DoPont Air Products Nanomaterials LLC
DoPont Air Products Nanomaterials LLC Patent applications | ||
Patent application number | Title | Published |
---|---|---|
20100167546 | Method and Composition for Chemical Mechanical Planarization of A Metal or A Metal Alloy - A composition and associated method for chemical mechanical planarization of a metal-containing substrate (e.g., a copper substrate) are described herein which afford high and tunable rates of metal removal as well as low dishing and erosion levels during CMP processing. | 07-01-2010 |