| Freescale Semiconductor Patent applications |
| Patent application number | Title | Published |
|---|
| 20110040912 | APPARATUS AND METHOD FOR MULTIPLE ENDIAN MODE BUS MATCHING - Apparatus and method for bus matching. The method includes: receiving data transfer characteristics at a first endian mode and at a second endian mode; determining a connectivity of multiple devices to an interfacing bus in response to the data transfer characteristics and in response to a relationship between a width of the interfacing bus and a width of each device interface; wherein at least one device interface is connected in parallel to multiple interfacing bus portions; and configuring a control logic such as to provide control signals representative of a transfer of data over the interfacing bus; whereas the control logic is configured in response to the connectivity. The apparatus includes: an interfacing bus characterized by an interfacing bus width; a master device, connected to the interfacing bus, whereas the master device includes a master device interface; multiple slave devices, each slave device connected to the interfacing bus and includes a slave device interface; wherein at least one slave device interface is connected in parallel to multiple interfacing bus portions; and control logic, connected to the interfacing bus and to the master device, the control logic is adapted to provide control signals representative of a transfer of data over the interfacing bus; whereas the control logic is configured in response to a connectivity of the multiple slave devices to the interfacing bus; whereas said connectivity is responsive to data transfer characteristics and is responsive to relationships between a width of the interfacing bus and a width of each device interface. | 02-17-2011 |
| 20110017926 | SEMICONDUCTOR INTRA-FIELD DOSE CORRECTION - A system and method are provided for automatic dose-correction recipe generation, the system including a dose-correction recipe generator, a reticle data unit in signal communication with the recipe generator, a slit data unit in signal communication with the recipe generator, a process data unit in signal communication with the recipe generator, a wafer data unit in signal communication with the recipe generator, a control unit in signal communication with the recipe generator, and an output unit or a storage unit in signal communication with the control unit; and the method including receiving a current reticle data set and a previous reticle data set, receiving a current slit data set and a previous slit data set, receiving a process condition, receiving a wafer condition, automatically generating a dose-correction recipe in accordance with the received reticle, slit, process and wafer information, and controlling a dose in accordance with the generated recipe. | 01-27-2011 |
| 20100225346 | DEVICE AND METHOD FOR EVALUATING ELECTROSTATIC DISCHARGE PROTECTION CAPABILITIES - A device and a method for evaluating ESD protection capabilities of an integrated circuit, the method includes: connecting multiple test probe to multiple integrated circuit testing points. The method is characterized by repeating the stages of: (i) charging a discharge capacitor to an ESD protection circuit triggering voltage level; (ii) connecting the discharge capacitor to the integrated circuit during a testing period such as to cause the discharge capacitor to interact with the integrated circuit; (iii) measuring at least one signal of the integrated circuit, during at least a portion of the testing period; and (iv) determining at least one ESD protection characteristic of the integrated circuit in response to the at least one signal. | 09-09-2010 |
| 20100197106 | SEMICONDUCTOR EMBEDDED RESISTOR GENERATION - A method for generating an embedded resistor in a semiconductor device and related computer-readable storage medium are provided, the method and program steps of the medium including forming a shallow trench isolation (STI) region in a substrate; forming a pad oxide on the STI region and substrate; depositing a silicon layer on the pad oxide; forming a photo-resist mask on a portion of the silicon layer disposed substantially above the STI region.; etching the silicon layer to yield a polyconductor (PC) disposed substantially above the STI region; oxidizing the PC; depositing at least one of an oxide material or a metal gate material on the oxidized surface; depositing a silicon layer on the at least one oxide material or metal gate material; depositing additional silicon on a portion of the silicon layer disposed substantially above the STI region; patterning a transistor gate with a photo-resist mask disposed on another portion of the silicon layer disposed substantially away from the STI region; and etching the silicon layer to yield at least one transistor structure disposed substantially away from the STI region and at least one resistor structure disposed substantially above the STI region. | 08-05-2010 |
| 20100013687 | METHOD AND APPARATUS FOR CONVERTING SIGNALS - A method of converting a plurality of input signals on first and second converters, such that the first and second converters are both used when the plurality of signals comprises two signals, characterised in that said method comprises:
| 01-21-2010 |
