Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


Heraeus Quarzglas GmbH & Co. KG

Heraeus Quarzglas GmbH & Co. KG Patent applications
Patent application numberTitlePublished
20120114847SiO2 SLURRY FOR THE PRODUCTION OF QUARTZ GLASS AS WELL AS THE APPLICATION OF THE SLURRY05-10-2012
20120056106OPTICAL FILTER MATERIAL MADE OF GALLIUM-DOPED QUARTZ GLASS, FILTER COMPONENT AND METHOD FOR IRRADIATION BY MEANS OF A UV RADIATION SOURCE - The invention relates to an optical filter material made of doped quartz glass, which at a low dopant concentration exhibits spectral transmission as high as possible of at least 80% cm03-08-2012
20120011889DRAWING METHOD FOR PRODUCING CYLINDRICAL-SHAPED COMPONENTS FROM QUARTZ GLASS - In a known drawing method for producing cylinder-shaped components from quartz glass, a quartz glass strand (01-19-2012
20110281227MELTING CRUCIBLE FOR USE IN A CRUCIBLE DRAWING METHOD FOR QUARTZ GLASS - In a known melting crucible for use in a crucible drawing method, it is provided that the interior face of the crucible wall facing a crucible interior space is covered at least partially with a protective layer made of a noble metal. The known melting crucible does have good corrosion resistance with respect to the quartz glass melt, but the material costs are high because of the expensive coating metals. In order to provide a melting crucible for use in a crucible drawing method for quartz glass that exhibits good corrosion resistance at low material costs, it is proposed that the protective layer (11-17-2011
20110244154METHOD AND CYLINDRICAL SEMI-FINISHED PRODUCT FOR PRODUCING AN OPTICAL COMPONENT - In a known method for producing a dimensionally stable semi-finished product for use in producing fibers from synthetic quartz glass, an SiO10-06-2011
20110232847QUARTZ GLASS MEMBER FOR PLASMA ETCHING - Provided is a doped quartz glass member for plasma etching, which is used in a plasma etching process and is free from any problematic fluoride accumulation during use. The quartz glass member for plasma etching is used as a jig for semiconductor production in a plasma etching process, and includes at least two or more kinds of metal elements in a total amount of 0.01 wt % or more to less than 0.1 wt %, in which the metal elements are formed of at least one kind of a first metal element selected from metal elements belonging to Group 3B of the periodic table and at least one kind of a second metal element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, lanthanoids, and actinoids.09-29-2011
20110183138METHOD FOR PRODUCING QUARTZ GLASS DOPED WITH NITROGEN AND QUARTZ GLASS GRAINS SUITABLE FOR CARRYING OUT THE METHOD - In a known method for producing quartz glass that is doped with nitrogen, an SiO07-28-2011
20110177333METHOD FOR PRODUCING A TUBULAR SEMIFINISHED PRODUCT FROM QUARTZ GLASS, METHOD FOR PRODUCING AN OPTICAL COMPONENT USING THE SEMIFINISHED PRODUCT, AND SEMIFINISHED PRODUCT CONSISTING OF QUARTZ GLASS DOPED WITH FLUORINE - The aim of the invention is to improve a generally known method for producing quartz glass doped with fluorine, wherein SiO07-21-2011
20110123738METHOD OF MAKING A SILICA CRUCIBLE IN A CONTROLLED ATMOSPHERE - A silica crucible is made in a mold cavity of the type in which ambient atmosphere can be drawn through silica grain in the cavity. In one embodiment, a silica grain layer is formed in the mold cavity and gas, which may comprise helium, nitrogen, hydrogen, or a mixture thereof, is introduced into the mold cavity. The silica grain layer is heated while substantially no ambient atmosphere is drawn through the silica grain. Thereafter, at least a portion of the silica grain layer is fused while drawing ambient atmosphere through the silica grain. The gas displaces air in the mold cavity thereby reducing nitrogen oxides and ozone.05-26-2011
20110120190METHOD FOR PRODUCING QUARTZ GLASS USING A MIXED POWDER - A mixed quartz powder contains quartz powder and two or more types of doping element in an amount of from 0.1 to 20 mass %. The aforementioned doped elements include a first dope element selected from the group consisting of N, C and F, and a second dope element selected from the group consisting of Mg, Ca, Sr, Ba, Sc, Y, Ti, Zr, Hf, the lanthanides and the actinides. The “quartz powder” is a powder of crystalline quartz or it is a powder of glassy SiO05-26-2011
20110120189Method for producing a component with a layer of transparent quartz glass - In a known method for producing a component with a layer of transparent quartz glass, comprising: applying particles of synthetically produced quartz glass to a base body made of quartz glass and sintering the particles so as to form the quartz glass layer. Starting therefrom, in order to permit a comparatively inexpensive and reproducible production of a component with at least one layer of transparent quartz glass that is distinguished by ultrahigh purity and the absence of bubbles, it is suggested according to the invention that at least part of the SiO05-26-2011
20110113829METHOD AND APPARATUS FOR PRODUCING A QUARTZ GLASS CYLINDER - In a known method for drawing a tubular quartz glass strand, SiO05-19-2011
20110072852METHOD FOR THE PRODUCTION OF A CYLINDER MADE FROM QUARTZ GLASS USING A RETAINING DEVICE, AND RETAINING DEVICE - The invention relates to a known method for the production of a cylinder from quartz glass, comprising a step, wherein an SiO03-31-2011
20100316796METHOD FOR PRODUCING RAISED MARKING ON A GLASS OBJECT - In a known method for producing a raised marking on a glass object, a suspension containing SiO12-16-2010
