ASML Netherlands B.V. Patent applications |
Patent application number | Title | Published |
20160140267 | PROCESS BASED METROLOGY TARGET DESIGN - Methods and systems for automatically generating robust metrology targets which can accommodate a variety of lithography processes and process perturbations. Individual steps of an overall lithography process are modeled into a single process sequence to simulate the physical substrate processing. That process sequence drives the creation of a three-dimensional device geometry as a whole, rather than “building” the device geometry element-by-element. | 05-19-2016 |
20160139514 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate, A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa. | 05-19-2016 |
20160128170 | APPARATUS FOR AND METHOD OF SUPPLYING TARGET MATERIAL - An EUV light source target material handling system is disclosed which includes a target material dispenser and a target material repository in which solid target material in the target material repository is converted to target material in liquid form through the use of inductive heating. | 05-05-2016 |
20160124321 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus in which immersion liquid is supplied to a localized space, the space is substantially polygonal in plan substantially parallel to the substrate. In an embodiment, two corners of the space have a radius of curvature no greater than the width of a transition zone between the space configured to contain liquid and a surrounding configured not to contain liquid. | 05-05-2016 |
20160124319 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation. | 05-05-2016 |
20160116850 | LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed that includes a fluid handling system configured to confine immersion liquid to a localized space between a final element of a projection system and a substrate and/or table and a gas supplying device configured to supply gas with a solubility in immersion liquid of greater than 5×10 | 04-28-2016 |
20160116849 | METHOD OF DETERMINING CRITICAL-DIMENSION-RELATED PROPERTIES, INSPECTION APPARATUS AND DEVICE MANUFACTURING METHOD - A method of determining a critical-dimension-related property, such as critical dimension (CD) or exposure dose, includes illuminating each of a plurality of periodic targets having different respective critical dimension biases, measuring intensity of radiation scattered by the targets, recognizing and extracting each grating from the image, determining a differential signal, and determining the CD-related property based on the differential signal, the CD biases and knowledge that the differential signal approximates to zero at a 1:1 line-to-space ratio of such periodic targets. Use of the determined CD-related property to control a lithography apparatus in lithographic processing of subsequent substrates. In order to use just two CD biases, a calibration may use measurements on a “golden wafer” (i.e. a reference substrate) to determine the intensity gradient for each of the CD pairs, with known CDs. Alternatively, the calibration can be based upon simulation of the sensitivity of intensity gradient to CD. | 04-28-2016 |
20160116848 | LITHOGRAPHIC APPARATUS AND METHOD - A device manufacturing method includes conditioning a beam of radiation using an illumination system. The conditioning includes controlling an array of individually controllable elements and associated optical components of the illumination system to convert the radiation beam into a desired illumination mode, the controlling including allocating different individually controllable elements to different parts of the illumination mode in accordance with an allocation scheme, the allocation scheme selected to provide a desired modification of one or more properties of the illumination mode, the radiation beam or both. The method also includes patterning the radiation beam having the desired illumination mode with a pattern in its cross-section to form a patterned beam of radiation, and projecting the patterned radiation beam onto a target portion of a substrate. | 04-28-2016 |
20160110488 | SOURCE MASK OPTIMIZATION TO REDUCE STOCHASTIC EFFECTS - Disclosed herein is a computer-implemented method for improving a lithographic process for imaging a portion of a design layout onto a substrate using a lithographic projection apparatus, the method comprising defining a multi-variable cost function, the multi-variable cost function being a function of a stochastic effect of the lithographic process. | 04-21-2016 |
20160109814 | LITHOGRAPHIC APPARATUS, POSITIONING SYSTEM FOR USE IN A LITHOGRAPHIC APPARATUS AND METHOD - A lithographic apparatus having a reference body and a positioning system, the positioning system including a main body; a reaction body; an actuator; and a controller. The main body is moveable relative to the reference body along a path in a first direction and a second opposite direction. The reaction body is moveable relative to the main body along a further path in the first and second directions and is moveably connected to the reference body to be moveable relative to the reference body in the first and second directions. The controller provides a first and a second signal to the actuator. The actuator is arranged between the main body and the reaction body to accelerate the main body in the first direction and to accelerate the reaction body in the second direction under control of the first signal, and to accelerate the main body in the second direction and to accelerate the reaction body in the first direction under control of the second signal. The controller determines when the reaction body moves in the second direction and to provide the second signal after the first signal to the actuator when the reaction body moves in the second direction along the further path. | 04-21-2016 |
20160109812 | LITHOGRAPHIC APPARATUS - A lithographic apparatus including a substrate table position measurement system and a projection system position measurement system to measure a position of the substrate table and the projection system, respectively. The substrate table position measurement system includes a substrate table reference element mounted on the substrate table and a first sensor head. The substrate table reference element extends in a measurement plane substantially parallel to the holding plane of a substrate on substrate table. The holding plane is arranged at one side of the measurement plane and the first sensor head is arranged at an opposite side of the measurement plane. The projection system position measurement system includes one or more projection system reference elements and a sensor assembly. The sensor head and the sensor assembly or the associated projection system measurement elements are mounted on a sensor frame. | 04-21-2016 |
20160103399 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap. | 04-14-2016 |
20160103398 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the one or more meniscus pinning features, wherein the plurality of gas supply openings in a linear array are of a similar or the same size. | 04-14-2016 |
20160097984 | Focus Monitoring Arrangement and Inspection Apparatus Including such an Arrangement - An inspection apparatus ( | 04-07-2016 |
20160097983 | Inspection Method and Apparatus, Substrates for use Therein and Device Manufacturing Method - A substrate is provided with device structures and metrology structures ( | 04-07-2016 |
20160091422 | Inspection Apparatus And Device Manufacturing Method - An inspection apparatus comprises an illumination system ( | 03-31-2016 |
20160086324 | Method of Measuring a Property of a Target Structure, Inspection Apparatus, Lithographic System and Device Manufacturing Method - A property of a target structure is measured based on intensity of an image of the target. The method includes (a) obtaining an image of the target structure; (b) defining ( | 03-24-2016 |
20160085905 | PROCESS WINDOW IDENTIFIER - Disclosed herein is a computer-implemented method for determining an overlapping process window (OPW) of an area of interest on a portion of a design layout for a device manufacturing process for imaging the portion onto a substrate, the method comprising: obtaining a plurality of features in the area of interest; obtaining a plurality of values of one or more processing parameters of the device manufacturing process; determining existence of defects, probability of the existence of defects, or both in imaging the plurality of features by the device manufacturing process under each of the plurality of values; and determining the OPW of the area of interest from the existence of defects, the probability of the existence of defects, or both. | 03-24-2016 |
20160085161 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus. | 03-24-2016 |
20160078160 | METHOD OF SIMULATING FORMATION OF LITHOGRAPHY FEATURES BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - A method of determining an uncertainty in the position of a domain within a self-assembly block copolymer (BCP) feature. The method includes simulating a BCP feature, calculating a minimum energy position of a first domain within the simulated BCP feature, simulating the application of a potential that causes the position of the first domain to be displaced from the minimum energy position, simulating release of the potential back toward the minimum energy, recording a plurality of energies of the BCP feature during the release and recording at each of the plurality of energies a displacement of the first domain from the minimum energy position, calculating, from the recorded energies and recorded displacements, a probability distribution indicating a probability of the first domain being displaced from the minimum energy position, and, from the probability distribution, calculating an uncertainty in the position of the first domain within the BCP feature. | 03-17-2016 |
20160077450 | POSITIONING SYSTEM, A LITHOGRAPHIC APPARATUS AND A METHOD FOR POSITIONAL CONTROL - A positioning system for controlling a relative position between a first component and a second component of a lithographic apparatus, wherein a position of each component is defined by a set of orthogonal coordinates, the positioning system including: a measuring device configured to determine an error in the momentary position of one of the components with respect to a setpoint position in a measurement coordinate; and a controller configured to control movement of the other component in a control coordinate based on the determined error; wherein the measurement coordinate is different from the control coordinate. | 03-17-2016 |
20160077445 | ALIGNMENT SENSOR, LITHOGRAPHIC APPARATUS AND ALIGNMENT METHOD - An alignment sensor including an illumination source, such as a white light source, having an illumination grating operable to diffract higher order radiation at an angle dependent on wavelength; and illumination optics to deliver the diffracted radiation onto an alignment grating from at least two opposite directions. For every component wavelength incident on the alignment grating, and for each direction, the zeroth diffraction order of radiation incident from one of the two opposite directions overlaps a higher diffraction order of radiation incident from the other direction. This optically amplifies the higher diffraction orders with the overlapping zeroth orders. | 03-17-2016 |
20160070181 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A magnetization tool for post-assembly magnetization of a magnet assembly including a main coil, an end surface of the main coil configured to be positioned substantially parallel to an outer surface of the magnet assembly for magnetizing a magnetic pole of the magnet assembly, the main coil being configured to generate a magnetic field and a shielding arrangement positioned adjacent the main coil in a plane substantially parallel to the end surface of the main coil, whereby the shielding arrangement is configured to generate a shielding magnetic field, whereby a resulting magnetic field of the shielding magnetic field and the magnetic field is substantially only protruding the magnetic pole of the magnet assembly and directly adjacent magnetic poles of the magnet assembly such that the magnetic pole of the magnet assembly and the directly adjacent magnetic poles of the magnetic pole have a substantially opposite polarity. | 03-10-2016 |
20160070179 | METHOD OF CONTROLLING A RADIATION SOURCE AND LITHOGRAPHIC APPARATUS COMPRISING THE RADIATION SOURCE - A method of selecting a periodic modulation to be applied to a variable of a radiation source, wherein the source delivers radiation for projection onto a substrate and wherein there is relative motion between the substrate and the radiation at a scan speed, the method including: for a set of system parameters and for a position on the substrate, calculating a quantity, the quantity being a measure of the contribution to an energy dose delivered to the position that arises from the modulation being applied to the variable of the source, wherein the contribution to the energy dose is calculated as a convolution of: a profile of radiation, and a contribution to an irradiance of radiation delivered by the source; and selecting a modulation frequency at which the quantity for the set of system parameters and the position on the substrate satisfies a certain criteria. | 03-10-2016 |
