| EBARA CORPORATION Patent applications |
| Patent application number | Title | Published |
|---|
| 20120032079 | INSPECTION SYSTEM BY CHARGED PARTICLE BEAM AND METHOD OF MANUFACTURING DEVICES USING THE SYSTEM - An inspection apparatus by an electron beam comprises: an electron-optical device | 02-09-2012 |
| 20110266468 | EXTREME ULTRAVIOLET LIGHT SOURCE APPARATUS - An extreme ultraviolet light source apparatus comprises a target supply unit supplying a target into a vacuum chamber, a laser oscillator outputting a laser light into the vacuum chamber, a collector mirror outputting an extreme ultraviolet light outside by reflecting the extreme ultraviolet light emitted from the target being ionized as a plasma by irradiation with the laser light at a plasma luminescence point in the vacuum chamber, and an ion debris removal unit at least a part of which is located in an obscuration region including the plasma luminescence point. | 11-03-2011 |
| 20110155905 | SPECIMEN OBSERVATION METHOD AND DEVICE, AND INSPECTION METHOD AND DEVICE USING THE METHOD AND DEVICE - A technique capable of improving the ability to observe a specimen using an electron beam in an energy region which has not been conventionally given attention is provided. This specimen observation method comprises: irradiating the specimen with an electron beam; detecting electrons to be observed which have been generated and have obtained information on the specimen by the electron beam irradiation; and generating an image of the specimen from the detected electrons to be observed. The electron beam irradiation comprises irradiating the specimen with the electron beam with a landing energy set in a transition region between a secondary emission electron region in which secondary emission electrons are detected and a mirror electron region in which mirror electrons are detected, thereby causing the secondary emission electrons and the mirror electrons to be mixed as the electrons to be observed. The detection of the electrons to be observed comprises performing the detection in a state where the secondary emission electrons and the mirror electrons are mixed. Observation and inspection can be quickly carried out for a fine foreign material and pattern of 100 nm or less. | 06-30-2011 |
| 20110104830 | APPARATUS FOR INSPECTION WITH ELECTRON BEAM, METHOD FOR OPERATING SAME, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING FORMER - A substrate inspection apparatus | 05-05-2011 |
| 20110085918 | WATER-LIFTING PUMP APPARATUS AND METHOD OF CONTROLLING OPERATION THEREOF - A water-lifting pump apparatus which is free of a discharge valve and a check valve, is low in cost, and is capable of reducing vibration and noise due to a waterfall after the end of water pumping operation. The water-lifting pump apparatus has a suction tank ( | 04-14-2011 |
| 20110059183 | WATER-INSOLUBLE MEDICINE - A method of producing water-insoluble anti-cancer drug in the form of particulates, the method including preparing a water-insoluble anti-cancer drug having at least one multiple bond in the structure, and irradiating said water-insoluble anti-cancer drug with a laser beam having a wavelength of a low absorption portion in the vicinity of the foot of an absorption curve on the long wavelength side within the absorption band until said water-insoluble anti-cancer drug is formed into particulates having an average particle diameter of 50 to 200 nm. | 03-10-2011 |
| 20110024623 | DETECTOR AND INSPECTING APPARATUS - An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors | 02-03-2011 |
| 20110012456 | MAGNETIC BEARING DEVICE AND METHOD - An energy-saving magnetic bearing device with no bias current for making the relation between the excitation current and the magnetic force of the electromagnet linear is provided. In a magnetic bearing device for supporting a rotor | 01-20-2011 |
| 20100307619 | WATER SUPPLY APPARATUS - The present invention provides a water supply apparatus capable of performing a backup operation, without lowering water supply capability, when a failure has occurred in one control substrate due to surge or noise caused by lightning or due to lifetimes of various sensors, by switching to the other control substrate, and capable of reliably performing the backup operation by means of devices that prevent failure of the control substrates. The water supply apparatus ( | 12-09-2010 |
| 20100286289 | CHITOSAN-CONTAINING COMPOSITION AND PRODUCTION PROCESS OF SAME - The present invention provides an industrially useful chitosan-containing composition in the form of any of a transparent aqueous solution, gel or dry powder having a neutral to weakly alkaline pH when in the form of an aqueous solution that can be applied to pharmaceutical additives, foods, beverages and cosmetics. A production process of the chitosan-containing composition of the present invention has a step for preparing an acidic chitosan aqueous solution, a step for forming a solid by removing a water-soluble salt from a salt formed by mixing an acidic polymer component into the acidic chitosan aqueous solution, and a step for dissolving the solid in a weakly basic solution. | 11-11-2010 |
