| ENTEGRIS, INC. Patent applications |
| Patent application number | Title | Published |
|---|
| 20130120897 | Electrostatic Chuck with Photo-Patternable Soft Protrusion Contact Surface - In accordance with an embodiment of the invention, there is provided a soft protrusion structure for an electrostatic chuck, which offers a non-abrasive contact surface for wafers, workpieces or other substrates, while also having improved manufacturability and compatibility with grounded surface platen designs. The soft protrusion structure comprises a photo-patternable polymer. | 05-16-2013 |
| 20130101438 | CUSTOMIZABLE DISPENSE SYSTEM WITH SMART CONTROLLER - Embodiments disclosed provide a customizable dispense system implementing modular architecture, the customizable dispense system comprising a smart controller configured to operate various pneumatic pumps and motor pumps in various semiconductor manufacturing processes that are sensitive to defects in printed patterns. The smart controller is configured to, upon switching from communicating with a first pump to a second pump, automatically recognize the second pump and apply a control scheme to control the second pump, which may be a motor pump or a pneumatic pump. The switching may be due to physical disconnection of the first pump and physical connection of the second pump or it can be entirely done via software. The smart controller may be connected to track and a variety of devices, including smart filters. | 04-25-2013 |
| 20130092263 | Fluid Filter With Polymeric Membrane And Metal Supports - The present invention provides a fluid filter utilizing a polymeric membrane supports by metallic screens contained in a housing. The supports have apertures through which fluid can pass. The metallic supports are created such that they have at least one surface substantially free from burrs, so as not to damage the membrane. This smooth surface is in communication with the polymeric membrane. One or more indexing protrusions can be added along the circumference to restrict the relative movement between the supports, and to align the apertures of the two supports. | 04-18-2013 |
| 20130070384 | High Surface Resistivity Electrostatic Chuck - In accordance with an embodiment of the invention, there is provided an electrostatic chuck. The electrostatic chuck comprises an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck, the surface layer including a charge control layer comprising a surface resistivity of greater than about 10 | 03-21-2013 |
| 20130056485 | SUBSTRATE TRANSPORT CARRIER - A transport container for substrates such as semiconductor wafers and solar cell substrates includes a cover and a base having a plurality of side walls including movable wall portions with vertically extending hinges or hinges that provide a pivot about a vertical axis. The hinges can be resilient movable polymer portions such as living hinges and can have an unconnected upper edge and an unconnected lower edge to allow the movable wall portions to move inwardly relative to a floor of the base. The cover can include a base engagement portion configured as a cam portion that engages a cover engagement portion on the movable wall portions as the cover is inserted onto the base. As the cam portions of the cover engage the cover engagement portions, the cam portions move the wall inwardly relative to the base to align the substrates. | 03-07-2013 |
| 20130056389 | THIN WAFER SHIPPER - An improved wafer support mechanism in a wafer container useful for carrying a plurality of axially aligned thin mostly circular wafer substrates. The container includes a cassette that has a plurality of adjacently disposed teeth for receiving the substrates, wherein each rib member is continuous from the cassette open top to the cassette open bottom, a removable top cover portion, a removable bottom cover portion, a cushion assembly removably attached to the container top cover and another cushion assembly removably located in the container bottom cover and held in place by the weight of the wafer cassette. The top cushions are formed of individual segments having an extended lead-in feature at the end of each segment, spring sections in each segment and each segment has a V-shaped cross section to receive the wafer edge. The top and bottom cushions are installed in the top and bottom container covers respectively, and extend the wafer support to approximately the entire circumference of each wafer. | 03-07-2013 |
| 20130048018 | POST-CMP CLEANING BRUSH - Embodiments of the invention include a CMP brush that has a combination of central nodules at an inner region of the brush and one or more edge nodules at an end region of the brush where the central nodules and edge nodules are in a staggered or matched arrangement with each other and an upper surface of each edge nodule on the brush has the same or a greater contact area than an upper surface of a central nodule. The area of contact of the upper surface of each edge nodule with the substrate edge region is the same or greater than the area of contact of the upper surface of a central nodule with the substrate center region. | 02-28-2013 |
