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FLX MICRO, INC.

FLX MICRO, INC. Patent applications
Patent application numberTitlePublished
20110001143Composition Comprising Silicon Carbide - A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties.01-06-2011