| Carl Zeiss SMT Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110049364 | REDUCING PARTICLE IMPLANTATION - Methods disclosed herein include: (a) forming a channel in a sample, the channel extending one micron or more along a direction oriented at an angle to a surface of the sample; (b) exposing a portion of the sample above the channel to a particle beam to cause particles to leave the surface of the sample; and (c) forming an image of the sample based on particles that leave the surface. | 03-03-2011 |
| 20110001058 | GAS FIELD ION SOURCE WITH COATED TIP - Coated tips, as well as related articles, systems and methods are disclosed. | 01-06-2011 |
| 20100136255 | ICE LAYERS IN CHARGED PARTICLE SYSTEMS AND METHODS - Charged particle sources, systems and methods are disclosed. | 06-03-2010 |
| 20100052697 | REPAIRING DEFECTS - Methods and systems for defect repair are disclosed. The methods include: (a) identifying a defect causing an absence of an electrical connection between a first circuit element and a second circuit element, the first and second circuit elements being positioned in or on a substrate and the defect being positioned in the substrate; (b) removing a portion of the substrate to expose the defect, and depositing a conductive material to electrically connect the first and second circuit elements; and (c) verifying that the defect caused the absence of an electrical connection between the first and second circuit elements. | 03-04-2010 |
| 20100051805 | ION BEAM STABILIZATION - Ion microscope methods and systems are disclosed. In general, the systems and methods provide high ion beam stability. | 03-04-2010 |
| 20100012839 | INCREASING CURRENT IN CHARGED PARTICLE SOURCES AND SYSTEMS - Disclosed are charged particle systems that include a tip, at least one gas inlet configured to supply gas particles to the tip, and a element having a curved surface positioned to adsorb un-ionized gas particles, and to direct desorbing gas particles to propagate toward the tip. The charged particle systems can include a field shunt connected to the tip, and configured to adjust an electric field at an apex of the tip. | 01-21-2010 |
| 20100012837 | MULTIPLE CURRENT CHARGED PARTICLE METHODS - Charged particle beams with different charged particle currents are disclosed. In some embodiments, a method includes exposing a sample to a first ion beam having a first ion current at the sample, and exposing the sample to a second ion beam having a second ion current at the sample, where the first ion current is at least two times greater than the second ion current. In certain embodiments, a method includes creating a first ion beam at a first pressure, exposing a sample to the first ion beam, creating a second ion beam at a second pressure, and exposing the sample to the second ion beam, where the first pressure is at least two times greater than the second pressure. | 01-21-2010 |
| 20090314939 | SAMPLE DECONTAMINATION - Disclosed herein are methods that include: (a) exposing a sample in a chamber to a first gas, where the first gas reacts with surface contaminants on the sample to form a second gas; (b) removing at least a portion of the second gas from the chamber; and (c) exposing the sample to a charged particle beam to cause a plurality of particles to leave the sample and detecting at least some of the plurality of particles. The charged particle beam can include particles having a molecular weight of 40 atomic mass units or less. | 12-24-2009 |
