| HORIBA STEC, CO., LTD. Patent applications |
| Patent application number | Title | Published |
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| 20120116596 | MASS FLOW CONTROLLER - The present invention comprises a flow rate sensor part and control valve; a calculation part that performs a proportional calculation on a deviation between a flow rate measurement value and setting value to calculate a feedback control value for the flow rate control valve; and an opening level control signal output part that generates an opening level control signal on the basis of the feedback control value to output the opening level control signal to the flow rate control valve. A gain value to be multiplied by the deviation is calculated by using a function that, in a predetermined period after the time point when the flow rate setting value decreases by a predetermined amount or more, calculates a larger value as a calculation value obtained by using a variation between the flow rate setting value before the decrease and a flow rate setting value after the decrease decreases. | 05-10-2012 |
| 20120101744 | FLUID MEASUREMENT SYSTEM - This invention is to improve procedures of maintenance of a fluid measurement system having a fluid measurement device and a control device. The fluid measurement system has a fluid measurement device and a control device to control the fluid measurement device, and the fluid measurement device comprises a fluid sensor and a related data store part configured to store fluid calculation related data for calculation of one or more fluid parameters with measurement data obtained by the fluid sensor, and the control device obtains the fluid calculation related data from the related data store part and calculates the one or more fluid parameters with the measurement data of the fluid sensor and the fluid calculation related data. | 04-26-2012 |
| 20120080104 | DIAGNOSTIC MECHANISM - A diagnostic mechanism includes: a flow rate control part configured to control an opening degree of a flow rate control valve provided in a flow passage so that a measurement flow rate value outputted from a flow rate sensor becomes a target flow rate value; an inspection value output part configured to output an inspection value related to a time integral of the measurement flow rate value in a diagnostic period which is defined in correspondence with a part of a period from a time point of closing the flow passage upstream of the flow rate sensor to a time point of expiration of a state that the measurement flow rate value and the target flow rate value are substantially nearly equal; and a diagnosing part configured to compare the inspection value and a predetermined specified value to diagnose whether an abnormality relating to the flow rate sensor is present. | 04-05-2012 |
| 20120042838 | LIQUID SOURCE VAPORIZER - The present invention is one that is intended to prevent bubbles from being recombined to suppress the bubbles from being enlarged, and also homogenize a temperature distribution of a stored liquid source, and provided with: a liquid source container; a first heater that is provided on a side wall of the liquid source container and intended to heat the stored liquid source to a predetermined temperature; a second heater that is provided in an inside central part of the liquid source container and intended to heat the stored liquid source to the predetermined temperature; a plurality of bubble generators that are immersed into the stored liquid source, provided between the second heater and the side wall, and release carrier gas into the liquid source to perform bubbling; and a gas supply pipe that supplies the carrier gas to the bubble generators. | 02-23-2012 |
| 20120011943 | LIQUID SAMPLE HEATING VAPORIZER - The present invention is intended to improve response property and accuracy of temperature control of a liquid sample, and is provided with a vaporization tank that retains the liquid sample, one or more heaters that are provided in the vaporization tank and respectively have heating parts that come into contact with the liquid sample to heat the liquid sample, a temperature detection part that is provided in contact with an outer surface including the heating part of any of the heaters and detects a temperature of the outer surface, and a control part that receives a temperature detection signal from the temperature detection part to control electric power supplied to the heaters. | 01-19-2012 |
| 20120006425 | FLUID SYSTEM - In order to simplify a configuration of a fluid system without increasing the number of parts of an intermediate support body while using a common intermediate support body, the fluid system includes a fluid circuit device configured by connecting a plurality of fluid units for controlling or measuring a state of fluid using pipes and pipe joints and a holding mechanism for holding the fluid circuit device, wherein the holding mechanism includes a base member and the intermediate support body interposed between the fluid circuit device and the base member so as to couple the fluid circuit device and the base member, and wherein one end of the intermediate support body is attached to a respective pipe joint and the other end thereof is attached to the base member so that each of the pipe joints is connected to the base member. | 01-12-2012 |