| 20130020220 | RETICLE POD - A dual containment pod having an outer pod and an inner pod that provides support structure and environmental control means. The inner pod includes a base having a flat, polished surface with protrusions upon which the reticle seats and providing a gap between the reticle and the polished surface. The gap separates the reticle from the flat, polished surface of the base and is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. The top cover of the inner pod seats on the polished surface proximate a periphery of the base. Moveable reticle engaging pins on the top cover of the inner pod are engaged by the top cover of the outer container when the inner pod is assembled inside the outer pod providing reticle restraint. | 01-24-2013 |
| 20120297981 | POROUS BARRIER FOR EVENLY DISTRIBUTED PURGE GAS IN A MICROENVIRONMENT - An improved system and method for purging a microenvironment to desired levels of relative humidity, oxygen, or particulates through the implementation of a purge gas delivery apparatus and method that provides even distribution of the purging gas within the microenvironment. A substrate container has a tower therein with a fluid flow passageway extending the length of the tower. Apertures with porous media between the aperture and fluid flow passageway regulate the volume and pressure of air discharging at each aperture. Alternatively, the tower may be formed of a porous tubular polymeric material. A sleeve may direct the discharge purge gas in the interior. | 11-29-2012 |
| 20120128505 | Method and System for Pump Priming - The disclosure describes systems and methods relating generally to filtration. Even more particularly, embodiments described herein relate to optimizing operating routines of a pump based on filter. Embodiments of priming routines described herein can perform a back pressure step to pressurize the filter from downstream and a back flush step to flush the filter from downstream. | 05-24-2012 |
| 20120118816 | Non-Dewetting Porous Membranes - Microporous membrane composites that are non-dewetting are disclosed. These microporous membrane composites are wet with solutions of methanol and water and are non-dewetting following autoclave treatment in water. The microporous membrane composites comprise a microporous membrane support that is coated with a crosslinked ionomer comprising hydrophilic groups. Compared to the microporous membrane support, the microporous membrane composite has a flow loss on average in isopropyl alcohol of less than 82%. | 05-17-2012 |
| 20120091165 | System and Method for Correcting for Pressure Variations Using a Motor - Systems and methods for compensating for pressure increase which may occur in various enclosed spaces of a pumping apparatus are disclosed. Embodiments of the present invention may compensate for pressure increases in chambers of a pumping apparatus by moving a pumping means of the pumping apparatus to adjust the volume of the chamber to compensate for a pressure increase in the chamber. More specifically, in one embodiment, to account for unwanted pressure increases to the fluid in a dispense chamber the dispense motor may be reversed to back out piston to compensate for any pressure increase in the dispense chamber. | 04-19-2012 |
| 20120090704 | Liquid Flow Controller And Precision Dispense Apparatus And System - Apparatus and a control system for monitoring (preferably digitally) and/or controlling pressure to a pneumatic load such as a proportional fluid control valve and using a measurement input from a fluid measurement device that responds to a flow rate, the liquid measurement input being used to control the pressure to the pneumatic load so that pneumatic load may be increased or decreased (to proportionally open or close the pneumatic valve) to change the flow rate of the fluid to a desired rate. The pneumatic load can also be adjusted (to proportionally open or close the pneumatic valve) to accommodate changes in temperature and viscosity of a fluid. | 04-19-2012 |
| 20120076945 | MOLDED ROTATABLE BASE FOR A POROUS PAD - A rotatable base for a porous pad has openings that provide for improved flow distribution of a liquid in the base across a substrate. The rotatable base can be molded form a two piece mold and the openings can have draft angles to facilitate the molding process. | 03-29-2012 |
