| INFINEON TECHNOLOGIES AUSTRIA AG Patent applications |
| Patent application number | Title | Published |
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| 20120126926 | Transformer Device and Method for Manufacturing a Transformer Device - A transformer device includes a glass substrate having a first side and a second side arranged opposite the first side. A first recess is formed at the first side of the glass substrate. A second recess is formed at the second side of the glass substrate. The first and second recesses are arranged opposite to each other. A first coil is arranged in the first recess and a second coil is arranged in the second recess. | 05-24-2012 |
| 20120112242 | Semiconductor body with strained region - A semiconductor body comprised of a semiconductor material includes a first monocrystalline region of the semiconductor material having a first lattice constant along a reference direction, a second monocrystalline region of the semiconductor material having a second lattice constant, which is different than the first, along the reference direction, and a third, strained monocrystalline region between the first region and the second region. | 05-10-2012 |
| 20120098097 | IGBT MODULE AND A CIRCUIT - An IGBT module is provided. The IGBT module has at least a first individual IGBT with a first softness during switching-off the IGBT module, and at least a second individual IGBT connected in parallel to the at least one first IGBT. The at least one second individual IGBT has a second softness during switching-off the IGBT module which is different than the first softness. Further a circuit and an electronic power device having two individual IGBTs, which are connected in parallel, are provided. | 04-26-2012 |
| 20120098030 | BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A trench IGBT is disclosed. One embodiment includes an embedded structure arranged above a collector region and selected from a group consisting of a porous semiconductor region, a cavity, and a semiconductor region including additional scattering centers for holes, the embedded structure being arranged below the body contact region such that the embedded structure and the body contact region overlap in a horizontal projection. | 04-26-2012 |
| 20120091564 | SEMICONDUCTOR COMPONENT WITH MARGINAL REGION - A semiconductor wafer is disclosed. One embodiment provides at least two semiconductor components each having an active region, and wherein at least one zone composed of porous material is arranged between the active regions of the semiconductor components. | 04-19-2012 |
| 20120091563 | METHOD FOR INSULATING A SEMICONDUCTOR MATERIAL IN A TRENCH FROM A SUBSTRATE - A semiconductor structure is disclosed. In one embodiment, the trench is formed in a substrate, including an upper portion and a lower portion, the upper portion including a lateral dimension larger than a lateral dimension of the lower portion. The lower portion is lined with a first insulating layer and is at least partially filled with a semiconductor material. The first insulating layer extends into the upper portion. A second insulating layer covers, at least partially, the substrate, a portion of the first insulating layer extending into the upper portion and the semiconducting material in the lower portion. | 04-19-2012 |
| 20120091457 | SEMICONDUCTOR COMPONENT INCLUDING A LATERAL TRANSISTOR COMPONENT - A semiconductor arrangement is disclosed. One embodiment includes a first semiconductor layer including a first and second component zone that form a pn-junction or a Schottky-junction. A second semiconductor layer includes a drift control zone adjacent to the second component zone. A dielectric layer separates the first semiconductor layer from the second semiconductor layer. A rectifying element is coupled between the drift control zone and the second component zone. | 04-19-2012 |
| 20120088353 | SEMICONDUCTOR DEVICE WITH A CHARGE CARRIER COMPENSATION STRUCTURE IN A SEMICONDUCTOR BODY AND METHOD FOR ITS PRODUCTION - A semiconductor device with a charge carrier compensation structure in a semiconductor body and to a method for its production. The semiconductor body includes drift zones of a first conduction type and charge compensation zones of a second conduction type complementing the first conduction type. The drift zones include a semiconductor material applied in epitaxial growth zones, wherein the epitaxial growth zones include an epitaxially grown semiconductor material which is non-doped to lightly doped. Towards the substrate, the epitaxial growth zones are provided with a first conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of a second, complementary conduction type. Towards the front side, the epitaxial growth zones are provided with a second, complementary conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of the first conduction type. | 04-12-2012 |
| 20120083085 | METHOD FOR PRODUCING AN ELECTRODE STRUCTURE - A method for producing a semiconductor device with an electrode structure includes providing a semiconductor body with a first surface, and with a first sacrificial layer extending in a vertical direction of the semiconductor body from the first surface, and forming a first trench extending from the first surface into the semiconductor body. The first trench is formed at least by removing the sacrificial layer in a section adjacent to the first surface. The method further includes forming a second trench by isotropically etching the semiconductor body in the first trench, forming a dielectric layer which covers sidewalls of the second trench, and forming an electrode on the dielectric layer in the second trench, the electrode and the dielectric layer in the second trench forming the electrode structure. | 04-05-2012 |
| 20120083081 | METHOD FOR PRODUCING A GATE ELECTRODE STRUCTURE - A transistor with a gate electrode structure is produced by providing a semiconductor body with a first surface, and with a first sacrificial layer extending in a vertical direction of the semiconductor body from the first surface. A first trench extending from the first surface into the semiconductor body is formed by removing the sacrificial layer in a section adjacent the first surface. A second trench is formed by isotropically etching the semiconductor body in the first trench. A third trench is formed below the second trench by removing at least a part of the first sacrificial layer below the second trench. A dielectric layer is formed which at least covers sidewalls of the third trench and which only covers sidewalls of the second trench. A gate electrode is formed on the dielectric layer in the second trench. The gate electrode and dielectric layer in the second trench form the gate electrode structure. | 04-05-2012 |
| 20120080690 | Method for Manufacturing a Composite Wafer Having a Graphite Core, and Composite Wafer Having a Graphite Core - According to an embodiment, a composite wafer includes a carrier substrate having a graphite core and a monocrystalline semiconductor layer attached to the carrier substrate. | 04-05-2012 |
| 20120068260 | Method for producing a structure element and semiconductor component comprising a structure element - A semiconductor component includes a semiconductor body having a surface and a cutout in the semiconductor body. The cutout extends from the surface of the semiconductor body into the semiconductor body in a direction perpendicular to the surface. The cutout has a base and at least one sidewall. The component further includes a layer on the surface of the semiconductor body and in the cutout. The layer forms a well above the cutout. The well has a well base, a well edge and at least one well sidewall. The at least one well sidewall forms an angle α in the range of 20° to 80° with respect to the surface of the semiconductor body. The layer has at least one edge which, proceeding from the well edge, extends in the direction of the surface of the semiconductor body. | 03-22-2012 |
| 20120040505 | METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE - A transistor component and method of forming a transistor component. One embodiment provides a semiconductor arrangement including a semiconductor body having a at least one first trench, a first field electrode arranged in the lower trench section of the at least one first trench and being insulated from the semiconductor body by a field electrode dielectric. A dielectric layer is formed on the first field electrode in the at least one first trench, including depositing a dielectric material on a first side of the semiconductor body and on the field plate at a higher deposition rate than on sidewalls of the at least one first trench. | 02-16-2012 |
| 20120037955 | Transistor Component with Reduced Short-Circuit Current - A transistor component includes in a semiconductor body a source zone and a drift zone of a first conduction type, and a body zone of a second conduction type complementary to the first conduction type, the body zone arranged between the drift zone and the source zone. The transistor component further includes a source electrode in contact with the source zone and the body zone, a gate electrode adjacent the body zone and dielectrically insulated from the body zone by a gate dielectric layer, and a diode structure connected between the drift zone and the source electrode. The diode structure includes a first emitter zone adjoining the drift zone in the semiconductor body, and a second emitter zone of the first conduction type adjoining the first emitter zone. The second emitter zone is connected to the source electrode and has an emitter efficiency γ of less than 0.7. | 02-16-2012 |
| 20120037920 | Silicone Carbide Trench Semiconductor Device - A semiconductor device as described herein includes a silicon carbide semiconductor body. A trench extends into the silicon carbide semiconductor body at a first surface. A gate dielectric and a gate electrode are formed within the trench. A body zone of a first conductivity type adjoins to a sidewall of the trench, the body zone being electrically coupled to a contact via a body contact zone including a higher maximum concentration of dopants than the body zone. An extension zone of the first conductivity type is electrically coupled to the contact via the body zone, wherein a maximum concentration of dopants of the extension zone along a vertical direction perpendicular to the first surface is higher than the maximum concentration of dopants of the body zone along the vertical direction. A distance between the first surface and a bottom side of the extension zone is larger than the distance between the first surface and the bottom side of the trench. | 02-16-2012 |
| 20120032260 | ELECTRONIC DEVICE WITH CONNECTING STRUCTURE - A semiconductor device including a connecting structure includes an edge region, a first trench and a second trench running toward the edge region, a first electrode within the first trench, and a second electrode within the second trench, the first and second electrodes being arranged in a same electrode plane with regard to a main surface of a substrate of the electronic device within the trenches, and the first electrode extending, at an edge region side end of the first trench, farther toward the edge region than the second electrode extends, at an edge region side end of the second trench, toward the edge region. | 02-09-2012 |
| 20120028417 | SEMICONDUCTOR COMPONENT WITH CELL STRUCTURE AND METHOD FOR PRODUCING THE SAME - A semiconductor component comprises a semiconductor body comprising a first component electrode arranged on one of the surfaces of the semiconductor body, a second component electrode arranged on one of the surfaces of the semiconductor body, and a component control electrode arranged on one of the surfaces of the semiconductor body. In this case, active semiconductor element cells are arranged in a first active cell array of the semiconductor body, the semiconductor element cells comprising a first cell electrode, a second cell electrode and a cell control electrode and also a drift path between the cell electrodes. At least the component control electrode is arranged on a partial region of the semiconductor body and a second active cell array is additionally situated in the partial region of the semiconductor body below the component control electrode. | 02-02-2012 |
| 20120025304 | Trench Semiconductor Device and Method of Manufacturing - A semiconductor device includes a semiconductor body including a trench with first and second opposing sidewalls. A first electrode is arranged in a lower portion of the trench and a second electrode in an upper portion of the trench. A dielectric structure is arranged in the trench, including a first portion between the electrodes. The first portion includes, in sequence along a lateral direction from the first sidewall to the second sidewall, a first part including a first dielectric material, a second part including a second dielectric material selectively etchable to the first dielectric material, a third part including the first dielectric material, the first dielectric material of the third part being continuously arranged along a vertical direction from a top side of the first electrode to a bottom side of the second electrode, a fourth part including the second dielectric material and a fifth part including the first dielectric material. | 02-02-2012 |
| 20120025303 | SEMICONDUCTOR DEVICE AND METHOD FOR THE PRODUCTION OF A SEMICONDUCTOR DEVICE - In one embodiment, a field effect transistor has a semiconductor body, a drift region of a first conductivity type and a gate electrode. At least one trench extends into the drift region. A field plate is arranged at least in a portion of the at least one trench. A dielectric material at least partially surrounds both the gate electrode and the field plate. The field plate includes a first semiconducting material. | 02-02-2012 |
| 20120019284 | Normally-Off Field Effect Transistor, a Manufacturing Method Therefor and a Method for Programming a Power Field Effect Transistor - A normally-off power field-effect transistor semiconductor structure is provided. The structure includes a channel, a source electrode, a gate electrode and trapped charges which arranged between the gate electrode and the channel such that the channel is in an off-state when the source electrode and the gate electrode are on the same electric potential. Further, a method for forming a semiconductor device and a method for programming a power field effect transistor are provided. | 01-26-2012 |
| 20120018856 | Semiconductor Device With Drift Regions and Compensation Regions - Disclosed is a method of forming a semiconductor device with drift regions of a first doping type and compensation regions of a second doping type, and a semiconductor device with drift regions of a first doping type and compensation regions of a second doping type. | 01-26-2012 |
| 20120018846 | Surge-Current-Resistant Semiconductor Diode With Soft Recovery Behavior and Methods for Producing a Semiconductor Diode - A bipolar semiconductor component, in particular a diode, comprising an anode structure which controls its emitter efficiency in a manner dependent on the current density in such a way that the emitter efficiency is low at small current densities and sufficiently high at large current densities, and an optional cathode structure, which can inject additional holes during commutation, and production methods therefor. | 01-26-2012 |
| 20120018798 | Method for Protecting a Semiconductor Device Against Degradation, a Semiconductor Device Protected Against Hot Charge Carriers and a Manufacturing Method Therefor - A method for protecting a semiconductor device against degradation of its electrical characteristics is provided. The method includes providing a semiconductor device having a first semiconductor region and a charged dielectric layer which form a dielectric-semiconductor interface. The majority charge carriers of the first semiconductor region are of a first charge type. The charged dielectric layer includes fixed charges of the first charge type. The charge carrier density per area of the fixed charges is configured such that the charged dielectric layer is shielded against entrapment of hot majority charge carriers generated in the first semiconductor region. Further, a semiconductor device which is protected against hot charge carriers and a method for forming a semiconductor device are provided. | 01-26-2012 |
| 20120013029 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES HAVING A METALLISATION LAYER - A method for manufacturing semiconductor devices is disclosed. In one embodiment a semiconductor substrate having a first surface, a second surface opposite to the first surface and a plurality of semiconductor components is provided. The semiconductor substrate has a device thickness. At least one metallisation layer is formed on the second surface of the semiconductor substrate. The metallisation layer has a thickness which is greater than the device thickness. | 01-19-2012 |
| 20120012994 | METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICES HAVING A GLASS SUBSTRATE - A method for manufacturing semiconductor devices is disclosed. A semiconductor wafer is provided having a first surface and a second surface opposite to the first surface. A first glass substrate is provided which has at least one of cavities and openings at the bonding surface. The first glass substrate is bonded to the first surface of the semiconductor wafer such that the metal pads are arranged within respective cavities or openings of the first glass substrate. The second surface of the semiconductor wafer is machined. At least one metallisation region is formed on the machined second surface of the semiconductor wafer. | 01-19-2012 |
