| FEI Company Patent applications |
| Patent application number | Title | Published |
|---|
| 20120128028 | Method of Measuring the Temperature of a Sample Carrier in a Charged Particle-Optical Apparatus - A method of determining the temperature of a sample carrier in a charged particle-optical apparatus, characterized in that the method comprises the observation of the sample carrier with a beam of charged particles, the observation giving information about the temperature of the sample carrier. The invention is based on the insight that a charged particle optical apparatus, such as a TEM, STEM, SEM or FIB, can be used to observe temperature related changes of a sample carrier. The changes may be mechanical changes (e.g. of a bimetal), crystallographic changes (e.g. of a perovskite), and luminescent changes (in intensity or decay time). In a preferred embodiment the sample carrier shows two bimetals, showing metals with different thermal expansion coefficients, bending in opposite directions. The distance between the two bimetals is used as a thermometer. | 05-24-2012 |
| 20120112090 | Charged Particle Source with Integrated Electrostatic Energy Filter - A charged particle filter with an integrated energy filter, in which the charged particle emitter, the focusing electrodes, and the deflection electrodes are arranged round a straight axis. Where most energy filters used have a highly curved optical axis, and thus use parts with forms that are difficult to manufacture, the source according the invention uses electrodes surrounding a straight optical axis. A beam of charged particles can be deflected quite far from the axis showing respectable energy dispersion at an energy selecting slit without introducing coma or astigmatism that cannot be corrected, provided that some of the are formed as 120°/60°/120°/60°. Such electrodes can be attached to each other by gluing or brazing of ceramic, and then series of a highly concentric bores can be formed by, e.g., spark erosion. | 05-10-2012 |
| 20120112062 | Environmental Cell for Charged Particle Beam System - An environmental cell for a charged particle beam system allows relative motion between the cell mounted on an X-Y stage and the optical axis of the focusing column, thereby eliminating the need for a sub-stage within the cell. A flexible cell configuration, such as a retractable lid, permits a variety of processes, including beam-induced and thermally-induced processes. Photon yield spectroscopy performed in a charged particle beam system and using gas cascade amplification of the photoelectrons allows analysis of material in the cell and monitoring of processing in the cell. Luminescence analysis can be also performed using a retractable minor. | 05-10-2012 |
| 20120107521 | Protective Layer For Charged Particle Beam Processing - A protective layer is applied to a work piece to protect the surface during charged particle beam processing by directing a fluid toward the surface. The surface is preferably not touched by the applicator. Ink jet print-type print heads are suitable applicators. Ink jet-type print heads allow a wide variety of fluids to be used to form the protective layer. Useful fluids that form protective layers include colloidal silica having small silver particles and hydrocarbon-based inks. | 05-03-2012 |
| 20120103945 | Method And Apparatus For Laser Machining - Laser processing is enhanced by using endpointing or by using a charged particle beam together with a laser. End-pointing uses emissions, such as photons, electrons, ions, or neutral particles, from the substrate to determine when the material under the laser has changed or is about to change. Material removed from the sample can be deflected to avoid deposition onto the laser optics. | 05-03-2012 |
| 20120091360 | CHARGED PARTICLE BEAM SYSTEM HAVING MULTIPLE USER-SELECTABLE OPERATING MODES - A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled. | 04-19-2012 |
| 20120091338 | Environmental cell for a particle-optical apparatus - The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture ( | 04-19-2012 |
| 20120080407 | Multi-Source Plasma Focused Ion Beam System - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 04-05-2012 |
| 20120080148 | Compact RF Antenna for an Inductively Coupled Plasma Ion Source - An inductively coupled plasma ion source for a focused ion beam (FIB) system is disclosed, comprising an insulating plasma chamber with a feed gas delivery system, a compact radio frequency (RF) antenna coil positioned concentric to the plasma chamber and in proximity to, or in contact with, the outer diameter of the plasma chamber. In some embodiments, the plasma chamber is surrounded by a Faraday shield to prevent capacitive coupling between the RF voltage on the antenna and the plasma within the plasma chamber. High dielectric strength insulating tubing is heat shrunk onto the outer diameter of the conductive tubing or wire used to form the antenna to allow close packing of turns within the antenna coil. The insulating tubing is capable of standing off the RF voltage differences between different portions of the antenna, and between the antenna and the Faraday shield. | 04-05-2012 |
| 20120074333 | X-ray Detector for Electron Microscope - Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt. | 03-29-2012 |
| 20120056088 | Navigation and Sample Processing Using an Ion Source Containing both Low-Mass and High-Mass Species - An improved method and apparatus for imaging and milling a substrate using a FIB system. Preferred embodiments of the present invention use a mixture of light and heavy ions, focused to the same focal point by the same beam optics, to simultaneously mill the sample surface (primarily with the heavy ions) while the light ions penetrate deeper into the sample to allow the generation of images of subsurface features. Among other uses, preferred embodiments of the present invention provide improved methods of navigation and sample processing that can be used for various circuit edit applications, such as backside circuit edit. | 03-08-2012 |
| 20120045097 | HIGH ACCURACY BEAM PLACEMENT FOR LOCAL AREA NAVIGATION - An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. This invention demonstrates a method where high accuracy navigation to the site of interest within a relatively large local area (e.g. an area 200 μm×200 μm) is possible even where the stage/navigation system is not normally capable of such high accuracy navigation. The combination of large area, high-resolution scanning, digital zoom and registration of the image to an idealized coordinate system enables navigation around a local area without relying on stage movements. Once the image is acquired any sample or beam drift will not affect the alignment. Preferred embodiments thus allow accurate navigation to a site on a sample with sub-100 nm accuracy, even without a high-accuracy stage/navigation system. | 02-23-2012 |
| 20120037802 | Distributed Potential Charged Particle Detector - A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field. | 02-16-2012 |
| 20120032092 | Plasma Igniter for an Inductively Coupled Plasma Ion Source - A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection. | 02-09-2012 |