20100307197Method for producing a cylinder from synthetic quartz glass - A known method for producing synthetic quartz glass comprises the method steps: (a) forming a cylindrical SiO12-09-2010
20100260949SYNTHETIC SILICA GLASS TUBE FOR THE PRODUCTION OF A PREFORM - Known synthetic quartz glass tubes for the production of a preform have an inner bore with a surface layer produced without using tools in the molten state and an inner zone. The aim of the invention is to provide a tube which does not release any OH groups to the surroundings. For this purpose, the surface layer (10-14-2010
20100251771METHOD FOR PRODUCING DOPED QUARTZ GLASS - The invention relates to a method allowing cost-effective production of doped quartz glass, particularly laser-active quartz glass, that is improved with regard to the homogeneity of the doping material distribution, in that a suspension is provided comprising SiO10-07-2010
20100186453METHOD FOR THE PRODUCTION OF A BLANK MOLD FOR OPTICAL FIBERS - In a known method for the production of a blank mold for optical fibers, a fluorine-doped SiO07-29-2010
20100147027METHOD FOR MAKING A BLANK FROM MATERIAL, PARTICULARLY FOR AN OPTICAL COMPONENT FOR USE IN MICROLITHOGRAPHY - The invention is concerned with a material which shows low absorption for UV radiation having a wavelength below 250 nm, low birefringence, high chemical resistance and high radiation resistance and which is therefore particularly usable for making optical components for microlithography. According to the invention the material consists of synthetically produced quartz crystallites which form a polycrystalline structure and have a mean grain size in the range between 500 nm and 30 μm. The method according to the invention for making a blank from the material comprises providing granules consisting of synthetically produced quartz crystals having a mean grain size in the range between 500 nm and 30 μm, and sintering the granules to obtain a blank of polycrystalline quartz.06-17-2010
20100132609QUARTZ GLASS CRUCIBLE FOR SILICON SINGLE CRYSTAL PULLING OPERATION AND PROCESS FOR MANUFACTURING THE SAME - A quartz glass crucible for silicon single crystal pulling operation that by a simple arrangement, attains prevention of any collapse onto the inside at a superior edge of straight trunk part; and a process for manufacturing the same. The quartz glass crucible for silicon single crystal pulling operation having a straight trunk part and a bottom part, is characterized in that at least the straight trunk part is provided with a gradient of fictive temperature so that the fictive temperature on the outermost side thereof is 25° C. or more lower than the fictive temperature on the innermost side thereof.06-03-2010
20100132407METHOD FOR PRODUCING A TUBE OF QUARTZ GLASS BY ELONGATING A HOLLOW CYLINDER OF QUARTZ GLASS - In a known method for producing a tube of quartz glass by elongation, a hollow cylinder of quartz glass is continuously supplied to a heating zone, softened therein zone by zone, and a tube strand is drawn in the direction of a drawing axis out of the softened region by using a roll puller, the roll puller comprising a frame by which a plurality of puller rolls are fixed, which are rotatable around a rotation axis and which are distributed over the circumference of the tube strand and adjoining the tube strand with their cylindrical outer surface. Starting therefrom, to indicate a vertical drawing method in which a high draw ratio can also be accomplished with little constructional effort by using a take-off unit in the form of a roll puller and which simultaneously allows an optimization of the dimensional stability of the quartz glass tubes obtained, and which particularly avoids material losses caused by ovality and siding, the invention suggests that the frame of the roll puller s stationary, and the hollow cylinder and the tube strand are rotated about the drawing axis relative to one another, the relative rotation being set to a range between 0.01 and 5 revolutions per linear meter of drawn-off tube strand.06-03-2010
20100126217METHOD FOR PRODUCING A CYLINDER OF QUARTZ GLASS USING A HOLDING DEVICE AND APPROPRIATE HOLDING DEVICE FOR PERFORMING THE METHOD - A known method for producing a cylinder of quartz glass comprises a method step in which a porous SiO05-27-2010
20090320521Method of producing a quartz glass crucible - A method of producing a quartz glass crucible for pulling a single crystal comprising: providing a melting mold comprising a wall having passages between outside and inside; providing an outer layer granulation consisting of first coarser SiO12-31-2009
20090266110SiO slurry for the production of quartz glass as well as the application of the slurry - A known SiO10-29-2009
20090260400Method for Producing a Tubular Semifinished Product From Fluorine-Doped Quartz Glass - To improve a generally known method for producing a tubular semifinished product from fluorine-doped quartz glass such that it is possible to produce a tubular semifinished product of fluorine-doped quartz glass with an inner bore of high quality while the efforts for making or treating the same are as small as possible, the present invention suggests a method comprising the following steps: (a) providing a substrate tube consisting of fluorine-doped quartz glass; (b) forming, in a deposition process, SiO10-22-2009
20090239732Optical component quartz glass - Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1009-24-2009