| 20120012902 | Semiconductor Device Including a Channel Stop Zone - A semiconductor device as described herein includes a body region of a first conductivity type adjoining a channel region of a second conductivity at a first side of the channel region. A gate control region of the first conductivity type adjoins the channel region at a second side of the channel region opposed to the first side, the channel region being configured to be controlled in its conductivity by voltage application between the gate control region and the body region. A source zone of the second conductivity type is arranged within the body region and a channel stop zone of the second conductivity type is arranged at the first side, the channel stop zone being arranged at least partly within at least one of the body region and the channel region. The channel stop zone includes a maximum concentration of dopants lower than a maximum concentration of dopants of the source zone. | 01-19-2012 |
| 20120008238 | Transistor Half-Bridge Control - A circuit for driving a transistor half bridge is disclosed that comprises a series circuit of a first and a second transistor both having intrinsic or external free-wheeling diodes coupled in parallel. The circuit for driving a transistor half bridge comprises: an over-current detection circuit that is configured to signal an over-current condition when a load current flowing through the first transistor exceeds a first threshold; a protection circuit that is coupled to the over-current detection circuit and that is configured to disable an activation of the first transistor in response to a detected over-current and to re-enable the activation of the first transistor after a first time interval has elapsed; an evaluation circuit that is coupled to the over-current detection circuit and that is configured to check whether a further over-current condition is detected within a second time interval that follows the first time interval. An active free-wheeling by activating the second transistor is disabled when a further over-current condition is detected within the second time interval, and an active free-wheeling by activating the second transistor is enabled during the first time interval when no further over-current condition is detected within the second time interval. | 01-12-2012 |
| 20110318904 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A semiconductor device and manufacturing method is disclosed. One embodiment provides a common substrate of a first conductivity type and at least two wells of a second conductivity type. A buried high resistivity region and at least an insulating structure is provided insulating the first well from the second well. The insulating structure extends through the buried high resistivity region and includes a conductive plug in Ohmic contact with the first semiconductor region. A method for forming an integrated semiconductor device is also provided. | 12-29-2011 |
| 20110316514 | Voltage Converter and Voltage Conversion Method - A voltage converter and a voltage conversion method is disclosed. The voltage converter includes input terminals configured to receive an input voltage. Output terminals are configured to provide an output voltage and an output current. At least one first converter stage is connected between the input terminals and the output terminals, comprising at least one unipolar transistor, and configured to provide a first output current. At least one second converter stage is connected between the input terminals and the output terminals, comprising at least one bipolar transistor, and configured to provide a second output current. A control circuit is configured to control the first output current and the second output current such that there is a first output current range in which the first output current is higher than the second output current. | 12-29-2011 |
| 20110294289 | Method for Producing a Connection Electrode for Two Semiconductor Zones Arranged One Above Another - A method for producing a connection electrode for a first and second adjacent and complementarily doped semiconductor zones includes a step of producing a trench extending through the first semiconductor zone into the second semiconductor zone in such a way that the first semiconductor zone is uncovered at sidewalls of the trench and the second semiconductor zone is uncovered at least at a bottom of the trench. The method also includes producing a first connection zone in the first semiconductor zone by implanting dopant atoms into the sidewalls at least at a first angle. The method further includes producing a second connection zone in the second semiconductor zone by implanting dopant atoms at least at a second, different angle. The method also includes depositing an electrode layer at least onto the sidewalls and the bottom of the trench for the purpose of producing the connection electrode. | 12-01-2011 |
| 20110278667 | SEMICONDUCTOR COMPONENT ARRANGEMENT AND METHOD FOR PRODUCING THEREOF - A semiconductor component arrangement and method for producing thereof is disclosed. One embodiment provides at least one power semiconductor component integrated in a semiconductor body and at least one logic component integrated in the semiconductor body. The logic component includes a trench extending into the semiconductor body proceeding from a first side, at least one gate electrode arranged in the trench and insulated from the semiconductor body by a gate dielectric, and at least one source zone and at least one drain zone of a first conduction type, which are formed in the semiconductor body in a manner adjacent to the gate dielectric and in a manner spaced apart from one another in a peripheral direction of the trench and between which at least one body zone of a second conduction type is arranged. | 11-17-2011 |
| 20110272761 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a source metallization, a source region of a first conductivity type in contact with the source metallization, a body region of a second conductivity type which is adjacent to the source region. The semiconductor device further includes a first field-effect structure including a first insulated gate electrode and a second field-effect structure including a second insulated gate electrode which is electrically connected to the source metallization. The capacitance per unit area between the second insulated gate electrode and the body region is larger than the capacitance per unit area between the first insulated gate electrode and the body region. | 11-10-2011 |
| 20110272735 | SEMICONDUCTOR COMPONENT WITH A TRENCH EDGE TERMINATION - A semiconductor component includes a semiconductor body having a first surface and a second surface, and having an inner region and an edge region. The semiconductor component further includes a pn-junction between a first semiconductor region of a first conductivity type and a second semiconductor region of a second conductivity type, the pn-junction extending in a lateral direction of the semiconductor body in the inner region. A first trench extends from the first side in the edge region into the semiconductor body. The trench has sidewalls that are arranged opposite to another and that are beveled relative to a horizontal direction of the semiconductor body. | 11-10-2011 |
| 20110260537 | METHOD OF BALANCING CURRENT SUPPLIED TO A LOAD - A method of balancing current supplied by a plurality of regulators coupled to a load includes: measuring an average load current supplied by each regulator; determining an overall average current to be shared by the plurality of regulators; comparing each average load current with the overall average current to be shared by the plurality of regulators; and adjusting an output current of one or more of the plurality of regulators so that the plurality of regulators supply the same current to the load. | 10-27-2011 |
| 20110244646 | SEMICONDUCTOR WITH A DYNAMIC GATE-DRAIN CAPACITANCE - A semiconductor device with a dynamic gate drain capacitance. One embodiment provides a semiconductor device. The device includes a semiconductor substrate, a field effect transistor structure including a source region, a first body region, a drain region, a gate electrode structure and a gate insulating layer. The gate insulating layer is arranged between the gate electrode structure and the body region. The gate electrode structure and the drain region partially form a capacitor structure including a gate-drain capacitance configured to dynamically change with varying reverse voltages applied between the source and drain regions. The gate-drain capacitance includes at least one local maximum at a given threshold or a plateau-like course at given reverse voltage. | 10-06-2011 |
| 20110241170 | MONOLITHIC SEMICONDUCTOR SWITCHES AND METHOD FOR MANUFACTURING - One aspect is monolithic semiconductor switches and method for manufacturing. One embodiment provides a semiconductor die with a first n-type channel FET and a second n-type channel FET. A source of the first n-type channel FET and a drain of the second n-type channel FET are electrically coupled to at least one contact area at a first side of the semiconductor die, respectively. A drain of the first n-type channel FET, a gate of the first n-type channel FET, a source of the second n-type channel FET and the gate of the second n-type channel FET are electrically coupled to contact areas at a second side of the semiconductor die opposite to the first side, respectively. The contact areas of the drain of the first n-type channel FET, of the gate of the first n-type channel FET, of the source of the second n-type channel FET and of the gate of the second n-type channel FET are electrically separated from each other, respectively. | 10-06-2011 |
| 20110241104 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR ITS PRODUCTION - An integrated circuit device includes a semiconductor body fitted with a first electrode and a second electrode on opposite surfaces. A control electrode on an insulating layer controls channel regions of body zones for a current flow between the two electrodes. A drift section adjoining the channel regions comprises drift zones and charge compensation zones. A part of the charge compensation zones includes conductively connected charge compensation zones electrically connected to the first electrode. Another part includes nearly-floating charge compensation zones, so that an increased control electrode surface has a monolithically integrated additional capacitance C | 10-06-2011 |
| 20110233728 | SEMICONDUCTOR COMPONENT - A method for producing a semiconductor component is proposed. The method includes providing a semiconductor body having a first surface; forming a mask on the first surface, wherein the mask has openings for defining respective positions of trenches; producing the trenches in the semiconductor body using the mask, wherein mesa structures remain between adjacent trenches; introducing a first dopant of a first conduction type using the mask into the bottoms of the trenches; carrying out a first thermal step; introducing a second dopant of a second conduction type, which is complementary to the first conduction type, at least into the bottoms of the trenches; and carrying out a second thermal step. | 09-29-2011 |
| 20110227095 | Semiconductor Device Including a Normally-On Transistor and a Normally-Off Transistor - A semiconductor device is disclosed. One embodiment includes a first semiconductor die having a normally-off transistor. In a second semiconductor die a plurality of transistor cells of a normally-on transistor are formed, wherein one of a source terminal/drain terminal of the normally-on transistor is electrically coupled to a gate terminal of the normally-on transistor and the other one the source terminal/drain terminal of the normally-off transistor is electrically coupled to one of a source terminal/drain terminal of the normally-on transistor. The second semiconductor die includes a gate resistor electrically coupled between the gate terminal of the normally-off transistor and respective gates of the plurality of transistor cells. A voltage clamping element is electrically coupled between the gate terminal and the one of the source terminal/drain terminal of the normally-on transistor. | 09-22-2011 |
| 20110215858 | CONTROLLING THE RECOMBINATION RATE IN A BIPOLAR SEMICONDUCTOR COMPONENT - Disclosed is a method for controlling the recombination rate in the base region of a bipolar semiconductor component, and a bipolar semiconductor component. | 09-08-2011 |
| 20110215729 | METHOD FOR OPERATING A FLUORESCENT LAMP - A method for operating a fluorescent lamp which is connected to a series resonant circuit with a resonant circuit inductance and a resonant circuit capacitance. The method includes applying an excitation AC voltage at an excitation frequency to the series resonant circuit using a half bridge circuit, which has an output to which the series resonant circuit is coupled, and which has a first and a second switch which are alternately switched on and off on the basis of a frequency signal. A current flowing through the resonant circuit is monitored for the presence of a critical operating state. The switched-on times of the first and second switches are shortened in comparison to switched-on times which are predetermined by the frequency signal, upon detection of a critical operating state. | 09-08-2011 |
| 20110210377 | NITRIDE SEMICONDUCTOR DEVICE - A semiconductor device is described. In one embodiment, the device includes a Group-III nitride channel layer and a Group-III nitride barrier layer on the Group-III nitride channel layer, wherein the Group-III nitride barrier layer includes a first portion and a second portion, the first portion having a thickness less than the second portion. A p-doped Group-III nitride gate layer section is arranged at least on the first portion of the Group-III nitride barrier layer and a gate contact formed on the p-doped Group-III nitride gate layer. | 09-01-2011 |
| 20110207310 | SEMICONDUCTOR DEVICE WITH A FIELD STOP ZONE AND PROCESS OF PRODUCING THE SAME - Embodiments discussed herein relate to processes of producing a field stop zone within a semiconductor substrate by implanting dopant atoms into the substrate to form a field stop zone between a channel region and a surface of the substrate, at least some of the dopant atoms having energy levels of at least 0.15 eV below the energy level of the conduction band edge of semiconductor substrate; and laser annealing the field stop zone. | 08-25-2011 |
| 20110189839 | Method for producing a semiconductor device with a semiconductor body - A semiconductor device with a semiconductor body and method for its production is disclosed. The semiconductor body includes drift zones of epitaxially grown semiconductor material of a first conduction type. The semiconductor body further includes charge compensation zones of a second conduction type complementing the first conduction type, which are arranged laterally adjacent to the drift zones. The charge compensation zones are provided with a laterally limited charge compensation zone doping, which is introduced into the epitaxially grown semiconductor material. The epitaxially grown semiconductor material includes 20 to 80 atomic % of the doping material of the drift zones and a doping material balance of 80 to 20 atomic % introduced by ion implantation and diffusion. | 08-04-2011 |
| 20110165763 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body. | 07-07-2011 |
| 20110147883 | SEMICONDUCTOR BODY WITH A BURIED MATERIAL LAYER AND METHOD - Disclosed is a method for forming a buried material layer in a semiconductor body, and a semiconductor arrangement including a buried material layer. | 06-23-2011 |
| 20110147817 | SEMICONDUCTOR COMPONENT HAVING AN OXIDE LAYER - Semiconductor component having an oxide layer. One embodiment includes a first semiconductor region and a second semiconductor region. An oxide layer is arranged between the first and second semiconductor region. The first semiconductor region and the oxide layer form a first semiconductor-oxide interface. The second semiconductor region and the oxide layer form a second semiconductor-oxide interface. The oxide layer has a chlorine concentration, the chlorine concentration having a first maximum in the region of the first semiconductor-oxide interface, and having a second maximum in the region of the second semiconductor-oxide interface. | 06-23-2011 |
| 20110147796 | SEMICONDUCTOR DEVICE WITH METAL CARRIER AND MANUFACTURING METHOD - Semiconductor device including a metal carrier substrate. Above the carrier substrate a first semiconductor layer of Al | 06-23-2011 |
| 20110133272 | SEMICONDUCTOR DEVICE WITH IMPROVED ON-RESISTANCE - A semiconductor device includes a source, a drain, and a gate configured to selectively enable a current to pass between the source and the drain. The semiconductor device includes a drift zone between the source and the drain and a first field plate adjacent the drift zone. The semiconductor device includes a dielectric layer electrically isolating the first field plate from the drift zone and charges within the dielectric layer close to an interface of the dielectric layer adjacent the drift zone. | 06-09-2011 |
