| Capella Photonics, Inc. Patent applications |
| Patent application number | Title | Published |
|---|
| 20100214643 | MEMS DEVICE WITH INTEGRATED VIA AND SPACER - A MEMS device and fabrication method are disclosed. A bottom substrate having an insulating layer sandwiched between an upper layer and a lower layer may be bonded to a device layer. One or more portions of the upper layer may be selectively removed to form one or more device cavities. Conductive vias may be formed through the lower layer at locations that underlie the one or more device cavities and electrically isolated from the lower layer. Devices may be formed from the device layer. Each device overlies a corresponding device cavity. Each device may be connected to the rest of the device layer by one or more corresponding hinges formed from the device layer. One or more electrical contacts may be formed on a back side of the lower layer. Each contact is electrically connected to a corresponding conductive via. | 08-26-2010 |
| 20090028503 | FLEX SPECTRUM WSS - Switching optical signals containing a plurality of spectral channels characterized by a predetermined channel spacing is described. A selected beam deflector array may be selected from among a plurality of available beam deflector arrays configured to accommodate spectral channels of different channel spacings. The selected beam deflector array is configured to accommodate spectral channels of the predetermined channel spacing. The spectral channels are selectively optically coupled to the selected beam deflector array, which selectively optically couples the spectral channels between one or more input ports and one or more output ports. | 01-29-2009 |
| 20080266637 | OPTICAL APPARATUS WITH REDUCED EFFECT OF MIRROR EDGE DIFFRACTION - A micromirror for use in an optical apparatus may comprise a reflective portion, configured to be rotatable about a switching axis and an attenuation axis that is different from the switching axis. The reflective portion may include an edge that is substantially parallel to the attenuation axis. The edge may include one or more edge features that protrude above a plane of the micromirror surface and/or are submerged below the plane of the micromirror surface, and/or have an edge shape that deviates from a straight line. Alternatively, an array of micromirrors may have mirrors characterized by sawtooth features disposed along edges that are substantially parallel to the attenuation axis. | 10-30-2008 |
