| Hybrid Plastics, Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110318587 | RADIATION SHIELDING WITH POLYHEDRAL OLIGOMERIC SILSESQUIOXANES AND METALLIZED ADDITIVES - Nanoscopic metallized and nonmetallized nanoscopic silicon containing agents including polyhedral oligomeric silsesquioxane and polyhedral oligomeric silicate provide radiation absorption and in situ formation of nanoscopic glass layers on material surfaces. These property improvements are useful in space-survivable materials, microelectronic packaging, and radiation absorptive paints, coatings and molded articles. | 12-29-2011 |
| 20100305282 | METHOD FOR MODIFYING SURFACE PROPERTIES WITH NANOSTRUCTURED CHEMICALS - A method of using metallized and nonmetallized nanostructured chemicals as surface and volume modification agents within polymers and on the surfaces of nano and macroscopic particulates and fillers. Because of their 0.5 nm-3.0 nm size, nanostructured chemicals can be utilized to greatly increase surface area, improve compatibility, and promote lubricity between surfaces at a length scale not previously attainable. | 12-02-2010 |
| 20100137464 | POROSITY CONTROL WITH POLYHEDRAL OLIGOMERIC SILSESQUIOXANES - The use of nanostructured chemicals based on polyhedral oligomeric silsesquioxanes (POSS) and polyhedral oligomeric silicates (POS) are used to control porosity in organic and inorganic media. The precisely defined nanoscopic dimensions of this class of chemicals enables porosity to be both created (increased) or reduced (decreased) as desired. The thermal and chemical stability of the POSS/POS nanostructures and the ability of these nano-building blocks to be selectively placed or rationally assembled with both inorganic and organic material mediums allow tailoring of porosity. | 06-03-2010 |