| 20110121437 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A semiconductor device includes a drift zone of a first conductivity type formed within a semiconductor body, wherein one side of opposing sides of the drift zone adjoins a first zone within the semiconductor body and the other side adjoins a second zone within the semiconductor body. First semiconductor subzones of a second conductivity type different from the first conductivity type are formed within each of the first and second zones opposing each other along a lateral direction extending parallel to a surface of the semiconductor body. A second semiconductor subzone is formed within each of the first and second zones and between the first semiconductor subzones along the lateral direction. An average concentration of dopants within the second semiconductor subzone along 10% to 90% of an extension of the second semiconductor subzone along a vertical direction perpendicular to the surface is smaller than the average concentration of dopants along a corresponding section of extension within the drift zone. | 05-26-2011 |
| 20110115453 | NONLINEAR CONTROL LOOP FOR DC-DC CONVERTERS - A nonlinear converter, such as a DC-DC converter, includes a nonlinear controller configured to receive an output voltage and a current, and configured to generate a PWM signal. The PWM signal is generated based on setting the converter to a first phase associated with both buck and boost modes when a clock signal is asserted, and selecting a second phase associated with the buck mode of the converter, if a sliding function signal achieves a first predetermined relationship with respect to a buck threshold before a next clock signal is asserted, or selecting a third phase associated with the boost mode of the converter, if the sliding function signal achieves a second predetermined relationship with respect to a boost threshold before a next clock signal is asserted. The nonlinear converter may include a power stage configured to provide the output voltage and a coil current to the nonlinear controller. | 05-19-2011 |
| 20110109283 | SYSTEM AND METHOD FOR CONTROLLING A CONVERTER - A system and method for controlling a converter. One embodiment provides the cyclic actuation of a first switching element, used for applying an input voltage to an inductive storage element. A second switching element is used as a first rectifier element in a rectifier arrangement, in a step-up converter. An actuating circuit is provided for the first and second switching elements. | 05-12-2011 |
| 20110101451 | SEMICONDUCTOR COMPONENT STRUCTURE WITH VERTICAL DIELECTRIC LAYERS - A semiconductor component having a semiconductor body having a first and a second side, an edge and an edge region adjacent to the edge in a lateral direction is described. | 05-05-2011 |
| 20110101416 | BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A bipolar semiconductor device with a hole current redistributing structure and an n-channel IGBT are provided. The n-channel IGBT has a p-doped body region with a first hole mobility and a sub region which is completely embedded within the body region and has a second hole mobility which is lower than the first hole mobility. Further, a method for forming a bipolar semiconductor device is provided. | 05-05-2011 |
| 20110095392 | HIGH VOLTAGE RESISTANCE COUPLING STRUCTURE - The disclosed invention provides a structure and method for providing a high lateral voltage resistance between the electrical networks, sharing a lateral plane, of conductive elements (e.g., having different high voltage potentials) comprising a coupler. In one embodiment, an integrated coupler providing a high lateral voltage resistance comprises a primary conductive element and a secondary conductive element. An isolating material is laterally configured between the electrical network of the primary conductive element and an electrical network of the secondary conductive element. The isolating material may comprise a low-k dielectric layer and prevents any lateral barrier layers (e.g., etch stop layers, diffusion barrier layers, etc.) from extending between the first conductive element and the electrical network of the second conductive element. The structure therefore provides a galvanically isolated integrated coupler which avoids electrical shorting between circuits (e.g., at barrier layers) resulting in an improved high voltage resistance. | 04-28-2011 |
| 20110095362 | FIELD PLATE TRENCH TRANSISTOR AND METHOD FOR PRODUCING IT - A field plate trench transistor having a semiconductor body. In one embodiment the semiconductor has a trench structure and an electrode structure embedded in the trench structure. The electrode structure being electrically insulated from the semiconductor body by an insulation structure and having a gate electrode structure and a field electrode structure. The field plate trench transistor has a voltage divider configured such that the field electrode structure is set to a potential lying between source and drain potentials. | 04-28-2011 |
| 20110095360 | METHOD AND DEVICE INCLUDING TRANSISTOR COMPONENT HAVING A FIELD ELECTRODE - A transistor component and method of forming a transistor component. One embodiment provides a semiconductor arrangement including a semiconductor body having a at least one first trench, a first field electrode arranged in the lower trench section of the at least one first trench and being insulated from the semiconductor body by a field electrode dielectric. A dielectric layer is formed on the first field electrode in the at least one first trench, including depositing a dielectric material on a first side of the semiconductor body and on the field plate at a higher deposition rate than on sidewalls of the at least one first trench. | 04-28-2011 |
| 20110095336 | LATERAL HEMT AND METHOD FOR THE PRODUCTION OF A LATERAL HEMT - In one embodiment a lateral HEMT has a first layer, the first layer including a semiconducting material, and a second layer, the second layer including a semiconducting material and being at least partially arranged on the first layer. The lateral HEMT further has a passivation layer and a drift region, the drift region including a lateral width w | 04-28-2011 |
| 20110089528 | SEMICONDUCTOR HAVING OPTIMIZED INSULATION STRUCTURE AND PROCESS FOR PRODUCING THE SEMICONDUCTOR - A semiconductor having an optimized insulation structure which is simple and inexpensive to produce and can be made smaller than LOCOS insulation structures is disclosed. An implantation mask on a surface of a semiconductor substrate is used to implant elements into the semiconductor substrate, which elements, on thermal activation, form an insulation region together with the further elements of the semiconductor substrate. The thermal activation is effected by means of laser irradiation, during which the semiconductor substrate is briefly melted and then recrystallizes during the subsequent cooling, so that the implanted elements form the insulation region together with the further elements of the semiconductor substrate. | 04-21-2011 |
| 20110089527 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A semiconductor and method for manufacturing a semiconductor device. In one embodiment the method includes providing a semiconductor substrate with a first substrate surface and at least one trench having at least one trench surface. The trench extends from the first substrate surface into the semiconductor substrate. The trench has a first trench section and a second trench section. The trench surface is exposed in an upper portion of the first and second trench sections and covered with a first insulating layer in a lower portion. A second insulating layer is formed at least on the exposed trench surface in the upper portion. A conductive layer is formed on the second insulating layer at least in the upper portion, wherein the second insulating layer electrically insulates the conductive layer from the semiconductor substrate. The conductive layer is removed in the first trench section without removing the conductive layer in the second trench section. | 04-21-2011 |
| 20110089481 | MOS TRANSISTOR WITH ELEVATED GATE DRAIN CAPACITY - A MOS transistor having an increased gate-drain capacitance is described. One embodiment provides a drift zone of a first conduction type. At least one transistor cell has a body zone, a source zone separated from the drift zone by the body zone, and a gate electrode, which is arranged adjacent to the body zone and which is dielectrically insulated from the body zone by a gate dielectric. At least one compensation zone of the first conduction type is arranged in the drift zone. At least one feedback electrode is arranged at a distance from the body zone, which is dielectrically insulated from the drift zone by a feedback dielectric and which is electrically conductively connected to the gate electrode. | 04-21-2011 |
| 20110076817 | INTEGRATED CIRCUIT DEVICE WITH A SEMICONDUCTOR BODY AND METHOD FOR THE PRODUCTION OF AN INTEGRATED CIRCUIT DEVICE - An integrated circuit device with a semiconductor body and a method for the production of a semiconductor device a provided. The semiconductor body comprises a cell field with a drift zone of a first conduction type. In addition, the semiconductor device comprises an edge region surrounding the cell field. Field plates with a trench gate structure are arranged in the cell field, and an edge trench surrounding the cell field is provided in the edge region. The front side of the semiconductor body is in the edge region provided with an edge zone of a conduction type complementing the first conduction type with doping materials of body zones of the cell field. The edge zone of the complementary conduction type extends both within and outside the edge trench. | 03-31-2011 |
| 20110062558 | SEMICONDUCTOR WAFER FOR SEMICONDUCTOR COMPONENTS AND PRODUCTION METHOD - A semiconductor wafer for semiconductor components and to a method for its production is disclosed. In one embodiment, the semiconductor wafer includes a front side with an adjoining near-surface active zone as basic material for semiconductor component structures. The rear side of the semiconductor wafer is adjoined by a getter zone for gettering impurity atoms in the semiconductor wafer. The getter zone contains oxygen precipitates. In the near-surface active zone, atoms of doping material are located on lattice vacancies. The atoms of doping material have a higher diffusion coefficient that the oxygen atoms. | 03-17-2011 |
| 20110049667 | Semiconductor Component With Dielectric Layer Stack - A semiconductor component has a semiconductor body zone, a first electrically conductive layer adjacent to the semiconductor body zone, a first dielectric layer with first dielectric properties and a second dielectric layer with second dielectric properties. The first dielectric properties differ from the second dielectric properties. The first dielectric layer and the second dielectric layer are arranged between the semiconductor body zone and the first electrically conductive layer. A second electrically conductive layer is applied between the first dielectric layer and the second dielectric layer. A first voltage divider is switched between the first electrically conductive layer and the semiconductor body zone. The second electrically conductive layer is electrically conductively connected only to the voltage divider. | 03-03-2011 |
| 20110049593 | Semiconductor Component - A semiconductor component comprising a semiconductor body, a channel zone in the semiconductor body, a channel control electrode adjacent to the channel zone, and a dielectric layer between the channel zone and the channel control electrode, wherein the dielectric layer has a relative dielectric constant ε | 03-03-2011 |
| 20110042791 | METHOD FOR TREATING AN OXYGEN-CONTAINING SEMICONDUCTOR WAFER, AND SEMICONDUCTOR COMPONENT - A method for treating an oxygen-containing semiconductor wafer, and semiconductor component. One embodiment provides a first side, a second side opposite the first side. A first semiconductor region adjoins the first side. A second semiconductor region adjoins the second side. The second side of the wafer is irridated such that lattice vacancies arise in the second semiconductor region. A first thermal process is carried out the duration of which is chosen such that oxygen agglomerates form in the second semiconductor region and that lattice vacancies diffuse from the first semiconductor region into the second semiconductor region. | 02-24-2011 |
| 20110025301 | Detection of a load state of a half-bridge - Disclosed is a method for diagnosing a half-bridge having a first and a second switching element. The method includes providing a half-bridge that has a first and a second switching element connected in series with each other. The first and the second switching element are driven on and off cyclically, with the switching elements during one drive cycle being alternatingly driven on and off such that they are alternatingly subject to a load current flowing therethrough. A current measuring signal is provided, representing a current flow through one of the switching elements. A first reference signal is provided. A first diagnostic signal is generated that is dependent on an integral of the measuring signal over a first integration period, and on an integral of a first reference signal over a second integration period. | 02-03-2011 |
| 20110024791 | BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A bipolar semiconductor device and method are provided. One embodiment provides a bipolar semiconductor device including a first semiconductor region of a first conductivity type having a first doping concentration, a second semiconductor region of a second conductivity type forming a pn-junction with the first semiconductor region, and a plurality of third semiconductor regions of the first conductivity type at least partially arranged in the first semiconductor region and having a doping concentration which is higher than the first doping concentration. Each of the third semiconductor regions is provided with at least one respective junction termination structure. | 02-03-2011 |
| 20110018029 | SEMICONDUCTOR DEVICE HAVING A FLOATING SEMICONDUCTOR ZONE - A semiconductor device includes a first trench and a second trench extending into a semiconductor body from a surface. A body region of a first conductivity type adjoins a first sidewall of the first trench and a first sidewall of the second trench, the body region including a channel portion adjoining to a source structure and being configured to be controlled in its conductivity by a gate structure. The channel portion is formed at the first sidewall of the second trench and is not formed at the first sidewall of the first trench. An electrically floating semiconductor zone of the first conductivity type adjoins the first trench and has a bottom side located deeper within the semiconductor body than the bottom side of the body region. | 01-27-2011 |
| 20110006407 | SEMICONDUCTOR DEVICE WITH CHANNEL STOP TRENCH AND METHOD - A semiconductor device is provided which includes a semiconductor substrate having a first surface, an active area and a peripheral area. The semiconductor device further includes least one channel stop trench formed in the semiconductor substrate, wherein the channel stop trench extends from the first surface at least partially into the semiconductor substrate and is arranged between the active area and the peripheral area. At least one electrode is arranged in the channel stop trench. The semiconductor substrate includes at least a peripheral contact region, which is arranged in the peripheral area at the first surface of the semiconductor substrate. A conductive layer is provided and in electrical contact with the electrode arranged in the channel stop trench and in electrical contact with the peripheral contact region. The conductive layer is electrically connected to the semiconductor substrate merely in the peripheral area and electrically insulated from the semiconductor substrate in the active area. | 01-13-2011 |
| 20100321041 | Determining the dead time in driving a half-bridge - Disclosed is a circuit arrangement for determining a temporal change of an output voltage of a half-bridge circuit during a dead time. In one embodiment, the circuit arrangement includes a first input for applying the output voltage. A capacitive network is provided having a first and a second circuit node capacitively coupled to the input, and having a terminal for a reference potential. A recharging circuit is configured, during the switched-on phase of one of a first and second switching elements, to adjust electrical potentials of the first and second nodes, the electrical potentials each being different from the reference potential. A comparator arrangement is provided that is configured during the dead time to determine a time difference between such times at which the electrical potentials at the first and second node each assume a given potential value, the time difference being a measure for the change with time of the output voltage. | 12-23-2010 |
| 20100320536 | TRANSISTOR COMPONENT HAVING AN AMORPHOUS SEMI-ISOLATING CHANNEL CONTROL LAYER - Disclosed is a transistor component having a control structure with a channel control layer of an amorphous semiconductor insulating material extending in a current flow direction along a channel zone. | 12-23-2010 |
| 20100320535 | TRANSISTOR COMPONENT HAVING AN AMORPHOUS CHANNEL CONTROL LAYER - Disclosed is a semiconductor component, including: a drift zone arranged between a first and a second connection zone; a channel control layer of an amorphous semi-insulating material arranged adjacent to the drift zone. | 12-23-2010 |
