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General Chemical Performance Products LLC
| General Chemical Performance Products LLC Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20080234162 | SEMICONDUCTOR ETCH RESIDUE REMOVER AND CLEANSING COMPOSITIONS - An aqueous and semi-aqueous formulation useful for removing post etch and ash residue from Cu low K dielectric semiconductor devices. The composition comprises a polycarboxylic acid buffering system, a fluoride system, water, a water miscible organic solvent for the said aqueous compositions and optionally a chelating agent, a metal corrosion inhibitor and a surfactant. | 09-25-2008 |