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AUROTEK CORPORTION

AUROTEK CORPORTION Patent applications
Patent application numberTitlePublished
20110159700FILM FORMATION SYSTEM AND FILM FORMATION METHOD - A film formation system and a film formation method are disclosed. The film formation method includes the following steps performed in the film formation system that includes a container containing liquid, a water draining means for draining the liquid, a ring-shaped component installed in the container, and a carrying component installed in the liquid in the container for carrying at least a substrate: enabling the carrying component in the liquid and enabling the ring-shaped component to float on the liquid; when a film layer that is composed of nano-spheres is formed on the liquid, locating the film layer in a ring of the ring-shaped component; and removing the liquid, allowing the film layer to move downward in accordance with the ring-shaped component and be formed on the substrate, thereby preventing the nano-spheres from contacting an inner wall of the container and bursting, through the installation of the ring-shaped component.06-30-2011