| 20100301410 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREFOR - A semiconductor device having a semiconductor body, a source metallization arranged on a first surface of the semiconductor body and a trench including a first trench portion and a second trench portion and extending from the first surface into the semiconductor body is provided. The semiconductor body further includes a pn-junction formed between a first semiconductor region and a second semiconductor region. The first trench portion includes an insulated gate electrode which is connected to the source metallization, and the second trench portion includes a conductive plug which is connected to the source metallization and to the second semiconductor region. | 12-02-2010 |
| 20100301408 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed. One embodiment includes a trench within a semiconductor body and a gate insulating structure at opposing sidewalls within the trench. A gate electrode structure adjoins the gate insulating structure within the trench and a dielectric structure adjoins the gate electrode structure within the trench. The gate electrode structure is in contact with the semiconductor body at a bottom side of the trench and is electrically coupled to a drain zone over an element having a voltage blocking capability. | 12-02-2010 |
| 20100277088 | SYSTEM FOR SUPPLYING CURRENT TO A LOAD - A system for supplying current to a load is disclosed. One embodiment provides a switching converter for providing a load current to the load. The switching regulator includes a switching circuit. A current control unit generates a modulated current control signal representing a desired load current. The switching circuit is driven dependent on the modulated current control signal. A logic circuit receives a pulse-width-modulated control signal representing a desired dimming ratio and is configured to generate a gate signal for driving the switching circuit dependent on the current control signal during a duty cycle of the pulse-width-modulated control signal. The logic circuit is configured to activate the switching converter, independent on the state of the current control signal, at the beginning of the duty cycle of the pulse-width-modulated control signal. | 11-04-2010 |
| 20100264508 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A semiconductor device and manufacturing method is disclosed. One embodiment provides a common substrate of a first conductivity type and at least two wells of a second conductivity type. A buried high Ohmic region and at least an insulating structure is provided insulating the first well from the second well. The insulating structure extends through the buried high Ohmic region and includes a conductive plug in Ohmic contact with the first semiconductor region. A method for forming an integrated semiconductor device is also provided. | 10-21-2010 |
| 20100264467 | TRANSISTOR COMPONENT HAVING A SHIELDING STRUCTURE - A transistor component having a shielding structure. One embodiment provides a source terminal, a drain terminal and control terminal. A source zone of a first conductivity type is connected to the source terminal. A drain zone of the first conductivity type is connected to the drain terminal. A drift zone is arranged between the source zone and the drain zone. A junction control structure is provided for controlling a junction zone in the drift zone between the drain zone and the source zone, at least including one control zone. A shielding structure is arranged in the drift zone between the junction control structure and the drain zone and at least includes a shielding zone of a second conductivity type being complementarily to the first conductivity type. The shielding zone is connected to a terminal for a shielding potential. The at least one control zone and the at least one shielding zone have different geometries or different orientations in a plain that is perpendicular to a current flow direction of the component. | 10-21-2010 |
| 20100264462 | SEMICONDUCTOR INCLUDING LATERAL HEMT - A semiconductor including a lateral HEMT and to a method for production of a lateral HEMT is disclosed. In one embodiment, the lateral HEMT has a substrate and a first layer, wherein the first layer has a semiconductor material of a first conduction type and is arranged at least partially on the substrate. Furthermore, the lateral HEMT has a second layer, wherein the second layer has a semiconductor material and is arranged at least partially on the first layer. In addition, the lateral HEMT has a third layer, wherein the third layer has a semiconductor material of a second conduction type, which is complementary to the first conduction type, and is arranged at least partially in the first layer. | 10-21-2010 |
| 20100258840 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed. One embodiment provides a cell area and a junction termination area at a first side of a semiconductor zone of a first conductivity type. At least one first region of a second conductivity type is formed at a second side of the semiconductor zone. The at least one first region is opposed to the cell area region. At least one second region of the second conductivity type is formed at the second side of the semiconductor zone. The at least one second region is opposed to the cell area region and has a lateral dimension smaller than the at least first region. | 10-14-2010 |
| 20100258801 | SEMICONDUCTOR COMPONENT INCLUDING A LATERAL TRANSISTOR COMPONENT - A semiconductor component including a lateral transistor component is disclosed. One embodiment provides an electrically insulating carrier layer. On the carrier layer a first and a second semiconductor layer are arranged on above another and are separated from another by a dielectric layer and from which at least the first semiconductor layer includes a polycrystalline semiconductor material, an amorphous semiconductor material or an organic semiconductor material. In the first semiconductor layer: a source zone, a body zone, a drift zone and a drain zone are provided. In the second semiconductor layer; a drift control zone is arranged adjacent to the drift zone, including a control terminal at a first lateral end for applying a control potential, and is coupled to the drain zone via a rectifying element at a second lateral end. A gate electrode is arranged adjacent to the body zone and is dielectrically insulated from the body zone by a gate dielectric layer. | 10-14-2010 |
| 20100254478 | ARRANGEMENT AND METHOD FOR SIGNAL TRANSMISSION BETWEEN DIFFERENT VOLTAGE DOMAINS - An arrangement and method for signal transmission between different voltage domains is disclosed. One embodiment provides a first signal processing unit receiving a first supply voltage. A second signal processing unit receives a second supply voltage, the first supply voltage and the second supply voltage overlap each other in a first overlap range. A third signal processing unit receives a third supply voltage, the second supply voltage and the third supply voltage overlap each other in a second voltage overlap range. A first information signal from the first signal processing unit is transmitted to the second signal processing unit. A second information signal dependent on the first information signal from the second signal processing is transmitted to the third signal processing unit. | 10-07-2010 |
| 20100230718 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE - A semiconductor device has a first semiconductor layer of a first conductivity type and a second semiconductor layer of a second conductivity type complementary to the first conductivity type arranged in or on the first semiconductor layer. Further, the semiconductor device has a region of the first conductivity type arranged in the second semiconductor layer. A first electrode contacts the region of the first conductivity type and the second semiconductor layer. A first trench extends into the first semiconductor layer, and a voltage dependent short circuit diverter structure includes electrically conductive material arranged in the first trench and coupled to the first electrode and a highly-doped diverter region of the second conductivity type. The diverter region of the voltage dependent short circuit diverter structure has the second conductivity type and is arranged to provide a diverter channel region of the second conductivity type between the diverter region and the second semiconductor layer in the event of a short circuit. | 09-16-2010 |
| 20100230715 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE - A semiconductor device has a semiconductor body with a semiconductor device structure including at least a first electrode and a second electrode. Between the two electrodes, a drift region is arranged, the drift region including charge compensation zones and drift zones arranged substantially parallel to one another. At least one charge carrier storage region which is at least partially free of charge compensation zones is arranged in the semiconductor body. | 09-16-2010 |
| 20100213506 | COMPONENT ARRANGEMENT INCLUDING A MOS TRANSISTOR HAVING A FIELD ELECTRODE - A component arrangement including a MOS transistor having a field electrode is disclosed. One embodiment includes a gate electrode, a drift zone and a field electrode, arranged adjacent to the drift zone and dielectrically insulated from the drift zone by a dielectric layer a charging circuit, having a rectifier element connected between the gate electrode and the field electrode. | 08-26-2010 |
| 20100213505 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING A SEMICONDUCTOR DEVICE - A semiconductor device has a first semiconductor layer of a first conductivity type and a second semiconductor layer of a second conductivity type complementary to the first conductivity type arranged in or on the first semiconductor layer. The semiconductor device has a region of the first conductivity type arranged in the second semiconductor layer. A first electrode contacts the region of the first conductivity type and the second semiconductor layer. A trench extends into the first semiconductor layer, and a voltage dependent short circuit diverter structure has a highly-doped diverter region of the second conductivity type. This diverter region is arranged via an end of a channel region and coupled to a diode arranged in the trench. | 08-26-2010 |
| 20100210091 | METHOD FOR PRODUCING A SEMICONDUCTOR - A method for producing a semiconductor includes providing a p-doped semiconductor body having a first side and a second side; implanting protons into the semiconductor body via the first side to a target depth of the semiconductor body; bonding the first side of the semiconductor body to a carrier substrate; forming an n-doped zone in the semiconductor body by heating the semiconductor body such that a pn junction arises in the semiconductor body; and removing the second side of the semiconductor body at least as far as a space charge zone spanned at the pn junction. | 08-19-2010 |
| 20100187605 | MONOLITHIC SEMICONDUCTOR SWITCHES AND METHOD FOR MANUFACTURING - One aspect is monolithic semiconductor switches and method for manufacturing. One embodiment provides one semiconductor die with a first and a second FET. One of source/drain of the first FET and one of source/drain of the second FET are electrically coupled to at least one contact area at a first side of one semiconductor die, respectively. The other one of source/drain of the first FET, a gate of the first FET, the other one of source/drain of the second FET and the gate of the second FET are electrically coupled to contact areas at a second side of the one semiconductor die opposite to the first side, respectively. The contact areas of the other one of source/drain of the first FET, of the gate of the first FET, of the other one of source/drain of the second FET and of the gate of the second FET are electrically separated from each other, respectively. | 07-29-2010 |
| 20100181641 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A semiconductor and method for manufacturing a semiconductor device. In one embodiment the method includes providing a semiconductor substrate with a first substrate surface and at least one trench having at least one trench surface. The trench extends from the first substrate surface into the semiconductor substrate. The trench has a first trench section and a second trench section. The trench surface is exposed in an upper portion of the first and second trench sections and covered with a first insulating layer in a lower portion. A second insulating layer is formed at least on the exposed trench surface in the upper portion. A conductive layer is formed on the second insulating layer at least in the upper portion, wherein the second insulating layer electrically insulates the conductive layer from the semiconductor substrate. The conductive layer is removed in the first trench section without removing the conductive layer in the second trench section. | 07-22-2010 |
| 20100181627 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A semiconductor device and method for manufacturing. One embodiment provides a semiconductor device including an active cell region and a gate pad region. A conductive gate layer is arranged in the active cell region and a conductive resistor layer is arranged in the gate pad region. The resistor layer includes a resistor region which includes a grid-like pattern of openings formed in the resistor layer. A gate pad metallization is arranged at least partially above the resistor layer and in electrical contact with the resistor layer. An electrical connection is formed between the gate layer and the gate pad metallization, wherein the electrical connection includes the resistor region. | 07-22-2010 |
| 20100156505 | CIRCUIT ARRANGEMENT AND METHOD FOR GENERATING A DRIVE SIGNAL FOR A TRANSISTOR - Disclosed is a circuit arrangement for generating a drive signal for a transistor. In one embodiment, the circuit arrangement includes a control circuit that receives a switching signal, a driver circuit that outputs a drive signal, and at least one transmission channel. The control circuit transmits, depending on the switching signal for each switching operation of the transistor, switching information and switching parameter information via the transmission channel to the driver circuit. The driver circuit generates the drive signal depending on the switching information and depending on the switching parameter information. | 06-24-2010 |
| 20100155743 | SiC SEMICONDUCTOR DEVICE WITH SELF-ALIGNED CONTACTS, INTEGRATED CIRCUIT AND MANUFACTURING METHOD - One aspect includes a semiconductor device with self-aligned contacts, integrated circuit and manufacturing method. One embodiment provides gate control structures. Each of the gate control structures is configured to control the conductivity of a channel region within a silicon carbide substrate by field effect. A contact hole is self-aligned to opposing sidewalls of adjacent gate control structures by intermediate spacers. | 06-24-2010 |
| 20100151643 | METHOD FOR PRODUCING AN INTEGRATED CIRCUIT INCLUDING A TRENCH TRANSISTOR AND INTEGRATED CIRCUIT - A method for producing an integrated circuit including a trench transistor and an integrated circuit is disclosed. | 06-17-2010 |
| 20100127304 | BIPOLAR SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD - A bipolar semiconductor device and manufacturing method. One embodiment provides a diode structure including a structured emitter coupled to a first metallization is provided. The structured emitter includes a first weakly doped semiconductor region of a first conductivity type which forms a pn-load junction with a weakly doped second semiconductor region of the diode structure. The structured emitter includes at least a highly doped first semiconductor island of the first conductivity type which at least partially surrounds a highly doped second semiconductor island of the second conductivity type. | 05-27-2010 |
| 20100117725 | SEMICONDUCTOR DIODE - A semiconductor diode with integrated resistor has a semiconductor body with a front surface, a back surface and a diode structure with an anode electrode and a cathode electrode. A resistance layer arranged on the back surface of the semiconductor body provides the integrated resistor | 05-13-2010 |
| 20100117144 | SEMICONDUCTOR DEVICE AND METHOD FOR THE PRODUCTION OF A SEMICONDUCTOR DEVICE - In one embodiment, a field effect transistor has a semiconductor body, a drift region of a first conductivity type and a gate electrode. At least one trench extends into the drift region. A field plate is arranged at least in a portion of the at least one trench. A dielectric material at least partially surrounds both the gate electrode and the field plate. The field plate includes a first semiconducting material. | 05-13-2010 |
| 20100102871 | ELECTRONIC CIRCUIT AND METHOD FOR CONTROLLING A POWER FIELD EFFECT TRANSISTOR - An electronic circuit and a method for controlling a power field effect transistor. The electronic circuit comprises a power field effect transistor having a semiconductor body, which has a drain zone, a drift zone, a source zone and a bulk zone. The power field effect transistor further comprises a gate and a field plate. The field plate is placed adjacent to the drift zone and is isolated from the drift zone. A switch circuitry is provided for electrically connecting the field plate depending on the drain-source voltage such that the field plate is electrically connected to the drain zone, if |UDS|>UT, where UT is a predetermined voltage, and if |UDS|>UT, the field plate is connected to an electrode having an electrode-source voltage UES. | 04-29-2010 |