20160070178 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between a projection system of the lithographic projection apparatus and a substrate. A sensor positioned on a substrate table, which holds the substrate, is configured to be exposed to radiation when immersed in liquid (e.g., under the same conditions as the substrate will be exposed to radiation). By having a surface of an absorption element of the sensor, that is to be in contact with liquid, formed of no more than one metal type, long life of the sensor may be obtained. | 03-10-2016 |
20160062248 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A map of the surface of a substrate is generated at a measurement station. The substrate is then moved to where a space between a projection lens and the substrate is filled with a liquid. The substrate is then aligned using, for example, a transmission image sensor and, using the previous mapping, the substrate can be accurately exposed. Thus the mapping does not take place in a liquid environment. | 03-03-2016 |
20160062247 | LITHOGRAPHIC APPARATUS, SUBSTRATE AND DEVICE MANUFACTURING METHOD - A method uses a lithographic apparatus to form an inspection target structure upon a substrate. The method comprises forming the periphery of the inspection target structure so as to provide a progressive optical contrast transition between the inspection target structure and its surrounding environment. This may be achieved by providing a progressive change in the optical index at the periphery of the target structure. | 03-03-2016 |
20160062243 | Lithographic Method and Apparatus - A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates. | 03-03-2016 |
20160061590 | Method For Controlling A Distance Between Two Objects, Inspection Apparatus And Method - A broadband spectroscopic analysis is used for controlling a distance (d) between a miniature solid immersion lens (SIL, | 03-03-2016 |
20160061589 | METROLOGY METHOD, TARGET AND SUBSTRATE - A diffraction measurement target that has at least a first sub-target and at least a second sub-target, and wherein (1) the first and second sub-targets each include a pair of periodic structures and the first sub-target has a different design than the second sub-target, the different design including the first sub-target periodic structures having a different pitch, feature width, space width, and/or segmentation than the second sub-target periodic structure or (2) the first and second sub-targets respectively include a first and second periodic structure in a first layer, and a third periodic structure is located at least partly underneath the first periodic structure in a second layer under the first layer and there being no periodic structure underneath the second periodic structure in the second layer, and a fourth periodic structure is located at least partly underneath the second periodic structure in a third layer under the second layer. | 03-03-2016 |
20160054665 | SUBSTRATE PLACEMENT IN IMMERSION LITHOGRAPHY - A method for determining an offset between a center of a substrate and a center of a depression in a chuck includes providing a test substrate to the depression, the test substrate having a dimension smaller than a dimension of the depression, measuring a position of an alignment mark of the test substrate while in the depression, and determining the offset between the center of the substrate and the center of the depression from the position of the alignment mark. | 02-25-2016 |
20160054647 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system has a final element. The apparatus also includes a barrier member surrounding a space between the projection system and, in use, the substrate, to define in part with the final element a reservoir for liquid. The barrier member is spaced from the final element to define a gap therebetween. The apparatus further includes a deformable seal between a radially outer surface of the final element and a radially outer surface of the barrier member. The deformable seal is configured to substantially prevent a gas from flowing past the seal towards or away from the reservoir of liquid. | 02-25-2016 |
20160048085 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD INVOLVING A HEATER - A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater. | 02-18-2016 |
20160041478 | Lithography Cluster, Method and Control Unit for Automatic Rework of Exposed Substrates - A lithography cluster comprises a track unit, a lithography apparatus, a metrology unit, a control unit and a strip unit. The track unit is for applying a layer on a substrate for lithographic exposure. The lithography apparatus is for exposing the layer according to a pattern. The metrology unit is for measuring a property of the exposed pattern in the layer. The control unit is for controlling an automatic substrate flow between the track unit, the lithography apparatus, and the metrology unit. The strip unit is for removing the layer from the substrate. The control unit is constructed and arranged for controlling the automatic substrate flow on the basis of the measured property such that the substrate is directed to the strip unit for removing the layer if a measured property of its pattern falls outside a pre-determined quality range. | 02-11-2016 |
20160041374 | Radiation Collector, Radiation Source and Lithographic Apparatus - A radiation collector ( | 02-11-2016 |
20160035605 | Support Structure, Method of Controlling the Temperature Of The Same, and Apparatuses Including the Same - Disclosed are support structure apparatuses for holding a substrate or patterning device, for example in a lithographic apparatus, and apparatuses comprising such support structure apparatuses. The support structure apparatus comprises a temperature regulation system for controlling the temperature of the support structure and one or more temperature sensors located on the periphery of said support structure being operable to measure the temperature of the support structure at said periphery. The temperature regulation system may be operable to calculate an average temperature of the substrate holder from temperature values measured by said temperature sensors and position dependent correlation factors, which depend upon the position of an applied heat load on a substrate or patterning device mounted upon the support structure. | 02-04-2016 |
20160033877 | Metrology Method and Inspection Apparatus, Lithographic System and Device Manufacturing Method - Methods are disclosed for measuring target structures formed by a lithographic process on a substrate. A grating structure within the target is smaller than an illumination spot and field of view of a measurement optical system. The optical system has a first branch leading to a pupil plane imaging sensor and a second branch leading to a substrate plane imaging sensor. A spatial light modulator is arranged in an intermediate pupil plane of the second branch of the optical system. The SLM imparts a programmable pattern of attenuation that may be used to correct for asymmetries between the first and second modes of illumination or imaging. By use of specific target designs and machine-learning processes, the attenuation patterns may also be programmed to act as filter functions, enhancing sensitivity to specific parameters of interest, such as focus. | 02-04-2016 |
20160033876 | IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS - An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid. | 02-04-2016 |
20160033875 | LITHOGRAPHIC APPARATUS AND CONTAMINATION REMOVAL OR PREVENTION METHOD - An immersion lithographic apparatus is cleaned by use of a cleaning liquid consisting essentially of ultra-pure water and (a) a mixture of hydrogen peroxide and ozone, or (b) hydrogen peroxide at a concentration of up to 5%, or (c) ozone at a concentration of up to 50 ppm, or (d) oxygen at concentration of up to 10 ppm, or (e) any combination selected from (a)-(d). | 02-04-2016 |
20160033872 | METHOD OF PERFORMING MODEL-BASED SCANNER TUNING - A model-based tuning method for tuning a first lithography system utilizing a reference lithography system, each of which has tunable parameters for controlling imaging performance. The method includes the steps of defining a test pattern and an imaging model; imaging the test pattern utilizing the reference lithography system and measuring the imaging results; imaging the test pattern utilizing the first lithography system and measuring the imaging results; calibrating the imaging model utilizing the imaging results corresponding to the reference lithography system, where the calibrated imaging model has a first set of parameter values; tuning the calibrated imaging model utilizing the imaging results corresponding to the first lithography system, where the tuned calibrated model has a second set of parameter values; and adjusting the parameters of the first lithography system based on a difference between the first set of parameter values and the second set of parameter values. | 02-04-2016 |
20160033860 | Lithographic Apparatus - The present invention is concerned with an apparatus for shielding a reticle for EUV lithography. The apparatus comprises a pellicle, and at least one actuator in communication with the pellicle, the actuator being configured to induce, in use, movement of the pellicle with respect to a reticle. | 02-04-2016 |
20160026750 | PATTERN SELECTION FOR FULL-CHIP SOURCE AND MASK OPTIMIZATION - The present invention relates to lithographic apparatuses and processes, and more particularly to tools for co-optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present invention enables full chip pattern coverage while lowering the computation cost by intelligently selecting a small set of critical design patterns from the full set of clips to be used in source and mask optimization. Optimization is performed only on these selected patterns to obtain an optimized source. The optimized source is then used to optimize the mask (e.g. using OPC and manufacturability verification) for the full chip, and the process window performance results are compared. If the results are comparable to conventional full-chip SMO, the process ends, otherwise various methods are provided for iteratively converging on the successful result. | 01-28-2016 |
20160026096 | Method of Determining Dose, Inspection Apparatus, Patterning Device, Substrate and Device Manufacturing Method - A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate, the method comprising the steps: (a) receiving a substrate comprising first and second structures produced using the lithographic process; (b) detecting scattered radiation while illuminating the first structure with radiation to obtain a first scatterometer signal; (c) detecting scattered radiation while illuminating the second structure with radiation to obtain a second scatterometer signal; (d) using the first and second scatterometer signals to determine an exposure dose value used to produce said first and second structures wherein the first structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose and the second structure has a first periodic characteristic with spatial characteristics and yet at least another second periodic characteristic with spatial characteristics designed to be affected by the exposure dose wherein the exposure dose affects the exposure dose affected spatial characteristics of the first and second structures in a different manner. | 01-28-2016 |
20160026095 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an embodiment, a lithographic projection apparatus has an off-axis image field and a concave refractive lens as the final element of the projection system. The concave lens can be cut-away in parts not used optically to prevent bubbles from being trapped under the lens. | 01-28-2016 |
20160026091 | Radiation Collector, Radiation Source and Lithographic Apparatus - A radiation collector comprising a first collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a first location at a distance from the radiation collector, a second collector segment comprising a plurality of grazing incidence reflector shells configured to direct radiation to converge in a second location at said distance from the radiation collector, wherein the first location and the second location are separated from one another. | 01-28-2016 |
20160026085 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion. | 01-28-2016 |
20160025992 | Illumination System, Inspection Apparatus Including Such an Illumination System, Inspection Method and Manufacturing Method - In an illumination system ( | 01-28-2016 |
20160018744 | OBJECT HOLDER, LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF MANUFACTURING AN OBJECT HOLDER - A method of manufacturing an object holder for use in a lithographic apparatus, the object holder including one or more electrically functional components, the method including: using a composite structure including a carrier sheet different from a main body of the object holder and a layered structure including one or a plurality of layers and formed on the carrier sheet; connecting the composite structure to a surface of the main body such that the layered structure is between the carrier sheet and the surface of the main body; and removing the carrier sheet from the composite structure, leaving the layered structure connected to the main body. | 01-21-2016 |
