DONGWOO FINE-CHEM

Patent application number	Title	Published
DONGWOO FINE-CHEM Patent applications
20110097835	PHOTORESIST COMPOSITION AND METHOD OF MANUFACTURING A DISPLAY SUBSTRATE USING THE SAME - A photoresist composition includes an alkali-soluble resin, a dissolution inhibitor including a quinone diazide compound, a first additive including a benzenol compound represented by the following Chemical Formula 1, a second additive including an acrylic copolymer represented by the following Chemical Formula 2 and an organic solvent. Accordingly, heat resistance of a photoresist pattern may be improved, and the photoresist pattern may be readily stripped. As a result, crack formation in the photoresist pattern may be reduced and/or prevented.	04-28-2011
20100156283	NAPHTHYL CARBAZOLE DERIVATIVES, KL HOST MATERIAL, THE ORGANIC LIGHT EMITTING DEVICE EMPLOYING THE SAME, THE DISPLAY DEVICE AND THE ILLUMINATION DEVICE EMPLOYING THE SAME - Naphthylcarbazole derivatives are provided. The naphthylcarbazole derivatives are represented by Formula 1. Further provided are KL host materials, organic electroluminescent devices employing the host materials, and displays and lighting systems comprising the devices.	06-24-2010