| 20120070311 | System and Method for Pressure Compensation in a Pump - Systems and methods for maintaining substantially a baseline pressure in a chamber of a pumping apparatus are disclosed. Embodiments of the present invention may serve to control a motor to compensate or account for a pressure drift which may occur in a chamber of the pumping apparatus. More specifically, a dispense motor may be controlled to substantially maintain a baseline pressure in the dispense chamber before a dispense based on a pressure sensed in the dispense chamber. In one embodiment, before a dispense is initiated a control loop may be utilized such that it is repeatedly determined if the pressure in the dispense chamber is above a desired pressure and, if so, the movement of the pumping means regulated to maintain substantially the desired pressure in the dispense chamber until a dispense of fluid is initiated. | 03-22-2012 |
| 20120061288 | COMPOSITE SUBSTRATE CARRIER - A composite wafer carrier according to an embodiment of the present invention comprises an operative portion formed of a first thermoplastic material and a support portion formed of a second different thermoplastic material. One of the operative portion and support portion is overmolded onto the other to form a gapless hermitic interface that securely bonds the portions together. The operative portion may be a transparent window, a portion of a latching mechanism or a wafer contact portion. Preferred embodiments of the invention include wafer carriers with said features, process carriers with said features and a process for manufacturing wafer carriers with said features. | 03-15-2012 |
| 20110277789 | METHODS AND MATERIALS FOR MAKING A MONOLITHIC POROUS PAD CAST ONTO A ROTATABLE BASE - The present invention includes methods and materials for making a brush or pad for removing materials, particles, or chemicals from a substrate. The brush or pad includes a rotatable base for supporting a porous pad material. The base include an inner surface and an outer surface and a plurality of channels in the base for interlocking the porous pad material with the base. A porous pad material covers at least a portion of the outer surface of the base and is used for removing material from various substrates. The porous pad material fills one or more of the channels in the base and interlocks the porous pad material with the base. Preferably the channels fluidly connect said inner surface with the outer surface of the base and aid in the alignment of porous pad nodes and the distribution of fluid within the porous pad. | 11-17-2011 |
| 20110252973 | FILTER APPARATUS CAPABLE OF RELEASING AIR - A filter apparatus capable of releasing air from a filter body, comprising a filter body held by a holder. The filter body includes a fluid inlet and a fluid outlet. The filter body is disposed in the holder so as to rotate around an axis of rotation that passes through the fluid inlet. The holder includes a front panel. The front panel comprises engaging portions, for temporarily engaging the fluid outlet at either an air releasing position or at a filtering position, and a fixing means for fixing the filter body at each position. The filter apparatus further includes means for rotating the filter body. | 10-20-2011 |
| 20110211976 | METHOD AND SYSTEM FOR OPTIMIZING OPERATION OF A PUMP - The disclosure describes systems and methods relating generally to filtration. Even more particularly, embodiments described herein relate to optimizing operating routines of a pump based on filter information and process fluid information. The filter information can be stored on an electronically readable tag on the filter. | 09-01-2011 |
| 20110211975 | METHOD AND SYSTEM FOR CONTROLLING OPERATION OF A PUMP BASED ON FILTER INFORMATION IN A FILTER INFORMATION TAG - The disclosure describes systems and methods relating generally to filtration. Even more particularly, this disclosure relates to controlling the operation of a pump using filter information. A removable filter can include an electronically readable tag storing filter information. The filter information can be read by a tag reader and rules applied to the filter information to determine whether or how to operate a pump. | 09-01-2011 |
| 20110163540 | O-RINGLESS SEAL COUPLINGS - An operative fluid device ( | 07-07-2011 |
| 20110151755 | CMP RETAINING RING - An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or backbone portion is preferably overmolded onto the other. The base portion can be generally defined by a flat pad-contacting surface, an outer surface, and an inner surface. The base portion can additionally include channels extending from the outer surface to the inner surface to facilitate transfer of slurry to and from the substrate to be polished during the process. One or both of the base portion or backbone portion further includes a plurality of circular ribs that serve to create additional bonding surface with the overmolded material. The retaining ring may additionally includes a plurality of bosses with threaded insert holes by which the retaining ring is attached to a chemical mechanical polishing system. | 06-23-2011 |
