| COLTENE WHALEDENT AG Patent applications |
| Patent application number | Title | Published |
| 20100084778 | DENTAL POST - A method of manufacturing a dental post according to the present invention comprises the steps of: (i) overjacketing extrusion of at least one thermoplastic material over at least one filament or yarn, such that the thermoplastic material cross-sectionally enwraps the at least one filament or yarn; (ii) solidifying the extruded product of step (i); (iii) equipping the solidified extruded product of step (ii) with a surface texture, such that the thermoplastic wrapping is not modified in a way as to expose or dam-age the at least one filament or yarn. | 04-08-2010 |
| 20100035213 | Dental Kit and Method for Retracting Sulcus - Sulcus is retracted from teeth prior to performing a dental procedure on the teeth by applying an expandable curable silicone compound to the surface of the teeth and preventing the silicone compound from expanding in a direction away from the surface of the teeth, thereby forcing the silicone to expand against the sulcus and forcing retraction of the sulcus from contact with the teeth. | 02-11-2010 |
| 20090192240 | DENTAL COMPOSITE MATERIAL - The invention concerns hardenable dental composite materials, comprising i) non-agglomerated nanofillers having particle sizes of about 1 to about 50 nm; and ii) core-shell polymer particles with an elastic core compound, preferably having a modulus of elasticity of less than about 18 MPa, more preferably of less than 14 MPa, most preferably of less than about 10 MPa; and a substantially non-elastic shell compound. The materials have improved properties that allow for advantageous restoration of molar and premolar teeth with the bulk filling technique | 07-30-2009 |
| 20090061393 | RETRACTION OF SULCUS - The invention concerns a method of retraction of sulcus, in which, in a first step, a flowable retraction material ( | 03-05-2009 |
| 20090023115 | DENTAL FILLING MATERIAL - The invention concerns a dental filling material with dual hardening mechanism, wherein i) a first hardening mechanism is based on a photocuring reaction, preferably a radical reaction, and ii) a second hardening mechanism is dependent on H | 01-22-2009 |