| 20100087053 | METHOD FOR FABRICATING A SEMICONDUCTOR HAVING A GRADED PN JUNCTION - A method for fabricating a semiconductor body is presented. The semiconductor body includes a p-conducting zone, an n-conducting zone and a pn junction in a depth T | 04-08-2010 |
| 20100079191 | CIRCUIT FOR ACTUATION OF A TRANSISTOR - A circuit for actuation of a transistor. One embodiment provides an actuation output for connection to the actuation connection of the transistor. A measurement arrangement is provided for ascertaining a load current flowing through the load path or a voltage across the load path and for providing a measurement signal. An actuation current source having an actuation current output is connected to the actuation output and supplied with the measurement signal and designed to produce an actuation current at the actuation current output. The actuation current is at a current level dependent on the measurement signal. | 04-01-2010 |
| 20100079181 | SAMPLE-POINT ADJUSTMENT IN A SWITCHING CONVERTER - An apparatus and method of generating a drive signal for a switch in a switching converter having input terminals for applying an input voltage, output terminals for providing an output signal, and at least one inductive storage element coupled to the switch. The method includes sampling the output signal to provide a sampled output signal, and generating a pulsewidth modulated drive signal having a duty cycle that is dependent on the sampled output signal, wherein the output voltage is sampled at sampling times that are dependent on the duty cycle. | 04-01-2010 |
| 20100078775 | SEMICONDUCTOR DEVICE WITH A CHARGE CARRIER COMPENSATION STRUCTURE AND METHOD FOR THE PRODUCTION OF A SEMICONDUCTOR DEVICE - A semiconductor device has a cell field with drift zones of a first type of conductivity and charge carrier compensation zones of a second type of conductivity complementary to the first type. An edge region which surrounds the cell field has a higher blocking strength than the cell field, the edge region having a near-surface area which is undoped to more weakly doped than the drift zones, and beneath the near-surface area at least one buried, vertically extending complementarily doped zone is positioned. | 04-01-2010 |
| 20100078774 | SEMICONDUCTOR DEVICE WITH CHANNEL STOP TRENCH AND METHOD - A semiconductor device is provided which includes a semiconductor substrate having a first surface, an active area and a peripheral area. The semiconductor device further includes least one channel stop trench formed in the semiconductor substrate, wherein the channel stop trench extends from the first surface at least partially into the semiconductor substrate and is arranged between the active area and the peripheral area. At least one electrode is arranged in the channel stop trench. The semiconductor substrate includes at least a peripheral contact region, which is arranged in the peripheral area at the first surface of the semiconductor substrate. A conductive layer is provided and in electrical contact with the electrode arranged in the channel stop trench and in electrical contact with the peripheral contact region. The conductive layer is electrically connected to the semiconductor substrate merely in the peripheral area and electrically insulated from the semiconductor substrate in the active area. | 04-01-2010 |
| 20100078765 | Power semiconductor - A power semiconductor component is described. One embodiment provides a semiconductor body having an inner zone and an edge zone. A base zone of a first conduction type is provided. The base zone is arranged in the at least one inner zone and the at least one edge zone. An emitter zone of a second conduction type is provided. The emitter zone is arranged adjacent to the base zone in a vertical direction of the semiconductor body. A field stop zone of the first conduction type is provided. The field stop zone is arranged in the base zone and has a first field stop zone section having a first dopant dose in the edge zone and a second field stop zone section having a second dopant dose in the inner zone. The first dopant dose is higher than the second dopant dose. | 04-01-2010 |
| 20100078718 | SEMICONDUCTOR DEVICE AND METHODS FOR PRODUCING A SEMICONDUCTOR DEVICE - A semiconductor device includes a semiconductor substrate, a trench, a buried insulated source electrode arranged in a bottom portion of the trench, a first gate electrode and a second gate electrode arranged in an upper portion of the trench and spaced apart from one another. A surface gate contact extends into the upper portion of the trench and is in physical and electrical contact with the first gate electrode and second gate electrode. | 04-01-2010 |
| 20100078713 | SEMICONDUCTOR COMPONENT STRUCTURE WITH VERTICAL DIELECTRIC LAYERS - A method for producing a semiconductor structure and a semiconductor component are described. | 04-01-2010 |
| 20100078710 | Semiconductor component with a drift zone and a drift control zone - A semiconductor component has a drift zone and a drift control zone, a drift control zone dielectric, which is arranged in sections between the drift zone and the drift control zone, and has a first and a second connection zone, which are doped complementarily with respect to one another and which form a pn junction between the drift control zone and a section of the drift zone. | 04-01-2010 |
| 20100078708 | MOS TRANSISTOR HAVING AN INCREASED GATE-DRAIN CAPACITANCE - A MOS transistor having an increased gate-drain capacitance is described. One embodiment provides a drift zone of a first conduction type. At least one transistor cell has a body zone, a source zone separated from the drift zone by the body zone, and a gate electrode, which is arranged adjacent to the body zone and which s dieletrically insulated from the body zone by a gate dielectric. At least one compensation zone of the first conduction type is arranged in the drift zone. At least one feedback electrode is arranged at a distance from the body zone, which is dielectrically insulated from the drift zone by a feedback dielectric and which is electrically conductively connected to the gate electrode. | 04-01-2010 |
| 20100078707 | SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF - A semiconductor device includes a source metallization, a source region of a first conductivity type in contact with the source metallization, a body region of a second conductivity type which is adjacent to the source region. The semiconductor device further includes a first field-effect structure including a first insulated gate electrode and a second field-effect structure including a second insulated gate electrode which is electrically connected to the source metallization. The capacitance per unit area between the second insulated gate electrode and the body region is larger than the capacitance per unit area between the first insulated gate electrode and the body region. | 04-01-2010 |
| 20100078694 | SEMICONDUCTOR COMPONENT HAVING A DRIFT ZONE AND A DRIFT CONTROL ZONE - A description is given of a normally on semiconductor component having a drift zone, a drift control zone and a drift control zone dielectric arranged between the drift zone and the drift control zone. | 04-01-2010 |
| 20100072971 | CIRCUIT FOR A SEMICONDUCTOR SWITCHING ELEMENT INCLUDING A TRANSFORMER - A circuit for a semiconductor switching element including a transformer. One embodiment provides a first voltage supply circuit having a first oscillator. A first transformer is connected downstream of the first oscillator. A first accumulation circuit for providing a first supply voltage is connected downstream of the first transformer. A driver circuit having input terminals for feeding in the first supply voltage and having output terminals for providing a drive voltage for the semiconductor switching element, designed to generate the drive voltage for the semiconductor switching element at least from the first supply voltage. | 03-25-2010 |
| 20100052044 | SEMICONDUCTOR DEVICE WITH A TRENCH GATE STRUCTURE AND METHOD FOR THE PRODUCTION THEREOF - A semiconductor device with a trench gate structure includes a semiconductor body with switching electrodes. At least gate electrode controls the off state and the on state between the switching electrodes. The at least one gate electrode in the trench gate structure controls at least one vertical switching channel through at least one body zone. The trench gate structure includes at least one trench with side walls, wherein the at least one gate electrode, which is insulated against the side walls in the region of the at least one body zone alternately by at least one gate oxide section and at least one trench oxide section and forms a switching channel with a gate oxide section in the at least one region, is located in the at least one trench. | 03-04-2010 |
| 20100046263 | RECTIFIER CIRCUIT WITH A VOLTAGE SENSOR - A rectifier circuit with a synchronously controlled semiconductor element comprising at least one field effect transistor with a control electrode and two switching electrodes. The control electrode operates the reverse state and the forward state between the switching electrodes. For this, the rectifier circuit comprises at least one driver which cooperates with a voltage sensor of the field effect transistor. During the diode operating state of the field effect transistor, the driver operates this to the forward state. The voltage sensor thereby forms at least one part of a non-linear voltage divider which comprises at least one monolithically integrated measuring capacitance. | 02-25-2010 |
| 20100044838 | SEMICONDUCTOR COMPONENT WITH MARGINAL REGION - A semiconductor component having a semiconductor body includes an active region and a marginal region surrounding the active region. The marginal region extends from the active region as far as an edge of the semiconductor body. A zone composed of porous material is formed in the marginal region. | 02-25-2010 |
| 20100044825 | SEMICONDUCTOR DEVICE AND METHOD FOR THE PRODUCTION OF A SEMICONDUCTOR DEVICE - In a semiconductor body, a semiconductor device has an active region with a vertical drift section of a first conduction type and a near-surface lateral well of a second, complementary conduction type. An edge region surrounding this active region comprises a variably laterally doped doping material zone (VLD zone). This VLD zone likewise has the second, complementary conduction type and adjoins the well. The concentration of doping material of the VLD zone decreases to the concentration of doping material of the drift section along the VLD zone towards a semiconductor chip edge. Between the lateral well and the VLD zone, a transitional region is provided which contains at least one zone of complementary doping located at a vertically lower point than the well in the semiconductor body. | 02-25-2010 |
| 20100044788 | SEMICONDUCTOR DEVICE WITH A CHARGE CARRIER COMPENSATION STRUCTURE AND PROCESS - A semiconductor device with a charge carrier compensation structure. In one embodiment, the semiconductor device has a central cell field with a gate and source structure. At least one bond contact area is electrically coupled to the gate structure or the source structure. A capacitance-increasing field plate is electrically coupled to at least one of the near-surface bond contact areas. | 02-25-2010 |
| 20100044720 | SEMICONDUCTOR DEVICE WITH A REDUCED BAND GAP AND PROCESS - The application relates to a semiconductor device made of silicon with regionally reduced band gap and a process for the production of same. One embodiment provides a semiconductor device including a body zone, a drain zone and a source zone. A gate extends between the source zone and the drain zone. A reduced band gap region is provided in a region of the body zone, made of at least ternary compound semiconductor material. | 02-25-2010 |
| 20100025748 | SEMICONDUCTOR DEVICE WITH A DYNAMIC GATE-DRAIN CAPACITANCE - A semiconductor device with a dynamic gate drain capacitance. One embodiment provides a semiconductor device. The device includes a semiconductor substrate, a field effect transistor structure including a source region, a first body region, a drain region, a gate electrode structure and a gate insulating layer. The gate insulating layer is arranged between the gate electrode structure and the body region. The gate electrode structure and the drain region partially form a capacitor structure including a gate-drain capacitance configured to dynamically change with varying reverse voltages applied between the source and drain regions. The gate-drain capacitance includes at least one local maximum at a given threshold or a plateau-like course at given reverse voltage. | 02-04-2010 |
| 20100009525 | METHOD INCLUDING PRODUCING A MONOCRYSTALLINE LAYER - A method including producing a monocrystalline layer is disclosed. A first lattice constant on a monocrystalline substrate has a second lattice constant at least in a near-surface region. The second lattice constant is different from the first lattice constant. Lattice matching atoms are implanted into the near-surface region. The near-surface region is momentarily melted. A layer is epitaxially deposited on the near-surface region that has solidified in monocrystalline fashion. | 01-14-2010 |
| 20100007028 | DEVICE INCLUDING AN IMIDE LAYER WITH NON-CONTACT OPENINGS AND METHOD - A device including an imide layer with non-contact openings and the method for producing the device. One embodiment provides a substrate on a main surface of the substrate, an imide layer on the metallization layer, at least one contact opening through the imide layer and a plurality of non-contact openings in the imide layer. The non-contact openings are dimensioned to provide for an increased surface area of the imide layer or a surface area of the imide layer which is not reduced by more than 10 percent. | 01-14-2010 |
| 20090325361 | METHOD FOR PRODUCING A SEMICONDUCTOR INCLUDING A MATERIAL LAYER - A method for producing a semiconductor including a material layer. In one embodiment a trench is produced having two opposite sidewalls and a bottom, in a semiconductor body. A foreign material layer is produced on a first one of the two sidewalls of the trench. The trench is filled by epitaxially depositing a semiconductor material onto the second one of the two sidewalls and the bottom of the trench. | 12-31-2009 |
| 20090322417 | SEMICONDUCTOR COMPONENT ARRANGEMENT HAVING A COMPONENT WITH A DRIFT ZONE AND A DRIFT CONTROL ZONE - Disclosed is a semiconductor including a component having a drift zone and a drift control zone. A first connection zone is adjacent to the drift zone and is doped more highly than the drift zone. A drift control zone is arranged adjacent to the drift zone and is coupled to the first connection zone. A drift control zone is dielectric arranged between the drift zone and the drift control zone. At least one rectifier element is arranged between the first connection zone and the drift control zone. A charging circuit is connected to the drift control zone. | 12-31-2009 |
| 20090322293 | SWITCHING CONVERTER INCLUDING A RECTIFIER ELEMENT WITH NONLINEAR CAPACITANCE - A switching converter including a rectifier element with nonlinear capacitance. One embodiment provides a switching element configured to be driven in the on state and in the off state. A first capacitive element is between the load path terminals of the switching element and has a nonlinear capacitance characteristic curve dependent on a voltage between the load path connections. A rectifier element is coupled between the inductive storage element and the capacitive storage element such that it enables a current flow between the inductive storage element and the capacitive storage element when the switching element is driven in the off state. A second capacitive element is between the load path terminals of the rectifier element and has a nonlinear capacitance characteristic curve dependent on a voltage between the load path connections. | 12-31-2009 |
| 20090321818 | SEMICONDUCTOR COMPONENT WITH TWO-STAGE BODY ZONE - A semiconductor component with a two-stage body zone. One embodiment provides semiconductor component including a drift zone, and a compensation zone of a second conduction type. The compensation zone is arranged in the drift zone. A source zone and a body zone is provided. The body zone is arranged between the source zone and the drift zone. A gate electrode is arranged adjacent to the body zone. The body zone has a first body zone section and a second body zone section, which are adjacent to one another along the gate dielectric and of which the first body zone section is doped more highly than the second body zone section. | 12-31-2009 |
| 20090321804 | SEMICONDUCTOR COMPONENT INCLUDING A DRIFT ZONE AND A DRIFT CONTROL ZONE - A semiconductor component including a drift zone and a drift control zone. One embodiment provides a transistor component having a drift zone, a body zone, a source zone and a drain zone. The drift zone is arranged between the body zone and the drain zone. The body zone is arranged between the source zone and the drift zone. | 12-31-2009 |
| 20090315108 | SEMICONDUCTOR DEVICE WITH FIELD ELECTRODE AND METHOD - A semiconductor device with a field electrode and method. One embodiment provides a controllable semiconductor device including a control electrode for controlling the semiconductor device and a field electrode. The field electrode includes a number of longish segments which extend in a first lateral direction and which run substantially parallel to one another. The control electrode includes a number of longish segments extending in a second lateral direction and running substantially parallel to one another, wherein the first lateral direction is different from the second lateral direction. | 12-24-2009 |