| 20100237243 | Testing apparatus using charged particles and device manufacturing method using the testing apparatus - A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source | 09-23-2010 |
| 20100209259 | EVACUATION APPARATUS - The present invention relates to an evacuation apparatus for evacuating a vacuum chamber of a substrate processing apparatus for processing a substrate such as a semiconductor wafer or liquid crystal panel. An evacuation apparatus according to the present invention includes a first vacuum pump connected to a vacuum chamber, and a second vacuum pump connected to the first vacuum pump. The first vacuum pump has a pair of multistage pump rotors. | 08-19-2010 |
| 20100130343 | CERAMICS SLIDING MEMBER FOR USE IN PURE WATER - A ceramics sliding member for use in ultrapure water or pure water of the present invention is made of an SiC sintered body. The SiC sintered body includes β-SiC at a ratio of 20% or more thereto and has an average crystal structure whose aspect ratio is 2 or greater. | 05-27-2010 |
| 20100080686 | MULTISTAGE HIGH-PRESSURE PUMP - A multistage high-pressure pump according to the present invention includes a rotational shaft ( | 04-01-2010 |
| 20100061676 | BEARING SYSTEM OR A SEALING SYSTEM USING A CARBON BASED SLIDING MEMBER - An object of the present invention is to provide a bearing system or a sealing system which has excellent durability when used with the purified water as a lubricating liquid. | 03-11-2010 |
| 20100047096 | TURBO VACUUM PUMP AND SEMICONDUCTOR MANUFACTURING APPARATUS HAVING THE SAME - A turbo vacuum pump is suitable for evacuating a corrosive process gas or evacuating a gas containing reaction products. The turbo vacuum pump includes a casing having an intake port, a pump section comprising rotor blades and stator blades housed in the casing, bearings for supporting the rotor blades, a motor for rotating the rotor blades; and a rotating shaft comprising a first rotating shaft to which the rotor blades are attached, and a second rotating shaft to which a motor rotor of the motor is attached. | 02-25-2010 |
| 20100032566 | SUBSTRATE SURFACE INSPECTION METHOD AND INSPECTION APPARATUS - A substrate surface inspection method inspects for a defect on a substrate including a plurality of materials on a surface thereof. The inspection method comprises: irradiating the surface of the substrate with an electron beam, a landing energy of the electron beam set such that a contrast between at least two types of materials of the plurality of materials is within a predetermined range; detecting electrons generated by the substrate to acquire a surface image of the substrate, with a pattern formed thereon from the at least two types of materials eliminated or weakened; and detecting the defect from the acquired surface image by detecting as the defect an object image having a contrast by which the object image can be distinguished from a background image in the surface image. Defects present on the substrate surface can be detected easily and precisely by using a cell inspection. | 02-11-2010 |
| 20100019149 | MAPPING-PROJECTION-TYPE ELECTRON BEAM APPARATUS FOR INSPECTING SAMPLE BY USING ELECTRONS EMITTED FROM THE SAMPLE - An apparatus capable of detecting defects of a pattern on a sample with high accuracy and reliability and at a high throughput, and a semiconductor manufacturing method using the same are provided. The electron beam apparatus is a mapping-projection-type electron beam apparatus for observing or evaluating a surface of the sample by irradiating the sample with a primary electron beam and forming on a detector an image of reflected electrons emitted from the sample. An electron impact-type detector such as an electron impact-type CCD or an electron impact-type TDI is used as the detector for detecting the reflected electrons. The reflected electrons are selectively detected from an energy difference between the reflected electrons and secondary electrons emitted from the sample. To eliminate charge-up caused on the sample surface by irradiation with the primary electron beam, the surface of the sample is covered with a cover placed above the sample and a gas is supplied to the space above the sample covered with the cover. The gas is brought into contact with the sample surface to reduce charge-up on the sample surface. | 01-28-2010 |
