CAP1 Co., Ltd.
|CAP1 Co., Ltd. Patent applications|
|Patent application number||Title||Published|
|20100170025||Negative ion generating hat - A negative ion generating hat is provided. The hat is configured in a way that a predetermined space portion is formed between an inner of the hat and a lower band of the inner surface and a negative ion generating fabric is inserted into the space portion, thereby preventing a negative ion generating coating from being easily stripped off in spite of a stretching or creasing of a band.||07-08-2010|