FUJIFILM PLANAR SOLUTIONS, LLC Patent applications |
Patent application number | Title | Published |
20140238441 | CLEANING METHOD AND SYSTEM - A system for removing particles or deposits from a surface having particles or deposits thereon, the system comprising at least one vessel, at least one enclosure containing a surface having particles or deposits thereon, one or more pumps, and one or more valves; the at least one vessel suitable for holding a chemical composition; wherein the at least one vessel is in fluid communication with the at least one enclosure, and the at least one enclosure is in fluid communication with the at least one vessel, to form at least a primary chemical composition circulation loop. | 08-28-2014 |
20140121382 | HYDRATE FORMS OF 1,2,4-TRIAZOLE, PROCESSES FOR MANUFACTURE THEREOF, AND COMPOSITIONS THEREOF - The present invention provides new hydrate forms of triazole, triazole alkaline salt, and alkali doped 1,2,4-triazole. The present invention also discloses processes for manufacturing new hydrate forms of triazole, triazole alkaline salt, and alkali-doped 1,2,4-triazole. The present invention also relates to compositions for different applications of new hydrate forms of triazole, triazole alkaline salt, and alkali doped 1,2,4-triazole. In addition, the present invention provides co-crystal form of triazole with acid, and methods of preparing thereof. | 05-01-2014 |
20130288478 | HIGHLY DILUTABLE POLISHING CONCENTRATES AND SLURRIES - The present disclosure provides a concentrate for use in chemical mechanical polishing slurries, and a method of diluting that concentrate to a point of use slurry. The concentrate comprises abrasive, complexing agent, and corrosion inhibitor, and the concentrate is diluted with water and oxidizer. These components are present in amounts such that the concentrate can be diluted at very high dilution ratios, without affecting the polishing performance. | 10-31-2013 |