| eMemory Technology Inc. Patent applications |
| Patent application number | Title | Published |
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| 20120124272 | FLASH MEMORY APPARATUS - A flash memory apparatus including a command analysis unit, a first flash memory and a second flash memory is provided. The command analysis unit with a plurality of command buffers receives a plurality of command elements and queues the command elements in the command buffers in sequence. The command analysis unit transmits the command elements simultaneously to the first flash memory and the second flash memory through a command bus, and the flash memory device writes/reads the first flash memory and the second flash memory simultaneously through a first data bus and a second data bus different from the first data bus respectively to execute an operation. The flash memory device queues the command elements so as to enhance the command throughput, and the flash memories share the same command bus for dual channel operation. | 05-17-2012 |
| 20120099361 | SEMICONDUCTOR CAPACITOR, ONE TIME PROGRAMMABLE MEMORY CELL AND FABRICATING METHOD AND OPERATING METHOD THEREOF - A one time programmable memory cell having a gate, a gate dielectric layer, a source region, a drain region, a capacitor dielectric layer and a conductive plug is provided herein. The gate dielectric layer is disposed on a substrate. The gate is disposed on the gate dielectric layer. The source region and the drain region are disposed in the substrate at the sides of the gate, respectively. The capacitor dielectric layer is disposed on the source region. The capacitor dielectric layer is a resistive protection oxide layer or a self-aligned silicide block layer. The conductive plug is disposed on the capacitor dielectric layer. The conductive plug is served as a first electrode of a capacitor and the source region is served as a second electrode of the capacitor. The one time programmable memory (OTP) cell is programmed by making the capacitor dielectric layer breakdown. | 04-26-2012 |
| 20110299336 | SINGLE-POLYSILICON LAYER NON-VOLATILE MEMORY AND OPERATING METHOD THEREOF - A single-polysilicon layer non-volatile memory having a floating gate transistor, a program gate and a control gate is provided. The floating gate transistor has a floating gate and a tunneling dielectric layer. The floating gate is disposed on a substrate. The tunneling dielectric layer is disposed between the floating gate and the substrate. The program gate, the control gate and the erase gate are respectively disposed in the substrate under the floating gate separated by the tunneling dielectric layer. Therefore, during a program operation and an erase operation, charges are injected in and expelled out through different regions of the tunneling dielectric layer, so as to increase reliability of the non-volatile memory. | 12-08-2011 |
| 20110298556 | VOLTAGE SOURCE CIRCUIT FOR CRYSTAL OSCILLATION CIRCUIT - A voltage source circuit for a crystal oscillation circuit is provided, in which the voltage source circuit and the crystal oscillation circuit are formed with the same process. The voltage source circuit includes a current source, a first PMOS, a first NMOS and a regulator unit. The current source is coupled between a voltage source and an output terminal, in which the output terminal outputs a reference voltage. Both of the gates and drains of the first PMOS and the NMOS are coupled to each other, and the first PMOS and the first NMOS are coupled between the output terminal and a ground. The regulator unit generates a work voltage to the crystal oscillation circuit as a voltage source of the crystal oscillation circuit according to the reference voltage. | 12-08-2011 |
| 20110242893 | NON-VOLATILE MEMORY UNIT CELL WITH IMPROVED SENSING MARGIN AND RELIABILITY - A non-volatile memory unit cell includes a first transistor pair and first and second control gates. The first transistor pair includes first and second transistors that are connected in series and of the same type. The first and second transistors have a first floating polysilicon gate and a second floating polysilicon gate, respectively. The first control gate is coupled to the first floating polysilicon gate through a tunneling junction and the second control gate is coupled to the second floating polysilicon gate through another tunneling junction. | 10-06-2011 |
| 20110194355 | VERIFY WHILE WRITE SCHEME FOR NON-VOLATILE MEMORY CELL - A verify while write (VWW) scheme for a non-volatile memory (NVM) cell is provided. The VWW scheme conducts simultaneous write and verify operation by sensing the memory cell current during the write pulse at exactly the same write bias condition in contrast to the “verify+retry-write” write algorithm in the prior art. The VWW scheme removes the iterative “verify and then retry-write” to save both control timing and power consumed in these iterations. Instead, the VWW scheme is composed of single write pulse only in the entire algorithm with exact write pulse width trimmed automatically for multiple memory cells undergoing parallel writing within one write command assertion. Faster write speed, more power efficient write operation and higher reliability of non-volatile semiconductor memory cell are thus achieved with the VWW scheme in this present disclosure. | 08-11-2011 |
| 20110057243 | NON-VOLATILE MEMORY WITH A STABLE THRESHOLD VOLTAGE ON SOI SUBSTRATE - A non-volatile memory disposed in a SOI substrate is provided. The non-volatile memory includes a memory cell and a first conductive type doped region. The memory cell includes a gate, a charge storage structure, a bottom dielectric layer, a second conductive type drain region, and a second conductive type source region. The gate is disposed on the SOI substrate. The charge storage structure is disposed between the gate and the SOI substrate. The bottom dielectric layer is disposed between the charge storage layer and the SOI substrate. The second conductive type drain region and the second conductive type source region are disposed in a first conductive type silicon body layer next to the two sides of the gate. The first conductive type doped region is disposed in the first conductive type silicon body layer and electrically connected to the first conductive type silicon body layer beneath the gate. | 03-10-2011 |