| 20120032078 | Backscatter Reduction in Thin Electron Detectors - In a direct electron detector, backscattering of electrons into the detector volume from below the sensor is prevented. In some embodiments, an empty space is maintained below the sensor. In other embodiments, a structure below the sensor includes geometry, such as multiple high aspects ratio channels, either extending to or from the sensor to trap electrons, or a structure of angled surfaces to deflect the electrons that pass through the sensor. | 02-09-2012 |
| 20120012747 | Contrast for Scanning Confocal Electron Microscope - A scanning confocal transmission electron microscope includes a descan deflector and a corrector below the sample. The microscope uses a detector that is preferably significantly larger than the resolution of the microscope and is positioned in the real image plane, which provides improved contrast, particularly for light elements. | 01-19-2012 |
| 20120006987 | Charged Particle Beam Processing System with Visual and Infrared Imaging - A charged particle beam system for processing substrates is disclosed, comprising a charged particle column, combination infrared radiation and visible light illumination and imaging subsystems, in-vacuum optics, and a precision stage for supporting and positioning the substrate alternately under the charged particle column and the imaging system. The axes of the charged particle column and imaging system are offset to enable much closer working distances for both imaging and beam processing than would be possible in a single integrated assembly. A method for extremely accurately calibrating the offset between the column and imaging system is disclosed, enabling beam processing at precisely-determined locations on the substrate. The imaging system is capable of locating sub-surface features on the substrate which cannot be seen using the charged particle beam. Two illumination modes are disclosed, enabling both bright-field and dark-field imaging in infrared radiation and visible light. | 01-12-2012 |
| 20120003394 | Beam-Induced Deposition at Cryogenic Temperatures - A method of depositing material onto a substrate at cryogenic temperatures using beam-induced deposition. A precursor gas is chosen from a group of compounds having a melting point that is lower than the cryogenic temperature of the substrate. Preferably the precursor gas is chosen from a group of compounds having a sticking coefficient that is between 0.5 and 0.8 at the desired cryogenic temperature. This will result in the precursor gas reaching equilibrium between precursor molecules adsorbed onto the substrate surface and precursor gas molecules desorbing from the substrate surface at the desired cryogenic temperature. Suitable precursor gases can comprise alkanes, alkenes, or alkynes. At a cryogenic temperature of between −50° C. and −85° C., hexane can be used as a precursor gas to deposit material; at a cryogenic temperature of between −50° C. and −180° C., propane can be used as a precursor gas. | 01-05-2012 |
| 20120001068 | Method of Electron Diffraction Tomography - The invention relates to a method for electron diffraction tomography in a Transmission Electron Microscope. Known methods involve using Scanning Transmission Electron Microscope, and use the scanned beam for STEM diffraction. The invention proposes to form the diffraction patterns with a stationary beam with a diameter slightly larger than the crystal, as a result of which a TEM without STEM unit can be used. Finding the crystal is done in TEM mode. Advantages of the method according to the invention are: a TEM without scanning unit can be used, and the diffraction volume is not depending on the orientation of the crystal, as the whole crystal is illuminated while obtaining the diffraction pattern. | 01-05-2012 |
| 20110315876 | Blocking Member for Use in the Diffraction Plane of a TEM - The invention relates to a blocking member to be placed in the diffraction plane of a TEM. It resembles the knife edge used for single sideband imaging, but blocks only electrons deflected over a small angle. As a result the Contrast Transfer Function of the TEM according to this invention will equal that of a single sideband microscope at low frequencies and that of a normal microscope for high frequencies. Preferable the highest frequency blocked by the blocking member is such that a microscope without the blocking member would show a CTF of 0.5. | 12-29-2011 |
| 20110309263 | Dual Beam System - A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed. | 12-22-2011 |
| 20110301869 | Method and System for Spectroscopic Data Analysis - A method of analyzing spectroscopic data, the method comprising collecting spatially resolved measurement spectroscopic data of a sample for a series of measurements spots, assigning the measurement spots into a predefined set of spectral categories, based on characteristics of the spectroscopic data of the respective measurement spots, identifying groupings of the measurement spots based on their respective spectral categories and their spatial relationships, and assigning each grouping of measurement spots to a fundamental sample unit data object. | 12-08-2011 |
| 20110284763 | Charged Particle Source with Integrated Energy Filter - A particle source in which energy selection occurs by sending a beam of electrically charged particles eccentrically through a lens so that energy dispersion will occur in an image formed by the lens. By projecting this image onto a slit in an energy selecting diaphragm, it is possible to allow only particles in a limited portion of the energy spectrum to pass. Consequently, the passed beam will have a reduced energy spread. The energy dispersed spot is imaged on the slit by a deflector. When positioning the energy dispersed spot on the slit, central beam is deflected from the axis to such an extent that it is stopped by the energy selecting diaphragm. Hereby reflections and contamination resulting from this beam in the region after the diaphragm are avoided. Also electron-electron interaction resulting from the electrons from the central beam interacting with the energy filtered beam in the area of deflector is avoided. | 11-24-2011 |
| 20110278451 | Simultaneous Electron Detection - The invention provides multiple detectors that detect electrons that have passed through a sample. The detectors preferably detect electrons after the electrons have been passed through a prism that separates electrons according to their energies. Electrons in different energy ranges are then detected by different detectors, with preferably at least one of the detectors measuring the energy lost by the electrons as they pass through the sample. One embodiment of the invention provides EELS on core-loss electrons while simultaneously providing a bright-field STEM signal from low-loss electrons. | 11-17-2011 |
| 20110272592 | Encapsulation of Electrodes in Solid Media for use in conjunction with Fluid High Voltage Isolation - An inductively-coupled plasma source for a focused charged particle beam system includes a conductive shield that provides improved electrical isolation and reduced capacitive RF coupling and a dielectric fluid that insulates and cools the plasma chamber. The conductive shield may be enclosed in a solid dielectric media. The dielectric fluid may be circulated by a pump or not circulated by a pump. A heat tube can be used to cool the dielectric fluid. | 11-10-2011 |
| 20110266440 | SEM Imaging Method - A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps:
| 11-03-2011 |