20160018742 | Method of Measuring Overlay Error and a Device Manufacturing Method - The overlay error of a target in a scribelane is measured. The overlay error of the required feature in the chip area may differ from this due to, for example, different responses to the exposure process. A model is used to simulate these differences and thus a more accurate measurement of the overlay error of the feature determined. | 01-21-2016 |
20160004172 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A position control system includes a position measurement system including a first position measurement configuration arranged to determine a position of an object in a first operating area and a second position measurement configuration to determine a position of the object in a second operating area; and a control unit configured to control a position of the object, the control unit including a first and a second controller, the first and second controllers being arranged to convert an input signal representing a position of the object to a respectively first and second control signal, the control unit being arranged to determine a combined control signal for controlling the position of the object in an overlapping area of the first and second operating area, wherein the combined control signal is obtained by applying a continuous weight function to the first and second control signal. | 01-07-2016 |
20160004171 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic projection apparatus is disclosed in which liquid is provided between a projection system of the apparatus and a substrate. The use of both liquidphobic and liquidphilic layers on various elements of the apparatus is provided to help prevent formation of bubbles in the liquid and to help reduce residue on the elements after being in contact with the liquid. | 01-07-2016 |
20160004170 | Lithographic Apparatus and Device Manufacturing Method - Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s). | 01-07-2016 |
20150380266 | METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - Causing a self-assemblable block copolymer (BCP) having first and second blocks to migrate from a region surrounding a lithography recess of the substrate and a dummy recess on the substrate to within the lithography recess and the dummy recess, causing the BCP to self-assemble into an ordered layer within the lithography recess, the layer having a first block domain and a second block domain, and selectively removing the first domain to form a lithography feature having the second domain within the lithography recess, wherein a width of the dummy recess is smaller than the minimum width required by the BCP to self-assemble, the dummy recess is within the region of the substrate surrounding the lithography recess from which the BCP is caused to migrate, and the width between portions of a side-wall of the lithography recess is greater than the width between portions of a side-wall of the dummy recess. | 12-31-2015 |
20150378264 | A LITHOGRAPHY MODEL FOR THREE-DIMENSIONAL PATTERNING DEVICE - A computer-implemented method for simulating a scattered radiation field of a patterning device including one or more features, in a lithographic projection apparatus, the method including: determining a scattering function of the patterning device using one or more scattering functions of feature elements of the one or more features; wherein at least one of the one or more features is a three-dimensional feature, or the one or more scattering functions characterize scattering of incident radiation fields at a plurality of incident angles on the feature elements. | 12-31-2015 |
20150370180 | Lithographic Apparatus and Method - A support such as a clamp ( | 12-24-2015 |
20150370178 | Electrostatic Clamp - An electrostatic clamp ( | 12-24-2015 |
20150370177 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus having an optical column capable of creating a pattern on a target portion of a substrate is disclosed. The optical column may have a self-emissive contrast device configured to emit a beam, and a projection system configured to project the beam onto the target portion. The apparatus may also have an actuator to move the optical column or a part thereof with respect to the substrate. The apparatus may be constructed to reduce the optical effect of density variation in a medium around the moving part of the optical column on the beam. | 12-24-2015 |
20150370174 | PATTERNING DEVICE, METHOD OF PRODUCING A MARKER ON A SUBSTRATE AND DEVICE MANUFACTURING METHOD - A patterning device, for use in forming a marker on a substrate by optical projection, the patterning device including a marker pattern having a density profile that is periodic with a fundamental spatial frequency corresponding to a desired periodicity of the marker to be formed. The density profile is modulated (such as sinusoidally) so as to suppress one or more harmonics of the fundamental frequency, relative to a simple binary profile having the fundamental frequency. | 12-24-2015 |
20150364335 | METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - A method of forming a plurality of regularly spaced lithography features, the method including providing a self-assemblable block copolymer having first and second blocks in a plurality of trenches on a substrate, each trench including opposing side-walls and a base, with the side-walls having a width therebetween, wherein a first trench has a greater width than a second trench; causing the self-assemblable block copolymer to self-assemble into an ordered layer in each trench, the layer having a first domain of the first block alternating with a second domain of the second block, wherein the first and second trenches have the same number of each respective domain; and selectively removing the first domain to form regularly spaced rows of lithography features having the second domain along each trench, wherein the pitch of the features in the first trench is greater than the pitch of the features in the second trench. | 12-17-2015 |
20150362844 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a structure surrounds a space between the projection system and a substrate table of the lithographic projection apparatus. A gas seal is formed between said structure and the surface of said substrate to contain liquid in the space. | 12-17-2015 |
20150356234 | FAST FREEFORM SOURCE AND MASK CO-OPTIMIZATION METHOD - The present disclosure relates to lithographic apparatuses and processes, and more particularly to tools for optimizing illumination sources and masks for use in lithographic apparatuses and processes. According to certain aspects, the present disclosure significantly speeds up the convergence of the optimization by allowing direct computation of gradient of the cost function. According to other aspects, the present disclosure allows for simultaneous optimization of both source and mask, thereby significantly speeding the overall convergence. According to still further aspects, the present disclosure allows for free-form optimization, without the constraints required by conventional optimization techniques. | 12-10-2015 |
20150356233 | COMPUTATIONAL WAFER INSPECTION - Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a portion of a design layout onto a substrate, the method comprising: identifying a hot spot from the portion of the design layout; determining a range of values of a processing parameter of the device manufacturing process for the hot spot, wherein when the processing parameter has a value outside the range, a defect is produced from the hot spot with the device manufacturing process; determining an actual value of the processing parameter; determining or predicting, using the actual value, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the hot spot with the device manufacturing process. | 12-10-2015 |
20150355557 | Gas Flow Optimization in Reticle Stage Environment - A system is disclosed for reducing overlay errors by controlling gas flow around a patterning device of a lithographic apparatus. The lithographic apparatus includes an illumination system configured to condition a radiation beam. The lithographic apparatus further includes a movable stage comprising a support structure that may be configured to support a patterning device. The patterning device may be configured to impart the radiation beam with a pattern in its cross-section to form a patterned radiation beam. In addition, the lithographic apparatus comprises a plate ( | 12-10-2015 |
20150355556 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithographic apparatus is disclosed in which at least a part of the liquid supply system (which provides liquid between the projection system and the substrate) is moveable in a plane substantially parallel to a top surface of the substrate during scanning. The part is moved to reduce the relative velocity between that part and the substrate so that the speed at which the substrate may be moved relative to the projection system may be increased. | 12-10-2015 |
20150355554 | METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes an alignment sensor including a self-referencing interferometer for reading the position of a mark including a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot which scans said structure. Multiple position-dependent signals are detected in a detection optical system and processed to obtain multiple candidate position measurements. Each mark includes sub-structures of a size smaller than a resolution of the optical system. Each mark is formed with a positional offset between the sub-structures and larger structures that is a combination of both known and unknown components. A measured position of at least one mark is calculated using signals from a pair of marks, together with information on differences between the known offsets, in order to correct for said unknown component of said positional offset. | 12-10-2015 |
20150355025 | Estimation of Spectral Feature of Pulsed Light Beam - A method is described for estimating a spectral feature of a pulsed light beam produced by an optical source and directed toward a wafer of a lithography apparatus. The method includes receiving a set of N optical spectra of pulses of the light beam; saving the received N optical spectra to a saved set; transforming the optical spectra in the saved set to form a set of transformed optical spectra; averaging the transformed optical spectra to form an averaged spectrum; and estimating a spectral feature of the pulsed light beam based on the averaged spectrum. | 12-10-2015 |
20150346609 | Inspection Apparatus and Method - A spectroscopic scatterometer detects both zero order and higher order radiation diffracted from an illuminated spot on a target grating. The apparatus forms and detects a spectrum of zero order (reflected) radiation, and separately forms and detects a spectrum of the higher order diffracted radiation. Each spectrum is formed using a symmetrical phase grating, so as to form and detect a symmetrical pair of spectra. The pair of spectra can be averaged to obtain a single spectrum with reduced focus sensitivity. Comparing the two spectra can yield information for improving height measurements in a subsequent lithographic step. The target grating is oriented obliquely so that the zero order and higher order radiation emanate from the spot in different planes. Two scatterometers can operate simultaneously, illuminating the target from different oblique directions. A radial transmission filter reduces sidelobes in the spot and reduces product crosstalk. | 12-03-2015 |
20150346606 | Lithographic Method and Apparatus - A method of patterning substrates using a lithographic apparatus. The method comprising providing a beam of radiation using an illumination system, using a patterning device to impart the radiation beam with a pattern in its cross-section, and using a projection system to project the patterned radiation beam onto target portions of a lot of substrates, wherein the method further comprises performing a radiation beam aberration measurement after projecting the patterned radiation beam onto a subset of the lot of substrates, performing an adjustment of the projection system using the results of the radiation beam aberration measurement, then projecting the patterned radiation beam onto a further subset of the lot of substrates. | 12-03-2015 |
20150346605 | Method of Designing Metrology Targets, Substrates Having Metrology Targets, Method of Measuring Overlay, and Device Manufacturing Method - Metrology targets are formed by a lithographic process, each target comprising a bottom grating and a top grating. Overlay performance of the lithographic process can be measured by illuminating each target with radiation and observing asymmetry in diffracted radiation. Parameters of metrology recipe and target design are selected so as to maximize accuracy of measurement of overlay, rather than reproducibility. The method includes calculating at least one of a relative amplitude and a relative phase between (i) a first radiation component representing radiation diffracted by the top grating and (ii) a second radiation component representing radiation diffracted by the bottom grating after traveling through the top grating and intervening layers. The top grating design may be modified to bring the relative amplitude close to unity. The wavelength of illuminating radiation in the metrology recipe can be adjusted to bring the relative phase close to π/2 or 3π/2. | 12-03-2015 |
