GLOBAL STANDARD TECHNOLOGY CO., LTD. Patent applications |
Patent application number | Title | Published |
20140106282 | LOW-POLLUTION BURNING METHOD USING SYSTEM FOR INDIVIDUALLY CONTROLLING CO AND NOx - The disclosure relates to a waste gas purification method, and more particularly, to a waste gas burning method of reducing CO and NOx by burning waste gases using a system for individually controlling CO and NOx. In accordance with the disclosure, there is provided a low-pollution burning method using a system for individually controlling CO and NOx including a waste gas introduction and flame injection step; a first waste gas burning step; and a second waste gas burning step. | 04-17-2014 |
20130280154 | APPARATUS AND METHOD FOR TREATING PERFLUORO-COMPOUND - The present invention discloses an apparatus and method for treating perfluoro-compounds (PFCs). The method for treating PFCs includes: (a) decomposing PFCs and eliminating a first acid gas generated by the decomposition through a pre-cleaner; (b) filtering out dust particles from the exhaust gas through a filter; (c) electrifying the dust particles in the exhaust gas by electrical discharge and collecting dusts through a dust collector; (d) decomposing PFCs using a regenerative/catalytic reaction through a catalytic reactor; (e) eliminating a second acid gas generated by the regenerative/catalytic reaction through a post-cleaner; and (f) letting the purified exhaust gas out through a fan. | 10-24-2013 |
20130239857 | SWIRL FLOW TYPE PRE-MIXED LOW-POLLUTION COMBUSTION APPARATUS - The disclosure relates to a waste gas purification apparatus, and more particularly, to a waste gas combustion apparatus to burn and process waste gases. The disclosure provides the waste gas combustion apparatus to process the waste gases generated in an industrial process, such as a chemical process, a semiconductor manufacturing process, or an LCD manufacturing process. The waste gas combustion apparatus includes a combustion gas supply unit provided with a first combustion region in which the waste gases are primarily burned by supply of fuel gases which are pre-mixed with diluted fuel gases, and a second combustion region which is supplied with support gases so as to completely burn fuel gases which are not reacted in the first combustion region. | 09-19-2013 |
20100206519 | TEMPERATURE CONTROL SYSTEM FOR SEMICONDUCTOR MANUFACTURING EQUIPMENT - A temperature control system for semiconductor manufacturing equipment is disclosed, which can properly cool a process chamber adopted in the semiconductor manufacturing equipment such as a wafer etching device. The temperature control system for semiconductor manufacturing equipment includes a thermocline for cooling heat transfer fluid accommodated therein through a heat exchange with a heat exchanger and storing heat energy, a supply line for controlling the temperature of the heat transfer fluid in the thermocline through a heater and supplying the heat transfer fluid with a proper temperature to a process device, a recovery line for forwarding the heat transfer fluid having passed through the process device to the thermocline, and a bypass for forwarding a part of the heat transfer fluid passing through the recovery line to the supply line through the heater. | 08-19-2010 |