20090163344Component of Quartz Glass for Use in Semiconductor Manufacture and Method for Producing the Same - The invention starts from a known component of quartz glass for use in semiconductor manufacture, which component at least in a near-surface region shows a co-doping of a first dopant and of a second oxidic dopant, said second dopant containing one or more rare-earth metals in a concentration of 0.1-3% by wt. each (based on the total mass of SiO06-25-2009
20090151848Method for bonding components made of high silica material - The present invention relates to a method for bonding components made of high silica material by way of integral joining by forming a high-silica bonding mass between connecting surfaces of the components. A method is provided which permits an inexpensive production of a mechanically and thermally stable composite of components made of a high silica material, particularly for large-area bonded connections for which a contact pressure of more than 5 N/cm06-18-2009
20090139265Method and device for manufacturing silica glass06-04-2009
20090103105Method for interferometrically measuring an optical property of a test piece and a device suited for carrying out this method - The invention relates to a method for interferometrically measuring large optics. A combination of a method known as stitching technique, during which the sub-interferograms are determined on partial surfaces of measuring area and are joined in a software-controlled manner and which, as a result, enables the use of small, more cost-effective interferometers, however polished surfaces of the test piece being assumed, together with an immersion method, during which, in fact, lower demands for the surface quality of the test piece exist that, however, is accompanied by edge faults. In order to make this combination possible, a modification of the stitching technique is developed, during which the measuring area (CA) is completely covered by a film consisting of an immersion liquid. A device a suited for carrying out this method is characterized by contact bodies, which are made of transparent material, rest upon the main surfaces of the test piece, and which completely cover the measuring area (CA), a film consisting of an immersion liquid being formed between the contact bodies and the main surfaces of the test piece.04-23-2009
20090100871METHOD FOR MANUFACTURING A SILICA GLASS BLOCK - A method for manufacturing a silica glass block is provided in which, by markedly reducing the bubbles within the silica glass block, the quality of a silica glass block can be improved, contamination of the silica glass block can be prevented, and the yield of the silica glass block can be improved. The method comprises preparing a natural or synthetic silica raw material powder, packing the silica raw material powder into a glass fusing furnace, preheat treating the silica raw material powder packed into the fusing furnace, heating and fusing the heat preheat-treated silica raw material powder, and cooling a silica glass melt fused in the fusing furnace. The silica raw material powder packed into the fusing furnace is closely packed in the packing step, and an evacuation and a rare gas or H04-23-2009
20090098370BLACK SYNTHETIC QUARTZ GLASS WITH A TRANSPARENT LAYER - To provide a black synthetic quartz glass with a transparent layer, which has high emissivity in the far infrared region, has excellent light-shielding properties, maintains the same degree of purity as synthetic quartz glass in terms of metal impurities, has high-temperature viscosity characteristics comparable to natural quartz glass, can undergo high-temperature processing like welding, and does not release carbon from its surface; together with a method for the production thereof.04-16-2009
20090064715Method and device for drawing a tubular strand of quartz glass - In a known method for drawing a tubular quartz glass strand, a crucible is fed with SiO03-12-2009
20090019893Method for Producing a Tube of Quartz Glass by Elongating a Hollow Cylinder of Quartz Glass - In a known method for producing a tube of quartz glass by elongating a hollow cylinder of quartz glass 01-22-2009
20090004088Method for producing an optical component of synthetic quartz glass with enhanced radiation resistance, and blank for producing the component - To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: 01-01-2009
20080274869Quartz Glass Blank and Method for Producing Said Blank - The present invention relates to a quartz glass blank for an optical component for transmitting radiation of a wavelength of 15 nm and shorter, the blank consisting of highly pure quartz glass, doped with titanium and/or fluorine, which is distinguished by an extremely high homogeneity. The homogeneity relates to the following features: 11-06-2008
20080216513Method for the Regeneration of a Worn Quartz Glass Jig - To provide a technique with which a quartz glass jig and a doped quartz glass jig are regenerated by completely removing the impurities which are attached to the surface and the impurities which have diffused into the interior from quartz glass jigs which have been used in semiconductor production processes and then carrying out working repair and removing the contamination from the working processes as well. After use, the impurities are removed from the aforementioned quartz glass jigs in the said purification treatment process which includes a purification treatment process in which the quartz glass jigs are subjected to a purification treatment in a gaseous atmosphere which includes a halogen element at a temperature within the region above a prescribed temperature.09-11-2008

Patent applications by Heraeus Quarzglas GmbH & Co. KG