| AVIZA TECHNOLOGY LIMITED Patent applications |
| Patent application number | Title | Published |
|---|
| 20100108905 | PLASMA SOURCES - This invention relates to a plasma source in the form of plasma generator ( | 05-06-2010 |
| 20090170343 | METHOD AND APPARATUS FOR TREATING A SEMI-CONDUCTOR SUBSTRATE - This invention relates to a method of treating a semiconductor wafer and in particular, but not exclusively, to planarisation. The method consists of depositing a liquid short-chain polymer formed from a silicon containing bas or vapour. Subsequently water and OH are removed and the layer is stabilised. | 07-02-2009 |
| 20080245770 | Positive Displacement Pumping Chamber - A substrate processing system as illustrated at ( | 10-09-2008 |