| 20090305486 | METHOD FOR PRODUCING A SEMICONDUCTOR LAYER - A method for producing a semiconductor layer is disclosed. One embodiment provides for a semiconductor layer on a semiconductor substrate containing oxygen. Crystal defects are produced at least in a near-surface region of the semiconductor substrate. A thermal process is carried out wherein the oxygen is taken up at the crystal defects. The semiconductor layer is deposited epitaxially over the near-surface region of the semiconductor substrate. | 12-10-2009 |
| 20090302814 | SYSTEM AND METHOD FOR CONTROLLING A CONVERTER - A system and method for controlling a converter. One embodiment provides the cyclic actuation of a first switching element, used for applying an input voltage to an inductive storage element. A second switching element is used as a first rectifier element in a rectifier arrangement, in a step-up converter. An actuating circuit is provided for the first and second switching elements. | 12-10-2009 |
| 20090298270 | METHOD FOR PRODUCING A SEMICONDUCTOR - A method for producing a semiconductor is disclosed. One embodiment provides a p-doped semiconductor body having a first side and a second side. An n-doped zone is formed in the semiconductor body by implantation of protons into the semiconductor body via the first side down to a specific depth of the semiconductor body and by subsequent heating at least of the proton-implanted region of the semiconductor body. A pn junction arises in the semiconductor body. The second side of the semiconductor body is removed at least as far as a space charge zone spanned at the pn junction. | 12-03-2009 |
| 20090298262 | METHOD OF SPLITTING BRITTLE MATERIALS WITH TRENCHING TECHNOLOGY - One aspect of the invention relates to a method for splitting an object made of brittle material into at least two pieces. The object has a first flat surface and a second flat surface opposite to each other. The method includes etching at least one trench in at least one of the surfaces so as to form at least one line on the surface. The method also includes splitting the object into separate pieces along the line. | 12-03-2009 |
| 20090289690 | SEMICONDUCTOR DEVICE WITH SWITCH ELECTRODE AND GATE ELECTRODE AND METHOD FOR SWITCHING A SEMICONDUCTOR DEVICE - A semiconductor device with switch electrode and gate electrode and a method for switching a semiconductor device. One embodiment provides a semiconductor substrate with an emitter region, a drift region, a body region and a source region. The drift region is formed between the emitter and the body region while the body region is formed between the drift and the source region. A first trench structure extends from the source region at least partially into the drift region. The first trench structure includes a gate electrode arranged next to the body region and a switch electrode arranged in portions next to the drift region, wherein the switch and gate electrodes are electrically insulated from each other in the trench structure. A first gate driver is electrically connected to the gate electrode while a second gate driver is electrically connected to the switch gate. | 11-26-2009 |
| 20090284162 | METHOD FOR DRIVING A FLUORESCENT LAMP, AND LAMP BALLAST - A method for driving a fluorescent lamp and lamp ballast is disclosed. In one embodiment, an excitation AC voltage having an excitation frequency is applied to the series resonant circuit using a half-bridge circuit, having an output, to which the series resonant circuit is coupled, and having a first and a second switch, which are driven in the on state and in the off state with a fundamental frequency predetermined by a frequency signal or with an increased frequency. The switches are driven with the fundamental frequency or with the increased frequency with respect to the fundamental frequency in a manner dependent on a temporal change in the resonant circuit current between two temporally spaced-apart evaluation instants lying within a switched-on duration of one of the switches. | 11-19-2009 |
| 20090273024 | METHOD FOR PRODUCING A TRANSISTOR COMPONENT HAVING A FIELD PLATE - A method for producing a transistor component having a field plate. One embodiment includes providing a semiconductor body having a first side, and including a first trench extending into the semiconductor body. A field plate dielectric layer is produced on the first side and at uncovered areas of the first trench such that a residual trench remains. A field plate layer is produced in the residual trench. The first side of the semiconductor body is uncovered using a polishing method. The field plate dielectric layer is partially removed from the at least one first trench proceeding from the first side. | 11-05-2009 |
| 20090267200 | METHOD FOR MANUFACTURING A SEMICONDUCTOR SUBSTRATE INCLUDING LASER ANNEALING - A method for manufacturing a semiconductor device by laser annealing. One embodiment provides a semiconductor substrate having a first surface and a second surface. The second surface is arranged opposite to the first surface. A first dopant is introduced into the semiconductor substrate at the second surface such that its peak doping concentration in the semiconductor substrate is located at a first depth with respect to the second surface. A second dopant is introduced into the semiconductor surface at the second surface such that its peak doping concentration in the semiconductor substrate is located at a second depth with respect to the second surface, wherein the first depth is larger than the second depth. At least a first laser anneal is performed by directing at least one laser beam pulse onto the second surface to melt the semiconductor substrate, at least in sections, at the second surface. | 10-29-2009 |
| 20090267174 | SEMICONDUCTOR DEVICE WITH A CHARGE CARRIER COMPENSATION STRUCTURE IN A SEMICONDUCTOR BODY AND METHOD FOR ITS PRODUCTION - A semiconductor device with a charge carrier compensation structure in a semiconductor body and to a method for its production. The semiconductor body includes drift zones of a first conduction type and charge compensation zones of a second conduction type complementing the first conduction type. The drift zones include a semiconductor material applied in epitaxial growth zones, wherein the epitaxial growth zones include an epitaxially grown semiconductor material which is non-doped to lightly doped. Towards the substrate, the epitaxial growth zones are provided with a first conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of a second, complementary conduction type. Towards the front side, the epitaxial growth zones are provided with a second, complementary conduction type incorporated by ion implantation over the entire surface and with selectively introduced doping material zones of the first conduction type. | 10-29-2009 |
| 20090261379 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR BODY AND METHOD FOR ITS PRODUCTION - A semiconductor device includes an active region with a vertical drift path of a first conduction type and with a near-surface lateral well of a second, complementary conduction type. In addition, the semiconductor device has an edge region surrounding the active region. This edge region has a variable lateral doping material zone of the second conduction type, which adjoins the well. A transition region in which the concentration of doping material gradually decreases from the concentration of the well to the concentration at the start of the variable lateral doping material zone is located between the lateral well and the variable lateral doping material zone. | 10-22-2009 |
| 20090236680 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR BODY AND METHOD FOR ITS PRODUCTION - A semiconductor device with a semiconductor body and method for its production is provided. The semiconductor body includes drift zones of epitaxially grown semiconductor material of a first conduction type. The semiconductor body further includes charge compensation zones of a second conduction type complementing the first conduction type, which are arranged laterally adjacent to the drift zones. The charge compensation zones are provided with a laterally limited charge compensation zone doping, which is introduced into the epitaxially grown semiconductor material. The epitaxially grown semiconductor material includes 20 to 80 atomic % of the doping material of the drift zones and a doping material balance of 80 to 20 atomic % introduced by ion implantation and diffusion. | 09-24-2009 |
| 20090218621 | SEMICONDUCTOR COMPONENT WITH A DRIFT REGION AND A DRIFT CONTROL REGION - A semiconductor component with a drift region and a drift control region. One embodiment includes a semiconductor body having a drift region of a first conduction type in the semiconductor body. A drift control region composed of a semiconductor material, which is arranged, at least in sections, is adjacent to the drift region in the semiconductor body. An accumulation dielectric is arranged between the drift region and the drift control region. | 09-03-2009 |
| 20090218618 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SAME - A semiconductor device and method. One embodiments provides a semiconductor substrate having a trench with a sidewall isolation comprising a first isolating material, a field electrode formed in lower portion of the trench, a cover comprising a second material above the field electrode, the second material being selectively etchable to the first isolating material, a gate dielectric on the sidewall in an upper portion of the trench and a gate electrode in the upper portion of the trench. | 09-03-2009 |
| 20090212331 | SEMICONDUCTOR COMPONENT WITH SCHOTTKY ZONES IN A DRIFT ZONE - A description is given of a semiconductor component comprising a drift zone of a first conduction type and at least one Schottky metal zone arranged in the drift zone, and of a method for producing a semiconductor component. | 08-27-2009 |
| 20090212322 | Vertical Semiconductor Device - A vertical semiconductor device includes a semiconductor body, and first and second contacts on opposite sides of the semiconductor body. A plurality of regions are formed in the semiconductor body including, in a direction from the first contact to the second contact, a first region of a first conductivity type, a second region of a second conductivity type; and a third region of the first conductivity type. The third region is electrically connected to the second contact. A semiconductor zone of the second conductivity type and increased doping density is arranged in the second region. The semiconductor zone separates a first part of the second region from a second part of the second region. The semiconductor zone has a maximum doping density exceeding about 10 | 08-27-2009 |
| 20090195335 | SEMICONDUCTOR CONFIGURATION HAVING AN INTEGRATED COUPLER AND METHOD FOR MANUFACTURING SUCH A SEMICONDUCTOR CONFIGURATION - A semiconductor configuration having an integrated coupler is provided. The semiconductor configuration includes a coupler which is integrated in the substrate and which includes a first port and a second port. The coupler defines, in a plan view onto the substrate, an inner region of the substrate surrounded at least in sections by the coupler, and an outer region of the substrate arranged outside to the coupler. The coupler is at least a magnetic coupler, a capacitive coupler, or a combination of both. At least a circuit element is integrated in the inner region of the substrate and includes a port which is electrically connected to the second port of the coupler. | 08-06-2009 |
| 20090189240 | SEMICONDUCTOR DEVICE WITH AT LEAST ONE FIELD PLATE - A semiconductor component with at least one field plate. One embodiment provides the field plate to make contact with the semiconductor body at a connection contact. The semiconductor body has in the region of the connection contact a doping concentration that is less than 5·10 | 07-30-2009 |
| 20090189216 | SEMICONDUCTOR COMPONENT INCLUDING A DRIFT ZONE AND A DRIFT CONTROL ZONE - Semiconductor component including a drift region and a drift control region. One embodiment provides a drift zone and a drift control zone. A drift control zone dielectric is arranged between the first drift zone and the drift control zone and has at least two sections arranged at a distance from one another in a current flow direction of the component. At least one separating structure is arranged between the drift zone and the drift control zone in the region of an interruption, defined by the at least two sections, of the drift control zone dielectric and has at least one PN junction. | 07-30-2009 |
| 20090184373 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device is provided which has a semiconductor substrate. An active cell area having at least one active cell is formed in the semiconductor substrate, wherein at least sections of the active cell area are surrounded by an edge termination region. An integrated gate runner structure is arranged at least partially in the edge termination region and has at least one low electrical resistance portion and at least one high electrical resistance portion which are electrically connected in series with each other. | 07-23-2009 |
| 20090166729 | POWER SEMICONDUCTOR HAVING A LIGHTLY DOPED DRIFT AND BUFFER LAYER - A power semiconductor element having a lightly doped drift and buffer layer is disclosed. One embodiment has, underneath and between deep well regions of a first conductivity type, a lightly doped drift and buffer layer of a second conductivity type. The drift and buffer layer has a minimum vertical extension between a drain contact layer on the adjacent surface of a semiconductor substrate and the bottom of the deepest well region which is at least equal to a minimum lateral distance between the deep well regions. The vertical extension can also be determined such that a total amount of dopant per unit area in the drift and buffer layer is larger then a breakdown charge amount at breakdown voltage. | 07-02-2009 |
| 20090166727 | POWER SEMICONDUCTOR HAVING A LIGHTLY DOPED DRIFT AND BUFFER LAYER - A power semiconductor element having a lightly doped drift and buffer layer is disclosed. One embodiment has, underneath and between deep well regions of a first conductivity type, a lightly doped drift and buffer layer of a second conductivity type. The drift and buffer layer has a minimum vertical extension between a drain contact layer on the adjacent surface of a semiconductor substrate and the bottom of the deepest well region which is at least equal to a minimum lateral distance between the deep well regions. The vertical extension can also be determined such that a total amount of dopant per unit area in the drift and buffer layer is larger then a breakdown charge amount at breakdown voltage. | 07-02-2009 |
| 20090159927 | INTEGRATED CIRCUIT DEVICE AND METHOD FOR ITS PRODUCTION - An integrated circuit device includes a semiconductor body fitted with a first electrode and a second electrode on opposite surfaces. A control electrode on an insulating layer controls channel regions of body zones for a current flow between the two electrodes. A drift section adjoining the channel regions comprises drift zones and charge compensation zones. A part of the charge compensation zones includes conductively connected charge compensation zones electrically connected to the first electrode. Another part includes nearly-floating charge compensation zones, so that an increased control electrode surface has a monolithically integrated additional capacitance C | 06-25-2009 |
| 20090152667 | Semiconductor with active component and method for manufacture - A semiconductor with active component and method for manufacture. One embodiment provides a semiconductor component arrangement having an active semiconductor component and a semiconductor body having a first semiconductor zone, a third semiconductor zone, and also a drift zone arranged between the first semiconductor zone and the third semiconductor zone. A patterned fourth semiconductor zone doped complementarily to the drift zone is arranged in the drift zone. A potential control structure is provided, which is connected to the patterned fourth semiconductor zone. The potential control structure is designed to connect the patterned fourth semiconductor zone, in the off state of the semiconductor component, to an electrical potential lying between the electrical potential of the first semiconductor zone and the electrical potential of the third semiconductor zone. | 06-18-2009 |
| 20090152624 | INTEGRATED CIRCUIT DEVICE WITH A SEMICONDUCTOR BODY AND METHOD FOR THE PRODUCTION OF AN INTEGRATED CIRCUIT DEVICE - An integrated circuit device with a semiconductor body and a method for the production of a semiconductor device a provided. The semiconductor body comprises a cell field with a drift zone of a first conduction type. In addition, the semiconductor device comprises an edge region surrounding the cell field. Field plates with a trench gate structure are arranged in the cell field, and an edge trench surrounding the cell field is provided in the edge region. The front side of the semiconductor body is in the edge region provided with an edge zone of a conduction type complementing the first conduction type with doping materials of body zones of the cell field. The edge zone of the complementary conduction type extends both within and outside the edge trench. | 06-18-2009 |