| 20100019147 | METHOD AND APPARATUS FOR CHARGED PARTICLE BEAM INSPECTION - A charged particle beam inspection apparatus comprises: an electron gun for irradiating an electron beam onto a sample; a detector for detecting a signal obtained from the sample; an image processor for forming an image from the signal obtained from the detector, and an energy controller for controlling the beam energy of the electron beam to be irradiated onto the sample. An identical charged particle beam inspection apparatus carries out a plurality of types of inspections. An inspection apparatus of a projection type may be applied thereto. A pattern defect inspection, a foreign material inspection, and an inspection for a defect in a multilayer are carried out. Beam energies E | 01-28-2010 |
| 20100012838 | INSPECTION METHOD AND APPARATUS OF A GLASS SUBSTRATE FOR IMPRINT - A method for inspecting a glass substrate for imprint including a glass substrate with a pattern surface and a transmissive conductive film coating at least part of the pattern surface, includes an electron beam irradiation step of irradiating the pattern surface of the glass substrate for imprint disposed on a stage with an electron beam having a predetermined irradiation area; an electron detection step of simultaneously detecting electrons from the pattern surface by the electron beam irradiation by means of a detection surface with a plurality of pixels; and a defect detection step of obtaining an image of the pattern surface based on the electrons detected by the detection surface and detecting a defect of the pattern surface. | 01-21-2010 |
| 20090324725 | PEG-MODIFIED HYDROXYAPATITE, PHARMACEUTICAL USING THE SAME AS BASE MATERIAL AND PRODUCTION PROCESS THEREOF - The present invention provides a PEG-modified HAP having a high degree of safety and novel functions by modifying the surface of hydroxyapatite particles with a polyethylene glycol derivative, applications thereof, and a production process of the same. The PEG-modified HAP of the present invention is a substance in which hydroxyapatite having a particle diameter of 50 μm to 10 nm is bonded to a polyethylene glycol derivative having a carboxyl group as a terminal functional group through —O(CO) bonds, and the carbon content thereof is 10 to 0.1%. In addition, the present invention is a substance composed of this substance and a pharmaceutical active ingredient or pharmaceutical additive, in which the weight ratio of the pharmaceutical active ingredient is 1 to 30%, and the substance is obtained by treating hydroxyapatite having a particle diameter of 50 μm to 10 nm and an active ester of polyethylene glycol derivative having a carboxyl group as a terminal functional group in an anhydrous organic solvent. | 12-31-2009 |
| 20090294287 | MICROCHIP ELECTROPHORESIS METHOD AND DEVICE - An separation method comprising a temperature control process useful for microchip electrophoresis such as microchip DGGE is provided along with a device therefor. | 12-03-2009 |
| 20090246048 | TURBO VACUUM PUMP - An oil-free turbo vacuum pump is capable of evacuating gas in a chamber from atmospheric pressure to high vacuum. The turbo vacuum pump includes a pumping section having rotor blades and stator blades which are disposed alternately in a casing, and a main shaft for supporting the rotor blades. A gas bearing is used as a bearing for supporting the main shaft in a thrust direction, spiral grooves are formed in both surfaces of a stationary part of the gas bearing, and the stationary part having the spiral grooves is placed between an upper rotating part and a lower rotating part which are fixed to the main shaft. A thrust magnetic bearing for canceling out a thrust force generated by the differential pressure between a discharge side and an intake side by an evacuation action of the pumping suction is provided. | 10-01-2009 |
| 20090246038 | TURBO VACUUM PUMP - An oil-free turbo vacuum pump is capable of evacuating gas in a chamber from atmospheric pressure to high vacuum. The turbo vacuum pump includes a pumping section having rotor blades and stator blades which are disposed alternately in a casing, a main shaft for supporting the rotor blades, and a bearing and motor section having a motor for rotating the main shaft and a bearing mechanism for supporting the main shaft rotatably. A gas bearing is used as a bearing for supporting the main shaft in a thrust direction, spiral grooves are formed in both surfaces of a stationary part of the gas bearing, and the stationary part having the spiral grooves is placed between an upper rotating part and a lower rotating part which are fixed to the main shaft. | 10-01-2009 |
| 20090242471 | POWER RECOVERY CHAMBER - A power recovery chamber is used for a positive-displacement power recovery apparatus in the seawater desalination plant or system. The power recovery chamber includes a cylinder, a piston disposed in the cylinder and capable of being reciprocated in a longitudinal direction of the cylinder, and a piston guide disposed in the cylinder and extending in the longitudinal direction of the cylinder for guiding the piston when the piston is reciprocated in the longitudinal direction of the cylinder. At least a part of an outer circumferential surface of the piston is out of contact with an inner surface of the cylinder, and the piston is brought into contact with the piston guide at a part where the piston guide passes through the piston. | 10-01-2009 |