| 20110266439 | Method of Using a Direct Electron Detector for a TEM - A method of using a direct electron detector in a TEM, in which an image with a high intensity peak, such as a diffractogram or an EELS spectrum, is imaged on said detector. As known the high intensity peak may damage the detector. To avoid this damage, the centre of the image is moved, as a result of which not one position of the detector is exposed to the high intensity, but the high intensity is smeared over the detector, displacing the high intensity peak before damage results. | 11-03-2011 |
| 20110251713 | DEFECT ANALYZER - The present invention provides methods, devices, and systems for analyzing defects in an object such as a semiconductor wafer. In one embodiment, it provides a method of characterizing defects in semiconductor wafers during fabrication in a semiconductor fabrication facility. This method comprises the following actions. The semiconductor wafers are inspected to locate defects. Locations corresponding to the located defects are then stored in a defect file. A dual charged-particle beam system is automatically navigated to the vicinity defect location using information from the defect file. The defect is automatically identified and a charged particle beam image of the defect is then obtained. The charged particle beam image is then analyzed to characterize the defect. A recipe is then determined for further analysis of the defect. The recipe is then automatically executed to cut a portion of the defect using a charged particle beam. The position of the cut is based upon the analysis of the charged particle beam image. Ultimately, a surface exposed by the charged particle beam cut is imaged to obtain additional information about the defect. | 10-13-2011 |
| 20110248164 | Combination Laser and Charged Particle Beam System - A combined laser and charged particle beam system. A pulsed laser enables milling of a sample at material removal rates several orders of magnitude larger than possible for a focused ion beam. In some embodiments, a scanning electron microscope enables high resolution imaging of the sample during laser processing. In some embodiments, a focused ion beam enables more precise milling of the sample. A method and structure for deactivating the imaging detectors during laser milling enables the removal of imaging artifacts arising from saturation of the detector due to a plasma plume generated by the laser beam. In some embodiments, two types of detectors are employed: type-1 detectors provide high gain imaging during scanning of the sample with an electron or ion beam, while type-2 detectors enable lower gain imaging and endpoint detection during laser milling. | 10-13-2011 |
| 20110240852 | AUTOMATED SLICE MILLING FOR VIEWING A FEATURE - A method and apparatus for performing a slice and view technique with a dual beam system. The feature of interest in an image of a sample is located by machine vision, and the area to be milled and imaged in a subsequent slice and view iteration is determined through analysis of data gathered by the machine vision at least in part. A determined milling area may be represented as a bounding box around a feature, which dimensions can be changed in accordance with the analysis step. The FIB is then adjusted accordingly to slice and mill a new face in the subsequent slice and view iteration, and the SEM images the new face. Because the present invention accurately locates the feature and determines an appropriate size of area to mill and image, efficiency is increased by preventing the unnecessary milling of substrate that does not contain the feature of interest. | 10-06-2011 |
| 20110226819 | METHOD FOR OBTAINING IMAGES FROM SLICES OF SPECIMEN - The invention relates to a method for obtaining images from slices of a specimen, the method comprising: repeatedly obtaining an image of the surface layer of the specimen ( | 09-22-2011 |
| 20110210264 | Distributed Ion Source Acceleration Column - An ion beam system uses a separate accelerating electrode, such as a resistive tube, to accelerate the ions while maintaining a low electric field at an extended, that is, distributed ion source, thereby improving resolution. A magneto-optical trap can be used as the ion source. | 09-01-2011 |
| 20110198511 | Plasma Igniter for an Inductively Coupled Plasma Ion Source - A focused ion beam (FIB) system is disclosed, comprising an inductively coupled plasma ion source, an insulating plasma chamber containing the plasma, a conducting source biasing electrode in contact with the plasma and biased to a high voltage to control the ion beam energy at a sample, and a plurality of apertures. The plasma within the plasma chamber serves as a virtual source for an ion column comprising one or more lenses which form a focused ion beam on the surface of a sample to be imaged and/or FIB-processed. The plasma is initiated by a plasma igniter mounted near or at the column which induces a high voltage oscillatory pulse on the source biasing electrode. By mounting the plasma igniter near the column, capacitive effects of the cable connecting the source biasing electrode to the biasing power supply are minimized. Ion beam sputtering of the apertures is minimized by proper aperture materials selection. | 08-18-2011 |
| 20110169116 | Radiation Detector - The invention discloses a process for manufacturing a radiation detector for detecting e.g. 200 eV electrons. This makes the detector suited for e.g. use in an Scanning Electron Microscope. The detector is a PIN photodiode with a thin layer of pure boron connected to the p | 07-14-2011 |
| 20110144922 | Method and System for Spectrum Data Analysis - A method and system for spectrum data analysis. The method comprises the steps of collecting a spectrum of an unknown material; providing a set of data templates; calculating weighting factors for the element data templates to minimize error in approximating the spectrum; removing one or more of the templates having negative weights in approximating the spectrum; and re-calculating an approximation of the spectrum with said one or more templates removed. Embodiments of the invention are suitable for analyzing noisy spectra having relatively few data points. | 06-16-2011 |
| 20110133083 | COMPACT SCANNING ELECTRON MICROSCOPE - A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder. | 06-09-2011 |
| 20110117748 | Localized Plasma Processing - A method of localized plasma processing improves processing speed and reduces work piece damage compared to charged particle beam deposition and etching. In one embodiment, a plasma jet exits a plasma generating chamber and activates a reactive gas. A jet of plasma and reactive gas impacts and processes the work piece. Because the plasma and the ions in the reactive gas can have low kinetic energy, there can be little or no surface damage. This is particularly useful for deposition processes. When it is desired to etch material, the reactive ions can be more energetic to enhance etching. | 05-19-2011 |
| 20110115129 | Method and Apparatus for Laser Machining - A charged particle beam and a laser beam are used together to micromachine a substrate. A first beam alters the state of a region of the work piece, and the second beam removes material whose state was altered. In one embodiment, an ion beam can create photon absorbing defects to lower the local ablation threshold, allowing the laser beam to remove material in a region defined by the ion beam. The combination of laser beam and charged particle beam allows the creation of features similar in size to the charged particle beam spot size, at milling rates greater than charged particle processing because of the increased energy provided by the laser beam. | 05-19-2011 |
