| CARL ZEISS NTS GMBH Patent applications |
| Patent application number | Title | Published |
|---|
| 20120091363 | PROCESSING SYSTEM - A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam. | 04-19-2012 |
| 20120074317 | Particle Beam Microscope and Method for Operating the Particle Beam Microscope - A method for operating a particle beam microscope comprising detecting light rays or particles which emanate from a structure, wherein the structure comprises at least one of: at least a portion of a surface of an object and at least a portion of a surface of an object holder of the particle beam microscope; generating a surface model of the structure depending on the at least one of the detected light rays and the particles; determining a position and an orientation of the surface model of the structure relative to the object region; determining a measurement location relative to the surface model of the structure; and positioning the object depending on the generated surface model of the structure, depending on the determined position and orientation of the surface model of the structure, and depending on the determined measurement location. | 03-29-2012 |
| 20120025095 | CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME - A charged particle beam system includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens. | 02-02-2012 |
| 20120025094 | CHARGED PARTICLE BEAM SYSTEM - A charged particle beam system for performing precession diffraction includes a lens | 02-02-2012 |
| 20120025093 | Particle Beam System - A particle beam system includes a particle beam source for generating a particle beam, a high voltage source, a beam blanker system with deflection plates | 02-02-2012 |
| 20120025078 | Particle Beam System - A particle beam system comprises a particle beam source | 02-02-2012 |
| 20120025077 | Particle Beam System - A particle beam system comprises a particle beam source | 02-02-2012 |
| 20110210249 | Transmission Electron Microscope - A transmission electron microscope in which a sample is positioned in a sample plane | 09-01-2011 |
| 20110198326 | LASER PROCESSING SYSTEM, OBJECT MOUNT AND LASER PROCESSING METHOD - A processing system includes a common base, an object mount configured to hold an object for inspection or processing, and at least one aperture plate provided on the object mount. The aperture plate has at least one aperture The processing system also includes a laser device mounted on the common base and configured to scan a laser beam across a scan region, and a transport device configured to displace the object mount relative to the common base from a first position to a second position. When the object mount is in the first position, the object and the at least one aperture are positioned within the scan region of the laser device. The processing system also includes at least one light guide provided on the object mount. The light guide has an input port provided by the at least one aperture, and an output port. The processing system also includes at least one light detector mounted at a fixed position relative to the common base and configured to detect light emerging from the output port of the light guide. | 08-18-2011 |
| 20110108736 | SACP Method and Particle Optical System for Performing the Method - An SACP method includes directing a beam of charged particles onto an object surface of an object using a particle optical system, and detecting intensities of particles emanating from the object. The method further includes: (a | 05-12-2011 |
| 20100327179 | CHARGED PARTICLE BEAM COLUMN AND METHOD OF OPERATING SAME - A charged particle beam column includes a charged particle beam source to generate a charged particle beam; an objective lens to focus the charged particle beam in an object plane; a first condenser lens disposed in a beam path of the charged particle beam between the charged particle beam source and the objective lens; a deflector disposed in the beam path between the first condenser lens and the objective lens and configured to change an angle of incidence of the charged particle beam in an object plane; and an aberration corrector disposed in the beam path between the deflector and the objective lens and configured to compensate aberrations introduced by the objective lens. The aberration corrector is also configured to not compensate aberrations introduced by the first condenser lens. | 12-30-2010 |
| 20100294930 | SCANNING CHARGED PARTICLE BEAMS - Methods are disclosed that include exposing, in direct succession, portions of a surface of a sample to a charged particle beam, the portions of the surface of the sample forming a row in a first direction, the charged particle beam having an average spot size fat the surface of the sample, each portion being spaced from its neighboring portions by a distance of at least din the first direction, and a ratio d/f being 2 or more. | 11-25-2010 |