20150346116 | Metrology Method and Apparatus, Lithographic System and Device Manufacturing Method - A lithographic process is used to form a plurality of target structures (T) on a substrate (W). Each target structure comprises overlaid gratings each having a specific overlay bias. Asymmetry (A) of each grating, measured by scatterometry, includes contributions due to (i) the overlay bias, (ii) an overlay error (OV) in the lithographic process and (iii) bottom grating asymmetry within the overlaid gratings. Asymmetry measurements are obtained for three or more target structures having three or more different values of overlay bias (e.g., −d, | 12-03-2015 |
20150343461 | Deposition Method and Apparatus - A method for depositing a protective layer of material on a localized area on a substrate, such as a pattern of photo resist, includes forming a controlled environment around the substrate and positioning a hollow needle adjacent to the localized area on the substrate. A liquid comprising the material is directed through the hollow needle onto the localized area, so as to deposit a layer of the material on the localized area. The layer of material may act as a Z-contrast forming layer in TEM. | 12-03-2015 |
20150338753 | Radiation Source and Lithographic Apparatus - A radiation source comprising a fuel source configured to deliver fuel to a location from which the fuel emits EUV radiation. The radiation source further comprises an immobile fuel debris receiving surface provided with a plurality of grooves. The grooves have orientations which are arranged to direct the flow of liquid fuel under the influence of gravity in one or more desired directions. | 11-26-2015 |
20150338752 | MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS - A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating. | 11-26-2015 |
20150338749 | Method of Determining Focus, Inspection Apparatus, Patterning Device, Substrate and Device Manufacturing Method - A method of determining focus of a lithographic apparatus has the following steps. Using the lithographic process to produce first and second structures on the substrate, the first structure has features which have a profile that has an asymmetry that depends on the focus and an exposure perturbation, such as dose or aberration. The second structure has features which have a profile that is differently sensitive to focus than the first structure and which is differently sensitive to exposure perturbation than the first structure. Scatterometer signals are used to determine a focus value used to produce the first structure. This may be done using the second scatterometer signal, and/or recorded exposure perturbation settings used in the lithographic process, to select a calibration curve for use in determining the focus value using the first scatterometer signal or by using a model with parameters related to the first and second scatterometer signals. | 11-26-2015 |
20150338748 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure configured to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a substrate table configured to hold a substrate; a projection system configured to project the patterned beam onto a target portion of the substrate; a liquid supply system configured to provide liquid to a space between the projection system and the substrate; and a shutter configured to isolate the space from the substrate or a space to be occupied by a substrate. | 11-26-2015 |
20150334813 | Beam Delivery for EUV Lithography - A beam delivery apparatus is used with a laser produced plasma source. The beam delivery apparatus comprises variable zoom optics ( | 11-19-2015 |
20150331338 | Substrate Support for a Lithographic Apparatus and Lithographic Apparatus - Disclosed is a substrate support for an apparatus of the type which projects a beam of EUV radiation onto a target portion of a substrate ( | 11-19-2015 |
20150331336 | Substrate and Patterning Device for Use in Metrology, Metrology Method and Device Manufacturing Method - A pattern from a patterning device is applied to a substrate by a lithographic apparatus. The applied pattern includes product features and metrology targets. The metrology targets include large targets which are for measuring overlay using X-ray scattering and small targets which are for measuring overlay by diffraction of visible radiation. Some of the smaller targets are distributed at locations between the larger targets, while other small targets are placed at the same locations as a large target. By comparing values measured using a small target and large target at the same location, parameter values measured using all the small targets can be corrected for better accuracy. The large targets can be located primarily within scribe lanes while the small targets are distributed within product areas. | 11-19-2015 |
20150331334 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus and device manufacturing method makes use of a liquid confined in a reservoir between the projection system and the substrate. Bubbles forming in the liquid from dissolved atmospheric gases or from out-gassing from apparatus elements exposed to the liquid are detected and/or removed so that they do not interfere with exposure and lead to printing defects on the substrate. Detection may be carried out by measuring the frequency dependence of ultrasonic attenuation in the liquid and bubble removal may be implemented by degassing and pressurizing the liquid, isolating the liquid from the atmosphere, using liquids of low surface tension, providing a continuous flow of liquid through the imaging field, and/or phase shifting ultrasonic standing-wave node patterns. | 11-19-2015 |
20150323876 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow. | 11-12-2015 |
20150323872 | Projection System and Mirror and Radiation Source for a Lithographic Apparatus - Disclosed is a system configured to project a beam of radiation onto a target portion of a substrate within a lithographic apparatus. The system comprises a mirror ( | 11-12-2015 |
20150316860 | LITHOGRAPHIC APPARATUS, SUBSTRATE SUPPORT SYSTEM, DEVICE MANUFACTURING METHOD AND CONTROL PROGRAM - A lithographic apparatus includes a driven object having compliant dynamics; a plurality of actuators configured to act on the driven object, wherein the plurality of actuators are over-determined in an actuator degree of freedom; a control system including a transformation matrix configured to generate controller output signals for each of the plurality of actuators in response to a setpoint, wherein the transformation matrix is configured such that the controller output signals do not excite the compliant dynamics of the driven object in at least one degree of freedom. | 11-05-2015 |
20150316858 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table. | 11-05-2015 |
20150316856 | POSITION MEASUREMENT SYSTEM, GRATING FOR A POSITION MEASUREMENT SYSTEM AND METHOD - A position measurement system to determine a position of a first object relative to a second object, includes an encoder head mounted on the first object, a grating mounted on the second object, wherein the grating includes a first array of grating lines in a first direction and a second array of grating lines in a second direction to diffract a measurement beam incident on the first and second arrays in at least one first diffracted beam in the first direction and in at least one second diffracted beam in the second direction, wherein the first diffracted beam is for position measurement in the first direction and the second diffracted beam is for position measurement in the second direction, wherein the measurement beam has a power quantity, and the grating is configured to distribute the power quantity unevenly over the first and second diffracted beams. | 11-05-2015 |
20150309422 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A gas knife configured to dry a surface in an immersion lithographic apparatus is optimized to remove liquid by ensuring that a pressure gradient is built up in the liquid film on the surface being dried. | 10-29-2015 |
20150309421 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a plurality of gas supply openings in a linear array at least partly surrounding and radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the plurality of gas supply openings in a linear array. | 10-29-2015 |
20150309420 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A liquid supply system for an immersion lithographic apparatus provides a laminar flow of immersion liquid between a final element of the projection system and a substrate. A control system minimizes the chances of overflowing and an extractor includes an array of outlets configured to minimize vibrations. | 10-29-2015 |
20150309419 | LITHOGRAPHIC APPARATUS AND TABLE FOR USE IN SUCH AN APPARATUS - An immersion lithographic apparatus includes a projection system, a first table with a first planar surface and a second table with a second planar surface, the first and second planar surfaces being substantially coplanar, a liquid confinement system configured to spatially confine an immersion liquid to a volume with a first surface area that is coplanar with the first and second planar surfaces, and is substantially smaller than a second surface area of the top surface of the substrate, and a swap bridge member attached to the first table, the swap bridge member having an upper surface that is substantially coplanar with the first and second planar surfaces, wherein the upper surface of the swap bridge member is configured to serve as part of the liquid confinement system and to deform when the swap bridge member collides with the second table and to remain attached to the first table | 10-29-2015 |
20150308895 | Metrology Method and Apparatus, Lithographic Apparatus, and Device Manufacturing Method - A metrology apparatus includes first ( | 10-29-2015 |
20150296602 | Method and Apparatus for Generating Radiation - A method of generating radiation for a lithography apparatus. The method comprises providing a continuously renewing fuel target ( | 10-15-2015 |
20150294998 | Sensor and Lithographic Apparatus - A backside illuminated sensor comprising a supporting substrate, a semiconductor layer which comprises a photodiode comprising a region of n-doped semiconductor provided at a first surface of the semiconductor layer, and a region of p-doped semiconductor, wherein a depletion region is formed between the region of n-doped semiconductor and the region of p-doped semiconductor, and a layer of p-doping protective material provided on a second surface of the semiconductor layer, wherein the first surface of the semiconductor layer is fixed to a surface of the supporting substrate. | 10-15-2015 |
20150293458 | Method of Determining Dose and Focus, Inspection Apparatus, Patterning Device, Substrate and Device Manufacturing Method - A method of determining exposure dose of a lithographic apparatus used in a lithographic process on a substrate. Using the lithographic process to produce a first structure on the substrate, the first structure having a dose-sensitive feature which has a form that depends on exposure dose of the lithographic apparatus on the substrate. Using the lithographic process to produce a second structure on the substrate, the second structure having a dose-sensitive feature which has a form that depends on the exposure dose of the lithographic apparatus but which has a different sensitivity to the exposure dose than the first structure. Detecting scattered radiation while illuminating the first and second structures with radiation to obtain first and second scatterometer signals. Using the first and second scatterometer signals to determine an exposure dose value used to produce at least one of the first and second structures. | 10-15-2015 |
20150293456 | DROPLET GENERATOR, EUV RADIATION SOURCE, LITHOGRAPHIC APPARATUS, METHOD FOR GENERATING DROPLETS AND DEVICE MANUFACTURING METHOD - A droplet generator, for an EUV radiation source, comprises: a capillary in which, in use, molten material flows; an actuator configured to modulate a pressure inside the capillary; and a controller configured to drive the actuator at a driving frequency; wherein the droplet generator is arranged such that, in use, the driving frequency is equal or about equal to a main resonance frequency of the molten material in the capillary. | 10-15-2015 |
20150286153 | SENSOR SYSTEM FOR LITHOGRAPHY - A sensor system to measure a physical quantity, the system including a parallel detection arrangement with multiple detectors to allow measurements in parallel at different spatial locations, wherein the multiple detectors share a noise source, wherein the sensor system is configured such that the multiple detectors each output a signal as a function of the physical quantity, and wherein the sensor system is configured such that at least one detector responds differently to noise originating from the shared noise source than the one or more other detectors | 10-08-2015 |
