functional groups X including a carboxyl group, an acid anhydride group, an epoxy group, a (meth)acryloyl group, an amino group, an alkoxysilyl group, a hydroxyl group, an isocyanate group, and an oxazoline group). The thermoplastic resin composition contains (iii-1) a functional group-containing hydrogenated diene polymer and (iii-2) a functional group-containing olefin polymer as the component (iii). | 10-22-2009 |
| 20090261512 | STEREOLITHOGRAPHY APPARATUS AND STEREOLITHOGRAPHY METHOD - A stereolithography apparatus that forms a three-dimensional model by sequentially laminating cured resin layers through repetition of a cycle of selectively applying light to liquid photocurable resin to form a cured resin layer, further applying liquid photocurable resin on the cured resin layer, and applying light to form a cured resin layer. The apparatus includes a table, a dispenser to supply the liquid photocurable resin onto the table, a recoater to apply the photocurable resin, and a controller to slow down a moving speed of the recoater based on a moving distance of the recoater during application operation of the recoater. | 10-22-2009 |
| 20090250835 | METHOD FOR MANUFACTURING MOLDING DIE AND METHOD FOR MANUFACTURING MOLDED PRODUCT - An object of the present invention is to provide a metal mold for micro components at low cost in a short time by using an optically molded object formed by an optical molding method. A method of manufacturing a mold for molding in accordance with the present invention includes forming a three-dimensional molded object by applying a photo-curable liquid resin composition, irradiating the photo-curable liquid resin composition with light, and removing non-cured portions of the photo-curable liquid resin composition, and forming the mold for molding based on the three-dimensional molded object, the method further including forming a metal coating covering the three-dimensional molded object, removing the three-dimensional molded object covered with the metal coating; and taking the metal coating as the mold for molding. | 10-08-2009 |
| 20090247798 | NORBORNENE DERIVATIVE, NORBORNENE POLYMER PRODUCED BY RING-OPENING (CO)POLYMERIZATION, AND PROCESS FOR PRODUCING THE POLYMER BY RING-OPENING (CO)POLYMERIZATION - The norbornene derivative of the present invention is represented by the following formula (Im). | 10-01-2009 |
| 20090247705 | RUBBER COMPOSITION, CROSSLINKED RUBBER AND MOLDED ARTICLE - A rubber composition includes (i) an α,β-unsaturated nitrile conjugated diene rubber containing structural units derived from a conjugated diene in an amount of 30 to 60 mass % with respect to the total structural units, (ii) an ethylene-α-olefin-nonconjugated diene copolymer rubber having a limiting viscosity of 3.3 dl/g or more measured at 135° C. in a decalin solvent, and (iii) a crosslinking agent. The rubber composition can produce a crosslinked rubber and a molded article exhibiting excellent oil resistance and heat resistance in a well-balanced manner. | 10-01-2009 |
| 20090247695 | PROCESS FOR PRODUCING CONJUGATED DIENE POLYMER, CONJUGATED DIENE POLYMER, AND RUBBER COMPOSITION - A process for simply and inexpensively producing a conjugated diene polymer with a narrow molecular weight distribution and a high cis-bond content at a low cost is provided. The process comprises a polymerization step, wherein a conjugated diene polymer having a cis-1,4-bond content of 98.5 mass % or more and a ratio (Mw/Mn) of the weight average molecular weight (Mw) to the number average molecular weight (Mn) measured by gel permeation chromatography of 2.5 or less is obtained by carrying out a polymerization reaction in conjugated diene compounds using a catalyst composition containing a rare earth element-containing compound or a reaction product of the rare earth element-containing compound with a Lewis base, an aluminoxane and/or organoaluminum compound, and an iodine-containing compound. | 10-01-2009 |
| 20090243156 | METHOD OF PHOTOFABRICATION - An object of the present invention is to provide an optical molding method that is capable of taking out the model shape of an optically-molded object with high accuracy, and capable of performing molding with high accuracy even when a shape having a fine structure or a microstructure is molded. An optical molding method to form a three-dimension shape object in which cured resin layers are laminated and integrated includes forming a cured resin layer of a photo-curable composition by irradiating a photo-curable composition layer with light, forming the photo-curable composition layer again above the cured resin layer, forming further a cured resin layer of the photo-curable composition by radiating a light, and repeating these steps, wherein the photo-curable composition layer is formed by applying a photo-curable resin composition containing resin, an ethylenic unsaturated compound, and an organic solvent above a base material or above the cured resin layer formed above the base material, and removing the organic solvent contained in the photo-curable resin composition, and wherein the three-dimension shape object is formed by removing the photo-curable composition that is not cured in the cured resin layers after the formation of all the cured resin layers is completed. | 10-01-2009 |
