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AZ ELECTRONIC MATERIALS K.K.
Tokyo, JP
| AZ ELECTRONIC MATERIALS K.K. Patent applications | ||
| Patent application number | Title | Published |
|---|---|---|
| 20110287360 | PHOTORESIST COMPOSITION AND METHOD OF FORMING PATTERN BY USING THE SAME - A photoresist composition is provided. The photoresist composition includes an alkali-soluble resin; a photosensitizer containing a first compound that contains a diazonaphthoquinone represented by Formula 1 and a second compound that contains a diazonaphthoquinone represented by Formula 2; and a solvent. | 11-24-2011 |