| 20110131800 | FRONT OPENING WAFER CONTANER WITH PATH TO GROUND EFFECTUATED BY DOOR - A front opening wafer carrier formed principally of plastic and comprising an enclosure portion and door has a path to ground with respect to the wafers, the path to ground effectuated by the door. The base “ground” may be provided at the machine interface upon which the carrier sits, or through the robotic arm that grasps, operates and moves the door. | 06-09-2011 |
| 20110114534 | WAFER CONTAINER WITH TUBULAR ENVIRONMENTAL CONTROL COMPONENTS - A wafer container utilizes a rigid polymer tubular tower with slots and a “getter” therein for absorbing and filtering moisture and vapors within the wafer container. The tower preferably utilizes a purge grommet at the base of the container and may have a check valve therein to control the flow direction of gas (including air) into and out of the container and with respect to the tower. The tower is sealingly connected with the grommet. The tower may have a getter media piece rolled in an elongate circular fashion forming or shaped as a tube and disposed within the tower and may have axially extending. The media can provide active and/or passive filtration as well as having capabilities to be recharged. Front opening wafer containers for 300 mm sized wafers generally have a pair of recesses on each of the left and right side in the inside rear of the container portions. These recesses are preferably utilized for elongate towers, such towers extending substantially from a bottom wafer position to a top wafer position. In alternative embodiment, a tubular shape of getter material is exposed within the front opening container without containment of the getter other than at the ends. The tubular getter form is preferably supported at discrete locations to maximize exposure to the internal container environment. A blocker member can selectively close the apertures. An elastomeric cap can facilitate securement of the tubular component in the container portion. | 05-19-2011 |
| 20110114129 | METHODS AND APPARATUSES FOR CONTROLLING CONTAMINATION OF SUBSTRATES - Components, systems, and methods for maintaining an extremely dry environment within substrate containers formed of polymers provides supplemental exterior gas washing of the substrate container to minimize permeation of moisture and oxygen through the polymer walls of the container and to control desorption of water entrapped in the polymer walls of the container. | 05-19-2011 |
| 20110005967 | METHODS AND APPARATUSES FOR LARGE DIAMETER WAFER HANDLING - A front opening semiconductor wafer container for large diameter wafers includes a container portion and a door. The container portion includes a left closed side, a right closed side, a closed back, an open front, and an open interior including a plurality of slots for receiving and containing the wafers. The door is attachable to the container portion to close the open front and selectively latchable to the container portion. The container portion includes a means for accommodating large diameter wafers, particularly 450 mm wafers. Optimized sag control is provided as well as enhanced structural rigidity, and wafer seating features. | 01-13-2011 |
| 20100308579 | INTEGRAL FACE SEAL - A fluid seal generally comprising a first fitting portion ( | 12-09-2010 |
| 20100307957 | REUSABLE RESILIENT CUSHION FOR WAFER CONTAINER - A container for holding a plurality of substrates includes an enclosure portion defining an interior space. The enclosure has a plurality of slots for receiving the substrates, and a door ( | 12-09-2010 |
| 20100294397 | SYSTEM FOR PURGING RETICLE STORAGE - The present invention provides a method, system, and components for protecting reticles and specifically for minimizing haze formation on reticles during storage and use. By substantially continually maintaining a purge in a storage housing having a reduced humidity level on reticles or by temporarily storing the reticle in a container in proximity to a desiccant or getter when not being purged, haze formation can be eliminated, minimized, or sufficiently controlled. Moreover, a filter media in the container may be positioned to be “recharged” during the substantially continual purging of the reticle, a reduced desirable humidity level can be readily maintained in the reticle container when the container is not currently being purged. Additionally, the system of the invention can comprise an ionizer associated with the purge system. For example, the ionizer can be associated with at least one of the plurality of purge lines of the purge system. The system of the invention can also include a purge gas source connected to the purge system that comprises a source of CDA or extra CDA. The storage housing can comprise a plurality of shelves that each include a plurality of reticle storage receptacles. | 11-25-2010 |