| 20100258719 | PARTICLE-BEAM MICROSCOPE - A particle beam microscope includes an illumination system generating a particle beam having a ring-shaped conical configuration. A selective detection system is configured to selectively detect one of two groups of particles having traversed the object region. The first group of particles includes the particles that traversed the object region un-scattered or scattered by a small scattering amount. The second group of particles includes particles scattered in the object region by a greater scattering amount. | 10-14-2010 |
| 20100155597 | PARTICLE OPTICAL DEVICE WITH MAGNET ASSEMBLY - A particle optical apparatus has a particle source for generating at least one beam of charged particles, and a magnet arrangement having two pole plates, which are arranged spaced apart from one another, such that the at least one beam of charged particles in operation passes through the pole plates, wherein trenches are provided in the pole plates, in which trenches coil wires are arranged. The trenches, when viewed in a cross section transverse to an extension direction of the trenches, have a smaller width in a region of a surface of the pole plates, than in a region arranged at a distance from the surface. | 06-24-2010 |
| 20100078557 | ELECTRON BEAM SOURCE AND METHOD OF MANUFACTURING THE SAME - A tip of an electron beam source includes a core carrying a coating. The coating is formed from a material having a greater electrical conductivity than a material forming the surface of the core. | 04-01-2010 |
| 20100051828 | PROCESSING SYSTEM - A processing system includes a particle beam column for generating a particle beam directed to a first processing location; a laser system for generating a laser beam directed to a second processing location located at a distance from the first processing location; and a protector including an actuator and a plate connected to the actuator. The actuator is configured to move the plate between a first position in which it protects a component of the particle beam column from particles released from the object by the laser beam and a second position in which the component of the particle beam column is not protected from particles released from the object by the laser beam. | 03-04-2010 |
| 20100038538 | OBJECTIVE LENS - An objective lens for focussing charged particles includes a magnetic lens and an electrostatic lens whose components are displaceable relative to each other. The bore of the outer pole piece of the magnetic lens exhibits a diameter D | 02-18-2010 |
| 20100038534 | METHOD OF GENERATING PARTICLE BEAM IMAGES USING A PARTICLE BEAM APPARATUS - A representation of a particle beam image is generated by acquiring plural data sets using a particle beam apparatus. Each data set represents secondary particle intensities from a region of an object. The secondary particle intensities are acquired for the different data sets with different parameter adjustments of the particle beam apparatus. From the plural acquired data sets image data are generated using a tone-mapping method. The image data are represented at an output medium. | 02-18-2010 |
| 20090152460 | System for Processing an Object - A processing system comprises a gas supply apparatus with which process gas is supplied to an object. An activation beam activates the gas thereby inducing a chemical reaction between material at the surface of the object and the process gas causing ablation of material from the surface or deposition of material at the surface. The gas supply apparatus is formed from a stack of plates providing a gas conduit system between at least one gas inlet and at least one gas outlet. | 06-18-2009 |
| 20090152459 | System and Method for Processing an Object - A system and a method for processing and inspecting an object are provided, wherein the system comprises a particle beam column, an object holder and a gas supply apparatus. Thereby, the object holder is formed comprising a base, a first table displaceable relative to the base, a second table displaceable relative to the first table and a third table rotatable relative to the second table, wherein the cannula of the gas supply apparatus is fixed at the first table. | 06-18-2009 |
| 20090121132 | Material processing system and method - A material processing system for processing a work piece is provided. The material processing is effected by supplying a reactive gas and energetic radiation for activation of the reactive gas to a surrounding of a location of the work piece to be processed. The radiation is preferably provided by an electron microscope. An objective lens of the electron microscope is preferably disposed between a detector of the electron microscope and the work piece. A gas supply arrangement of the material processing system comprises a valve disposed spaced apart from the processing location, a gas volume between the valve and a location of emergence of the reaction gas being small. The gas supply arrangement further comprises a temperature-adjusted, especially cooled reservoir for accommodating a starting material for the reactive gas. | 05-14-2009 |