| 20090140388 | INTEGRATED CIRCUIT INCLUDING AN EMITTER STRUCTURE AND METHOD FOR PRODUCING THE SAME - A semiconductor emitter structure for emitting charge carriers of a first conductivity type in a base volume of a second conductivity type material neighbored to the emitter structure in a vertical direction, includes multiple emitter volumes of first conductivity tape material having a predetermined lateral dimension in a lateral direction perpendicular to the vertical direction. The emitter volumes are, in the lateral direction, neighbored by semiconductor volumes of second conductivity type material, wherein the predetermined lateral dimension is such that space charges created by second conductivity type carriers laterally diffusing into the emitter volumes from the semiconductor volumes limit a maximum density of first conductivity type carriers within the emitter volumes by more than 20% as compared to emitter volumes of the same lateral dimension not neighbored by semiconductor volumes of the second conductivity type material. | 06-04-2009 |
| 20090134489 | SYSTEM INCLUDING AN INTER-CHIP COMMUNICATION SYSTEM - A system including an inter-chip communication system is disclosed. One embodiment includes a base chip including a base chip transceiver network. At least one chip is stacked on the base chip, the at least one stacked chip including a substrate, a cavity formed in the substrate, a first surface, and a stacked chip transceiver network disposed on the first surface adjacent to the cavity. | 05-28-2009 |
| 20090134434 | SEMICONDUCTOR DEVICE - A semiconductor device is disclosed. One embodiment provides a top surface. A first lateral semiconductor region is arranged adjacent to the top surface and includes a transistor structure. The transistor structure includes a drain zone of a first conductivity type. A second lateral semiconductor region is arranged below the first semiconductor region and includes a junction field-effect transistor structure. The junction field-effect transistor structure includes a source zone of the first conductivity type which is electrically connected to the drain zone of the transistor structure. | 05-28-2009 |
| 20090130806 | POWER SEMICONDUCTOR COMPONENT WITH CHARGE COMPENSATION STRUCTURE AND METHOD FOR THE FABRICATION THEREOF - A semiconductor component with charge compensation structure has a semiconductor body having a drift path between two electrodes. The drift path has drift zones of a first conduction type, which provide a current path between the electrodes in the drift path, while charge compensation zones of a complementary conduction type constrict the current path of the drift path. For this purpose, the drift path has two alternately arranged, epitaxially grown diffusion zone types, the first drift zone type having monocrystalline semiconductor material on a monocrystalline substrate, and a second drift zone type having monocrystalline semiconductor material in a trench structure, with complementarily doped walls, the complementarily doped walls forming the charge compensation zones. | 05-21-2009 |
| 20090114986 | FIELD PLATE TRENCH TRANSISTOR AND METHOD FOR PRODUCING IT - A field plate trench transistor having a semiconductor body. In one embodiment the semiconductor has a trench structure and an electrode structure embedded in the trench structure. The electrode structure being electrically insulated from the semiconductor body by an insulation structure and having a gate electrode structure and a field electrode structure. The field plate trench transistor has a voltage divider configured such that the field electrode structure is set to a potential lying between source and drain potentials. | 05-07-2009 |
| 20090109718 | INTEGRATED CIRCUIT INCLUDING A CONTROLLER FOR REGULATING A POWER SUPPLY - An integrated circuit includes a controller configured to regulate an output of a power supply based on a first signal. The integrated circuit includes an input configured to receive the first signal and to be coupled to an external capacitor that sets an adjustable blanking time for the power supply. | 04-30-2009 |
| 20090108303 | SEMICONDUCTOR COMPONENT AND METHOD - A semiconductor component and method of making a semiconductor component. One embodiment provides a first metallization structure electrically coupled to charge compensation zones via an ohmic contact and to drift zones via a Schottky contact. A second metallization structure, which is arranged opposite the first metallization structure, is electrically coupled to the charge compensation zones via a Schottky contact and to drift zones via an ohmic contact. | 04-30-2009 |
| 20090086512 | Driving a primary-side switch and a secondary-side rectifier element in a switching converter - An apparatus, comprising a transformer comprising a first winding and a second winding; a first switch coupled to the first winding and configured to alternate between an off state and an on state in response to a pulsed first signal; a rectifier coupled to the second winding and configured to alternate between an off state and an on state in response to a pulsed second signal; and a drive circuit configured to generate the first and second signals such that the first switch and the rectifier are switched to the on state in a temporally offset relation with each other. | 04-02-2009 |
| 20090085704 | CHIP INDUCTOR - A chip inductor includes a first substrate and a second substrate. The first substrate includes at least one first conductive strip line having end terminals at a surface of the first substrate and the second substrate includes at least one second conductive strip line having end terminals at a surface of the second substrate, wherein a pitch of the end terminals on the first substrate corresponds to a pitch of the end terminals on the second substrate. Furthermore, conductive studs are provided which connect the end terminals on the first substrate with the end terminals on the second substrate to form an inductor loop. | 04-02-2009 |
| 20090085104 | SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING - A method for manufacturing a semiconductor device includes providing a semiconductor substrate including a first surface and a second surface which is arranged opposite to the first surface. The semiconductor substrate includes a plurality of trench structures extending from the first surface into the semiconductor substrate. The thickness of the semiconductor substrate is then reduced by removing semiconductor material at the second surface to obtain a processed second surface with exposed bottom portions of the trench structures. At least a first mask is formed on the processed second surface in a self-aligned manner with respect to the bottom portions of the trench structures, and doping regions are formed in the semiconductor substrate between the trench structures. | 04-02-2009 |
| 20090085103 | SEMICONDUCTOR DEVICE AND METHOD - A semiconductor device and production method is disclosed. In one embodiment, the semiconductor device includes a first electrode and a second electrode, located on surfaces of a semiconductor body, and an insulated gate electrode. The semiconductor body has a contact groove for the first electrode in an intermediate oxide layer. Highly doped zones of a first conduction type are located in edge regions of the source connection zone. Below the highly doped zones of the first conduction type, there are highly doped zones of a body zone with a complementary conduction type. In a central region of the source connection zone, the body zone has a net charge carrier concentration with a complementary conduction type which is lower than the charge carrier concentration in the edge regions of the source connection zone. | 04-02-2009 |
| 20090085064 | HETEROJUNCTION SEMICONDUCTOR DEVICE AND METHOD - A semiconductor device includes a first semiconductor substrate of a first band-gap material and a second semiconductor substrate of a second band-gap material. The second band-gap material has a lower band-gap than the first band-gap material. A heterojunction is formed between the first semiconductor substrate and the second semiconductor substrate substantially in a first plane. The semiconductor device further includes, in a cross-section which is perpendicular to the first plane, a first semiconductor region of a first conductivity type and a second semiconductor region of the first conductivity type both of which extend from the second semiconductor substrate at least partially into the first semiconductor substrate. The first and second semiconductor regions are spaced in the first semiconductor substrate from each other in a direction parallel to the first plane by a first distance which is arranged in an area proximate to the heterojunction and which is larger than a second distance which is arranged in an area distal to the heterojunction. | 04-02-2009 |
| 20090078971 | SEMICONDUCTOR DEVICE WITH STRUCTURED CURRENT SPREAD REGION AND METHOD - A semiconductor device with structured current spread region and method is disclosed. One embodiment provides a drift portion of a first conductivity type, a current spread portion of the first conductivity type and first portions of the first conductivity type. The current spread portion and the first portions are arranged in a first plane on the drift portion, wherein the current spread portion surrounds at least partially the first portions. The semiconductor body further includes spaced apart body regions of a second conductivity type which are arranged on the current spread portion. Further, the doping concentration of the current spread portion is higher than the doping concentrations of the drift portion and of the first portions. | 03-26-2009 |
| 20090068803 | METHOD FOR MAKING AN INTEGRATED CIRCUIT INCLUDING VERTICAL JUNCTION FIELD EFFECT TRANSISTORS - A method for making an integrated circuit including vertical junction field effect transistors is disclosed. One embodiment creates a vertical junction field effect transistor using a fault-tolerant or alignment-tolerant production process. The device performance is not harmed, even if misalignments in consecutive semiconductor processing steps occur. | 03-12-2009 |
| 20090057713 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR BODY - A semiconductor body includes a drift zone of a first conduction type. A body zone of a second conduction type complementary to the first conduction type is located near the surface in the semiconductor body. The semiconductor body includes a near-surface field stop zone of the second complementary conduction type and doped more lightly than the body zone. | 03-05-2009 |
| 20090053869 | METHOD FOR PRODUCING AN INTEGRATED CIRCUIT INCLUDING A TRENCH TRANSISTOR AND INTEGRATED CIRCUIT - A method for producing an integrated circuit including a trench transistor and an integrated circuit is disclosed. | 02-26-2009 |
| 20090051013 | SEMICONDUCTOR WAFER FOR SEMICONDUCTOR COMPONENTS AND PRODUCTION METHOD - A semiconductor wafer for semiconductor components and to a method for its production is disclosed. In one embodiment, the semiconductor wafer includes a front side with an adjoining near-surface active zone as basic material for semiconductor component structures. The rear side of the semiconductor wafer is adjoined by a getter zone for gettering impurity atoms in the semiconductor wafer. The getter zone contains oxygen precipitates. In the near-surface active zone, atoms of doping material are located on lattice vacancies. The atoms of doping material have a higher diffusion coefficient that the oxygen atoms. | 02-26-2009 |
| 20090032906 | ELECTRO STATIC DISCHARGE DEVICE AND METHOD FOR MANUFACTURING AN ELECTRO STATIC DISCHARGE DEVICE - An electro static discharge device includes a semiconductor body. The semiconductor body includes a first surface, a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type arranged on the first semiconductor region and a third semiconductor region of the first conductivity type. The third semiconductor region is isolated from the first semiconductor region by the second semiconductor region. A resistor structure is arranged in the semiconductor body and comprises at least one trench structure. The resistor structure is arranged at least in the second semiconductor region and provides a high-resistance electrical connection between a first portion and a second portion of the second semiconductor region. | 02-05-2009 |
| 20090032865 | SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING IT - A semiconductor component having differently structured cell regions, and a method for producing it. For this purpose, the semiconductor component includes a semiconductor body. A first electrode on the top side of the semiconductor body is electrically connected to a first zone near the surface of the semiconductor body. A second electrode is electrically connected to a second zone of the semiconductor body. Furthermore, the semiconductor body has a drift path region, which is arranged in the semiconductor body between the first electrode and the second electrode. A cell region of the semiconductor component is subdivided into a main cell region and an auxiliary cell region, wherein the breakdown voltage of the auxiliary cells is greater than the breakdown voltage of the main cells. | 02-05-2009 |
| 20090032848 | SEMICONDUCTOR DEVICE AND METHOD FOR FORMING SAME - A method for manufacturing a semiconductor device. The method includes providing a semiconductor body of a conductivity type, wherein the semiconductor body comprises a first surface. At least one buried region of a second conductivity type is formed in the semiconductor body and at least a surface region of the second conductivity type is formed at the first surface of the semiconductor body, wherein the buried region and the surface region are formed such that they are spaced apart from each other. The buried region is formed by deep implantation of a first dopant of the second conductivity type. | 02-05-2009 |
| 20090026542 | INTEGRATED CIRCUIT INCLUDING A SEMICONDUCTOR ASSEMBLY IN THIN-SOI TECHNOLOGY - An integrated circuit including a semiconductor assembly in thin-film SOI technology is disclosed. One embodiment provides a semiconductor assembly in thin-film SOI technology including a first semiconductor substrate structure of a second conductivity type inverse to a first conductivity type in a semiconductor substrate below a first semiconductor layer, a second semiconductor substrate structure of a second conductivity type in a semiconductor substrate below a second semiconductor layer structure, and a third semiconductor substrate structure of the first conductivity type below the first semiconductor layer structure in the semiconductor substrate and otherwise surrounded by the first semiconductor substrate structure. | 01-29-2009 |
| 20090026532 | SHORT CIRCUIT LIMITING IN POWER SEMICONDUCTOR DEVICES - A power semiconductor device includes a semiconductor body. The semiconductor body includes a body region of a first conductivity type for forming therein a conductive channel of a second conductivity type; a gate electrode arranged next to the body region; and a floating electrode arranged between the gate electrode and the body region. | 01-29-2009 |
| 20090026531 | METHOD FOR INSULATING A SEMICONDUCTING MATERIAL IN A TRENCH FROM A SUBSTRATE - A method for insulating a semiconducting material in a trench from a substrate, wherein the trench is formed in the substrate and comprising an upper portion and a lower portion, the lower portion being lined with a first insulating layer and filled, at least partially, with a semiconducting material, comprises an isotropic etching of the substrate and the semiconducting material, and forming a second insulating layer in the trench, wherein the second insulating layer covers, at least partially, the substrate and the semiconducting material. | 01-29-2009 |
| 20090021271 | Measuring the On-Resistance of a Transistor Load Path - Methods, and apparatuses for performing them, including applying a control signal to a control terminal of a transistor, to switch the transistor to an on-state such that the transistor carries a load current through a load-path of the transistor; measuring a voltage drop across the load-path of the transistor while the load current is passing through the load-path of the transistor, yielding a first measurement value; feeding a test current into the load-path of the transistor, such that the test current and the load current are combined; measuring a voltage drop across the load-path of the transistor while the combined test and load currents are passing through the load-path of the transistor, a second measurement value; and determining an on-resistance of the load-path of the transistor from a difference of the first and second measurement values. | 01-22-2009 |
| 20090021174 | Controlling a Lamp Ballast - A method and apparatus for providing electrical current to a lamp, detecting a power supply voltage outage, detecting a return of the power supply voltage, determining how long the power supply voltage outage lasted, and preheating the lamp responsive to determining that the power supply voltage outage lasted greater than a threshold amount of time. | 01-22-2009 |
| 20090010033 | ACTIVE DIODE - An active diode is disclosed. One embodiment provides a method for operating a device. The electronic device includes a transistor connected between a first and a second connection of the electronic device; a control device coupled to a control connection of the transistor; and an energy storage device coupled to the control device. | 01-08-2009 |