| 20110114852 | Corrector for Axial Aberrations of a Particle-Optical Lens - Commercially available High Resolution Transmission Electron Microscopes (HR-TEM) and Scanning Transmission Electron Microscopes (HR-STEM) are nowadays equipped with correctors for correcting the axial spherical aberration C | 05-19-2011 |
| 20110114665 | GAS DELIVERY FOR BEAM PROCESSING SYSTEMS - Gas flow from multiple gas sources into a sample chamber of a beam system is controlled by a cycling valve for each gas source, with the gas pressure in the sample chamber being determined by the relative time that the valve is opened and the upstream pressure at the valve. A gas valve positioned inside the vacuum chamber allows rapid response in shutting off a gas. In some preferred embodiments, a precursor gas is supplied from a solid or liquid material in a container that remains outside the vacuum system while in use and which is readily connected or disconnected to the gas injection system without significant leakage. | 05-19-2011 |
| 20110101238 | Cold Field Emitter - A stable cold field electron emitter is produced by forming a coating on an emitter base material. The coating protects the emitter from the adsorption of residual gases and from the impact of ions, so that the cold field emitter exhibits short term and long term stability at relatively high pressures and reasonable angular electron emission. | 05-05-2011 |
| 20110100798 | Charged Particle Extraction Device And Method Of Design There for - The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes. | 05-05-2011 |
| 20110097706 | MICRO-REACTOR FOR OBSERVING PARTICLES IN A FLUID - The invention relates to a micro-reactor for observing small particles, cells, bacteria, viruses or protein molecules in a fluid. The micro-reactor shows a first channel formed between two layers for containing the fluid, with an inlet and an outlet, the two layers separated by a first distance. A likewise second channel with an inlet and an outlet is placed adjacent to the first channel. A gap connects the first channel and the second channel, at the gap at least one layer showing a window transparent to the method of inspection and at the window the two layers being separated by a very small distance of, for example, 1 μm or less. | 04-28-2011 |
| 20110084207 | Charged Particle Beam System Having Multiple User-Selectable Operating Modes - A method for performing milling and imaging in a focused ion beam (FIB) system employing an inductively-coupled plasma ion source, wherein two sets of FIB system operating parameters are utilized: a first set representing optimized parameters for operating the FIB system in a milling mode, and a second set representing optimized parameters for operating in an imaging mode. These operating parameters may comprise the gas pressure in the ICP source, the RF power to the ICP source, the ion extraction voltage, and in some embodiments, various parameters within the FIB system ion column, including lens voltages and the beam-defining aperture diameter. An optimized milling process provides a maximum milling rate for bulk (low spatial resolution) rapid material removal from the surface of a substrate. An optimized imaging process provides minimized material removal and higher spatial resolutions for improved imaging of the substrate area being milled. | 04-14-2011 |
| 20110070381 | USE OF NITROGEN-BASED REDUCING COMPOUNDS IN BEAM-INDUCED PROCESSING - A system for beam-induced deposition or etching, in which a charged particle or laser beam can be directed to a work piece within a single vacuum chamber, either normally incident or at an angle. Simultaneously with beam illumination of the work piece, a deposition or etch precursor gas is co-injected or premixed with a purification compound and (optionally) a carrier gas prior to injection into the process chamber. The beam decomposes the deposition precursor gas to deposit a film only in areas illuminated by the beam, or decomposes the etch precursor gas to etch a film only in areas illuminated by the beam. Undesired impurities such as carbon in the deposited film are removed during film growth by interaction with adsorbed species on the work piece surface that are generated by interaction of the beam with adsorbed molecules of the film purification compound. Alternatively, the film purification compound can be used to inhibit oxidation of the material etched by the etch precursor gas. By co-injecting or premixing the deposition or etch precursor gas and film purification compound prior to injection, the deposition or etch process may be optimized with respect to growth/etch rate and achievable material purity. | 03-24-2011 |
| 20110064191 | MICROCALORIMETRY FOR X-RAY SPECTROSCOPY - An improved microcalorimeter-type energy dispersive x-ray spectrometer provides sufficient energy resolution and throughput for practical high spatial resolution x-ray mapping of a sample at low electron beam energies. When used with a dual beam system that provides the capability to etch a layer from the sample, the system can be used for three-dimensional x-ray mapping. A preferred system uses an x-ray optic having a wide-angle opening to increase the fraction of x-rays leaving the sample that impinge on the detector and multiple detectors to avoid pulse pile up. | 03-17-2011 |
| 20110057393 | HIGH-VACUUM SEAL - The invention relates to an improved O-ring seal for use as a high vacuum seal. A limitation of standard O-rig seals is the permeation of water through the O-ring. Especially for instruments in which parts are kept at a cryogenic temperature, such as a cryogenic electron microscope, the presence of water in the vacuum is a problem, as this results in ice growth on the cryogenic parts. As a solution often a double O-ring seal is used, or a metal seal. Both of these solutions have severe draw-backs. | 03-10-2011 |
| 20110049382 | PATTERN MODIFICATION SCHEMES FOR IMPROVED FIB PATTERNING - An improved method of directing a charged particle beam that compensates for the time required for the charged particles to traverse the system by altering one or more of the deflector signals. According to one embodiment of the invention, a digital filter is applied to the scan pattern prior to digital-to-analog (D/A) conversion in order to reduce or eliminate over-shoot effects that can result from TOF errors. In other embodiments, analog filters or the use of signal amplifiers with a lower bandwidth can also be used to compensate for TOF errors. By altering the scan pattern, over-shoot effects can be significantly reduced or eliminated. | 03-03-2011 |
| 20110031655 | GAS-ASSISTED LASER ABLATION - An improved method for laser processing that prevents material redeposition during laser ablation but allows material to be removed at a high rate. In a preferred embodiment, laser ablation is performed in a chamber filled with high pressure precursor (etchant) gas so that sample particles ejected during laser ablation will react with the precursor gas in the gas atmosphere of the sample chamber. When the ejected particles collide with precursor gas particles, the precursor is dissociated, forming a reactive component that binds the ablated material. In turn, the reaction between the reactive dissociation by-product and the ablated material forms a new, volatile compound that can be pumped away in a gaseous state rather than redepositing onto the sample. | 02-10-2011 |
