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Canon Avelva Corporation

Kawasaki-shi, JP

Canon Avelva Corporation Patent applications
Patent application numberTitlePublished
20100062602Etching method, method for producing dielectric film of low dielectric constant, method for producing porous member, etching system and thin film forming equipment - To provide an etching method employing a novel CVD system and an etching apparatus applicable to the method.03-11-2010