20150286145 | Lithographic Apparatus - A radiation source for a lithographic apparatus uses a plurality of fiber lasers to ignite a fuel droplet at an ignition location to generate EUV radiation. The fiber lasers may be provided to emit parallel to an optical axis and a telescopic optical system is provided to focus the lasers at the ignition location, or the lasers may be directed towards the optical axis with a final focus lens being used to reduce beam waist. The lasers may be provided in two or more groups to allow them to be independently controlled and some of the lasers may be focused at a different location to provide a pre-pulse. Radiation from fiber lasers may also be combined using dichroic mirrors. | 10-08-2015 |
20150277243 | SUPPORT TABLE FOR A LITHOGRAPHIC APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support table for a lithographic apparatus, the support table having a support section and a conditioning system, wherein the support section, the conditioning system, or both, is configured such that heat transfer to or from a substrate supported on the support table, resulting from the operation of the conditioning system, is greater in a region of the substrate adjacent an edge of the substrate than it is in a region of the substrate that is at the center of the substrate. | 10-01-2015 |
20150277242 | SUBSTRATE POSITIONING SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A positioning system for positioning an object in a lithographic apparatus, including: a first and second object tables moveable in an operating area; a first position measurement system to provide an incremental position measurement of the second object table relative to a reference when in the operating area, wherein the first position measurement system is configured to provide an absolute position measurement of the first object table relative to the reference; a second position measurement system to provide an absolute position measurement of the first object table relative to the second object table, and wherein the first position measurement system is further configured to provide an absolute position measurement of the second object table relative to the reference based on the absolute position measurement of the first object table relative to the reference and on the absolute position measurement of the first object table relative to the second object table. | 10-01-2015 |
20150277241 | Patterning Device Manipulating System and Lithographic Apparatuses | 10-01-2015 |
20150277240 | Patterning Device Support and Lithographic Apparatus - A patterning device support ( | 10-01-2015 |
20150277238 | SUBSTRATE TABLE, IMMERSION LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A substrate table for an immersion lithographic apparatus is disclosed having a recess, configured to receive a substrate of a given size, and a fluid extraction system, configured to extract fluid from a gap between the edge of the substrate and the edge of the recess, the fluid extraction system configured such that the rate of flow of fluid extracted from a localized section of the gap is greater than the rate of flow of fluid extracted from another section of the gap. | 10-01-2015 |
20150268559 | Method and Apparatus for Generating Radiation - A radiation source (e.g., LPP— laser produced plasma source) for generation of extreme UV (EUV) radiation has at least two fuel particle streams having different trajectories. Each stream is directed to cross the path of an excitation (laser) beam focused at a plasma formation region, but the trajectories are spaced apart at the plasma formation region, and the streams phased, so that only one stream has a fuel particle in the plasma formation region at any time, and so that when a fuel particle from one stream is generating plasma and EUV radiation at the plasma generation region, other fuel particles are sufficiently spaced so as to be substantially unaffected by the plasma. The arrangement permits potential doubling of the radiation intensity achievable for a particular fuel particle size. | 09-24-2015 |
20150264791 | Method and Apparatus for Generating Radiation - A method for generating radiation. Directing a first body from a first location. Directing a second body from a second, different location. The first body and second body being used to form a target at a plasma formation location. At least one of the first body and second body comprising a fuel for use in generating a radiation generating plasma. Directing initiating radiation at the target at the plasma formation location to generate a radiation generating plasma from the target. | 09-17-2015 |
20150261102 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus includes a support structure to hold a patterning device, the patterning device configured to pattern a beam of radiation according to a desired pattern; a projection system to project the patterned beam onto a target portion of a substrate; a substrate table configured to hold the substrate, the substrate table including a support surface to support an intermediary plate between the projection system and at least one of the substrate and an object positioned on the substrate table and not in contact with the at least one of the substrate and the object; and a liquid supply system to provide a liquid, through which the beam is to be projected, in a space between the projection system and the at least one of the substrate and the object. | 09-17-2015 |
20150261100 | Alignment Measurement System, Lithographic Apparatus, and a Method to Determine Alignment of in a Lithographic Apparatus - An alignment measurement system measures an alignment target on an object. A measurement illuminates the target and is reflected. The reflected measurement beam is split and its parts are differently polarized. A detector receives the reflected measurement beam. A processing unit determines alignment on the basis of the measurement beam received by the detector. An alternative arrangement utilizes an optical dispersive fiber to guide a multi-wavelength measurement beam reflected from the object to a detector. | 09-17-2015 |
20150261097 | Position Measuring Apparatus, Position Measuring Method, Lithographic Apparatus and Device Manufacturing Method - An apparatus for measuring positions of marks on a substrate, includes an illumination arrangement for supplying radiation with a predetermined illumination profile across a pupil of the apparatus, an objective lens for forming a spot of radiation on a mark using radiation supplied by said illumination arrangement, a radiation processing element for processing radiation that is diffracted by the mark, a first detection arrangement for detecting variations in an intensity of radiation output by the radiation processing element and for calculating therefrom a position of the mark, an optical arrangement, a second detection arrangement, wherein the optical arrangement serves to direct diffracted radiation to the second detection arrangement, and wherein the second detection arrangement is configured to detect size and/or position variations in the radiation and to calculate therefrom a defocus and/or local tilt of the mark. | 09-17-2015 |
20150261095 | Radiation Source - A radiation source suitable for providing a beam of radiation to an illuminator of a lithographic apparatus. The radiation source comprises a nozzle configured to direct a stream of fuel droplets along a trajectory towards a plasma formation location. The radiation source is configured to receive a first amount of radiation such that, in use, the first amount of radiation is incident on a fuel droplet at the plasma formation location, and such that, in use, the first amount of radiation transfers energy to the fuel droplet to generate a radiation generating plasma that emits a second amount of radiation. The radiation source further comprises a first sensor arrangement configured to measure a property of the first amount of radiation that is indicative of a focus position of the first amount of radiation; and a second sensor arrangement configured to measure a property of a fuel droplet that is indicative of a position of the fuel droplet. | 09-17-2015 |
20150261093 | Actuation Mechanism, Optical Apparatus, Lithography Apparatus and Method of Manufacturing Devices - An EUV optical apparatus includes a number of adjustable mirrors ( | 09-17-2015 |
20150253679 | Lithographic Method and Apparatus - A method of exposing a patterned area on a substrate using an EUV lithographic apparatus having a demagnification of about 5× and a numerical aperture of about 0.4 is disclosed. The method comprises exposing a first portion of the patterned area on the substrate using a first exposure, the first portion dimensions are significantly less than the dimensions of a conventional exposure, and exposing one or more additional portions of the patterned area on the substrate using one or more additional exposures, the additional portions having dimensions which are significantly less than the dimensions of a conventional exposure. The method further comprises repeating the above to expose a second patterned area on the substrate, the second patterned area being provided with the same pattern as the first patterned area, wherein a distance between centre points of the first and second patterned areas corresponds with a dimension of a conventional exposure. | 09-10-2015 |
20150241797 | Reticle Cleaning by Means of Sticky Surface - Methods and systems are described for cleaning contamination from the surface of an object within a lithographic apparatus. A lithographic apparatus is provided that includes an illumination system configured to condition a radiation beam, a support constructed to hold a patterning device ( | 08-27-2015 |
20150241796 | Reticle Cooling System In A Lithographic Apparatus - A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a patterning device support configured to support a patterning device and a reticle cooling system configured to provide substantially uniform temperature distribution across the patterning device. The reticle cooling system includes a first and second array of gas inlets configured to provide a first and second gas flow along a first and second direction across a surface of the patterning device, respectively, where first and second directions are opposite to each other. The reticle cooling system further includes a switching control system configured to control operation of the first and second arrays of gas inlets. | 08-27-2015 |
20150241795 | METHOD FOR CALIBRATION OF AN ENCODER SCALE AND A LITHOGRAPHIC APPARATUS - A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other. | 08-27-2015 |
20150241792 | ILLUMINATION SYSTEM AND LITHOGRAPHIC APPARATUS - An illumination system is disclosed having a polarization member that includes first and second polarization modifiers movable into at least partial intersection with a radiation beam such that the respective polarization modifier applies a modified polarization to at least part of the beam. The illumination system further includes an array of individually controllable reflective elements positioned to receive the radiation beam after it has passed the polarization member, and a controller configured to control movement of the first and second polarization modifiers such that the first and second polarization modifiers intersect with different portions of the radiation beam. | 08-27-2015 |
20150241791 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method involving obtaining first calibration vibration data relating to vibrations of the lithographic apparatus from a sensor that is part of the lithographic apparatus and obtaining second calibration vibration data, the second calibration vibration data being a component of first parameter data of the lithographic apparatus. A filter is calculated from the first and second calibration vibration data, the filter being such that when applied to the first calibration vibration data, its output correlates closer with the second calibration vibration data. The filter can then be applied to vibration data obtained using the first sensor to obtain an estimate of a vibration component of the first parameter data during the lithographic process. | 08-27-2015 |
20150234297 | Method of Calibrating a Reluctance Actuator Assembly, Reluctance Actuator and Lithographic Apparatus Comprising Such Reluctance Actuator - A reluctance actuator assembly comprising a reluctance actuator, a flux sensor to measure a magnetic flux in a gap of the reluctance actuator, and a flux amplifier to drive an actuator coil of the reluctance actuator based on a flux set point and the flux measured by the flux sensor. A method comprising providing to the flux amplifier a flux setpoint, the flux setpoint comprising a time constant component and a sinusoidally varying component at an excitation frequency, measuring a force generated by the reluctance actuator in response to the flux setpoint, and calibrating the reluctance actuator assembly from the measured force. | 08-20-2015 |
