AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. Patent applications |
Patent application number | Title | Published |
20160122579 | SILICON CONTAINING BLOCK COPOLYMERS FOR DIRECT SELF-ASSEMBLY APPLICATION - The present invention relates to a novel diblock copolymer comprising a repeat unit ( | 05-05-2016 |
20160002494 | FINE RESIST PATTERN-FORMING COMPOSITION AND PATTERN FORMING METHOD USING SAME - The present invention provides a composition enabling to form a fine negative photoresist pattern free from troubles such as surface roughness, bridge defects or unresolved defects, and the invention also provides a pattern formation method employing that composition. The composition is used for miniaturizing a resist pattern by applying to a negative resist pattern from a chemically amplified resist composition and fattening the resist pattern. This composition comprises a polymer comprising a repeating unit having an amino group or a polymer mixture, and a solvent, and further comprises a specific amount of an acid or indicates a specific pH value. The polymer mixture comprises polymers whose HSP distance, determined from Hansen solubility parameter, is 3 or more. In the pattern formation method, the composition is cast on a negative photoresist pattern beforehand obtained by development with an organic solvent developer and is then heated to form a fine pattern. | 01-07-2016 |
20150331323 | COMPOSITION FOR FORMING OVERLAY FILM, AND RESIST PATTERN FORMATION METHOD EMPLOYING THE SAME - [Object] To provide a composition for forming a topcoat layer enabling to produce a pattern excellent in roughness and in pattern shape; and also to provide a pattern formation method employing that. | 11-19-2015 |
20150331319 | NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION - [Object] To provide a negative-working photosensitive siloxane composition developable inorganically, and also to provide a cured film-manufacturing method employing that. | 11-19-2015 |
20150329679 | COMPOSITE OF METAL OXIDE NANOPARTICLES AND SILSESQUIOXANE POLYMER, METHOD FOR PRODUCING SAME, AND COMPOSITE MATERIAL PRODUCED USING COMPOSITE THEREOF - [Problem] An object of the present invention is to provide a composite of metal oxide nanoparticles and a silsesquioxane polymer, which can form a high-quality cured film wherein aggregation and the like of metal oxide do not occur during a curing process and the metal oxide is uniformly dispersed. | 11-19-2015 |
20150309403 | ANTIREFLECTIVE COATING COMPOSITIONS AND PROCESSES THEREOF - The present invention relates to a novel absorbing antireflective coating composition comprising a novel crosslinkable polymer comprising at least one repeat unit (A) having structure (1), at least repeat (B) unit having a structure (2), and at least one repeat unit (C) having structure (3) | 10-29-2015 |
20150299132 | AROMATIC IMIDE COMPOUND AND METHOD FOR PRODUCING SAME - [Problem] to provide an aromatic imide compound wherein the sensitivity for visible light such as g-line, h-line etc. is increased and solubility is also improved. | 10-22-2015 |
20150298980 | METHOD FOR FORMING OF SILICEOUS FILM AND SILICEOUS FILM FORMED USING SAME - A siliceous film having high purity and a low etching rate is formed by (a) a step for forming a siliceous film on a substrate by coating a solution composed of a polysilazane, e.g., perhydropolysilazane on a substrate and then hardening (curing) the solution in an oxidizing atmosphere, or by coating a silica solution formed by a sol-gel method on a substrate, and (b) a step for heating the siliceous film in an inert gas environment containing a nitrogen-containing compound such as an alkylamine having a base dissociation constant (pKb) no greater than 4.5, or a halogen-containing compound in which the bond energy of a halogen atom such as F | 10-22-2015 |
20150291749 | POSITIVE-TYPE PHOTOSENSITIVE SILOXANE COMPOSITION - A positive-type photosensitive siloxane composition which comprises (I) two or more polysiloxanes that differ in the rate of dissolution in aqueous tetramethylammonium hydroxide (TMAH) solutions, (II) a polysiloxane that gives a film which after prebaking has a rate of dissolution in 2.38 wt-% aqueous TMAH solution of 50-1,000 Å/sec and that has a group soluble in aqueous TMAH solution, other than silanol, (III) a diazonaphthoquinone derivative, and (IV) a solvent. | 10-15-2015 |
