| IUCF-HYU Patent applications |
| Patent application number | Title | Published |
|---|
| 20120125427 | SOLAR CELL, AND METHOD FOR PRODUCING SAME - Provided are a solar cell a solar cell having high light absorbance and power conversion efficiency and a method for producing the solar cell. The solar cell includes a substrate, a first electrode disposed on the substrate, a photoactive layer disposed on the first electrode, and a second electrode disposed on the photoactive layer. The photoactive layer includes an electron acceptor and at least two electron donors. | 05-24-2012 |
| 20120073639 | SOLAR CELL AND A PRODUCTION METHOD THEREFOR - The present invention provides a solar cell and manufacturing method thereof. The solar cell according to the present invention comprises: first and second electrodes, at least one of which has light transmitting properties; two or more photoelectric conversion layers positioned between the first and second electrodes; and a transflective conductive layer positioned between the photoelectric conversion layers. Further, tunneling layers are also provided between the photoelectric conversion layers and the transflective conductive layer. The efficiency of the solar cell can be improved, as compared with the prior art, by providing tunneling layers and a transflective conductive layer in this way. | 03-29-2012 |
| 20110096847 | APPARATUS AND METHOD FOR PARSING BITSTREAM - Disclosed is an apparatus and method for parsing a bitstream. The apparatus may include an input port analyzer to analyze an input port indicating a source of data in a description, a data receiver to receive the data via the analyzed input port, and a parsing controller to control a parsing process based on the data received via the input port. | 04-28-2011 |
| 20100208507 | LUMINESCENCE DEVICE AND METHOD OF MANUFACTURING THE SAME - Provided are a luminescent device and a method of manufacturing the same. The luminescent device includes a charge trapping layer having bistable conductance and negative differential resistance (NDR) characteristics, and an organic luminescent layer electrically connected to the charge trapping layer. | 08-19-2010 |
| 20090184896 | ORGANIC LIGHT EMITTING DISPLAY AND METHOD OF DRIVING THE SAME - There is provided an organic light emitting display capable of compensating for the deterioration of organic light emitting diodes (OLED) while sharing an analog-to-digital converter (ADC). The organic light emitting display includes sub pixels positioned in the intersections between scan lines and data lines, a current source unit for supplying predetermined current to organic light emitting diodes (OLED) in a sensing period for grasping deterioration information on the OLEDs included in the sub pixels, at least one analog-to-digital converter (ADC) provided fewer than data lines in order to convert a voltage applied to the OLEDs into a digital signal, and a switching unit for coupling the data lines to the current source unit in the sensing period and for sequentially coupling at least one ADC to the data lines in the sensing period. | 07-23-2009 |
| 20090133336 | POLISHING SLURRY, METHOD OF PRODUCING SAME, AND METHOD OF POLISHING SUBSTRATE - Disclosed is a polishing slurry, particularly, a slurry for chemical mechanical polishing, which is used in a chemical mechanical polishing process for flattening a semiconductor laminate. More particularly, the present invention provides a method of producing a slurry which has high removal selectivity to a nitride layer used as a barrier film in a shallow trench isolation CMP process needed to fabricate ultra highly integrated semiconductors of 256 mega D-RAM or more (Design rule of 0.13 μm or less) and which decreases the occurrence of scratches on a flattened surface, and a method of polishing a substrate using the same. | 05-28-2009 |
| 20090100765 | POLISHING SLURRY, METHOD OF PRODUCING SAME, AND METHOD OF POLISHING SUBSTRATE - Disclosed is a polishing slurry, particularly, a slurry for chemical mechanical polishing, which is used in a chemical mechanical polishing process for flattening a semiconductor laminate. More particularly, the present invention provides a method of producing a slurry which has high removal selectivity to a nitride layer used as a barrier film in a shallow trench isolation CMP process needed to fabricate ultra highly integrated semiconductors of 256 mega D-RAM or more (Design rule of 0.13 μm or less) and which decreases the occurrence of scratches on a flattened surface, and a method of polishing a substrate using the same. | 04-23-2009 |
