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EON LABS, LLC

EON LABS, LLC Patent applications
Patent application numberTitlePublished
20100310434Distributed Dielectric Barrier Discharge Reactor - A plasma reactor consisting of a plurality of elements placed between two or more plasma generating electrodes is presented. Said elements consisting of surfaces, conducting, and/or dielectric which allow for the dielectric isolation of the electrodes from each other and creating a plurality of dielectrically isolated spaces for plasma generation. This plasma reactor achieves a high surface area, with low capacitance allowing simplified construction and is suitable for high frequency operation.12-09-2010