| 20100276033 | IDENTIFICATION TAG FOR FLUID CONTAINMENT DRUM - A fluid containment and dispensing system having a RHD tag associated therewith. The fluid containment and dispensing system includes a fluid containment drum having an opening defined thereon. The fluid containment and dispensing system further includes a dispensing mechanism operably coupleable with the opening, the dispensing mechanism configured to dispense the contents of the fluid containment drum. An identification tag is coupleable with the dispensing mechanism and includes a first laminate, a second laminate laminated to the first laminate, and a RFID member disposed between the first and second laminates, wherein the RFID member includes information associated with a fluid containment and dispensing system. | 11-04-2010 |
| 20100236970 | COMPOSITE SUBSTRATE CARRIER - A composite wafer carrier according to an embodiment of the present invention comprises an operative portion formed of a first thermoplastic material and a support portion formed of a second different thermoplastic material. One of the operative portion and support portion is overmolded onto the other to form a gapless hermitic interface that securely bonds the portions together. The operative portion may be a transparent window, a portion of a latching mechanism or a wafer contact portion. Preferred embodiments of the invention include wafer carriers with said features, process carriers with said features and a process for manufacturing wafer carriers with said features. | 09-23-2010 |
| 20100041323 | CMP RETAINING RING - An improved chemical mechanical polishing retaining ring. A representative embodiment comprises a base portion made from a wear-resistant plastic material, and an upper portion, or backbone portion, made from a stiffer and more wear resistant material. One of the base or backbone portion is preferably overmolded onto the other. The base portion can be generally defined by a flat pad-contacting surface, an outer surface, and an inner surface. The base portion can additionally include channels extending from the outer surface to the inner surface to facilitate transfer of slurry to and from the substrate to be polished during the process. One or both of the base portion or backbone portion further includes a plurality of circular ribs that serve to create additional bonding surface with the overmolded material. The retaining ring may additionally includes a plurality of bosses with threaded insert holes by which the retaining ring is attached to a chemical mechanical polishing system. | 02-18-2010 |
| 20100000932 | FILTER APPARATUS CAPABLE OF RELEASING AIR - [Problems] To provide a filter apparatus improved in operability and maintainability during an air releasing operation for a filter apparatus by promoting a reduction in the size of a filter apparatus capable releasing air for a chemical solution. | 01-07-2010 |
| 20090320681 | Filtering system for a semiconductor processing tool - The present invention provides a filtering system for a semiconductor processing tool. In one embodiment, the filtering system is associated with the semiconductor processing tool. A system of the invention comprises a first and second filter layer in fluid communication with a gas flow path. The flow path is a gas stream comprising volatile silica containing compounds such as hexamethyldisiloxane and trimethylsilanol. The gas flow path passes through the first and second filter layer to fluidly communicate with the semiconductor processing tool. Preferably, the first filter layer of the filtering system is upstream along the gas flow path from the second filter layer. The medias of the first and second filter layers are selected and arranged based on given contaminant concentrations. The invention also provides a method for filtering gas containing hexamethyldisiloxane and trimethylsilanol in communication with a semiconductor processing tool, which employs a system comprising a first and second filter layer. | 12-31-2009 |
| 20090301917 | RETICLE POD - A container that provides support structure and environmental control means including, for example, minimal contact with a wafer or reticle contained therein that cooperates with wafer or reticle to provide a diffusion barrier mitigates against particles settling on a face of the wafer or reticle. The container includes a base having a flat, polished surface with protrusions upon which the wafer or reticle rests. The protrusions are of a geometry, such as a sphere, that imparts minimum contact with the wafer or reticle and suspends the wafer or reticle over the base, providing a gap therebetween. The gap isolates the wafer or reticle from the flat, polished surface of the base, but is dimensioned to inhibit migration of particles into the gap, thereby preventing contamination of sensitive surfaces of the wafer or reticle. Diffusion filters provide pressure equalization without filter media. Moveable reticle pins on the top cover provide reticle restraint. Dual containment pod embodiment provides further isolation and protection. | 12-10-2009 |