| 20110314838 | GAS SUPPLY DEVICE - The present invention relates to a gas supply device having a compact configuration that enables prevention of vaporized gas by requisite minimum heating means from being liquefied again and an installation area to be considerably reduced. The gas supply device is provided with: a tank configured to retain material liquid; and a mass flow controller that is connected to an inside of the tank through a first valve unit, and controls a flow rate of gas resulting from vaporizing the material liquid, in which inside an outer wall of the tank, an internal flow path is formed, and the internal flow path is provided with a generated gas lead-out line provided with: a first valve flow-in flow path connecting the inside of the tank and a first inlet port; and a first valve flow-out flow path connecting a first outlet port and an introduction port of the mass flow controller . | 12-29-2011 |
| 20110291002 | GAS ANALYZER - This invention is to high-pressurize the maximum pressure for use of a gas analyzer, and comprises an ionizing part having an opening part to lead out ions of a sample gas to the outside, an ion drawing electrode arranged outside of the opening part of the ionizing part, a quadrupole part that selectively passes the ions lead out to the outside by the ion drawing electrode, and an ion detecting part that detects the ions passing the quadrupole, and an opening size of the opening part of the ionizing part is set to be smaller than an imaginary inscribing circle inscribed on all of four pole electrodes constituting the quadrupole part. | 12-01-2011 |
| 20110290031 | CAPACITANCE TYPE PRESSURE SENSOR - The present invention is adapted to prevent a diaphragm from being deformed by a thermal stress caused by thermal expansion coefficients of a sensor main unit and a fixing member and includes a sensor main unit to which a fixed electrode is fixed, a diaphragm structure that forms a sealed space between the diaphragm structure and the sensor main unit and a fixing member that is jointed to the diaphragm structure in a manner of surrounding a pressure receiving part of the diaphragm structure so as to lead a fluid to the pressure receiving part, wherein the diaphragm structure includes a flat plane diaphragm main unit and first and second ring members each having a known thermal expansion coefficient that are respectively provided on both sides of a circumference of the diaphragm main unit. | 12-01-2011 |
| 20110155264 | SOURCE GAS CONCENTRATION CONTROL SYSTEM - To prevent loss of control of a pressure of a source gas within a movable range of a control valve, a source gas concentration control system is provided. The system may include a first valve that is provided on an outlet line, a concentration measurement part that measures a concentration of the source gas in mixed gas, and a concentration control part that controls a stroke of the first valve such that the measured concentration of the source gas becomes equal to a predetermined concentration setting. The measured concentration may be measured in the concentration measurement part. The system may further include a temperature controller that controls a temperature inside the tank to meet a temperature setting, and a temperature setting part that sets the temperature setting of the temperature controller. | 06-30-2011 |
| 20110127770 | COUPLING RING - A coupling ring is provided, including a series of unit members with adjacent unit members rotatably coupled to each other, and a fastener coupling unit members on both ends to each other. A concave groove provided to extend circumferentially is externally fitted into an outer circumference of each of two opposing flanges. The unit members on the both ends are coupled to each other by the fastener to be turned into an annular state. The fastener is fastened to thereby press an inclined surface. The flanges are pressure-bonded to each other by forces generated during pressing. A stopper member is provided to restrict a separation angle between the unit member on one end and an adjacent unit member to fall within a certain angle in an open state in which the unit members on the both ends are not coupled to each other provided on at least one of the unit members. | 06-02-2011 |
| 20110126930 | FLUID DEVICE - In a fluid device composed of vertical and horizontal fluid lines, for a purpose of improving a compact size and of assuring ease of assembly, a plurality of vertical fluid lines are arranged in parallel to each other, and in the fluid device where, between the adjoining vertical fluid lines, a plurality of horizontal fluid lines for connecting them are arranged in parallel, one of the horizontal fluid lines connects pipes by using a flange joint to be fastened with a coupling ring, and the other one connects pipes by using joint pipes. | 06-02-2011 |
| 20110115104 | LIQUID MATERIAL VAPORIZATION APPARATUS - An object of this invention is to provide a liquid material vaporization apparatus that is capable of increasing the flow rate of a carrier gas without changing the shape of a nozzle. The liquid material vaporization apparatus comprises a gas-liquid mixing chamber in which a liquid material and the carrier gas are mixed, a liquid material introduction path that introduces the liquid material into the gas-liquid mixing chamber, a carrier gas introduction path that introduces the carrier gas into the gas-liquid mixing chamber, a vaporization nozzle section that is communicated with the gas-liquid mixing chamber to subject a mixture of the liquid material and the carrier gas to flash boiling, and a mixed gas derivation path that is communicated with the vaporization nozzle section to derive the mixed gas vaporized by the vaporization nozzle section. | 05-19-2011 |