20150234294 | LITHOGRAPHIC APPARATUS - An immersion lithographic apparatus is disclosed that includes a fluid supply system configured to supply a fluid, the fluid supply system having a chamber with a plurality of inlet holes in a first side wall and a plurality of outlet holes in a second side wall, the first side wall facing the second side wall, wherein the inlet holes direct fluid entering the chamber in a direction towards areas of the second side wall between the plurality of outlet holes. | 08-20-2015 |
20150234290 | MARK POSITION MEASURING APPARATUS AND METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement. | 08-20-2015 |
20150227654 | PROCESS WINDOW OPTIMIZER - Disclosed herein is a computer-implemented defect prediction method for a device manufacturing process involving processing a pattern onto a substrate, the method comprising: identifying a processing window limiting pattern (PWLP) from the pattern; determining a processing parameter under which the PWLP is processed; and determining or predicting, using the processing parameter, existence, probability of existence, a characteristic, or a combination thereof, of a defect produced from the PWLP with the device manufacturing process. | 08-13-2015 |
20150227061 | METHOD AND APPARATUS FOR MEASURING ASYMMETRY OF A MICROSTRUCTURE, POSITION MEASURING METHOD, POSITION MEASURING APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus includes a sensor, such as an alignment sensor including a self-referencing interferometer, configured to determine the position of an alignment target including a periodic structure. An illumination optical system focuses radiation of different colors and polarizations into a spot which scans the structure. Multiple position-dependent signals are detected and processed to obtain multiple candidate position measurements. Asymmetry of the structure is calculated by comparing the multiple position-dependent signals. The asymmetry measurement is used to improve accuracy of the position read by the sensor. Additional information on asymmetry may be obtained by an asymmetry sensor receiving a share of positive and negative orders of radiation diffracted by the periodic structure to produce a measurement of asymmetry in the periodic structure. | 08-13-2015 |
20150227060 | STAGE SYSTEM AND LITHOGRAPHIC APPARATUS COMPRISING SUCH STAGE SYSTEM - A stage system includes a movable stage, and an encoder for measuring a position of the stage, wherein the encoder includes an emitter for emitting an encoder beam, a grating for interacting with the encoder beam, and a detector for detecting the encoder beam having interacted with the grating, the encoder beam in use propagating along an optical path; a purging cap at least partly enclosing the optical path; and a purging medium supply device for supplying a purging medium into the purging cap. | 08-13-2015 |
20150227036 | LITHOGRAPHY APPARATUS, AN APPARATUS FOR PROVIDING SETPOINT DATA, A DEVICE MANUFACTURING METHOD, A METHOD FOR PROVIDING SETPOINT DATA AND A COMPUTER PROGRAM - An apparatus or method to calculate target dose values of a plurality of radiation beams at a plurality of different times in order to form a desired dose pattern on a target, each target dose value defining the dose distribution of a spot exposure formed by the radiation beam to which the target dose value is applied, wherein a nominal position of a characteristic point in the dose distribution of each of the spot exposures lies at a point of a spot exposure grid, and to provide target dose values at the resolution of the spot exposure grid by calculating target dose values at grid points on a lower resolution grid, the lower resolution grid having a resolution lower than the spot exposure grid, and for each of the calculated target dose values, deriving a target dose value at each of a plurality of points in the spot exposure grid. | 08-13-2015 |
20150220005 | Real-Time Reticle Curvature Sensing - A system and method that bends a reticle and senses a curvature of a bent reticle in real-time. The system includes movable reticle stage, reticle vacuum clamps, sensor systems, and reticle bender. The reticle bender comprises piezo actuators. The sensor systems comprises measurement targets and corresponding sensors. The sensors are attached to the movable reticle stage and the measurement targets are attached to the reticle clamps, the reticle bender, or on reticle surfaces. The system is configured to determine a width of the reticle or distance between measurement targets at opposing ends of the reticle, measure a first rotational angle at a first end of the reticle, and measure a second local rotational angle at a second end of the reticle that is opposite to the first end. Based on the width or distance and the first and second angles, a field curvature of the reticle is determined. | 08-06-2015 |
20150220003 | SUBSTRATE TABLE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface. | 08-06-2015 |
20150219438 | POSITION MEASURING APPARATUS, POSITION MEASURING METHOD, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An apparatus to measure the position of a mark, the apparatus including an objective lens to direct radiation on a mark using radiation supplied by an illumination arrangement; an optical arrangement to receive radiation diffracted and specularly reflected by the mark, wherein the optical arrangement is configured to provide a first image and a second image, the first image being formed by coherently adding specularly reflected radiation and positive diffraction order radiation and the second image being formed by coherently adding specularly reflected radiation and negative diffraction order radiation; and a detection arrangement to detect variation in an intensity of radiation of the first and second images and to calculate a position of the mark in a direction of measurement therefrom. | 08-06-2015 |
20150212435 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An electromagnetic actuator includes a coil assembly including a coil; a magnet assembly including a first and a second magnet unit, each magnet unit including a magnetic yoke and a plurality of permanent magnets mounted to the magnetic yoke, the first and second magnet unit forming a magnetic circuit for receiving the coil assembly and, upon energizing the coil, generating a force in a first direction; and a holder for holding the magnet units, wherein a weight ratio of the magnet assembly over the coil assembly is smaller than the weight ratio of the magnet assembly over the coil assembly when the ratio of force over electrical power is maximized. | 07-30-2015 |
20150212432 | Reticle Heater to Keep Reticle Heating Uniform - Systems and methods are disclosed for controlling the heating of a reticle. In one embodiment, a plurality of radiation sources generates a plurality of radiation beams ( | 07-30-2015 |
20150212430 | MAGNETIC DEVICE AND LITHOGRAPHIC APPARATUS - A magnetic device, comprising a first part, a second part, a first magnetic part coupled to the first part and having a first magnetic polarization, a second magnetic part coupled to the second part and having a second magnetic polarization and an additional magnetic part coupled to the first part and having an additional magnetic polarization, wherein the first magnetic part and the second magnetic part are configured to magnetically interact with each other, wherein the first magnetic part exerts a first force on the second magnetic part, the second magnetic part exerts a second force on the first magnetic part and the first force and the second force have opposite directions that are parallel to a reference direction, the first magnetic polarization is substantially parallel to the reference direction, the second magnetic polarization is substantially perpendicular to the reference direction, the additional magnetic polarization makes an angle with the first magnetic polarization and the angle has a magnitude in a range of about 90° to about 270°. | 07-30-2015 |
20150212428 | LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD AND DISPLACEMENT MEASUREMENT SYSTEM - A lithographic apparatus including a moveable object (WT) and a displacement measuring system arranged to determine a position quantity of the moveable object. The displacement measuring system includes an encoder (BC) and a grid structure. One of the encoder and the grid structure is connected to the moveable object. The grid structure includes a high precision grid portion (HG) and a low precision grid portion (LG). The encoder is arranged to cooperate with the high precision grid portion to determine the position quantity relative to the grid structure with a high precision. The encoder is arranged to cooperate with the low precision grid portion to determine the position quantity relative to the grid structure with a low precision. | 07-30-2015 |
20150205214 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In a lithographic projection apparatus, a liquid supply system maintains liquid in a space between the projection system and the substrate. The liquid supply system may further include a de-mineralizing unit, a distillation unit, a de-hydrocarbonating unit, a UV radiation source, and/or a filter configured to purify the liquid. A gas content reduction device may be provided to reduce a gas content of the liquid. A chemical may be added to the liquid using an adding device to inhibit lifeform growth and components of the liquid supply system may be made of a material which is non-transparent to visible light such that growth of lifeforms may be reduced. | 07-23-2015 |
20150205213 | DEFORMATION PATTERN RECOGNITION METHOD, PATTERN TRANSFERRING METHOD, PROCESSING DEVICE MONITORING METHOD, AND LITHOGRAPHIC APPARATUS - A deformation pattern recognition method including providing one or more deformation patterns, each deformation pattern being associated with a deformation of a substrate that may be caused by a processing device; transferring a first pattern to a substrate, the first pattern including at least N alignment marks, wherein each alignment mark is positioned at a respective predefined nominal position; processing the substrate; measuring a position of N alignment marks and determining an alignment mark displacement for the N alignment marks by comparing the respective nominal position with the respective measured position; fitting at least one deformation pattern to the measured alignment mark displacements; determining an accuracy value for each fitted deformation pattern, the accuracy value being representative of the accuracy of the corresponding fit; using the determined accuracy value, determining whether an associated deformation pattern is present. | 07-23-2015 |
20150205210 | SUPPORT FOR A MOVABLE ELEMENT AND LITHOGRAPHY APPARATUS - A support for a movable element includes a stator element, a gravity compensator field inducing element mounted on the stator element, the gravity compensator field inducing element configured to apply a translational force to the movable element by controlling a magnetic field in a gap between the stator element and the movable element, and a plurality of torque compensator field inducing elements mounted on the stator element, the torque compensator field inducing elements configured to apply a torque to the movable element by controlling a magnetic field in the gap between the stator element and the movable element, the torque being about a first axis substantially perpendicular to the direction of the translational force applied by the gravity compensator field inducing element. | 07-23-2015 |
20150205197 | METHODS FOR PROVIDING LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - A method of designing an epitaxy template to direct self-assembly of a block copolymer on a substrate into an ordered target pattern involves providing a primary epitaxy template design and then varying the design to optimize a pattern fidelity statistic, such as placement error, relative to the target pattern by modelling predicted self-assembled block copolymer patterns and optimizing pattern placement as a function of a varied design parameter. In addition to varying a design parameter to optimize the pattern fidelity statistic, a random error in the template design is included prior to modelling predicted patterns in order to compensate for expected template inaccuracy in practice. The inclusion of a realistic random error in the template design, in addition to systematic variation of a design parameter, may improve the template design optimization to render the result less sensitive to error which may be inevitable in practice. | 07-23-2015 |
20150192864 | LITHOGRAPHIC APPARATUS - A lithographic apparatus includes a first table to support a substrate; a second table, not being configured to support a substrate, including a sensor unit to sense a property of a patterned beam of radiation from a projection system, the second table to move under the projection system when the first table is moved out from under the projection system during a substrate exchange, the first and second tables being independently movable from each other; and a liquid supply system to supply a liquid to a space between the projection system and the substrate, the first table, and/or the second table, wherein the second table is configured to provide a confining surface at a bottom of a liquid confinement structure when the first table is removed from under the projection system so as to prevent the liquid from leaking out into the remainder of the lithographic apparatus. | 07-09-2015 |