| 20090239446 | Polishing Apparatus and Polishing Method - A polishing apparatus is provided for polishing wafers at a high yield rate even if roll-off exists. The polishing apparatus polishes a wafer W by applying a pressure between a polishing member (polishing pad) | 09-24-2009 |
| 20090236786 | HAND HAVING ROCKING MECHANISM AND SUBSTRATE DELIVERING DEVICE HAVING THE SAME | 09-24-2009 |
| 20090226608 | APPARATUS AND METHOD FOR COATING PARTICLES - An apparatus for coating particles with a polymer electrolyte, which includes at least one polymer membrane shell-coating part, the particles being coated with a membrane shell in the at least one polymer membrane shell-coating part by performing a step including contacting the particles having a predetermined charge with the polymer electrolyte having a charge opposite to that of the outer surface of the particles, thereby forming a membrane shell on the surface of the outermost layer of the particles. | 09-10-2009 |
| 20090224151 | DETECTOR AND INSPECTING APPARATUS - An inspecting apparatus for reducing a time loss associated with a work for changing a detector is characterized by comprising a plurality of detectors | 09-10-2009 |
| 20090218506 | ELECTRON BEAM APPARATUS - An electron beam emitted from an electron gun (G) forms a reduced image on a sample (S) through a non-dispersion Wien-filter ( | 09-03-2009 |
| 20090212214 | SAMPLE INSPECTION APPARATUS - The invention avoids charge up when creating a focus map for an electron beam apparatus for inspecting a sample. An auto-focus (AF) control apparatus controls to drive an actuator for moving a focus lens of an optical microscope while acquiring a contrast signal from the optical microscope for each of focus measurement points on a surface of a sample under control of a PC device, to automatically focus on the surface of the sample. The control apparatus detects a focus value of the optical microscope corresponding to a position (height) of the sample surface in an optical axis direction. The PC device receives the detected focus value, and converts the focus value into a voltage to be applied to an electrostatic lens of the electron beam device during actual sample inspection, and stores the converted value. | 08-27-2009 |
| 20090212213 | PROJECTION ELECTRON BEAM APPARATUS AND DEFECT INSPECTION SYSTEM USING THE APPARATUS - A sample is evaluated at a high throughput by reducing axial chromatic aberration and increasing the transmittance of secondary electrons. Electron beams emitted from an electron gun | 08-27-2009 |
| 20090196734 | TURBO VACUUM PUMP - A turbo vacuum pump comprising a suction part | 08-06-2009 |
| 20090189469 | MAGNETIC BEARING APPARATUS - A magnetic bearing apparatus supports a rotating object using magnetic levitation by a magnetic force of electromagnets. The magnetic bearing apparatus includes a PWM driver configured to supply exciting currents to the electromagnets, a driver power source configured to drive the PWM driver, and a displacement error signal removing section configured to extract a displacement error signal of the displacement information from a current flowing through the driver power source and to remove the displacement error signal from the displacement information. | 07-30-2009 |
| 20090152595 | SEMICONDUCTOR DEVICES AND METHOD OF TESTING SAME - There are provided a semiconductor device having a pattern which allows electric failures to be sensitively detected at high speeds, and a method of testing the same. In one embodiment, the semiconductor device comprises a pair of row wires including a plurality of first wires arranged in a first layer at predetermined intervals in a row direction, where the first wires have ends connected to second wires arranged in a second layer at a predetermined intervals through vias, and the first wire and second wire are at the same potential. In the pair of row wires, a first wire positioned at a right end of one row wire is connected to a first conductor, and a first wire positioned at a left end in the other row wire is connected to a second conductor. By sequentially scanning the first conductor and second conductor using an electron beam, a change in the amount of emitted secondary electrons due to a difference in potential between these conductors is detected to detect electric anomalies. | 06-18-2009 |
| 20090134036 | Electrolytic Processing Method and Electrolytic Processing Apparatus - An electrolytic processing method makes it possible to preferentially process a diffusion barrier layer while suppressing processing of an interconnect metal, thereby enabling omission of CMP or a lowering of processing pressure in CMP. The electrolytic processing method comprises: bringing a surface of a substrate (W) into contact with an electrolytic solution ( | 05-28-2009 |