| 20090239373 | CHEMICAL MECHANICAL POLISHING METHOD AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE - A chemical mechanical polishing method comprises polishing an organic film using a slurry including polymer particles having a surface functional group and a water-soluble polymer. | 09-24-2009 |
| 20090239147 | POLYMER COMPOSITION, PASTE FOR USE IN ELECTRODE FOR SECONDARY BATTERY, AND ELECTRODE FOR SECONDARY BATTERY - A polymer composition comprising (a) a fluorine-containing polymer and (b) a functional group-containing polymer which contains a structural unit originating from an alkyl (meth)acrylate and a structural unit originating from at least one monomer selected from the group consisting of a sulfonic acid group-containing unsaturated monomer, an amide group-containing unsaturated monomer, and a sulfonic acid group and amide group-containing unsaturated monomer is provided. | 09-24-2009 |
| 20090239080 | PHOTOSENSITIVE INSULATION RESIN COMPOSITION AND CURED PRODUCT THEREOF - An object of the present invention is to provide a cured product which is excellent in characteristics such as an electric insulation property, a heat impact resistance, an adhesive property and the like and to provide a photosensitive insulation resin composition from which the above cured product can be obtained and which is suited to uses such as an interlayer insulation film, a surface protecting layer and the like in semiconductor elements. The photosensitive insulation resin composition according to the present invention is characterized by comprising (A) a copolymer comprising 10 to 99 mole % of a constitutional unit (A1) represented by the following Formula (1) and 90 to 1 mole % of a constitutional unit (A2) represented by the following Formula (2) (provided that the total of all constitutional units constituting the above copolymer (A) is 100 mole %): | 09-24-2009 |
| 20090231518 | OPTICAL FILM, POLARIZATION PLATE AND LIQUID CRYSTAL DISPALY - [Problems] To provide an optical film for a liquid crystal display, in which a wide range of a retardation of transmitted light can be controlled in manufacturing and good viewing angle compensation effects on such as preventing light leakage or color dropout (coloring) in true black display and achieving a high contrast in all directions can be obtained when used in liquid crystal display. | 09-17-2009 |
| 20090221777 | PHOTOSENSITIVE RESIN COMPOSITION - Disclosed is a photosensitive resin composition comprising (A) a polyimide resin, (B) a photo-acid generator, and (C) a crosslinking agent having an alkoxyalkylated amino group. | 09-03-2009 |
| 20090221743 | BIOLOGICAL SUBSTANCE RELATED ARTICLE AND METHOD OF MANUFACTURING THE SAME, AND BIOLOGICAL SUBSTANCE ADSORPTION PREVENTIVE COATING COMPOSITION AND METHOD OF USING THE SAME - A biological substance related article includes a coating formed by causing a biological substance adsorption preventive coating composition to come in contact with a surface of the biological substance related article and heating the composition, the biological substance adsorption preventive coating composition including: (A) a copolymer obtained by copolymerizing raw material monomers including a monomer A1 shown by the following general formula (1) and an active hydrogen group-containing monomer A2; (B) a crosslinking agent reactive with an active hydrogen group; and (C) a solvent. | 09-03-2009 |
| 20090215920 | SILANE POLYMER AND METHOD FOR FORMING SILICON FILM - There are provided a silane polymer having a higher molecular weight from the viewpoints of wettability when applied to a substrate, a boiling point and safety, a composition which can form a high-quality silicon film easily, a silicon film forming composition which comprises a silane polymer obtained by irradiating a photopolymerizable silane compound with light of specific wavelength range to photopolymerize it, and a method for forming a silicon film which comprises applying the composition to a substrate and subjecting the coating film to a heat treatment and/or a light treatment. | 08-27-2009 |