20150192861 | Lithographic Apparatus and Method of Manufacturing a Device - There is disclosed a lithographic apparatus provided with a spectral purity filter which may be provided in one or more of the following locations: (a) in the illumination system, (b) adjacent the patterning device, either a static location in the radiation beam or fixed for movement with the patterning device, (c) in the projection system, and (d) adjacent the substrate table. The spectral purity filter is preferably a membrane formed of polysilicon, a multilayer material, a carbon nanotube material or graphene. The membrane may be provided with a protective capping layer, and/or a thin metal transparent layer. | 07-09-2015 |
20150192858 | Inspection Apparatus to Detect a Target Located Within a Pattern for Lithography - A system detects targets located within patterns. It operates in the pupil plane by filtering the received signal from the surrounding pattern. A method includes illuminating a target and a surrounding pattern with radiation, detecting the radiation reflected by the target and the surrounding pattern and forming a first set of data based on the detected radiation, removing portions of the first set of data which correspond to the target to form reduced data, interpolating the remaining portions of the reduced data over the removed portions to form product data, and subtracting the product data from the first set of data to form target data. | 07-09-2015 |
20150192856 | Heating and Cooling Systems in a Lithographic Apparatus - A system for controlling temperature of a patterning device in a lithographic apparatus is discussed. The system includes a cooling system and a heating system. The cooling system is configured to direct a gas flow along a first direction across a surface of the patterning device to remove heat from the patterning device prior to exposing the patterning device or during exposure of the patterning device. The heating system is configured to selectively heat areas on the surface of the patterning device prior to exposing the patterning device or during exposure of the patterning device. The selective heating and the heat removal achieve a substantially uniform temperature distribution in the patterning. | 07-09-2015 |
20150186582 | METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET - A method of metrology target design is described. The method includes providing a range or a plurality of values for design parameter of a metrology target and by a processor, selecting, by solving for and/or sampling within the range or the plurality of values for the design parameters, a plurality of metrology target designs having one or more design parameters meeting a constraint for a design parameter of the metrology target. | 07-02-2015 |
20150186581 | METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET - A method of metrology target design is described. The method includes determining a sensitivity of a parameter for a metrology target design to an optical aberration, determining the parameter for a product design exposed using an optical system of a lithographic apparatus, and determining an impact on the parameter of the metrology target design based on the parameter for the product design and the product of the sensitivity and one or more of the respective aberrations of the optical system. | 07-02-2015 |
20150186557 | METHODS AND SYSTEMS FOR PARAMETER-SENSITIVE AND ORTHOGONAL GAUGE DESIGN FOR LITHOGRAPHY CALIBRATION - Methods according to the present invention provide computationally efficient techniques for designing gauge patterns for calibrating a model for use in a simulation process. More specifically, the present invention relates to methods of designing gauge patterns that achieve complete coverage of parameter variations with minimum number of gauges and corresponding measurements in the calibration of a lithographic process utilized to image a target design having a plurality of features. According to some aspects, a method according to the invention includes transforming the space of model parametric space (based on CD sensitivity or Delta TCCs), then iteratively identifying the direction that is most orthogonal to existing gauges' CD sensitivities in this new space, and determining most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD changes along that direction in model parametric space. | 07-02-2015 |
20150185626 | METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET - A system to, and a method to, select a metrology target for use on a substrate including performing a lithographic simulation for a plurality of points on a process window region for each proposed target, identifying a catastrophic error for any of the plurality of points for each proposed target, eliminating each target having a catastrophic error at any of the plurality of points, performing a metrology simulation to determine a parameter over the process window for each target not having a catastrophic error at any of the plurality of points, and using the one or more resulting determined simulated parameters to evaluate target quality. | 07-02-2015 |
20150185625 | METHOD AND APPARATUS FOR DESIGN OF A METROLOGY TARGET - A method of metrology target design is described. The method includes determining a sensitivity of a parameter of a metrology target design to a perturbation of a process parameter for forming, or measuring the formation of, the metrology target, and determining a robustness of the metrology target design based on the sum of the sensitivity multiplied by the perturbation of at least one of the process parameters. | 07-02-2015 |
20150177166 | Inspection Method and Apparatus, Lithographic System and Device Manufacturing Method - An inspection method determines values of profile parameters of substrate patterns. A baseline substrate with a baseline pattern target (BP) is produced that has a profile described by profile parameters, for example CD (median critical dimension), SWA (side wall angle) and RH (resist height). Scatterometry is used to obtain first and second signals from first and second targets. Values of differential pattern profile parameters are calculated using a Bayesian differential cost function based on a difference between the baseline pupil and the perturbed pupil and dependence of the pupil on pattern profile parameters. For example, the difference is measured between a baseline process and a perturbed process for stability control of a lithographic process. Fed-forward differential stack parameters are also calculated from observations of stack targets on the same substrates as the pattern targets. | 06-25-2015 |
20150160567 | LITHOGRAPHIC PROJECTION APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic projection apparatus is disclosed where at least part of a space between a projection system of the apparatus and a substrate is filled with a liquid by a liquid supply system. The projection system is separated into two separate physical parts. With substantially no direct connection between the two parts of the projection system, vibrations induced in a first of the two parts by coupling of forces through the liquid filling the space when the substrate moves relative to the liquid supply system affects substantially only the first part of the projection system and not the other second part. | 06-11-2015 |
20150153661 | SUBSTRATE TABLE SYSTEM, LITHOGRAPHIC APPARATUS AND SUBSTRATE TABLE SWAPPING METHOD - A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction. | 06-04-2015 |
20150153656 | Method of Applying a Pattern to a Substrate, Device Manufacturing Method and Lithographic Apparatus for Use in Such Methods - A substrate is loaded onto a substrate support of a lithographic apparatus, after which the apparatus measures locations of substrate alignment marks. These measurements define first correction information allowing the apparatus to apply a pattern at one or more desired locations on the substrate. Additional second correction information is used to enhance accuracy of pattern positioning, in particular to correct higher order distortions of a nominal alignment grid. The second correction information may be based on measurements of locations of alignment marks made when applying a previous pattern to the same substrate. The second correction information may alternatively or in addition be based on measurements made on similar substrates that have been patterned prior to the current substrate. | 06-04-2015 |
20150153651 | METHODS AND SYSTEMS FOR PATTERN DESIGN WITH TAILORED RESPONSE TO WAVEFRONT ABERRATION - The present invention relates to methods and systems for designing gauge patterns that are extremely sensitive to parameter variation, and thus robust against random and repetitive measurement errors in calibration of a lithographic process utilized to image a target design having a plurality of features. The method may include identifying most sensitive line width/pitch combination with optimal assist feature placement which leads to most sensitive CD (or other lithography response parameter) changes against lithography process parameter variations, such as wavefront aberration parameter variation. The method may also include designing gauges which have more than one test patterns, such that a combined response of the gauge can be tailored to generate a certain response to wavefront-related or other lithographic process parameters. The sensitivity against parameter variation leads to robust performance against random measurement error and/or any other measurement error. | 06-04-2015 |
20150145172 | IMPRINT LITHOGRAPHY - An imprint lithography template is provided with an alignment mark, wherein the alignment mark is formed from dielectric material having a refractive index which differs from the refractive index of the imprint lithography template, the dielectric material having a thickness which is such that it provides a phase difference between alignment radiation which has passed through the dielectric material and alignment radiation which has not passed through the dielectric material. | 05-28-2015 |
20150145151 | Metrology Method and Apparatus, Lithographic System, Device Manufacturing Method and Substrate - A lithographic process is used to form a plurality of target structures ( | 05-28-2015 |
20150140862 | Actuation System and Lithographic Apparatus - Actuation systems and lithographic apparatus which address the issue of uncontrolled return of common mode currents are provided. In an embodiment such systems aim to prevent the occurrence of corona and discharge between high voltage electric cables in low pressure environments. An exemplary actuation system includes an actuator module, a power source and power transmission cables. The actuator module includes an electrical motor and a first plurality of shielded cables configured to connect to the electrical motor at one end. The actuator module is located in a low pressure environment and each shield of the first plurality of cables is grounded. The transmission cables electrically connect the first plurality of cables with power supply, and include an extra cable configured to connect each shield of the first plurality of cables with the first extra cable, via a choke so as to provide a return path for common-mode currents. | 05-21-2015 |
20150138568 | LITHOGRAPHIC MASK, LITHOGRAPHIC APPARATUS AND METHOD - A lithographic mask has a substrate substantially transmissive for radiation of a certain wavelength, the substrate having a radiation absorbing material in an arrangement, the arrangement configured to apply a pattern to a cross-section of a radiation beam of the certain wavelength, wherein the absorbing material has a thickness which is substantially equal to the certain wavelength divided by a refractive index of the absorbing material. | 05-21-2015 |
20150138519 | Contamination Trap for a Lithographic Apparatus - Disclosed is a contamination trap arrangement ( | 05-21-2015 |
20150136324 | IMPRINT LITHOGRAPHY METHOD AND APPARATUS - In an embodiment, there is provided an imprint lithography method that includes providing a first amount of imprintable medium on a first area of a substrate, the first amount of imprintable medium, when fixed, having a first etch rate; and providing a second amount of imprintable medium on a second, different area of the substrate, the second amount of imprintable medium, when fixed, having a second, different etch rate. | 05-21-2015 |
20150135146 | THREE-DIMENSIONAL MASK MODEL FOR PHOTOLITHOGRAPHY SIMULATION - A three-dimensional mask model of the invention provides a more realistic approximation of the three-dimensional effects of a photolithography mask with sub-wavelength features than a thin-mask model. In one embodiment, the three-dimensional mask model includes a set of filtering kernels in the spatial domain that are configured to be convolved with thin-mask transmission functions to produce a near-field image. In another embodiment, the three-dimensional mask model includes a set of correction factors in the frequency domain that are configured to be multiplied by the Fourier transform of thin-mask transmission functions to produce a near-field image. | 05-14-2015 |