| 20090127117 | HIGH PRESSURE-RESISTANT TYPE ELECTRICAL DEIONIZATION APPARATUS, HIGH PRESSURE-RESISTANT TYPE ELECTRICAL DEIONIZATION SYSTEM AND METHOD OF PRODUCING ULTRAPURE WATER USING HIGH PRESSURE-RESISTANT TYPE DEIONIZATION SYSTEM - The present invention provides an electrical deionization apparatus suitable for an ultra pure water production system allowing high pressure raw water from an atomic power plant to be reused as the ultra water. The electric deionization stack | 05-21-2009 |
| 20090111358 | Polishing apparatus and polishing method - The present invention provides a apparatus for polishing an object material such as a film on a substrate. This apparatus includes a polishing table for holding a polishing pad having a polishing surface, a motor configured to drive the polishing table, a holding mechanism configured to hold a substrate having an object material to be polished and to press the substrate against the polishing surface, a dresser configured to dress the polishing surface, and a monitoring unit configured to monitor a removal amount of the object material. The monitoring unit is operable to calculate the removal amount of the object material using a model equation containing a variable representing an integrated value of a torque current of the motor when polishing the object material and a variable representing a cumulative operating time of the dresser. | 04-30-2009 |
| 20090110563 | POWER RECOVERY SYSTEM - A power recovery system is used for reducing the total energy consumption in a process such as an industrial treating process or a fluid refining process including the delivery of a fluid under a high pressure. The power recovery system includes a high-pressure pump for pressuring raw water, a reverse osmosis membrane cartridge for treating high-pressure water discharged from the high-pressure pump with a reverse osmosis membrane to produce treated water, a positive-displacement piston pump for pressuring raw water under the pressure of concentrated water which is discharged from the reverse osmosis membrane cartridge without being treated by the reverse osmosis membrane, and a power recovery pump turbine for boosting the pressurized raw water discharged from the positive-displacement piston pump and adding the boosted water to the high-pressure water discharged from the high-pressure pump. The power recovery pump turbine is actuated by pressurized water generated in the power recovery system. | 04-30-2009 |
| 20090108703 | ROTARY APPARATUS - A rotary apparatus, in which a rotor can rotate stably when it rotates at a high speed, can rotate at a relatively high speed by the torque of a highly reliable induction motor. The rotary apparatus comprises a rotor shaft and an induction motor. The induction motor includes a motor rotor core fixed to the rotor shaft, conductors disposed in the motor rotor core and a motor end ring for assembling and connecting the conductors, and can rotate the rotor shaft at a high speed by the torque. The rotor shaft is provided with a member that covers the motor end ring. | 04-30-2009 |
| 20090101816 | Testing apparatus using charged particles and device manufacturing method using the testing apparatus - A system for further enhancing speed, i.e. improving throughput in a SEM-type inspection apparatus is provided. An inspection apparatus for inspecting a surface of a substrate produces a crossover from electrons emitted from an electron beam source | 04-23-2009 |
| 20090097984 | OPERATION CONTROL DEVICE FOR VACUUM PUMP AND METHOD FOR STOPPING OPERATION THEREOF - To provide an operation control device for a vacuum pump and a method for stopping the operation of the vacuum pump that make it possible to effectively remove products, resulting from solidification and liquefaction of gas in a casing and possibly hindering the rotation of a pump rotor, so that the vacuum pump may be started normally. An operation control device | 04-16-2009 |
| 20090096302 | MAGNETIC BEARING DEVICE AND METHOD - An energy-saving magnetic bearing device with no bias current for making the relation between the excitation current and the magnetic force of the electromagnet linear is provided. In a magnetic bearing device for supporting a rotor | 04-16-2009 |
| 20090093192 | DEVICE FOR AND METHOD OF POLISHING PERIPHERAL EDGE OF SEMICONDUCTOR WAFER - A device for polishing the peripheral edge part of a semiconductor wafer includes a wafer stage for holding the wafer, a wafer stage unit including devices for rotating the wafer stage, causing the wafer stage to undergo a rotary reciprocating motion within the same plane as the surface of the wafer stage, and moving the wafer stage parallel to the surface, a notch polishing part for polishing the notch on the wafer and a bevel polishing part for polishing the beveled part of the wafer. Pure water is supplied to the wafer to prevent it from becoming dry as it is transported from the notch polishing part to the bevel polishing part. | 04-09-2009 |