| 20100265755 | ONE TIME PROGRAMMABLE READ ONLY MEMORY AND PROGRAMMING METHOD THEREOF - A one time programmable read only memory disposed on a substrate of a first conductive type is provided. A gate structure is disposed on the substrate. A first doped region and a second doped region are disposed in the substrate at respective sides of the gate structure, and the first doped region and the second doped region are of a second conductive type which is different from the first conductive type. A third doped region of the first conductive type is disposed in the substrate and is adjacent to the second doped region, and a junction is formed between the third doped region and the second doped region. A metal silicide layer is disposed on the substrate. An clearance is formed in the metal silicide layer, and the clearance at least exposes the junction. | 10-21-2010 |
| 20100148238 | NON-VOLATILE MEMORY AND FABRICATING METHOD THEREOF - A non-volatile memory is formed on a substrate. The non-volatile memory includes an isolation structure, a floating gate, and a gate dielectric layer. The isolation structure is disposed in the substrate to define an active area. The floating gate is disposed on the substrate and crosses over the active area. The gate dielectric layer is disposed between the floating gate and the substrate. The floating gate includes a first region and a second region. An energy band of the second region is lower than an energy band of the first region, so that charges stored in the floating gate are away from an overlap region of the floating gate and the gate dielectric layer. | 06-17-2010 |
| 20100073985 | METHOD FOR OPERATING ONE-TIME PROGRAMMABLE READ-ONLY MEMORY - A method for operating a one-time programmable read-only memory (OTP-ROM) is provided. The OTP-ROM comprises a first gate and a second gate respectively disposed on a gate dielectric layer between a first doped region and a second doped region on a substrate, wherein the first gate is adjacent to the first doped region and coupled to the first doped region, the second gate is adjacent to the second doped region, the first gate is electrically coupled grounded, and the OTP-ROM is programmed through a breakdown effect. The method comprises a step of programming the OTP-ROM under the conditions that a voltage of the second doped region is higher than a voltage of the first doped region, the voltage of the second gate is higher than a threshold voltage to pass the voltage of the second doped region, and the first doped region and the substrate are at a reference voltage. | 03-25-2010 |
| 20100014359 | OPERATING METHOD OF NON-VOLATILE MEMORY - An operating method of a non-volatile memory adapted for a non-volatile memory disposed on an SOI substrate including a first conductive type silicon body layer is provided. The non-volatile memory includes a gate, a charge storage structure, a second conductive type drain region, and a second conductive type source region. In operating such a non-volatile memory, voltages are applied to the gate, the second conductive type drain region, the second conductive type source region and the first conductive type silicon body layer beneath the gate, to inject electrons or holes in to the charge storage structure or evacuate the electrons from the charge storage structure by a method selected from a group consisting of channel hot carrier injection, source side injection, band-to-band tunnelling hot carrier injection and Fowler-Nordheim (F-N) tunnelling. | 01-21-2010 |
| 20100006924 | ONE-TIME PROGRAMMABLE READ-ONLY MEMORY - A one-time programmable read-only memory (OTP-ROM) including a substrate, a first doped region, a second doped region, a third doped region, a first dielectric layer, a select gate, a second dielectric layer, a first channel, a second channel and a silicide layer is provided. The first doped region, the second doped region and the third doped region are disposed apart in a substrate. The first dielectric layer is disposed on the substrate between the first doped region and the second doped region. The select gate is disposed on the first dielectric layer. The second dielectric layer is disposed on the substrate between the second doped region and the third doped region. The silicide layer is disposed on the first doped region, the second doped region and the third doped region. The OTP-ROM stores data by a punch-through effect occurring between the second doped region and the third doped region. | 01-14-2010 |
| 20090244985 | METHOD FOR ERASING A P-CHANNEL NON-VOLATILE MEMORY - A present invention relates to a method of erasing a P-channel non-volatile memory is provided. This P-channel non-volatile memory includes a select transistor and a memory cell connected in series and disposed on a substrate. In the method of erasing the P-channel non-volatile memory, holes are injected into a charge storage structure by substrate hole injection effect. Hence, the applied operational voltage is low, so the power consumption is lowered, and the efficiency of erasing is enhanced. As a result, an operational speed of the memory is accelerated, and the reliability of the memory is improved. | 10-01-2009 |
