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FLX MICRO, INC.
| FLX MICRO, INC. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110001143 | Composition Comprising Silicon Carbide - A method of depositing a ceramic film, particularly a silicon carbide film, on a substrate is disclosed in which the residual stress, residual stress gradient, and resistivity are controlled. Also disclosed are substrates having a deposited film with these controlled properties and devices, particularly MEMS and NEMS devices, having substrates with films having these properties. | 01-06-2011 |
