| 20100285631 | METHOD OF SELECTIVELY DOPING A SEMICONDUCTOR MATERIAL FOR FABRICATING A SOLAR CELL - The present disclosure provides a method of selectively doping a semiconductor material for fabricating a solar cell. The method comprises forming at least one angled groove in the semiconductor material and forming a diffusion barrier on the semiconductor material. The diffusion barrier comprises a diffusion barrier material that is selected so that diffusing of a dopant material through the diffusion barrier is reduced. The method also comprises doping the semiconductor material by exposing the semiconductor material to the dopant material in a manner such that a region of the semiconductor material that is covered by the diffusion barrier has a predetermined first dopant concentration. In addition, the method comprises forming an electrical contact within the at least one angled groove after exposing the semiconductor material to the dopant material. The method is conducted so that a surface area of the semiconductor material within the at least one groove is substantially free from diffusion barrier material and has a second dopant concentration that is higher than the first dopant concentration. | 11-11-2010 |