| 20090209705 | THERMOPLASTIC RESIN COMPOSITION, OPTICAL FILM AND RETARDATION FILM - Each of the thermoplastic resin composition and the optical film of the present invention comprises a cycloolefin-based polymer (A) and a vinyl-based polymer (B) having a structural unit derived from p-isopropenylphenol. The thermoplastic resin composition and the optical film exhibit excellent compatibility of their components with keeping property of low birefringence inherent in the thermoplastic resin composition comprising the cycloolefln-based polymer and the vinyl-based polymer, and they are excellent in weathering resistance and heat resistance. | 08-20-2009 |
| 20090209670 | POLYOLEFIN RESIN FOAM AND THE PROCESS FOR PRODUCING THE SAME - An object of the invention is to provide a polyolefin resin foam which is excellent in flexibility, cushioning property and processability, especially excellent in cutting processability. The present invention relates to a polyolefin resin foam obtained by foaming a polyolefin resin composition using carbon dioxide in a supercritical state, wherein the polyolefin resin composition contains at least: (1) a thermoplastic elastomer composition obtained by subjecting to a dynamically heat treatment a mixture of (A) a rubber, and (B) (B-1) an α-olefin crystalline thermoplastic resin and/or (B-2) an α-olefin amorphous thermoplastic resin, each having a melt tension of less than 3.0 cN at a temperature of 210° C. and at a take-up speed of 2.0 m/min, in the presence of (C) a crosslinking agent; (2) a polyolefin resin; and (3) a nucleant agent having an average particle diameter of from 0.1 μm to less than 2.0 μm. The polyolefin resin foam has a density, for example, of 0.2 g/cm | 08-20-2009 |
| 20090209185 | CHEMICAL MECHANICAL POLISHING PAD - A chemical mechanical polishing pad used for chemical mechanical polishing comprises a polishing surface, a non-polishing surface that is provided opposite to the polishing surface, a side surface that connects an outer edge of the polishing surface and an outer edge of the non-polishing surface, and a plurality of grooves formed in the polishing surface. The side surface has a slope surface that is connected to the polishing surface, and a depth of the grooves is equal to or smaller than a height of the slope surface. | 08-20-2009 |
| 20090202791 | ULTRAVIOLET-CURABLE POLYMER COMPOSITION, RESIN MOLDED ARTICLE AND METHOD FOR PRODUCING SAME - An ultraviolet-curable polymer composition includes (A) 5 to 100 parts by mass of syndiotactic 1,2-polybutadiene having a 1,2-vinyl bond content of 70% or more and a degree of crystallinity of 5 to 50%, (B) 0 to 95 parts by mass of a thermoplastic polymer ((A)+(B)=100 parts by mass), (C) 10 parts by mass or less of a photoinitiator based on 100 parts by mass of the syndiotactic 1,2-polybutadiene (A) and the thermoplastic polymer (B) in total, and (D) 10 parts by mass or less of a polyfunctional acrylate based on 100 parts by mass of the syndiotactic 1,2-polybutadiene (A) and the thermoplastic polymer (B) in total. | 08-13-2009 |
| 20090191795 | COMPOSITION FOR FORMING POLISHING LAYER OF CHEMICAL MECHANICAL POLISHING PAD, CHEMICAL MECHANICAL POLISHING PAD AND CHEMICAL MECHANICAL POLISHING METHOD - Provided is a composition for forming a polishing layer of a chemical mechanical polishing pad having polishing characteristics such as a high polishing rate, an excellent planarity of the polished object and less scratches of the polished object. | 07-30-2009 |
| 20090191404 | Curable liquid composition, cured film, and antistatic laminate - The object of the invention is to provide a curate liquid composition excelling in storage stability and curability and capable of forming a coat (film) which excels in antistatic properties, hardness, scratch resistance, and transparency on the surface of various substrates, a cured film of the composition, and an anti static laminate. This object is achieved by providing a curate liquid composition comprising the following components (A), (B), (C), and (D): (A) particles comprising an oxide of at least one element selected from the group consisting of indium, antimony, zinc, and tin as a major component, (B) a compound having two or more polymerizable unsaturated groups in the molecule, (C) a silicon-containing surfactant, and (D) a solvent. | 07-30-2009 |
| 20090191362 | OPTICAL FILM, POLARIZING PLATE, AND LIQUID CRYSTAL DISPLAY DEVICE - An optical film has a film a formed of a cyclic olefin resin, and a homeotropically orientated optical anisotropic layer b disposed on the film a. This optical film preferably satisfies the below listed formulae (1) to (3). | 07-30-2009 |