20150253669 | COMPOSITION FOR FORMING FINE RESIST PATTERN AND PATTERN FORMATION METHOD USING SAME - The present invention provides a fine pattern-forming composition enabling to form a resist pattern having high dry etching resistance, and also provides a pattern formation method using that composition. This formation method hardly causes pipe blockages in the production process. The composition is used for miniaturizing a resist pattern by fattening in a process of forming a negative resist pattern from a chemically amplified resist composition, and comprises a polymer containing a repeating unit having a hydroxyaryl group and an organic solvent not dissolving the negative resist pattern. In the formation method, the fine pattern-forming composition and the resist composition are individually cast with the same coating apparatus, so as to prevent pipe blockages. | 09-10-2015 |
20150252222 | METHOD FOR FORMING DENSE SILICIC FILM - The present invention provides a dense silicic film and a producing method thereof. This method comprises coating a composition for coating film, which comprises a polymer having a silazane bond on a substrate, on a substrate, irradiating with light having a maximal peak in the range of 160-179 nm wavelength, and then irradiating with light having 10-70 nm wavelength longer maximal peak wavelength than the light used in the previous irradiation. | 09-10-2015 |
20150227043 | BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS - The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use. | 08-13-2015 |
20150200091 | POLYOXOMETALATE AND HETEROPOLYOXOMETALATE COMPOSITIONS AND METHODS FOR THEIR USE - The present invention relates to novel compositions comprising a metal component selected from a group chosen from at least one polyoxometalate, at least one heteropolyoxometalate and a mixture thereof; and, at least one organic component. The present invention also relates to methods of preparing the nanorod arrays and the nanorod materials and films. The present invention also relates to novel compositions to generate metal-oxide rich films, and also relates to processes for via or trench filling, reverse via or trench filling and imaging with underlayers. The materials are useful in wide range of manufacturing applications in many industries, including the semiconductor devices, electro-optical devices and energy storage industry. | 07-16-2015 |
20150200090 | SPIN COATABLE METALLIC HARD MASK COMPOSITIONS AND PROCESSES THEREOF - The present invention relates to a novel spin coatable composition comprising
| 07-16-2015 |
20150093912 | UNDERLAYER COMPOSITION FOR PROMOTING SELF ASSEMBLY AND METHOD OF MAKING AND USING - Disclosed herein is a formulation for depositing a cured underlayer for promoting the formation of self assembled structures. The underlayer comprises: (a) a polymer comprising at least one pendant vinyl ether monomer repeat unit having the structure, (I): | 04-02-2015 |
20150064904 | STABLE METAL COMPOUNDS AS HARDMASKS AND FILLING MATERIALS, THEIR COMPOSITIONS AND METHODS OF USE - The present invention relates to novel, soluble, multi-ligand-substituted metal oxide compounds to form metal oxide films with improved stability as well as compositions made from them and methods of their use. | 03-05-2015 |
20150064613 | NEGATIVE-WORKING PHOTOSENSITIVE SILOXANE COMPOSITION | 03-05-2015 |
20140370444 | ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF - The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3), | 12-18-2014 |
20140342290 | COMPOSITION COMPRISING A POLYMERIC THERMAL ACID GENERATOR AND PROCESSES THEREOF - The present invention relates a novel aqueous composition comprising polymeric thermal acid generator and a process of coating the novel composition onto photoresist pattern, thereby forming a layer of the polymeric thermal acid generator over the photoresist pattern. The polymeric thermal acid generator comprises a polymer having at least one repeating unit of structure 2; | 11-20-2014 |
20140335324 | TEMPLATE FOR SELF ASSEMBLY AND METHOD OF MAKING A SELF ASSEMBLED PATTERN - Disclosed and claimed herein is a template for directing a pattern in a block copolymer film and the process of making the pattern. | 11-13-2014 |
20140295349 | BOTTOM ANTIREFLECTIVE MATERIALS AND COMPOSITIONS - The present invention relates to novel antireflective coating compositions and their use in image processing. The compositions self-segregate to form hydrophobic surfaces of the novel antireflective coating compositions, the composition being situated between a reflective substrate and a photoresist coating. Such compositions are particularly useful in the fabrication of semiconductor devices by photolithographic techniques. The present invention also related to self-segregating polymers useful in image processing and processes of their use. | 10-02-2014 |
20140193754 | COMPOSITIONS OF NEUTRAL LAYER FOR DIRECTED SELF ASSEMBLY BLOCK COPOLYMERS AND PROCESSES THEREOF - The present invention relates to novel neutral layer compositions and methods for using the neutral layer compositions for aligning microdomains of directed self-assembling block copolymers (BCP). The compositions and processes are useful for fabrication of electronic devices. The neutral layer composition comprises at least one random copolymer having at least one unit of structure (1), at least one unit of structure (2) and at least one unit of structure (3) | 07-10-2014 |
