| Fujifilm Electronic Materials U.S.A., Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110259242 | Additives to Prevent Degradation of Cyclic Alkene Derivatives - This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): | 10-27-2011 |
| 20110091651 | Additives to Prevent Degradation of Cyclic Alkene Derivatives - This disclosure relates to compositions that include (a) at least one substituted or unsubstituted cyclic alkene, and (b) an antioxidant composition including at least one compound of Formula (I): | 04-21-2011 |
| 20090291210 | Additives to Prevent Degradation of Cyclic Alkene Derivatives - This disclosure relates to compositions that includes (a) one or more substituted or unsubstituted cyclic alkenes, and (b) an antioxidant composition including at least one compound of Formula (I): | 11-26-2009 |
| 20090197067 | Novel Positive Photosensitive Resin Compositions - The present disclosure relates to compositions that include at least one polybenzoxazole precursor polymer, at least one photoacid generator, and at least one basic compound. Articles, films, and methods related to these compositions are also disclosed. | 08-06-2009 |
| 20090004444 | Novel Photosensitive Resin Compositions - A positive-working photosensitive composition containing one or more polybenzoxazole precursor polymers, a diazonaphthoquinone photoactive compound which is the condensation product of a compound containing from 2 to about 9 aromatic hydroxyl groups with a 5-naphthoquinone diazide sulfonyl compound and a 4-naphthoquinone diazide sulfonyl compound, and at least one solvent, and the use of such compositions to form a relief pattern on a substrate. | 01-01-2009 |
