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Invarium, Inc.
| Invarium, Inc. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110154281 | OPTICAL LITHOGRAPHY CORRECTION PROCESS - A apparatus and method for correcting a process critical layout includes characterizing the influence of individual ones of a set of worst case process variations on a simulated nano-circuit layout design and then correcting layout geometries in the simulated nano-circuit layout based on such characterizations. | 06-23-2011 |