| 20090008723 | SEMICONDUCTOR COMPONENT INCLUDING AN EDGE TERMINATION HAVING A TRENCH AND METHOD FOR PRODUCING - A semiconductor component includes a semiconductor body having a first side, a second side, an edge delimiting the semiconductor body in a lateral direction, an inner region and an edge region. A first semiconductor zone of a first conduction type is arranged in the inner region and in the edge region. A second semiconductor zone of a second conduction type is arranged in the inner region and adjacent to the first semiconductor zone. A trench is arranged in the edge region and has first and second sidewalls and a bottom, and extends into the semiconductor body. A doped first sidewall zone of the second conduction type is adjacent to the first sidewall of the trench. A doped second sidewall zone of the second conduction type is adjacent to the second sidewall of the trench. A doped bottom zone of the second conduction type is adjacent to the bottom of the trench. Doping concentrations of the sidewall zones are lower than a doping concentration of the bottom zone. | 01-08-2009 |
| 20080315363 | METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT, AND A SEMICONDUCTOR COMPONENT - A method for producing a semiconductor component is proposed. The method includes providing a semiconductor body having a first surface; forming a mask on the first surface, wherein the mask has openings for defining respective positions of trenches; producing the trenches in the semiconductor body using the mask, wherein mesa structures remain between adjacent trenches; introducing a first dopant of a first conduction type using the mask into the bottoms of the trenches; carrying out a first thermal step; introducing a second dopant of a second conduction type, which is complementary to the first conduction type, at least into the bottoms of the trenches; and carrying out a second thermal step. | 12-25-2008 |
| 20080315303 | METHOD OF FORMING A SEMICONDUCTOR STRUCTURE COMPRISING INSULATING LAYERS WITH DIFFERENT THICKNESSES - The method of forming a semiconductor structure in a substrate comprises, forming a first trench with a first width W | 12-25-2008 |
| 20080296668 | SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE - A semiconductor device has a substrate having a plurality of neighboring trenches, and a contact area, one mesa stripe each being formed between two neighboring trenches. The contact area contacts mesa stripes and surrounds an opening region in which the contact area is not formed and which is formed such that the contact area contacts the same mesa stripes at two positions between which the opening region is arranged, and the opening region having a region of elongate extension which intersects the mesa stripes in a skewed or perpendicular manner. | 12-04-2008 |
| 20080290992 | SEMICONDUCTOR DEVICE WITH INTEGRATED COILS - A semiconductor device with a number of integrated coils is disclosed. In one embodiment, a first coil portion and a second coil portion are at least in part overlapping each other. Another embodiment provides a process for manufacturing a semiconductor device having at least the processes of generating a first coil portion, generating a second coil portion, wherein at least a part of the first coil portion and a part of the second coil portion are overlapping each other. | 11-27-2008 |
| 20080290976 | Signal transmitter and signal transmission apparatus - Disclosed is a signal transmitter including a primary winding, a first and at least one second secondary winding which are arranged at a distance from the primary winding in a first direction and are in each case inductively coupled to the primary winding, and each of which has at least two series-connected winding sections, with the at least two winding sections of each of the first and second secondary windings being arranged in at least two different winding levels, and a signal transmission apparatus having a signal transmitter such as this. | 11-27-2008 |
| 20080285623 | METHOD AND APPARATUS FOR THERMAL PROTECTION IN AN INTEGRATED CIRCUIT - Some embodiments discussed relate to an apparatus comprising a temperature sensor disposed in an integrated circuit, the temperature sensor including a bipolar transistor having a collector coupled to a portion of a substrate of the integrated circuit, and a bandgap reference circuit configured to generate a reference voltage, and a comparator coupled to the temperature sensor and the bandgap reference circuit, the comparator configured to receive a first voltage from the emitter of the bipolar transistor and the reference voltage from the bandgap reference circuit and generate a switch-off signal based on a voltage difference between the first voltage and the reference voltage. | 11-20-2008 |
| 20080265329 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING IT - A semiconductor device which has a semiconductor body and a method for producing it. At the semiconductor body, a first electrode which is electrically connected to a first near-surface zone of the semiconductor body and a second electrode which is electrically connected to a second zone of the semiconductor body are arranged. A drift section is arranged between the first and the second electrode. In the drift section, a coupling structure is provided for at least one field plate arranged in the drift section. The coupling structure has a floating first area doped complementarily to the drift section and a second area arranged in the first area. The second area forms a locally limited punch-through effect or an ohmic contact to the drift section, and the field plate is electrically connected at least to the second area. | 10-30-2008 |
| 20080265320 | COMPONENT ARRANGEMENT INCLUDING A POWER SEMICONDUCTOR COMPONENT HAVING A DRIFT CONTROL ZONE - A component arrangement including a MOS transistor having a field electrode is disclosed. One embodiment includes a gate electrode, a drift zone and a field electrode, arranged adjacent to the drift zone and dielectrically insulated from the drift zone by a dielectric layer a charging circuit, having a rectifier element connected between the gate electrode and the field electrode. | 10-30-2008 |
| 20080265315 | SEMICONDUCTOR DEVICE WITH A SEMICONDUCTOR BODY AND METHOD FOR PRODUCING IT - A semiconductor device with a semiconductor body and to a method for producing it. In one embodiment, the semiconductor body has first electrodes which contact first highly doped semiconductor zones and complementary-conduction body zones surrounding the first semiconductor zones. The semiconductor body has a second electrode which contacts a second highly doped semiconductor zone. Between the second semiconductor zone and the body zones, a drift zone is arranged. Control electrodes which are insulated from the semiconductor body by a gate oxide and act on the body zones for controlling the semiconductor device are arranged on the semiconductor body. The body zones have minority charge carrier injector zones with complementary conduction to the body zones, arranged between the first semiconductor zones and the drift zone. | 10-30-2008 |
| 20080265277 | SEMICONDUCTOR DEVICE AND METHOD FOR PRODUCING IT - A semiconductor device with a field ring in an edge pattern of a semiconductor body with a central cell area and with field plate discharge pattern. The edge pattern exhibits at least one horizontal field plate which is arranged with one end over the field ring and with its other end on insulating layers towards the edge of the semiconductor body. A first ring-shaped area of a type of conduction doped complementary to a drift section material exhibits a field ring effect. A second highly doped ring-shaped area which contacts the one end of the horizontal field plate and forms a pn junction with the first ring-shaped area and which is arranged within the first area exhibits a locally limited punch-through effect or a resistive contact to the drift section material. | 10-30-2008 |
| 20080258874 | TRANSPONDER CIRCUIT ARRANGEMENT AND METHOD FOR OPERATING A DEMODULATOR - A transponder circuit arrangement including antenna contacts to which an antenna signal can be applied. The antenna signal includes at least one signal in one transmission band of a plurality of transmission bands. The transponder circuit arrangement also includes a detector adapted to detect whether the antenna signal includes a signal in a predetermined transmission band, and a demodulator adapted to demodulate the signal in the predetermined transmission band when the signal has been detected therein, and otherwise to demodulate a signal in another transmission band. | 10-23-2008 |
| 20080258208 | SEMICONDUCTOR COMPONENT INCLUDING COMPENSATION ZONES AND DISCHARGE STRUCTURES FOR THE COMPENSATION ZONES - A semiconductor component including compensation zones and discharge structures for the compensation zones. One embodiment provides a drift zone of a first conduction type, at least one compensation zone of a second conduction type, complementary to the first conduction type, the at least one compensation zone being arranged in the drift zone, at least one discharge structure which is arranged between the at least one compensation zone and a section of the drift zone that surrounds the compensation zone or in the compensation zone and designed to enable a charge carrier exchange between the compensation zone and the drift zone if a potential difference between an electrical potential of the compensation zone and an electrical potential of the section of the drift zone that surrounds the compensation zone is greater than a threshold value predetermined by the construction and/or the positioning of the discharge structure. | 10-23-2008 |
| 20080252418 | TRANSPONDER DEVICE AND METHOD FOR PROVIDING A SUPPLY VOLTAGE - Transponder circuit arrangement having antenna connections for application of a voltage signal, a load-reduction modulation device, which is coupled to the antenna connections and is designed to modulate the applied, unmodulated voltage signal, which is at a first level, and a voltage conversion device, which is coupled to the load-reduction modulation device and is designed to provide a supply voltage, the magnitude of whose level is greater than the first level. | 10-16-2008 |
| 20080252269 | Actuating circuit - Disclosed is an actuating circuit and method for actuating a switch regulating the power consumption in a power factor correction circuit having input terminals for applying an input voltage and output terminals for providing an output voltage. The switch is cyclically turned on for an on-time and turned off for an off-time, the on-time having a first on-time period and a second on-time period directly adjacent to the first on-time period. A length for the first on-time period is dependent on the control signal, and a length for the second on-time period is proportional, at least for a prescribed range of values for an instantaneous value of the input voltage, to a quotient with a first first-degree function for the instantaneous value in the denominator and a second first-degree function for the instantaneous value in the numerator, with function values for the first function increasing as the instantaneous value rises. | 10-16-2008 |
| 20080252268 | Method for actuation, and actuating circuit for a switch in a power factor correction circuit - The document describes a method and an actuating circuit for actuating a switch regulating the power consumption in a power factor correction circuit which has input terminals for applying an input voltage and output terminals for providing an output voltage. In this case, the switch is cyclically turned on for an on-time and turned off for an off-time, respectively, with the on-time having a first on-time period and a second on-time period which is directly adjacent to the first on-time period. A length for the first on-time period is in this case dependent on the control signal, and a length for the second on-time period is proportional, at least for a prescribed range of values for an instantaneous value of the input voltage, to a quotient with a first first-degree function for this instantaneous value in the denominator and a second first-degree function for the instantaneous value in the numerator, with function values for the first function increasing as the instantaneous value rises. | 10-16-2008 |
| 20080246055 | SEMICONDUCTOR COMPONENT INCLUDING A MONOCRYSTALLINE SEMICONDUCTOR BODY AND METHOD - A semiconductor component comprising a monocrystalline semiconductor body, and to a method for producing the same is disclosed. In one embodiment, the semiconductor body has a semiconductor component structure with regions of a porous-mono crystalline semiconductor. | 10-09-2008 |
| 20080237701 | SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING IT - A semiconductor component includes a semiconductor body having an edge with an edge zone of a first conductivity type. Charge compensation regions of a second conductivity type are embedded into the edge zone, with the charge compensation regions extending from a top side of the semiconductor component vertically into the semiconductor body. For the number N | 10-02-2008 |
| 20080230833 | SEMICONDUCTOR COMPONENT AND METHOD FOR PRODUCING A SEMICONDUCTOR COMPONENT - A semiconductor component having a semiconductor body having first and second semiconductor regions of a first conduction type, and a third semiconductor region of a second conduction type, which is complementary to the first conduction type. The second semiconductor region is arranged between the first and third semiconductor region and together with the first semiconductor region forms a first junction region and together with the third semiconductor region forms a second junction region. In the second semiconductor region the dopant concentration is lower than the dopant concentration in the first semiconductor region. The dopant concentration in the second semiconductor region along a straight connecting line between the first and third semiconductor regions is inhomogeneous and has at least one minimum between the first and second junction regions, wherein the minimum is at a distance from the first and second junction regions. | 09-25-2008 |
| 20080224547 | Reverse voltage protected integrated circuit arrangement - An integrated circuit arrangement is disclosed which comprises a semiconductor body having a substrate and at least one substrate terminal, at least one semiconductor component integrated in the semiconductor body and being connected between a first supply terminal providing a first supply potential and a second supply terminal providing a second supply potential, and switching means adapted for connecting at least one of said substrate terminals to either the first or to the second supply terminal dependent on which supply terminal provides the lower supply potential. | 09-18-2008 |
| 20080214004 | METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE AND SEMICONDUCTOR DEVICE - A method for manufacturing a semiconductor device and semiconductor device. One embodiment provides a semiconductor substrate with an active region and a margin region bordering on the active region. The spacer layer in the margin region is broken through at a selected location and at least part of the spacer layer is removed in the active region using a common process. The location is selected such that at least part of the semiconductor mesa structure is exposed and the spacer layer in the margin region is broken through to the conductive layer and not to the semiconductor substrate. | 09-04-2008 |
| 20080205105 | VOLTAGE CONVERTER - A voltage converter having an input unit, a transitional unit configured to convert an AC voltage provided by the input unit into a transitional voltage and at least one auxiliary transitional voltage, and an output unit configured to convert the transitional voltage to a DC voltage using a charge pump unit, the charge pump unit being supplied with the at least one auxiliary transitional voltage as a control signal. | 08-28-2008 |
| 20080203470 | Lateral compensation component - A transistor is provided which includes a lateral compensation component. The lateral compensation component includes a plurality of n (or n−) layer/p (or p−) layer pairs, wherein adjacent ones of said pairs are separated by one of an insulator region and/or an intrinsic silicon region. | 08-28-2008 |
| 20080197442 | SEMICONDUCTOR COMPONENT WITH CELL STRUCTURE AND METHOD FOR PRODUCING THE SAME - A semiconductor component comprises a semiconductor body comprising a first component electrode arranged on one of the surfaces of the semiconductor body, a second component electrode arranged on one of the surfaces of the semiconductor body, and a component control electrode arranged on one of the surfaces of the semiconductor body. In this case, active semiconductor element cells are arranged in a first active cell array of the semiconductor body, the semiconductor element cells comprising a first cell electrode, a second cell electrode and a cell control electrode and also a drift path between the cell electrodes. At least the component control electrode is arranged on a partial region of the semiconductor body and a second active cell array is additionally situated in the partial region of the semiconductor body below the component control electrode. | 08-21-2008 |
| 20080197380 | Semiconductor component comprising a drift zone and a drift control zone - A semiconductor component is disclosed herein comprising a drift zone and a drift control zone. The drift control zone is arranged adjacent to the drift zone and is dielectrically insulated from the drift zone by a dielectric layer. The drift control zone includes at least one first semiconductor layer and one second semiconductor layer. The first semiconductor layer has a higher charge carrier mobility than the second semiconductor layer. | 08-21-2008 |