| 20110031394 | HIGH PRESSURE CHARGED PARTICLE BEAM SYSTEM - The current invention includes methods and apparatuses for processing, that is, altering and imaging, a sample in a high pressure charged particle beam system. Embodiments of the invention include a cell in which the sample is positioned during high pressure charged particle beam processing. The cell reduces the amount of gas required for processing, thereby allowing rapid introduction, exhaustion, and switching between gases and between processing and imaging modes. Maintaining the processes gases within the cell protects the sample chamber and column from contact with the gases. In some embodiments, the temperature of the cell walls and the sample can be controlled. | 02-10-2011 |
| 20110006208 | Method for Inspecting a Sample - The invention describes a method for inspecting samples in an electron microscope. A sample carrier | 01-13-2011 |
| 20110006207 | METHOD FOR S/TEM SAMPLE ANALYSIS - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. Preferred embodiments of the present invention also provide an in-line process for S/TEM based metrology on objects such as integrated circuits or other structures fabricated on semiconductor wafer by providing methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 01-13-2011 |
| 20100327180 | BEAM QUALITY IN FIB SYSTEMS - Applicants have found that the asymmetrical energy distribution of ions from an ion source allow chromatic aberration to be reduced by filtering ions in the low energy beam tail without significantly reducing processing time. A preferred embodiment includes within an ion beam column a filter that removes the low energy ions from the beam. | 12-30-2010 |
| 20100316811 | AU-CONTAINING LAYER FOR CHARGED PARTICLE BEAM PROCESSING - The invention provides a method for providing an Au-containing layer onto a surface of a work piece, which method comprises:
| 12-16-2010 |
| 20100308219 | METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 12-09-2010 |
| 20100305747 | METHOD AND APPARATUS FOR SAMPLE EXTRACTION AND HANDLING - An improved method and apparatus for extracting and handling samples for S/TEM analysis. Preferred embodiments of the present invention make use of a micromanipulator and a hollow microprobe probe using vacuum pressure to adhere the microprobe tip to the sample. By applying a small vacuum pressure to the lamella through the microprobe tip, the lamella can be held more securely and its placement controlled more accurately than by using electrostatic force alone. By using a probe having a beveled tip and which can also be rotated around its long axis, the extracted sample can be placed down flat on a sample holder. This allows sample placement and orientation to be precisely controlled, thus greatly increasing predictability of analysis and throughput | 12-02-2010 |
| 20100301211 | DUAL BEAM SYSTEM - A dual beam system provides for operation of a focused ion beam in the presence of a magnetic field from an ultra-high resolution electron lens. The ion beam is deflected to compensate for the presence of the magnetic field. | 12-02-2010 |
| 20100300873 | METHOD FOR CREATING S/TEM SAMPLE AND SAMPLE STRUCTURE - An improved method and apparatus for S/TEM sample preparation and analysis. Preferred embodiments of the present invention provide improved methods for TEM sample creation, especially for small geometry (<100 nm thick) TEM lamellae. A novel sample structure and a novel use of a milling pattern allow the creation of S/TEM samples as thin as 50 nm without significant bowing or warping. Preferred embodiments of the present invention provide methods to partially or fully automate TEM sample creation, to make the process of creating and analyzing TEM samples less labor intensive, and to increase throughput and reproducibility of TEM analysis. | 12-02-2010 |
| 20100294648 | Magnetically Enhanced, Inductively Coupled Plasma Source for a Focused Ion Beam System - The present invention provides an inductively coupled, magnetically enhanced ion beam source, suitable to be used in conjunction with probe-forming optics to produce an ion beam without kinetic energy oscillations induced by the source. | 11-25-2010 |
| 20100276592 | Compact Scanning Electron Microscope - A slider bearing for use with an apparatus comprising a vacuum chamber ( | 11-04-2010 |
| 20100258721 | DARK FIELD DETECTOR FOR USE IN AN ELECTRON MICROSCOPE - The invention relates to a dark-field detector for an electron microscope. The detector comprises a photodiode for detecting the scattered electrons, with an inner electrode and an outer electrode. As a result of the resistive behaviour of the surface layer the current induced by a scattered electron, e.g. holes, are divided over the electrodes, so that a current I | 10-14-2010 |
| 20100255213 | Method for Forming Microscopic 3D Structures - A method for forming microscopic 3D structures. In the method according to the invention a substrate ( | 10-07-2010 |
| 20100246993 | METHOD FOR DETERMINING DISTORTIONS IN A PARTICLE-OPTICAL APPARATUS - The invention relates to a method of determining the distortions in the projection system of a TEM, and a method of correcting for these aberrations. The aberrations are determined by collecting a large number of images of a sample, the sample slightly displaced between each acquisition of an image. On the images sub-fields ( | 09-30-2010 |
| 20100243889 | FORMING AN IMAGE WHILE MILLING A WORK PIECE - Dual beam instruments, comprising a Scanning Electron Microscope (SEM) column for imaging and a Focused Ion Beam (FIB) column for milling, are routinely used to extract samples (lamellae) from semiconductor wafers. By observing the progress of the milling with the SEM column, end pointing of the milling process can be performed. | 09-30-2010 |
| 20100230609 | SAMPLE CARRIER FOR SAMPLE HOLDER - The invention relates to a composite structure of a sample carrier | 09-16-2010 |
| 20100230590 | Compact Scanning Electron Microscope - A compact electron microscope is robust, simple to operate, and preferably requires no special utilities. Imaging can begin shortly after a sample is inserted. A preferred simplified design includes permanent magnets for focusing, lack a vacuum controller and vacuum gauge, and uses a backscattered electron detector and no secondary electron detector. | 09-16-2010 |
| 20100224592 | CHARGED PARTICLE BEAM PROCESSING - Electron-beam-induced chemical reactions with precursor gases are controlled by adsorbate depletion control. Adsorbate depletion can be controlled by controlling the beam current, preferably by rapidly blanking the beam, and by cooling the substrate. The beam preferably has a low energy to reduce the interaction volume. By controlling the depletion and the interaction volume, a user has the ability to produce precise shapes. | 09-09-2010 |
| 20100197142 | HIGH SELECTIVITY, LOW DAMAGE ELECTRON-BEAM DELINEATION ETCH - A method and apparatus for selective etching a substrate using a focused beam. For example, multiple gases may be used that are involved in competing beam-induced and spontaneous reactions, with the result depending on the materials on the substrate. The gases may include, for example, an etchant gas and an auxiliary gas that inhibits etching. | 08-05-2010 |
