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DoPont Air Products Nanomaterials LLC
| DoPont Air Products Nanomaterials LLC Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20100167546 | Method and Composition for Chemical Mechanical Planarization of A Metal or A Metal Alloy - A composition and associated method for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) are described herein which afford high and tunable rates of metal removal as well as low dishing and erosion levels during CMP processing. | 07-01-2010 |