| 20090168280 | ELECTROSTATIC DISCHARGE AVOIDING CIRCUIT - An ESD avoiding circuit includes a first ESD protection unit, an ESD detection unit, a switch unit, and an RC filter unit. The first ESD protection unit transmits an ESD current between a first conducting path and a second conducting path. The ESD detection unit is coupled to the first conducting path. The ESD detection unit includes an input terminal, and an output terminal coupled to the first ESD protection unit for detecting an ESD and controlling the first ESD protection unit to conduct the ESD current according to a detection result. The switch unit is coupled between the first conducting path and a core circuit and conducts the first conducting path to the core circuit according to signals of the input terminal and the output terminal of the ESD detection unit. The RC filter unit couples a first voltage to the input terminal of the ESD detection unit. | 07-02-2009 |
| 20090136038 | APPARATUS FOR RECEIVING ENCRYPTED DIGITAL DATA AND CRYPTOGRAPHIC KEY STORAGE UNIT THEREOF - An apparatus for receiving encrypted digital data is provided. The apparatus includes a decryption circuit, a controller, an NVM, and a one-way device. The decryption circuit receives a piece of encrypted digital data and decrypts the encrypted digital data into a piece of decrypted digital data. The controller is coupled to the decryption circuit for controlling the flow of the decryption performed by the decryption circuit. The NVM is coupled to the decryption circuit for storing and providing a cryptographic key required in the decryption. The one-way device is coupled between an input bus and the NVM. The one-way device blocks read requests received from the input bus. Besides, the one-way device translates write requests received from the input bus into access signals compatible with the NVM and then outputs the access signals to the NVM. | 05-28-2009 |
| 20080316660 | ELECTROSTATIC DISCHARGE AVOIDING CIRCUIT - An electrostatic discharge (ESD) avoiding circuit comprises an ESD detecting unit and a switch unit. The ESD detecting unit is coupled to a first conductive path for detecting whether the ESD happened or not. The switch unit is coupled between the first conductive path and a core circuit for switching whether the first conductive path is conducted to the core circuit or not according to a detection result of the ESD detecting unit. The ESD avoiding circuit can avoid an electrostatic current transmitting to the core circuit when the ESD is happened, and the ESD avoiding circuit can make the normal signal/voltage providing to the core circuit for operating when the ESD isn't happened. | 12-25-2008 |
| 20080310235 | SENSING CIRCUIT FOR MEMORIES - A memory apparatus includes a plurality of memory units, a sensing circuit and a bias-generating circuit. The plurality of memory units respectively outputs a data current to the sensing circuit, while the sensing circuit further includes a plurality of first transistors, a plurality of second transistors and a plurality of sensing amplifiers. In order to speed up the access time of the memory units, the bias-generating circuit rapidly provides a bias signal to the sensing circuit to turn on the first transistors of the sensing circuit. In the present invention, the sensing circuit uses a common reference voltage to reduce the circuit utilization area of the memory apparatus. | 12-18-2008 |
| 20080309399 | Two-phase charge pump circuit without body effect - A two-phase charge pump circuit without the body effect includes a voltage boost stage, an input stage connected to the voltage boost stage, and a high-voltage generator connected to the input stage. Each of the circuits can consist of NMOS or PMOS transistors. The body of each NMOS transistor is connected to an NMOS switch. The body of each PMOS transistor is connected to a PMOS switch. By providing an appropriate driving signal to each NMOS or PMOS switch, the body of each NMOS transistor can be switched to a lower voltage level and the body of each PMOS transistor is switched to a higher voltage level. This can prevent the body effect from occurring. | 12-18-2008 |
| 20080296701 | ONE-TIME PROGRAMMABLE READ-ONLY MEMORY - A one-time programmable read-only memory (OTP-ROM) including a substrate, a first doped region, a second doped region, a gate dielectric layer, a first gate and a second gate. The substrate is of a first conductive type. The first doped region and the second doped region are of a second conductive type and are separately disposed in the substrate. The gate dielectric layer is disposed on the substrate between the first doped region and the second doped region. The first gate and the second gate are disposed on the gate dielectric layer, respectively. The first gate is adjacent to the first doped region, while the second gate is adjacent to the second doped region. Here, the first gate is electrically coupled grounded, and the OTP-ROM is programmed through a breakdown effect. | 12-04-2008 |
| 20080246536 | Two-phase charge pump circuit without body effect - A two-phase charge pump circuit without the body effect includes a voltage boost stage, an input stage connected to the voltage boost stage, and a high-voltage generator connected to the input stage. Each of the circuits can consist of NMOS or PMOS transistors. The body of each NMOS transistor is connected to an NMOS switch. The body of each PMOS transistor is connected to a PMOS switch. By providing an appropriate driving signal to each NMOS or PMOS switch, the body of each NMOS transistor can be switched to a lower voltage level and the body of each PMOS transistor is switched to a higher voltage level. This can prevent the body effect from occurring. | 10-09-2008 |
| 20080205115 | APPARATUS AND METHOD FOR TRIMMING INTEGRATED CIRCUIT - A trimming apparatus including a switch transistor and a one-time programming (OTP) memory component is provided. The switch transistor has a first source/drain terminal connected to a first bias voltage, a gate terminal used for receiving a switch signal, and a second source/drain terminal connected to a first source/drain terminal of the OTP memory component. When the trimming apparatus provided by the present invention intends to perform trimming for an integrated circuit, the switch transistor is conducted to program the OTP memory component. | 08-28-2008 |
