FLX MICRO, INC.
|FLX MICRO, INC. Patent applications|
|Patent application number||Title||Published|
|20110001143||Composition Comprising Silicon Carbide - A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.||01-06-2011|