| 20090092469 | SUBSTRATE PROCESSING UNIT, SUBSTRATE TRANSFER METHOD, SUBSTRATE CLEANSING PROCESS UNIT, AND SUBSTRATE PLATING APPARATUS - To provide a substrate processing unit, a substrate transfer method, a substrate cleansing process unit, and a substrate plating apparatus that make it possible for a substrate carry-in mechanism such as a robot arm to quickly release hold on the substrate after carrying in the substrate so as to shorten the time for holding the substrate and improve throughput. The substrate processing unit | 04-09-2009 |
| 20090090863 | SAMPLE SURFACE OBSERVATION METHOD - A surface of a sample is observed by acquiring an image of the surface of the sample. An electron beam I irradiated onto the surface of the sample in which wiring including an insulation material and an electrically conductive material is formed. Electrons that acquired structure information regarding a structure of the surface of the sample are detected. An image of the surface of the sample is acquired by a result of the detection of electrons. The surface of the sample is observed using the acquired image of the surface of the sample. The electron beam is irradiated onto the surface of the sample in a state where a brightness of the insulation material and a brightness of the electrically conductive material in the image of the surface of the sample are set equal to each other. | 04-09-2009 |
| 20090081810 | SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD - A substrate processing apparatus has a fluid supply means | 03-26-2009 |
| 20090067977 | Seal device and method for operating the same and substrate processing apparatus comprising a vacuum chamber - The present invention provides a seal device comprising a sealing passage which allows communication between a first space and a second space, and evacuation lines individually connected to the first space and the sealing passage. A gas feed line for feeding dry gas is connected to the sealing passage. | 03-12-2009 |
| 20090060408 | DIAMOND-COATED BEARING OR SEAL STRUCTURE AND FLUID MACHINE COMPRISING THE SAME - The present invention is a bearing or seal structure | 03-05-2009 |
| 20090050822 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus - The present invention provides an electron beam apparatus for evaluating a sample surface, which has a primary electro-optical system for irradiating a sample with a primary electron beam, a detecting system, and a secondary electro-optical system for directing secondary electron beams emitted from the sample surface by the irradiation of the primary electron beam to the detecting system. | 02-26-2009 |
| 20090050802 | METHOD AND APPARATUS FOR INSPECTING SAMPLE SURFACE - Provided is a method and an apparatus for inspecting a sample surface with high accuracy. | 02-26-2009 |
| 20090047142 | VACUUM PUMP UNIT - The present invention relates to a dry vacuum pump unit capable of achieving ultimate pressure of about 1 Pa. The vacuum pump unit includes a main pump ( | 02-19-2009 |
| 20090039262 | ELECTRON BEAM APPARATUS AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE USING THE APPARATUS - The present invention provides an electron beam apparatus for irradiating a sample with primary electron beams to detect secondary electron beams generated from a surface of the sample by the irradiation for evaluating the sample surface. In the electron beam apparatus, an electron gun has a cathode for emitting primary electron beams. The cathode includes a plurality of emitters for emitting primary electron beams, arranged apart from one another on a circle centered at an optical axis of a primary electro-optical system. The plurality of emitters are arranged such that when the plurality of emitters are projected onto a straight line parallel with a direction in which the primary electron beams are scanned, resulting points on the straight line are spaced at equal intervals. | 02-12-2009 |
| 20090035151 | VACUUM PUMP SELF-DIAGNOSIS METHOD, VACUUM PUMP SELF-DIAGNOSIS SYSTEM, AND VACUUM PUMP CENTRAL MONITORING SYSTEM - There are provided a vacuum pump self-diagnosis method, a vacuum pump self-diagnosis system, a vacuum pump central monitoring system capable of making self-diagnosis of a dry vacuum pump. A vacuum pump self-diagnosis method decides the occurrence of failure and generates an alarm when a predetermined alarm set value is exceeded by an integrated value or an average value of a current of a motor for rotating a rotor of said vacuum pump. In a vacuum pump self-diagnosis system for making self-diagnosis of a vacuum pump which comprises a casing and a rotor rotatably arranged in the casing for sucking and discharging a gas through rotations of the rotor, the rotor comprises a plurality of stages and a pressure sensor is provided between the rotor stages. A self-diagnosis unit is provided for calculating an integrated value or an average value of a current of a motor for rotating said rotor, and making self-diagnosis of the vacuum pump when the integrated value or average value exceeds a predetermined alarm set value. The self-diagnosis unit switches from one self-diagnosis calculation method to another or interrupts the self-diagnosis calculation based on a pressure value detected by said pressure sensor. | 02-05-2009 |
