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ENSINGER KUNSTSTOFFTECHNOLOGIE GBR
| ENSINGER KUNSTSTOFFTECHNOLOGIE GBR Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20090277583 | RETAINING RING FOR HOLDING SEMICONDUCTOR WAFERS IN A CHEMICAL MECHANICAL POLISHING APPARATUS - A retaining ring to be fitted on a chemical mechanical polishing apparatus for semiconductor wafers is disclosed, the retaining ring comprising a carrier ring made of a first material and having fitting elements for fitting the carrier ring on the polishing apparatus; and a bearing ring comprising a plastic material, arranged concentrically on the carrier ring, the bearing ring resting with a first front side on a polishing surface of the polishing apparatus and being held on its side axially opposed to the first front side releasably, non-rotatably, with a positive and/or frictional connection and without adhesive on the carrier ring; wherein the first material has a higher rigidity than the plastic material of the bearing ring. | 11-12-2009 |
| 20090019815 | Spacer Profile for Insulated Glazing Unit - In order to provide a spacer profile for an insulated glazing unit, which profile has a cross-section based on a rectangular shape, is provided with two parallel spaced side walls which, when said insulated glazing unit is assembled, will be placed against the panes of glass to be kept apart from each other, and is further provided with first and second transverse walls which extend between said side walls and of which the first will be adjacent to the edge of the glazing unit and the second will face the space between the panes, with the intention of enabling simple handling of said profile when assembling the spacer frame whilst maintaining a high absorptive capacity for water vapor, it is proposed that said spacer profile comprises a binder matrix and, embedded therein, a particulate adsorbent material for water vapor, and that the binder matrix is permeable to water vapor. | 01-22-2009 |