| 20090284894 | Electrostatic chuck - In accordance with an embodiment of the invention, there is provided an electrostatic chuck comprising an electrode, and a surface layer activated by a voltage in the electrode to form an electric charge to electrostatically clamp a substrate to the electrostatic chuck. The surface layer includes a plurality of protrusions extending to a height above portions of the surface layer surrounding the protrusions to support the substrate upon the protrusions during electrostatic clamping of the substrate. The protrusions are substantially equally spaced across the surface layer as measured by a center to center distance between pairs of neighboring protrusions. | 11-19-2009 |
| 20090282979 | LOW-PROFILE SURFACE MOUNT FILTER - Embodiments of the present invention provide low-profile surface mount filters. One embodiment of the present invention includes a filter housing adapted to mount on a substrate block having a plurality of flow paths and a filter cavity defined therein. The filter cavity is defined to extend in a generally horizontal direction when the low-profile filter is in use. A first flow passage is defined to connect an inlet of the filter housing to a first section of the filter cavity and a second flow passage is defined to connect a second section of the filter cavity to an outlet of the filter housing. A filter assembly is disposed in the filter cavity and sealed to the surface of the filter cavity separating the filter cavity into adjacent sections including the first section of the filter cavity and second section of the filter cavity. | 11-19-2009 |
| 20090255596 | VALVE MANIFOLD ASSEMBLY - A valve manifold assembly including a manifold body defining a primary flow passage and a secondary flow passage fluidly coupled therewith through an aperture in the wall of the primary flow passage. A valve including a head portion and a stem extending therefrom is disposed through the aperture. The head portion has a valve sealing surface adjacent and extending around the stem, and a valve seat having a seat sealing surface facing into the primary flow passage extends around the aperture. The valve is selectively shiftable between a closed position wherein the valve sealing surface is sealingly engaged with the seat sealing surface to block fluid flow between the secondary flow passage and the primary flow passage, and an open position wherein the valve sealing surface is spaced apart from the seat sealing surface to enable fluid flow between the secondary flow passage and the primary flow passage. | 10-15-2009 |
| 20090242818 | WELDED DIAPHRAGM VALVE - A diaphragm valve including a valve body, a diaphragm assembly and an actuator assembly having a housing body that isolates the actuator from the ambient atmosphere. The diaphragm assembly is welded to the valve body to reduce and/or eliminate fluid leakage around the diaphragm assembly. Additionally or alternatively, the housing body for the actuator assembly may be welded to the valve body to reduce fluid leakage. The welding may be performed using ultrasonic welding techniques. | 10-01-2009 |
| 20090218254 | SHOCK ABSORBING SUBSTRATE CONTAINER - A substrate container is generally comprised of a cover, a base, a latching mechanism, and a substrate retention system. Substrate container has corners with flanges disposed at the corners. Each flange has a hole there through to enhance shock absorption capability by the container, and thus provide greater protection to the substrate. | 09-03-2009 |
| 20090217981 | FLUID HANDLING DEVICE WITH DIRECTIONALLY-BIASED WETTING SURFACE - A fluid handling device with an anisotropic wetting surface including a substrate with a multiplicity of asymmetric substantially uniformly shaped asperities thereon. Each asperity has a first asperity rise angle and a second asperity rise angle relative to the substrate. The asperities are structured to present a desired retentive force ratio (f | 09-03-2009 |
| 20090194475 | System and Method for Liquid Filtration with Reduced Hold-Up Volume - In one embodiment according to the invention, there is provided a filter device for liquid filtration, the filter device being in fluid communication with a plurality of liquid pathways, at least one pathway of the plurality of liquid pathways having a smallest equivalent fluid flow diameter of the plurality of liquid pathways. The device comprises a filter membrane ( | 08-06-2009 |
