Inventors list |
Assignees list |
Classification tree browser |
Top 100 Inventors |
Top 100 Assignees |
INSTYTUT TECHNOLOGII MATERIALOW ELEKTRONICZNYCH
| INSTYTUT TECHNOLOGII MATERIALOW ELEKTRONICZNYCH Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110300058 | METHOD OF GRAPHENE MANUFACTURING - The present invention relates to a method for manufacturing graphene by vapour phase epitaxy on a substrate comprising a surface of SiC, characterized in that the process of sublimation of silicon from the substrate is controlled by a flow of an inert gas or a gas other than an inert gas through the epitaxial reactor. The invention also relates to graphene obtained by this method. | 12-08-2011 |