| 20090189510 | METAL-COATING MATERIAL, METHOD FOR PROTECTING METAL, AND LIGHT EMITTING DEVICE - Provided is a metal-coating material excellent in sulfur barrier property and transparency, a method for protecting a metal using the metal-coating material, and a light emitting device permitting high luminance and long life. The metal-coating material contains a polymer (A) obtained by subjecting at least one silane compound (a1) selected from the group consisting of at least one organosilane represented by the formula (1): R | 07-30-2009 |
| 20090176950 | METAL HYDRIDE COMPLEX, METHOD OF HYDROGENATING RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN, AND PROCESS FOR PRODUCING PRODUCT OF HYDROGENATION OF RING-OPENING POLYMERIZATION POLYMER OF CYCLOOLEFIN - A metal hydride complex of the invention is a hydride complex of a metal selected from the group consisting of ruthenium, rhodium, osmium and iridium and has one or more aromatic carboxylic acid residues. According to the invention, there is provided a new metal hydride complex which is dissolved in an organic solvent having a low polarity such as a hydrocarbon solvent at a high concentration and has a high catalytic activity of hydrogenating carbon-carbon double bonds. The metal hydride complex relating to the invention is especially suitable as a catalyst in the hydrogenation reaction of a cycloolefin ring-opening polymer. | 07-09-2009 |
| 20090176045 | Molded Composite Material and Process for Production Thereof - A molded composite comprising a first molded part | 07-09-2009 |
| 20090171032 | IONOMER, METHOD FOR PRODUCING SAME AND MOLDED ARTICLE - An ionomer obtained by reacting metal compound particles having an average particle diameter of 0.1 μm or less, with a polymer having a structural unit derived from an unsaturated dicarboxylic acid anhydride. There are provided an ionomer which has the same flexibility and moldability as conventional olefin-based thermoplastic elastomers have, is good at mechanical properties, oil resistance and abrasion resistance, and is superior particularly in tensile strength at break and scratch resistance; a process for production thereof; and a molded article thereof. | 07-02-2009 |
| 20090169736 | THERMOSETTING RESIN COMPOSITION, METHOD OF FORMING ANTIHALATION FILM OF SOLID-STATE IMAGING DEVICE, ANTIHALATION FILM FOR SOLID-STATE IMAGING DEVICES, AND SOLID-STATE IMAGING DEVICE - A thermosetting resin composition comprising a polymer having a methylglycidyl group and an ultraviolet absorbent. This thermosetting resin composition has excellent storage stability and forms an antihalation film which can effectively suppress diffused reflection light from a foundation substrate in an exposure step for forming a color filter or microlens in a solid-state imaging device, has high heat resistance and does not have a rough surface even when it is subjected to dry etching. | 07-02-2009 |
| 20090165395 | CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION, CHEMICAL MECHANICAL POLISHING METHOD, AND KIT FOR PREPARING CHEMICAL MECHANICAL POLISHING AQUEOUS DISPERSION - A chemical mechanical polishing aqueous dispersion includes (A) abrasive grains having a pore volume of 0.14 ml/g or more, and (B) a dispersion medium. | 07-02-2009 |
| 20090159325 | ANISOTROPICALLY CONDUCTIVE CONNECTOR AND ANISOTROPICALLY CONDUCTIVE CONNECTOR DEVICE - An anisotropically conductive connector and an anisotropically conductive connector device. The anisotropically conductive connector includes a supporting member, a plurality of through-holes each extending in a thickness-wise direction of the supporting member, and anisotropically conductive sheets respectively held in the through-holes of the supporting member. Each anisotropically conductive sheet includes a frame plate, a plurality of through-holes each extending in a thickness-wise direction of the frame plate, and a plurality of anisotropically conductive elements arranged in the respective through-holes of the frame plate. Each of the anisotropically conductive elements includes a conductive part, conductive particles contained in an elastic polymeric substance in a state oriented so as to align in a thickness-wise direction of the element, and an insulating part to cover the outer periphery of the conductive part and including an elastic polymeric substance. | 06-25-2009 |
| 20090153146 | APPARATUS FOR INSPECTING CIRCUIT BOARD AND METHOD OF INSPECTING CIRCUIT BOARD - An apparatus and method for inspecting a circuit board is described which can well absorb a variation in a height of an electrode to be inspected and can maintain an insulating property between adjacent inspection electrodes even if the electrode to be inspected is arranged at a fine pitch. | 06-18-2009 |
| 20090149625 | AROMATIC COMPOUND HAVING FLUORENE SKELETON AND POLYARYLENE HAVING SULFONIC ACID GROUP - Sulfonated polyarylenes have excellent processability and methanol resistance. | 06-11-2009 |