| 20100194874 | User Interface for an Electron Microscope - A user interface for operation of a scanning electron microscope device that combines lower magnification reference images and higher magnification images on the same screen to make it easier for a user who is not used to the high magnification of electron microscopes to readily determine where on the sample an image is being obtained and to understand the relationship between that image and the rest of the sample. Additionally, other screens, such as, for example, an archive screen and a settings screen allow the user to compare saved images and adjust the settings of the system, respectively. | 08-05-2010 |
| 20100171037 | COMPACT SCANNING ELECTRON MICROSCOPE - A compact electron microscope uses a removable sample holder having walls that form a part of the vacuum region in which the sample resides. By using the removable sample holder to contain the vacuum, the volume of air requiring evacuation before imaging is greatly reduced and the microscope can be evacuated rapidly. In a preferred embodiment, a sliding vacuum seal allows the sample holder to be positioned under the electron column, and the sample holder is first passed under a vacuum buffer to remove air in the sample holder. | 07-08-2010 |
| 20100159370 | METHOD FOR FORMING MICROSCOPIC STRUCTURES ON A SUBSTRATE - The invention relates to a method for forming microscopic structures. By scanning a focused particle beam over a substrate in the presence of a precursor fluid, a patterned seed layer is formed. By now growing this layer with Atomic Layer Deposition or Chemical Vapour Deposition, a high quality layer can be grown. | 06-24-2010 |
| 20100151679 | SYSTEM FOR MODIFYING SMALL STRUCTURES - A charge transfer mechanism is used to locally deposit or remove material for a small structure. A local electrochemical cell is created without having to immerse the entire work piece in a bath. The charge transfer mechanism can be used together with a charged particle beam or laser system to modify small structures, such as integrated circuits or micro-electromechanical system. The charge transfer process can be performed in air or, in some embodiments, in a vacuum chamber. | 06-17-2010 |
| 20100148064 | X-RAY DETECTOR FOR ELECTRON MICROSCOPE - Multiple detectors arranged in a ring within a specimen chamber provide a large solid angle of collection. The detectors preferably include a shutter and a cold shield that reduce ice formation on the detector. By providing detectors surrounding the sample, a large solid angle is provided for improved detection and x-rays are detected regardless of the direction of sample tilt. | 06-17-2010 |
| 20100138028 | GRAPHICAL AUTOMATED MACHINE CONTROL AND METROLOGY - A graphical programming system allows a user to place geometric shapes onto a scaled image, the shape having associated behavior that operates on the image or on the object of which the image is formed. In a preferred embodiment, the shapes are objects in the Visio program by Microsoft Corporation. The shapes are dragged from a stencil onto an image provided by ion beam or electron microscope image. The shape invokes software or hardware to locate and measure features on the image or to perform operations, such as ion beam milling, on the object that is imaged. | 06-03-2010 |
| 20100127190 | CHARGED PARTICLE BEAM MASKING FOR LASER ABLATION MICROMACHINING - An improved method for substrate micromachining. Preferred embodiments of the present invention provide improved methods for the utilization of charged particle beam masking and laser ablation. A combination of the advantages of charged particle beam mask fabrication and ultra short pulse laser ablation are used to significantly reduce substrate processing time and improve lateral resolution and aspect ratio of features machined by laser ablation to preferably smaller than the diffraction limit of the machining laser. | 05-27-2010 |
| 20100116977 | MEASUREMENT AND ENDPOINTING OF SAMPLE THICKNESS - An improved method for TEM sample creation. The use of a SEM-STEM detector in the dual-beam FIB/SEM allows a sample to be thinned using the FIB, while the STEM signal is used to monitor sample thickness. A preferred embodiment of the present invention can measure the thickness of or create S/TEM samples by using a precise endpoint detection method that is reproducible and suitable for automation. Preferred embodiments also enable automatic endpointing during TEM lamella creation and provide users with direct feedback on sample thickness during manual thinning. Preferred embodiments of the present invention thus provide improved methods for endpointing sample thinning and methods to partially or fully automate endpointing to increase throughput and reproducibility of TEM sample creation. | 05-13-2010 |
| 20100108907 | CHARGED-PARTICLE OPTICAL SYSTEM WITH DUAL LOADING OPTIONS - A charged-particle optical system ( | 05-06-2010 |
| 20100108881 | SCANNING TRANSMISSION ELECTRON MICROSCOPE USING GAS AMPLIFICATION - A scanning transmission electron microscope operated with the sample in a high pressure environment. A preferred detector uses gas amplification by converting either scattered or unscattered transmitted electrons to secondary electrons for efficient gas amplification. | 05-06-2010 |
| 20100108506 | METHOD AND APPARATUS FOR CONTROLLING TOPOGRAPHICAL VARIATION ON A MILLED CROSS-SECTION OF A STRUCTURE - An improved method of controlling topographical variations when milling a cross-section of a structure, which can be used to reduce topographical variation on a cross-section of a write-head in order to improve the accuracy of metrology applications. Topographical variation is reduced by using a protective layer that comprises a material having mill rates at higher incidence angles that closely approximate the mill rates of the structure at those higher incidence angles. Topographical variation can be intentionally introduced by using a protective layer that comprises a material having mill rates at higher incidence angles that do not closely approximate the mill rates of the structure at those higher incidence angles. | 05-06-2010 |
| 20100092070 | HIGH ACCURACY BEAM PLACEMENT FOR LOCAL AREA NAVIGATION - An improved method of high accuracy beam placement for local area navigation in the field of semiconductor chip manufacturing. This invention demonstrates a method where high accuracy navigation to the site of interest within a relatively large local area (e.g. an area 200 μm×200 μm) is possible even where the stage/navigation system is not normally capable of such high accuracy navigation. The combination of large area, high-resolution scanning, digital zoom and registration of the image to an idealized coordinate system enables navigation around a local area without relying on stage movements. Once the image is acquired any sample or beam drift will not affect the alignment. Preferred embodiments thus allow accurate navigation to a site on a sample with sub-100 nm accuracy, even without a high-accuracy stage/navigation system. | 04-15-2010 |
| 20100072366 | METHOD FOR CORRECTING DISTORTIONS IN A PARTICLE-OPTICAL APPARATUS - The invention relates to a method for correcting distortions introduced by the projection system ( | 03-25-2010 |