| 20110106319 | MASS FLOW CONTROLLER - To improve PI performance of a mass flow controller, the mass flow controller changes a proportional coefficient, an integral coefficient, and a derivative coefficient used for PID operation in a stable state based on at least two out of a primary pressure, a time change amount of the primary pressure, and a flow rate set value. | 05-05-2011 |
| 20110048551 | FLOW RATE CONTROL DEVICE - A mass flow controller comprises a flow rate measuring part that measures a flow rate of a fluid flowing in a flow channel and outputs a measured flow rate value, a control valve, a valve control part that controls an opening degree of the control valve based on an entirely-close command to entirely close the control valve compulsorily or a set flow rate value set as a target value, and an external output part that outputs an external output flow rate value based on the measured flow rate value to the outside, and at a time when the valve control part receives the entirely close command or zero as the set flow rate value, the external output part outputs zero as the external output flow rate value, irrespective of the measured flow rate value. | 03-03-2011 |
| 20100269924 | FLOW RATE RATIO CONTROLLING APPARATUS - An object of this invention is to provide a flow rate ratio controlling apparatus that does not need devices of a plurality of types and that enables reduction of the number of types of components and the manufacturing cost. The flow rate ratio controlling apparatus comprises differential pressure flow rate controllers (MFC | 10-28-2010 |
| 20100243076 | FLOW CONTROL VALVE - A flow control valve is disclosed that includes a valve body member having a seating surface that is seated on a valve seated surface. Multiple inflow orifices and multiple outflow orifices may be formed on the valve seated surface or the seating surface, and may be formed so as not to overlap each other in a state in which the seating surface is seated on the valve seated surface. An inside inflow channel that is in communication with the inflow channel and the inflow orifice may be formed inside a member where the inflow orifices are formed and an inside outflow channel that is in communication with the outflow channel and the outflow orifice is formed inside a member where the outflow orifices are formed. | 09-30-2010 |
| 20100229967 | MASS FLOW CONTROLLER VERIFYING SYSTEM, VERIFYING METHOD AND VERIFYING PROGRAM - In a mass flow controller verifying system, there are provided a verifying gas line arranged in parallel to influent flow gas lines and joined into a post-confluent flow gas line, a reference volume calculating portion adapted to calculate a reference volume determined for a specified piping of a gas piping system, a verifying parameter calculating portion adapted to calculate a verifying parameter based on time series data of a measurement pressure measured by a pressure measurement unit during a control of a flow rate by a mass flow controller to be verified, and a comparing portion adapted to compare a reference parameter set based on the reference volume and the verifying parameter, whereby the verifying system can be introduced into an existing gas piping system used in a semiconductor manufacturing process and so forth at a low cost and is capable of verifying a mass flow controller quickly and accurately. | 09-16-2010 |
| 20100229965 | MASS FLOW METER, MASS FLOW CONTROLLER, MASS FLOW METER SYSTEM AND MASS FLOW CONTROL SYSTEM CONTAINING THE MASS FLOW METER AND THE MASS FLOW CONTROLLER - An object of this invention is to provide a superior mass flow meter or the like that can flexibly cope with a change of a sample fluid such as a gas kind without requiring a special troublesome labor and that can measure a flow rate with high accuracy. The mass flow meter comprises a sensor section that detects a flow rate of a sample fluid flowing in a flow channel, a setting section that sets a flow rate characteristic function that is intrinsic to each fluid to determine a flow rate based on a flow rate detected value output by the sensor section and an instrumental error correction parameter that is independent from the flow rate characteristic function and common to multiple sample fluids to correct an instrumental error of each mass flow meter, and a flow rate calculating section that calculates a flow rate measurement value of the sample fluid by applying the flow rate characteristic function and the instrumental error correction parameter to the flow rate detected value. | 09-16-2010 |
| 20100163119 | MASS FLOW METER AND MASS FLOW CONTROLLER - In order to improve a measurement accuracy of a mass flow meter, the mass flow meter comprises a flow rate calculating section that obtains an output signal from a sensor section having a thermosensitive resistive element arranged in a flow channel where a sample gas flows and that calculates a flow rate of the sample gas, a pressure measuring section that measures a primary side pressure in the flow channel, and a flow rate correcting section that corrects the measured flow rate obtained by the flow rate calculating section by the use of the primary side pressure obtained by the pressure measuring section and a gas coefficient determined by an isobaric specific heat of the sample gas. | 07-01-2010 |
