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International Manufacturing and Engineering Services Co. Ltd.
| International Manufacturing and Engineering Services Co. Ltd. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090086355 | SPINDLE STAGE FOR TESTING MAGNETIC HEAD WITH VCM MECHANISM AND AUTOMATIC MAGNETIC HEAD MOUNTING/DEMOUNTING DEVICE - To provide a spindle stage for testing a magnetic head in which high precision servo following can be performed by an inexpensive VCM mechanism without using a piezoelectric element, and to provide a device for mounting/demounting a magnetic head automatically. In a spindle stage for testing a magnetic head which includes: a head arm device having a head arm portion which is driven to swing by a VCM mechanism; and an HGA attached to the head arm portion, and loads the head arm device and the HGA relative to a surface of a medium in rotation to measure the electrical and mechanical characteristics, wherein the spindle stage includes: a fitting portion in which a swaging boss of the HGA is removably fitted; and a clamping member which moves between a locking position in which the swaging boss fitted in the fitting portion is locked and a releasing position in which the swaging boss can be freely fitted and removed into and from the fitting portion. | 04-02-2009 |
| 20080299296 | SUCCESSIVE VAPOUR DEPOSITION SYSTEM, VAPOUR DEPOSITION SYSTEM, AND VAPOUR DEPOSITION PROCESS - A successive vapor deposition system in which a vapor deposition material is heated, vaporized in a vacuum, and deposited onto a vapor deposition area of a substrate, includes a conveyer which conveys the substrate in a conveying direction parallel to a plane on which the substrate lies, wherein the vapor deposition area faces downward and is exposed through the underside of the conveyer; a plurality of vapor deposition chambers aligned in the conveying direction, each the vapor deposition chamber including a space through which the substrate is conveyed; at least one container positioned in each of the plurality of vapor deposition chambers below the plane on which the substrate lies, and containing the vapor deposition material, wherein a width of the container covers the vapor deposition area in a direction perpendicular to the conveying direction; and a heating medium provided for the container. | 12-04-2008 |