| INFOTONICS TECHNOLOGY CENTER, INC. Patent applications |
| Patent application number | Title | Published |
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| 20110270122 | MINIMALLY INVASIVE ALLERGY TESTING SYSTEM - An allergy testing system includes encapsulated allergens, a microneedle array, and an activation system coupled to the microneedle array and the encapsulated allergens such that the encapsulated allergens are moved into contact with a subject as the microneedle array is moved from a resting position to a penetrating position. A method for determining a degree of reaction to one or more allergens by a patient in a minimally invasive manner is also disclosed. Penetration of one or more microneedles into a skin of the patient is caused. Each of the penetrations into the skin is exposed with an allergen from each of the one or more microneedles. One or more images are captured of each of the penetrations into the skin. Each of the captured images are analyzed to assess the degree of reaction to the specific allergen. Allergic reactivity data is output for at least one of the allergens. | 11-03-2011 |
| 20100100005 | MINIMALLY INVASIVE ALLERGY TESTING SYSTEM WITH COATED ALLERGENS - An allergy testing system has a microneedle array. The allergy testing system also has at least one coated allergen. The allergy testing system further has an activation system coupled to the microneedle array such that the at least one coated allergen is moved into contact with a subject as the microneedle array is moved from a resting position to a penetrating position. A method for determining a degree of reaction to one or more allergens by a patient in a minimally invasive manner is disclosed. One or more allergen coated microneedles is caused to penetrate into a skin of the patient. One or more images of at least one of the penetrations into the skin are captured. At least one of the captured images are analyzed to assess the degree of reaction to a specific allergen. Allergic reactivity data is output for at least one of the allergens. | 04-22-2010 |
| 20090176371 | Method For The Preferential Polishing Of Silicon Nitride Versus Silicon Oxide - The present invention provides a method of removing silicon nitride in preference to silicon dioxide by CMP. The method utilizes a polishing slurry that includes colloidal silica abrasive particles dispersed in water and an additive that suppresses the silicon dioxide removal rate but enhances the silicon nitride removal rate. In one embodiment of the invention, the additive is lysine, which is effective at a pH of about 9, or arginine, which is effective at a pH of about 8. In another embodiment of the invention, the additive is lysine mono hydrochloride in combination with picolinic acid, which is effective at a pH of about 8, or arginine in combination with picolinic acid, which is effective at a pH of about 9. | 07-09-2009 |