| 20090194456 | WAFER CASSETTE - A front opening wafer container including an enclosure portion and a door. A wafer support system is provided including a pair of spaced apart cantilever wafer shelves, each wafer shelf including a pair of opposing inclined ramp portions. The ramp portions are cooperatively positioned and configured so that when the wafer is received on the shelves, the wafer is supported on the ramps at a lower peripheral corner of the wafer, all other portions of the wafer being free from contact with the wafer support system. Each wafer shelf may have a generally concave upper surface and the incline of the ramps is continuous with the concave upper surfaces of the wafer shelves. | 08-06-2009 |
| 20090183630 | APPARATUS AND METHOD FOR REDUCING PARTICLE CONTAMINATION IN A VACUUM CHAMBER - An apparatus and method for maintaining low gas velocity variation across a diffuser membrane during the vent-up of a vacuum chamber is disclosed. The diffuser membrane permeability and the pressure conditions across the membrane are chosen to minimize variation in gas flow velocity through the membrane during the vent-up cycle. This reduces re-distribution of particles from a vacuum chamber onto sensitive substrates in the vacuum chamber during vent-up from sub-atmospheric pressure to atmospheric pressure. | 07-23-2009 |
| 20090132094 | System and Method for a Variable Home Position Dispense System - Embodiments of the present, invention provide a system and method for reducing the hold-up volume of a pump. More particularly, embodiments of the present invention provide a system and method for determining a home position to reduce hold-up volume at a dispense pump and/or a feed pump. The home position for the diaphragm can be selected such that the volume of the chamber at the dispense pump and/or feed pump contains sufficient fluid to perform the various steps of a dispense cycle while minimizing the hold-up volume. Additionally, the home position of the diaphragm can be selected to optimize the effective range of positive displacement. | 05-21-2009 |
| 20090127483 | FLUID HANDLING DEVICE WITH ISOLATING CHAMBER - A fluid handling device includes a body portion defining a flow passage and an impulse chamber extending from the flow passage. The impulse chamber is fluidly coupled with the flow passage and has a pair of opposing ends defining a length dimension therebetween. The impulse chamber further presents a diameter dimension transverse to the length dimension, wherein the length dimension is at least 3 times and not greater than 10 times the diameter dimension. The device further includes at least one sensor operably coupled with the body portion. The sensor is disposed proximate the end of the impulse chamber opposite the flow passage and presents a sensing face facing into the impulse chamber. | 05-21-2009 |
| 20090116334 | METHOD FOR CONTROLLED MIXING OF FLUIDS VIA TEMPERATURE - Embodiments of the present invention provide a method for continuous flow production of mixed fluids. The mixed fluids can comprise a mixture of different fluids or a mixture of the same fluid having different input properties such as temperature. In general, two streams of fluid of varying temperature are supplied to a mixer. The flow rate of each of the input fluids can be regulated to produce a mixed fluid at a desired flow rate and temperature. As an example, mass flow controllers can regulate the flow rates of a hot and cold stream of de-ionized water to produce a stream of de-ionized water at a desired flow rate and temperature. | 05-07-2009 |
| 20090113985 | FLUID FLOW MEASURING AND PROPORTIONAL FLUID FLOW CONTROL DEVICE - Embodiments disclosed herein provide restrictive-flow flow measurement devices, valve improvements and signal control devices and processes that control the flow of liquids, including control processes for single-liquid calibration. In some embodiments, a fluid flow device can be calibrated using a single standard calibration fluid. The fluid flow of a first fluid through a flow meter is measured by calculating a first pressure difference between pressures sensed by two pressure sensors of the flow meter. The fluid flow of a second fluid through the flow meter is measured by calculating a second pressure difference between pressures sensed by the same two pressure sensors. A calibration coefficient is determined based upon the relationship between the flow rate, the fluid density and the calculated pressure difference for the first and second fluids. A relationship between the calibration coefficient and the kinematic viscosity of each fluid is then determined and stored. | 05-07-2009 |
