COMMISSARIAT AL'ENERGIE ATOMIQUE Patent applications |
Patent application number | Title | Published |
20130012400 | METHOD AND DEVICE FOR SEPARATING MOLECULAR TARGETS IN A COMPLEX MIXTURE - The invention relates to a method of analysing molecular targets contained in a complex mixture, comprising the following steps consisting in: a) bringing the mixture of molecular targets to be analysed into contact with an array of different types of primary probes, whereby each type of primary probe forming the array can bind specifically to a type of target selected from among the molecular targets, under conditions that enable specific binding between the molecular targets and the primary probes; b) optionally eliminating the primary probes that are not bound specifically to a molecular target; c) separating the molecular targets and the primary probes which are bound specifically in a probe/target complex, such as to recover the array of primary probes representing a fingerprint of the molecular targets to be analysed; and d) quantitatively analysing the primary probes eluted in step c. | 01-10-2013 |
20100293425 | PARAMETRIC SCAN REGISTER, DIGITAL CIRCUIT AND METHOD FOR TESTING A DIGITAL CIRCUIT USING SUCH REGISTER - The present invention relates to a parametric scan register and a method of testing a digital circuit with the aid of such a register. The parametric scan register includes a memory cell having at least one data input, able to receive a test datum, and transferring to its output a representative signal indicative of the test datum by use of a synchronization signal. It furthermore includes a parametric test block one input of which is linked to the output (s) of the cell, the output signal of the cell being transferred at the output of the parametric test block through an internal module, this internal module operating according to modes able to modify the output signal of the cell. Embodiments of the invention apply to the testing of integrated circuits with high integration density, for example in the field of nanotechnologies. | 11-18-2010 |
20100178596 | EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY MASK, WITH ABSORBENT CAVITIES - The invention relates to extreme ultraviolet photolithography masks operating in reflection. These masks comprise a lower mirror ( | 07-15-2010 |