| 20100044580 | Charged Particle Extraction Device and Method of Design There For - The present invention provides a method for extracting a charged particle beam from a charged particle source. A set of electrodes is provided at the output of the source. The potentials applied to the electrodes produce a low-emittance growth beam with substantially zero electric field at the output of the electrodes. | 02-25-2010 |
| 20100032567 | Method of Machining a Work Piece with a Focused Particle Beam - The invention relates to a method for producing high-quality samples for e.g. TEM inspection. When thinning samples with e.g. a Focused Ion Beam apparatus (FIB), the sample often oxidizes when taken from the FIB due to the exposure to air. This results in low-quality samples, that may be unfit for further analysis. By forming a passivation layer, preferably a hydrogen passivation layer, on the sample in situ, that is: before taking the sample from the FIB, high quality. | 02-11-2010 |
| 20100032302 | METHOD TO DIRECT PATTERN METALS ON A SUBSTRATE - A microscopic metallic structure is produced by creating or exposing a patterned region of increased conductivity and then forming a conductor on the region using electrodeposition. In some embodiments, a microscopic metallic structure is formed on a substrate, and then the substrate is etched to remove the structure from the substrate. In some embodiments, a focused beam of gallium ion without a deposition precursor gas scans a pattern on a silicon substrate, to produce a conductive pattern on which a copper structure is then formed by electrochemical deposition of one or more metals. The structure can be freed from the substrate by etching, or can used in place. A beam can be used to access an active layer of a transistor, and then a conductor can be electrodeposited to provide a lead for sensing or modifying the transistor operation while it is functioning. | 02-11-2010 |
| 20100025578 | Dual Beam System - A dual beam system includes an ion beam system and a scanning electron microscope with a magnetic objective lens. The ion beam system is adapted to operate optimally in the presence of the magnetic field from the SEM objective lens, so that the objective lens is not turned off during operation of the ion beam. An optional secondary particle detector and an optional charge neutralization flood gun are adapted to operate in the presence of the magnetic field. The magnetic objective lens is designed to have a constant heat signature, regardless of the strength of magnetic field being produced, so that the system does not need time to stabilize when the magnetic field is changed. | 02-04-2010 |
| 20090326866 | Methods and Apparatus for Statistical Characterization of Nano-Particles - A method and apparatus for determining statistical characteristics of nano-particles includes distributing the nano-particles over a surface and then determining properties of the nano-particles by automatic measurement of multiple particles or by a measurement that determines properties of multiple particles at one time, without manipulating individual nano-particles. | 12-31-2009 |
| 20090309018 | MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM - The present invention provides a plasma ion beam system that includes multiple gas sources and that can be used for performing multiple operations using different ion species to create or alter submicron features of a work piece. The system preferably uses an inductively coupled, magnetically enhanced ion beam source, suitable in conjunction with probe-forming optics sources to produce ion beams of a wide variety of ions without substantial kinetic energy oscillations induced by the source, thereby permitting formation of a high resolution beam. | 12-17-2009 |
| 20090306906 | METHOD AND SYSTEM FOR SPECTROSCOPIC DATA ANALYSIS - A method of analyzing spectroscopic data, the method comprising collecting spatially resolved measurement spectroscopic data of a sample for a series of measurements spots, assigning the measurement spots into a predefined set of spectral categories, based on characteristics of the spectroscopic data of the respective measurement spots, identifying groupings of the measurement spots based on their respective spectral categories and their spatial relationships, and assigning each grouping of measurement spots to a fundamental sample unit data object. | 12-10-2009 |
| 20090302217 | Hybrid Phase Plate - The invention relates to a hybrid phase plate for use in a TEM. The phase plate according to the invention resembles a Boersch phase plate in which a Zernike phase plate is mounted. As a result the phase plate according to the invention resembles a Boersch phase plate for electrons scattered to such an extent that they pass outside the central structure ( | 12-10-2009 |
| 20090289196 | Deflection Signal Compensation for Charged Particle Beam - Charged particles that are in transit through a deflection system when the beam is repositioned do not received the correct deflection force and are misdirected. By independently applying signals to the multiple stages of a deflection system, the number of misdirected particles during a pixel change is reduced. | 11-26-2009 |
| 20090289195 | Charged Particle Source with Integrated Energy Filter - The invention describes a particle source in which energy selection occurs. The energy selection occurs by sending a beam of electrically charged particles | 11-26-2009 |
| 20090242763 | Environmental Cell for a Particle-Optical Apparatus - The invention relates to an environmental cell for use in e.g. an electron microscope. The environmental cell shows an aperture ( | 10-01-2009 |
| 20090242759 | SLICE AND VIEW WITH DECORATION - Imprecisely located defects are imaged by milling a series of slices and performing a light, preferential etch to provide a topographical interface between materials having similar secondary electron emission characteristics. The slices are sufficiently small to capture small defects, but are sufficiently large to overcome problems with redeposition. | 10-01-2009 |
| 20090242758 | MULTISTAGE GAS CASCADE AMPLIFIER - A novel detector for a charged particle beam system which includes multiple gas amplification stages. The stages are typically defined by conductors to which voltage are applied relative to the sample or to a previous stage. By creating cascades of secondary electrons in multiple stages, the gain can be increased without causing dielectric breakdown of the gas. | 10-01-2009 |
| 20090230303 | DEFECT ANALYZER - The present invention provides methods, devices, and systems for analyzing defects in an object such as a semiconductor wafer. In one embodiment, it provides a method of characterizing defects in semiconductor wafers during fabrication in a semiconductor fabrication facility. This method comprises the following actions. The semiconductor wafers are inspected to locate defects. Locations corresponding to the located defects are then stored in a defect file. A dual charged-particle beam system is automatically navigated to the vicinity defect location using information from the defect file. The defect is automatically identified and a charged particle beam image of the defect is then obtained. The charged particle beam image is then analyzed to characterize the defect. A recipe is then determined for further analysis of the defect. The recipe is then automatically executed to cut a portion of the defect using a charged particle beam. The position of the cut is based upon the analysis of the charged particle beam image. Ultimately, a surface exposed by the charged particle beam cut is imaged to obtain additional information about the defect. | 09-17-2009 |
