| GASPLAS AS Patent applications |
| Patent application number | Title | Published |
|---|
| 20120034137 | PLASMA REACTOR - A reaction vessel has a reaction chamber; and one or more plasma sources coupled to the reaction chamber. Each plasma source has a plasma generator in fluid communication with a reaction region within the reaction chamber whereby the plasma generator at least partly ionises material to form a plasma prior to entry of the at least partly ionised material into the reaction region. The reaction vessel further includes a flow inducer for establishing a fluid flow within the reaction chamber. The flow inducer has the coupling of the one or more plasma sources to the reaction chamber. The coupling induces the flow of the at least partly ionised material from the plasma generator to establish a fluid flow within the reaction chamber. The flow of the at least partly ionised material from the plasma generator is a vortex. | 02-09-2012 |
| 20120034135 | PLASMA REACTOR - A reaction vessel has a reaction chamber, and two or more plasma nozzles coupled to the reactor chamber. Each plasma nozzle has a microwave plasma generator powered by a magnetron, and a feed tube for directing a flow of material via the plasma generator to a respective inlet to the reaction chamber whereby the plasma generator at least partly ionises the material to form a plasma prior to entry of the at least partly ionised material into the reaction chamber. The plasma-generating region of each nozzle is separated from the reactor chamber at a distance between 0.005 to 1 m. | 02-09-2012 |