20140159278 | STABLE METAL COMPOUNDS, THEIR COMPOSITIONS AND METHODS - The present disclosure relates to soluble, multi-ligand-substituted metal compounds with improved stability as well as compositions made from them and methods of their use. | 06-12-2014 |
20140154624 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL - Disclosed herein is a photosensitive composition comprising a heterocyclic thiol compound or tautomeric form thereof and its method of use on a substrate, which may include a chalcophile substrate. | 06-05-2014 |
20140151330 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 06-05-2014 |
20140087311 | DEVELOPABLE BOTTOM ANTI-REFLECTIVE COATING - The present invention provides a cross-linking agent capable of preventing formation of scum from a bottom anti-reflective coating, and also provides a composition for forming a bottom anti-reflection coating containing the agent. The cross-linking agent is a nitrogen-containing aromatic compound having at least one vinyloxy group or N-methoxymethylamide group, and the composition contains the cross-linking agent. The cross-linking agent of the formula (1) can be produced by reaction of a nitrogen-containing aromatic compound, a halogen compound having a vinyloxy group or N-methoxymethylamide group and a basic compound. | 03-27-2014 |
20140038109 | ANTIREFLECTIVE COATING COMPOSITION AND PROCESS THEREOF - The invention relates to an antireflective coating composition comprising a crosslinkable polymer, where the crosslinkable polymer comprises at least one unit of fused aromatic moiety, at least one unit with a phenylene moiety in the backbone of the polymer, and at least one hydroxybiphenyl unit, furthermore where the polymer comprises a crosslinking moiety of structure (4), | 02-06-2014 |
20130337381 | NEGATIVE-WORKING THICK FILM PHOTORESIST - Disclosed are compositions for negative-working thick film photophotoresists based on acrylic co-polymers. Also included are methods of using the compositions. | 12-19-2013 |
20130337380 | POSITIVE PHOTOSENSITIVE MATERIAL - The invention relates to a novel positive working photosensitive composition having: at least one photoacid generator; at least one novolak polymer; at least one polymer, having a polymer backbone, said polymer comprising a structure of the following formula: | 12-19-2013 |
20130337379 | ANTIREFLECTIVE COMPOSITIONS AND METHODS OF USING SAME - The present invention relates to a novel antireflective coating composition comprising a polymer obtained from a reaction product of at least one amino compound chosen from the group consisting of a polymer with repeat unit of structure (1), structure (2) and mixtures thereof reacted with a hydroxy compound chosen from the group consisting of structure (3), structure (4) and mixtures thereof, and, a thermal acid generator. The invention also relates to a process for using the novel composition in lithography. | 12-19-2013 |
20130330668 | NEUTRAL LAYER POLYMER COMPOSITION FOR DIRECTED SELF ASSEMBLY AND PROCESSES THEREOF - The present invention relates to a novel polymeric composition comprising a novel polymer having two or more repeat units and a terminus having the structure (1): | 12-12-2013 |
20130316515 | METHOD FOR PRODUCING SILICON DIOXIDE FILM - [Problem] To provide a method capable of forming an insulating film suffering less from both shrinkage and stress. | 11-28-2013 |
20130233827 | METHODS AND MATERIALS FOR REMOVING METALS IN BLOCK COPOLYMERS - The present invention relates to a method for treating a block copolymer solution, wherein the method comprises: providing a solution comprising a block copolymer in a non aqueous solvent; and, treating the solution to remove metals using an ion exchange resin. The invention also relates to a method of forming patterns using the treated block copolymer. | 09-12-2013 |
20120296022 | POLYSILAZANE-CONTAINING COMPOSITION CAPABLE OF FORMING A DENSE SILICEOUS FILM - The present invention provides a polysilazane-containing composition capable of forming a dense siliceous film more rapidly and at a lower temperature than known polysilazane-containing composition. In a process for forming the siliceous film, the composition comprising a polysilazane compound, a particular amine compound and a solvent is coated on a substrate and converted into a siliceous substance. The particular amine compound preferably contains two amine groups separated from each other at the distance corresponding to five C—C bonds or more, and the amine groups preferably have hydrocarbon substituent groups. | 11-22-2012 |