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FUJITSU LIMTIED
| FUJITSU LIMTIED Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20080220223 | RESIST COVER FILM FORMING MATERIAL, RESIST PATTERN FORMING METHOD, AND ELECTRONIC DEVICE AND METHOD FOR MANUFACTURING THE SAME - To provide a material including: a silicon-containing polymer having at least an alkali-soluble group and is represented by the following general formula (1); and an organic solvent capable of dissolving the silicon-containing polymer. | 09-11-2008 |