| 20100145633 | FLOW CONTROLLER, FLOW MEASURING DEVICE TESTING METHOD, FLOW CONTROLLER TESTING SYSTEM, AND SEMICONDUCTOR MANUFACTURING APPARATUS - A testing method for testing a flow controller with high accuracy by shortening as much as possible the time required for the test including the wait time. A testing-subject flow controller and a testing-standard flow controller are arranged in that order in series from the upstream side in a flow channel through which a fluid whose flow is to be controlled flows. In a flow-uncontrolled state in which the valve of the testing-subject flow controller is practically in the full-open state, and with the fluid flow controlled to a predetermined flow rate by the testing-standard flow controller, whether the actual flow-rate measurement according to the testing-subject flow controller falls within a predetermined range of actual flow-rate measurements according to the testing-standard flow controller is determined. | 06-10-2010 |
| 20100108154 | MATERIAL GAS CONCENTRATION CONTROL SYSTEM - A material gas concentration control system for keeping a concentration of a material gas in a mixed gas constant comprising a tank to accommodate the material, an inlet line to input a carrier gas for evaporating the accommodated material into the tank, and an outlet line to output the mixed gas consisting of the material gas evaporated in the tank and the carrier gas, and further comprising a first valve arranged in the inlet line, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a concentration control part that controls an open degree of the first valve so as to make the measured concentration of the material gas measured by the concentration measuring part become the previously determined set concentration. | 05-06-2010 |
| 20100108153 | MATERIAL GAS CONCENTRATION CONTROL SYSTEM - An object of this invention is to provide a responsive material gas concentration control system that can be mounted on a bubbling system and that can control a concentration of a material gas in a mixed gas at a constant value even though a partial pressure of the material gas fluctuates. The material gas concentration control system is used for a material evaporation system, and comprises a body that is connected to an outlet line and that has an internal flow channel for flowing the mixed gas, a concentration measuring part that measures the concentration of the material gas in the mixed gas, and a first valve that is arranged downstream of the concentration measuring part and that adjusts the measured concentration measured by the concentration measuring part at a previously determined set concentration, wherein the concentration measuring part and the first valve are mounted on the body. | 05-06-2010 |
| 20100076712 | GAS ANALYZER - A gas analyzer using a quadrupole mass spectrometric method etc. is provided with an ionizer | 03-25-2010 |
| 20100070240 | DIAGNOSTIC MECHANISM IN DIFFERENTIAL PRESSURE TYPE MASS FLOW CONTROLLER - This invention provides a diagnostic mechanism of a differential pressure type mass flow controller comprising a diagnostic parameter calculating section that obtains a mass flow rate integrated value by means of an integrating calculation from the lowering pressure value of an inlet side sensor among the inlet side sensor and an outlet side sensor arranged in communication respectively at the inlet side and the outlet side of a differential pressure generating resistive element that generates a differential pressure between the inlet and the outlet by changing a flow rate control valve arranged on the channel where a fluid flows from a flow rate control state to a closed state, and further obtains a diagnostic volume value from the obtained mass flow rate integrated value, and a comparing section that compares the diagnostic volume value obtained at the diagnostic parameter calculating section with a specified volume value. | 03-18-2010 |
| 20100037688 | FLOWMETER - Provided is a flowmeter which performs stable large flow volume measurement with improved linearity without increasing sizes of the entire apparatus. The flowmeter is provided with a flow tube ( | 02-18-2010 |
| 20100030390 | FLOW RATE RATIO CONTROL DEVICE - A flow rate ratio control device having: a main channel (RM); branch channels (R | 02-04-2010 |
| 20090320754 | INTEGRATED GAS PANEL APPARATUS - Provided is an integrated gas panel apparatus which has excellent responsiveness, stabilizes gas concentration, and furthermore, can keep a conventional panel shape as it is. A panel body ( | 12-31-2009 |
| 20090312876 | MASS FLOW CONTROLLER - This invention provides a mass flow controller that can prevent a flow rate change due to a pressure change without sacrificing the speed of response to a change of a flow rate setting value and can be used in a system that can generate a crosstalk. | 12-17-2009 |
| 20090097831 | LIQUID MATERIAL VAPORIZER - A liquid material vaporizer comprises a gas-liquid mixing section ( | 04-16-2009 |
| 20080295892 | MASS FLOW CONTROLLER - A mass flow controller has: a flow rate sensor section that measures the flow rate of a fluid and outputs a flow rate measurement signal indicating the measurement value; a flow rate control valve disposed upstream or downstream of the flow rate sensor section; a calculation section that calculates a feedback control value to the supplied to the flow rate control valve by performing at least a proportional calculation on the deviation of the flow rate measurement value indicated by the flow rate measurement signal from a flow rate setting value; and an opening control signal output section that generates an opening control signal based on the feedback control value and outputs the opening control signal to the flow rate control valve. The function used for calculating the gain value in the proportional calculation differs between a changing period and a stable period. | 12-04-2008 |
