Inventors list

Assignees list

Classification tree browser

Top 100 Inventors

Top 100 Assignees


FUJIMI CORPORATION

FUJIMI CORPORATION Patent applications
Patent application numberTitlePublished
20100096584Polishing Composition and Polishing Method Using the Same - A polishing composition used for chemical mechanical planarization of a substrate containing a noble metal layer is provided. The polishing composition contains positively-charged abrasive particles such as alpha-Al04-22-2010