| 20090032708 | Inspection system by charged particle beam and method of manufacturing devices using the system - An inspection apparatus by an electron beam comprises: an electron-optical device | 02-05-2009 |
| 20090026368 | APPARATUS AND METHOD FOR INSPECTING SAMPLE SURFACE - Provided is a defect inspection apparatus and an inspection (or evaluation) method with highly improved accuracy, which would not be provided by the prior art, in the defect inspection apparatus used in a manufacturing process of a semiconductor device. | 01-29-2009 |
| 20090017733 | SUBSTRATE PROCESSING APPARATUS - A substrate processing apparatus ( | 01-15-2009 |
| 20090014649 | ELECTRON BEAM APPARATUS - Secondary electrons emitted from a sample (W) by an electron beam irradiation is deflected by a beam separator ( | 01-15-2009 |
| 20080315095 | Electron beam apparatus, a device manufacturing method using the same apparatus, a pattern evaluation method, a device manufacturing method using the same method, and a resist pattern or processed wafer evaluation method - An object of the present invention is to provide an electron beam apparatus, in which a plurality of electron beams, e.g., four electron beams, is produced for one optical axis with a relatively high current achieved for each electron beam. | 12-25-2008 |
| 20080315090 | Objective lens, electron beam system and method of inspecting defect - An electron beam system or a method for manufacturing a device using the electron beam system in which an electron beam can be irradiated at a high current density and a ratio of transmittance of a secondary electron beam of an image projecting optical system can be improved and which can be compact in size. The surface of the sample S is divided into plural stripe regions which in turn are divided into rectangle-shaped main fields. The main field is further divided into plural square-shaped subfields. The irradiation with the electron beams and the formation of a two-dimensional image are repeated in a unit of the subfields. A magnetic gap formed by the inner and outer magnetic poles of the objective lens is formed on the side of the sample, and an outer side surface and an inner side surface of each of the inner magnetic pole and the outer magnetic pole, respectively, forming the magnetic gap have each part of a conical shape with a convex having an angle of 45° or greater with respect to the optical axis. | 12-25-2008 |
| 20080308729 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former - A substrate inspection apparatus | 12-18-2008 |
| 20080302963 | SHEET BEAM-TYPE TESTING APPARATUS - An electron beam apparatus such as a sheet beam based testing apparatus has an electron-optical system for irradiating an object under testing with a primary electron beam from an electron beam source, and projecting an image of a secondary electron beam emitted by the irradiation of the primary electron beam, and a detector for detecting the secondary electron beam image projected by the electron-optical system; specifically, the electron beam apparatus comprises beam generating means | 12-11-2008 |
| 20080302122 | ABSORPTION HEAT PUMP - An absorption heat pump, including: an evaporator which takes in a first heat source and evaporates refrigerant liquid into refrigerant vapor; an absorber which has a heat receiving medium passage and which takes in heat receiving medium liquid through a heat receiving medium inlet of the heat receiving medium passage, heats the heat receiving medium liquid with the heat of absorption generated when the refrigerant vapor generated in the evaporator is absorbed into solution, and discharges the heat receiving medium in the form of vapor or mixture of vapor and liquid through a heat receiving medium outlet of the heat receiving medium passage; a generator which takes in a second heat source and evaporates the refrigerant from the solution having absorbed the refrigerant vapor; and a condenser which takes in a cooling source and the refrigerant vapor generated in the generator to condense the refrigerant vapor. | 12-11-2008 |
| 20080274850 | Transmission apparatus - The present invention relates to a transmission apparatus ( | 11-06-2008 |
