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HANA SILICON, INC

HANA SILICON, INC Patent applications
Patent application numberTitlePublished
20100006081METHOD FOR MANUFACTURING SILICON MATTER FOR PLASMA PROCESSING APPARATUS - The present invention relates to a method for manufacturing silicon articles for a plasma processing apparatus. The present invention provides a method for manufacturing silicon articles, comprising: preparing a silicon ingot; forming a hollow silicon cylinder and a silicon core cylinder having a diameter less than that of the silicon ingot by coring the silicon ingot; forming a silicon annular plate having a central opening by cutting the hollow silicon cylinder and forming a silicon electrode plate by cutting the silicon core cylinder; and forming a silicon ring by processing the silicon annular plate and forming a silicon electrode by processing the silicon electrode plate. According to the present invention, a hollow silicon cylinder and a silicon core cylinder are manufactured by coring a cylindrical silicon ingot before the silicon ingot is sliced. They are used to manufacture silicon articles, such as a silicon ring and a silicon electrode, so that the production cost for the silicon articles can be reduced.01-14-2010