| 20090220130 | METHOD FOR LOCALIZING LABELS IN A SAMPLE - The invention relates to a method in which labels are introduced in a sample, a flat surface is prepared on the sample and a series of images is made of the sample surface with e.g. a scanning electron microscope. The labels may be gold labels or e.g. fluorescent labels. | 09-03-2009 |
| 20090218488 | BEAM POSITIONING FOR BEAM PROCESSING - An improved method and apparatus of beam processing corrects for beam drift while a beam is processing a sample. The beam position is aligned using a fiducial that is sufficiently near the working area so that the fiducial can be imaged and the sample processed without a stage moving. During processing, the beam positioning is corrected for drift using a model that predicts the drift. | 09-03-2009 |
| 20090200489 | HERMETICALLY SEALED HOUSING WITH ELECTRICAL FEED-IN - The invention relates to a hermetically sealed housing with an electrical feed-in. A standard printed circuit board | 08-13-2009 |
| 20090200464 | TEM WITH ABERRATION CORRECTOR AND PHASE PLATE - The invention relates to a TEM with a corrector ( | 08-13-2009 |
| 20090133167 | METHOD FOR OBTAINING A SCANNING TRANSMISSION IMAGE OF A SAMPLE IN A PARTICLE-OPTICAL APPARATUS - A method for improving the resolution of STEM images of thick samples. In STEM, the diameter of the cross-over depends on the opening half-angle α of the beam and can be as low as 0.1 nm. For optimum resolution an opening half-angle is chosen at which the diameter of the cross-over R(α) shows a minimum. For thick samples the resolution is, for those parts of the sample removed from the cross-over plane, limited by the convergence of the beam, resulting in a diameter D of the beam at the surface of the sample. The opening angle is chosen to balance the contribution of convergence and of diameter of the cross-over by choosing an opening half-angle smaller than the optimum opening half-angle. Effectively the sample is then scanned with a beam that has a substantially constant diameter over the length of the sample material through which the electrons have to travel. | 05-21-2009 |
| 20090111036 | PHOTOLITHOGRAPHY MASK REPAIR - Masks can be repaired by creating a structure that is different from the original design, but that produces the same aerial image. For example, missing opaque material can be replaced by implanting gallium atoms to reduce transmission and quartz can be etched to an appropriate depth to produce the proper phase. In another aspect, a laser or other means can be used to remove an area of a mask around a defect, and then mask structures, either the intended design structures or alternate structures that produce the same aerial image, can be constructed using charged particle beam deposition and etching. For example, an electron beam can be used to deposit quartz to alter the phase of transmitted light. An electron beam can also be used with a gas to etch quartz to remove a layer including implanted gallium atoms. Gallium staining can also be reduced or eliminated by providing a sacrificial layer that can be removed, along with the implanted gallium atoms, using, for example, a broad ion beam. In another aspect, a charged particle beam can be programmed to etch a defect using three-dimensional information derived from two charged particle beams images of the defect from different angle. | 04-30-2009 |
| 20090000400 | METHOD FOR ATTACHING A SAMPLE TO A MANIPULATOR - The invention relates to the extraction of a frozen hydrated sample for TEM (Transmission Electron Microscope) inspection, such as a vitrified biological sample, from a substrate and the attaching of said sample to a manipulator. Such a hydrated sample should be held at a cryogenic temperature to avoid ice formation. By melting or sublimating a part of the sample material outside the area to be studied in the TEM and freezing the material to the manipulator ( | 01-01-2009 |
| 20080314871 | HIGH RESOLUTION PLASMA ETCH - A method for fabrication of microscopic structures that uses a beam process, such as beam-induced decomposition of a precursor, to deposit a mask in a precise pattern and then a selective, plasma beam is applied, comprising the steps of first creating a protective mask upon surface portions of a substrate using a beam process such as an electron beam, focused ion beam (FIB), or laser process, and secondly etching unmasked substrate portions using a selective plasma beam etch process. Optionally, a third step comprising the removal of the protective mask may be performed with a second, materially oppositely selective plasma beam process. | 12-25-2008 |
| 20080308742 | IN-CHAMBER ELECTRON DETECTOR - A secondary particle detector | 12-18-2008 |
| 20080296499 | Charged Particle Instrument Equipped with Optical Microscope - An optical microscope slide in a charged particle instrument such as an electron microscope or a focused ion beam instrument. Conventional microscope slides are not fit for use in an electron microscope as they are insulating and would thus charge when viewed in an electron microscope due to the impinging beam of charged particles. However, microscope slides exist that show a coating with a conductive layer of e.g. Indium Tin Oxide (ITO). These microscope slides are normally used for heating the object mounted on the slide by passing a current through the conductive layer. Experiments show that these microscope slides can be used advantageously in a charged particle instrument by connecting the conductive layer to e.g. ground potential, thereby forming a return path for the impinging charged particles and thus avoiding charging. The invention further relates to a charged particle instrument that is further equipped with an optical microscope. | 12-04-2008 |
| 20080296498 | In-situ STEM sample preparation - A method for STEM sample preparation and analysis that can be used in a FIB-STEM system without a flip stage. The method allows a dual beam FIB/STEM system with a typical tilt stage having a maximum tilt of approximately 60 to be used to extract a STEM sample to from a substrate, mount the sample onto a TEM sample holder, thin the sample using FIB milling, and rotate the sample so that the sample face is perpendicular to a vertical electron column for STEM imaging. | 12-04-2008 |
| 20080290264 | Corrector for the correction of chromatic aberrations in a particle-optical apparatus - The invention describes a corrector for the correction of chromatic aberrations in a particle lens, such as used in a SEM or a TEM. So as to reduce the stability demands on the power supplies of such a corrector, the energy with which the particle beam passes through the corrector is lower than the energy with which the beam passes through the lens to be corrected. | 11-27-2008 |
| 20080283768 | Transfer mechanism for transferring a specimen - The invention relates to a transfer mechanism for transferring a specimen ( | 11-20-2008 |
| 20080250881 | Sample carrier and sample holder - The invention relates to a composite structure of a sample carrier | 10-16-2008 |
| 20080210869 | APPARATUS FOR OBSERVING A SAMPLE WITH A PARTICLE BEAM AND AN OPTICAL MICROSCOPE - An apparatus for observing a sample ( | 09-04-2008 |