| 20080274670 | Substrate Peripheral Portion Measuring Device, and Substrate Peripheral Portion Polishing Apparatus - A projecting/receiving unit ( | 11-06-2008 |
| 20080271911 | Submerged Electrode and Material Thereof - [Problems] To provide an electrode that is stable in liquid and is capable of processing a large volume of liquid and a small electrode that is capable of processing a large volume of liquid at high speed; provide a liquid processor and method of processing liquid in which the electrode is used; provide and electrode material being hard to be damaged by thermal stress; and provide an electrode, liquid processor and method of processing liquid in which the electrode material is used. | 11-06-2008 |
| 20080268150 | Method of Coating for Diamond Electrode - The present invention relates to a film-formation method of a diamond electrode used in an electrolytic processing apparatus and other devices for treating water and waste liquid. This method utilizes CVD such as hot filament CVD including supplying a high-concentration carbon source to form a low-quality thick first diamond film ( | 10-30-2008 |
| 20080265159 | Sample surface inspection apparatus and method - The present invention provides a surface inspection method and apparatus for inspecting a surface of a sample, in which a resistive film is coated on the surface, and a beam is irradiated to the surface having the resistive film coated thereon, to thereby conduct inspection of the surface of the sample. In the surface inspection method of the present invention, a resistive film having an arbitrarily determined thickness t | 10-30-2008 |
| 20080264798 | Copper Plating Bath and Plating Method - An acid copper plating solution and plating method are disclosed. The acid copper plating solution comprises copper ions, an organic acid or an inorganic acid, chloride ions, high molecular weight surfactant which controls the electrodeposition reaction, and a sulfur-containing saturated organic compound which promotes the electrocoating rate, wherein the high molecular weight surfactant comprises two or more types with different hydrophobicities. The plating method is a method for forming a plating film on a conductor layer, which is formed on at least a part of a structural object having a concave-convex pattern on a semiconductor substrate, and comprises providing a cathode potential to the conductor layer and supplying a plating solution which electrically connects an anode with the conductor layer, wherein the plating solution contains 25-75 g/l of copper ion and 0.4 mol/l of an organic acid or inorganic acid and an electric resistor is installed between the conductor layer and the anode. Also disclosed is a plating method for forming a wiring circuit on an electronic circuit substrate having fine holes and trenches, comprising forming a plating film on a conductor layer, which is formed on at least a part of the substrate, and filling the holes and trenches with copper, wherein the plating film is formed by using an acid copper plating solution containing copper ions, organic or inorganic acid, chloride ions, sulfur-containing saturated organic compound, and high molecular weight surfactant controlling electrocoating concentration of 500 ppm or more. | 10-30-2008 |
| 20080251718 | ELECTRON BEAM APPARATUS AND SAMPLE OBSERVATION METHOD USING THE SAME - The electron beam apparatus is provided with a stage for mounting a sample thereon, a primary optical system for generating an electron beam having an irradiation area and irradiating the electron beam onto the sample, a secondary optical system for detecting electrons which have been generated through the irradiation of the electron beam onto the sample and have acquired structural information of the sample and acquiring an image of the sample about a viewing area and an irradiation area changing section for changing the position of the irradiation area with respect to the viewing area. | 10-16-2008 |
| 20080250811 | Absorption refrigerating machine - To provide a highly efficient and compact absorption refrigerating machine with water heated from 60 to 70 degrees Celsius as the heat source. In an absorption refrigerating machine including a regenerator G, condenser C, an absorber A, an evaporator E, an auxiliary regenerator GX and an auxiliary absorber AX, the concentrated solution from G is heated and further concentrated in GX, while the diluted solution from A is cooled in AX, the refrigerant vapor from GX is absorbed. A low temperature heat exchanger XL is provided for heat exchange between the concentrated solution supplied from GX to A, and the diluted solution sent from AX to G, and a high temperature heat exchanger XH is provided for heating the diluted solution leaving from XL and sent to G with the concentrated solution supplied from G to GX. | 10-16-2008 |
| 20080200100 | Substrate Processing Apparatus - A substrate processing apparatus ( | 08-21-2008 |