| 20090057347 | METHOD AND APPARATUS FOR DISPENSING FLUIDS - A bag-in-bag-in-bottle assembly formed by a flexible dispensing container with a dispensing fitment. The dispensing container is positioned adjacent or sandwiched between one or more flexible pressurization containers having a separate inlet/outlet path through a second fitment. The bag-in-bag assembly can then be placed in a containment vessel with the fitments mounted such that it is accessible on the vessel. A liquid can be extracted from the dispensing container by introducing a fluid into the pressurization container(s) with enough pressure to force the liquid out through the dispensing fitment. A contoured dispensing head may be coupled to the bag-in-bag-in-bottle assembly using a earn actuation arrangement for simultaneously locking the pressurization, vent and fluid extraction couplings. | 03-05-2009 |
| 20090047143 | Method and system for high viscosity pump - Embodiments described herein provide systems and methods for high viscosity pumps including a noncompliant filter. One embodiment can include a multi-stage pump comprising an pump inlet flow path, a pump outlet flow path, a feed stage in fluid communication with the pump inlet flow path, a dispense stage in fluid communication with the feed stage and the pump outlet flow path, a noncompliant disposable filter for high viscosity fluid in a flow path between the feed stage and the dispense stage and a set of valves to selectively allow fluid flow through the multi-stage pump. | 02-19-2009 |
| 20090044830 | Molded Rotatable Base for a Porous Pad - A rotatable base ( | 02-19-2009 |
| 20090039019 | POROUS MEMBRANES CONTAINING EXCHANGE RESINS - Articles that include two or more exchange resins in one or more microporous membranes, where the membranes remove oppositely charged impurities from a fluid in contact with the membranes, are disclosed. Methods for using such devices to remove charged impurities from fluid in contact with the membrane are provided. | 02-12-2009 |
| 20080302712 | Liquid filtration device - The present invention provides a liquid filtration device with internal flow paths that facilitate the purging of air bubbles from the device. The device includes internal channels that collect bubbles from fluid entering the filtration device and more efficiently direct fluid to sweep bubbles from the device during operation. The present invention also provides for an automatic means to minimize fluid loss during a vent process. | 12-11-2008 |
| 20080275853 | NETWORK INTERFACE DEVICE - A network interface device in a manufacturing system may receive communications from remote users in a database query language. The network interface device may translate or forward commands and queries in a pump-supported language. The network interface device may communicate the commands and queries to pumps and other components on the manufacturing process using the pump-supported language. The results of the command or query may be returned to the network interface device, which may send the information to a database. A GUI allows the remote user to check states of pumps or other functions. | 11-06-2008 |
| 20080257159 | Air handling and chemical filtration system and method - The present invention relates to systems and methods for controlling humidity and temperature in gases or air streams used in semiconductor processing systems. These systems and methods can be used in combination with systems and methods for contaminant detection and removal. | 10-23-2008 |
| 20080225925 | System and Method for Non-Intrusive Thermal Monitor - Embodiments disclosed herein provide a non-intrusive thermal (NIT) monitor for sensing temperatures useful for semiconductor manufacturing applications. In some embodiments, a NIT monitor comprises a thermopile, a fluid housing with a fluid window, and an elongated member positioned between the thermopile and the fluid window for transmitting or reflecting infrared signals corresponding to a temperature of a fluid in the fluid housing. The fluid housing may have a cross-sectional profile to enable the manipulation of the fluid flow under the fluid window, enhancing the speed and accuracy of the temperature sampling. The elongated member, which may be hollow and coated with gold, may an extended piece of the fluid housing or a part of an optics housing. In some embodiments, the NIT monitor is connected to a main conditioning circuit board via a cable for processing the temperature measurements at a remote location. | 09-18-2008 |
| 20080204680 | PURGE SYSTEM FOR A SUBSTRATE CONTAINER - A purging station with a substrate container receiving zone having at least one upwardly extending purging nozzle. The nozzle has a circular engaging lip. The substrate container has support means for at least one substrate and a purge port assembly that includes an externally facing sealing flange facing downward from the container. The sealing flange has a central aperture and a cantilevered flange portion that engages with the circular engaging lip of the nozzle. The weight of the substrate container on the nozzle carried by the canilevered portion of the flange causes bending of the flange for a resilient soft seal. | 08-28-2008 |
