| BRION TECHNOLOGIES INC. Patent applications |
| Patent application number | Title | Published |
|---|
| 20110116067 | Illumination Optimization - A method of optimizing an illumination pupil shape for a lithographic process | 05-19-2011 |
| 20100167184 | LITHOGRAPHIC PROCESSING METHOD, AND DEVICE MANUFACTURED THEREBY - A multivariable solver for proximity correction uses a Jacobian matrix to approximate effects of perturbations of segment locations in successive iterations of a design loop. The problem is formulated as a constrained minimization problem with box, linear equality, and linear inequality constraints. To improve computational efficiency, non-local interactions are ignored, which results in a sparse Jacobian matrix. | 07-01-2010 |
| 20100162197 | METHOD AND SYSTEM FOR LITHOGRAPHY PROCESS-WINDOW-MAXIMIXING OPTICAL PROXIMITY CORRECTION - The present invention relates to an efficient OPC method of increasing imaging performance of a lithographic process utilized to image a target design having a plurality of features. The method includes the steps of determining a function for generating a simulated image, where the function accounts for process variations associated with the lithographic process; and optimizing target gray level for each evaluation point in each OPC iteration based on this function. In one given embodiment, the function is approximated as a polynomial function of focus and exposure, R(ε, f)=P | 06-24-2010 |
| 20100128969 | HARMONIC RESIST MODEL FOR USE IN A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A method for determining an image of a mask pattern in a resist coated on a substrate, the method including determining an aerial image of the mask pattern at substrate level; and convolving the aerial image with at least two orthogonal convolution kernels to determine a resist image that is representative of the mask pattern in the resist. | 05-27-2010 |
| 20100086863 | LITHOGRAPHIC PROCESSING METHOD, AND DEVICE MANUFACTURED THEREBY - A method of splitting a lithographic pattern into two sub-patterns, includes generating test structures corresponding to structures of interest in the lithographic pattern, varying the test structures through a selected range of dimensions, simulating an image of the test structures, determining an image quality metric for the simulated image, analyzing the determined image quality metric to determine pitch ranges for which split improves the image quality metric and ranges for which split does not improve the image quality metric, and generating the two sub-patterns in accordance with the determined pitch ranges. | 04-08-2010 |
| 20080309897 | MULTIVARIABLE SOLVER FOR OPTICAL PROXIMITY CORRECTION - The method of the invention tracks how the collective movement of edge segments in a mask layout alters the resist image values at control points in the layout and simultaneously determines a correction amount for each edge segment in the layout. A multisolver matrix that represents the collective effect of movements of each edge segment in the mask layout is used to simultaneously determine the correction amount for each edge segment in the mask layout. | 12-18-2008 |
| 20080301620 | SYSTEM AND METHOD FOR MODEL-BASED SUB-RESOLUTION ASSIST FEATURE GENERATION - Methods are disclosed to create efficient model-based Sub-Resolution Assist Features (MB-SRAF). An SRAF guidance map is created, where each design target edge location votes for a given field point on whether a single-pixel SRAF placed on this field point would improve or degrade the aerial image over the process window. In one embodiment, the SRAF guidance map is used to determine SRAF placement rules and/or to fine tune already-placed SRAFs. In another embodiment the SRAF guidance map is used directly to place SRAFs in a mask layout. | 12-04-2008 |