20150131076 | Inspection Method and Apparatus, Lithographic Apparatus, Lithographic Processing Cell and Device Manufacturing Method - A lithographic apparatus is disclosed. The lithographic apparatus includes a scatterometer configured to measure a property of the substrate. The scatterometer includes a radiation source configured to produce a radiated spot on a target on the substrate, where the radiated spot includes positions on the target. The scatterometer further includes a detector configured to generate measurement signals that correspond to respective ones of the positions of the radiated spot and a processor configured to output, based on the measurement signals, a single value that is representative of the property of the substrate. | 05-14-2015 |
20150131067 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A field manipulator to provide high resolution control of position in the XY plane and/or focus control. The field manipulator includes a plate located between the patterning device and the substrate. Control of the XY position is provided by tilting of the plate, while control of the focus position may be provided by localized deformation of the plate. Both adjustments may be performed by one or more actuators that act upon one or more edges of the plate. In an embodiment, two substantially parallel plates are provided and focus control can be provided by changing the spacing between them. A liquid may be provided between the plates which may be temperature controlled to adjust the focus by changing the refractive index of the liquid. | 05-14-2015 |
20150131064 | OBJECT HOLDER AND LITHOGRAPHIC APPARATUS - An object table to support an object, the object table having a support body, an object holder to hold an object, an opening adjacent an edge of the object holder, and a channel in fluid communication with the opening via a passageway, wherein the channel is defined by a first material which is different to a second material defining the passageway. | 05-14-2015 |
20150124234 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A substrate holder for use in a lithographic apparatus, the substrate holder including: a main body having a surface; a plurality of burls projecting from the surface and having end surfaces to support a substrate; and a thin film stack on the main body surface and forming an electric component, the thin film stack having a conductive layer configured to distribute electrical charge substantially uniformly throughout a plane of the stack in which the conductive layer is positioned. | 05-07-2015 |
20150124231 | Assembly For Modifying Properties Of A Plurality Of Radiation Beams, A Lithography Apparatus, A Method Of Modifying Properties Of A Plurality Of Radiation Beams And A Device Manufacturing Method - An assembly to modify a property of a plurality of radiation beams, the assembly including a plurality of waveguides configured to guide the plurality of radiation beams closer together, and a frequency multiplying device configured to receive the plurality of radiation beams guided by the plurality of waveguides and generate a corresponding plurality of radiation beams having frequencies that are an integer multiple higher. Also described are a corresponding lithography apparatus, method of modifying a property of a plurality of radiation beams and device manufacturing method. | 05-07-2015 |
20150116683 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is provided that has a sensor at substrate level, the sensor including a radiation receiver, a transmissive plate supporting the radiation receiver, and a radiation detector, wherein the sensor is arranged to avoid loss of radiation between the radiation receiver and a final element of the radiation detector. | 04-30-2015 |
20150116677 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - In an immersion lithography apparatus, the immersion liquid is supplied from a tank via a flow restrictor. The liquid held in the tank is maintained at a substantially constant height above the flow restrictor to ensure a constant flow of liquid. | 04-30-2015 |
20150116676 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed. | 04-30-2015 |
20150116675 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A method and apparatus for cleaning the inside of an immersion lithographic apparatus is disclosed. In particular, a liquid supply system of the lithographic apparatus may be used to introduce a cleaning fluid into a space between the projection system and the substrate table of the lithographic apparatus. Additionally or alternatively, a cleaning device may be provided on the substrate table and an ultrasonic emitter may be provided to create an ultrasonic cleaning liquid. | 04-30-2015 |
20150109624 | Position Measuring Method, Position Measuring Apparatus, Lithographic Apparatus and Device Manufacturing Method, Optical Element - An apparatus (AS) measures positions of marks ( | 04-23-2015 |
20150109599 | SUPPORT APPARATUS, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A support apparatus for a lithographic apparatus has an object holder and an extraction body radially outward of the object holder. The object holder is configured to support an object. The extraction body includes an extraction opening configured to extract fluid from a top surface of the support apparatus. The extraction body is spaced from the object holder such that the extraction body is substantially decoupled from the object holder. The extraction body comprises a projection configured such that it surrounds the object holder and such that, in use, a layer of liquid is retained on the projection and in contact with an object supported on the object holder. | 04-23-2015 |
20150109593 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space between the projection system and the substrate with a liquid, an outlet configured to remove a mixture of liquid and gas passing through a gap between a liquid confinement structure of the liquid supply system and the substrate, and an evacuation system configured to draw the mixture through the outlet, the evacuation system having a separator tank arranged to separate liquid from gas in the mixture and a separator tank pressure controller, connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region. | 04-23-2015 |
20150109592 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a measure is taken to reduce the effect of droplets and/or a liquid film on the last element of the projection system. | 04-23-2015 |
20150108373 | Photon Source, Metrology Apparatus, Lithographic System and Device Manufacturing Method - A laser driven light source comprises laser and focusing optics. These produce a beam of radiation focused on a plasma forming zone within a container containing a gas (e.g., Xe). Collection optics collects photons emitted by a plasma maintained by the laser radiation to form a beam of output radiation. Plasma has an elongate form (L>d) and collecting optics is configured to collect photons emerging in the longitudinal direction from the plasma. The brightness of the plasma is increased compared with sources which collect radiation emerging transversely from the plasma. A metrology apparatus using the light source can achieve greater accuracy and/or throughput as a result of the increased brightness. Back reflectors may be provided. Microwave radiation may be used instead of laser radiation to form the plasma. | 04-23-2015 |
20150098073 | LITHOGRAPHY APPARATUS AND DEVICE MANUFACTURING METHOD - A lithography apparatus and device manufacturing methods are disclosed. A lithography apparatus includes a support stage, and a measurement system including a sensor part and a reference part, the measurement system being configured to determine the position and/or orientation of the support stage, or of a component mounted on the support stage, relative to a reference frame by using the sensor part to interact with the reference part, wherein: the reference frame comprises N sub-frames coupled together so as to behave predominantly as a single rigid body with respect to vibrations below a first reference frequency and predominantly as an N-body system with respect to vibrations above a second reference frequency, where N is an integer greater than 1. | 04-09-2015 |
20150098067 | LITHOGRAPHIC APPARATUS - A lithographic apparatus including a first body including a heat source, a second body and a heater device is presented. The second body has a facing surface facing the first body via a gap between the first and second bodies. The heat source is for providing a heat flux to the second body via the gap. The heater device is attached to the facing surface. The heater device is configured to provide a further heat flux to the second body. | 04-09-2015 |
20150092171 | LITHOGRAPHIC APPARATUS - A lithographic apparatus includes a patterning device support to support a patterning device to form a patterned radiation beam, the patterning device support including a moveable structure movably arranged with respect to an object, a patterning device holder movably arranged relative to the movable structure and holding the patterning device, an actuator to move the movable structure relative to the object, and an ultra short stroke actuator to move the patterning device holder relative to the movable structure; a substrate support to hold a substrate; and a projection system to project the patterned radiation beam onto the substrate, a position measurement system for measuring a substrate positional error which is a difference between a desired position and an actual position of the substrate relative to a reference object; and a controller to move the actuator and the ultra short stroke actuator based on the substrate positional error. | 04-02-2015 |
20150092168 | SUBSTRATE HOLDER, LITHOGRAPHIC APPARATUS, AND DEVICE MANUFACTURING METHOD - A substrate holder for use in a lithographic apparatus. The substrate holder comprises a main body, a plurality of burls and a heater and/or a temperature sensor. The main body has a surface. The plurality of burls project from the surface and have end surfaces to support a substrate. The heater and/or temperature sensor is provided on the main body surface. The substrate holder is configured such that when a substrate is supported on the end surfaces, a thermal conductance between the heater and/or temperature sensor and the substrate is greater than a thermal conductance between the heater and/or temperature sensor and the main body surface. | 04-02-2015 |
20150089459 | DESIGN RULE AND LITHOGRAPHIC PROCESS CO-OPTIMIZATION - A computer-implemented method for obtaining values of one or more design variables of one or more design rules for a pattern transfer process comprising a lithographic projection apparatus, the method comprising. simultaneously optimizing one or more design variables of the pattern transfer process and the one or more design variables of the one or more design rules. The optimizing comprises evaluating a cost function that measures a metric characteristic of the pattern transfer process, the cost function being a function of one or more design variables of the pattern transfer process and one or more design variables of the one or more design rules. | 03-26-2015 |
20150085267 | Method of Determining Focus Corrections, Lithographic Processing Cell and Device Manufacturing Method - A method of, and associated apparatus for, determining focus corrections for a lithographic projection apparatus. The method comprises exposing a plurality of global correction fields on a test substrate, each comprising a plurality of global correction marks, and each being exposed with a tilted focus offset across it; measuring a focus dependent characteristic for each of the plurality of global correction marks to determine interfield focus variation information; and calculating interfield focus corrections from the interfield focus variation information. | 03-26-2015 |
20150077729 | MODULE AND METHOD FOR PRODUCING EXTREME ULTRAVIOLET RADIATION - A module for producing extreme ultraviolet radiation, including an extreme ultraviolet radiation-emitting source, the source being provided with a supply configured to supply a fluid of an ignition material to a predetermined target ignition position and a target-igniting mechanism constructed and arranged to produce a plasma from the ignition material at the target ignition position, the plasma emitting the extreme ultraviolet radiation; a collector mirror constructed and arranged to focus radiation emitted by the plasma at a focal point; and a heat sink having a thermal energy-diverting surface constructed and arranged to divert thermal energy away from the target ignition position, wherein the heat sink is located at a position proximate the target ignition position. | 03-19-2015 |
20150077728 | SENSOR, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A sensor for use in lithographic apparatus of an immersion type and which, in use, comes into contact with the immersion liquid is arranged so that the thermal resistance of a first heat path from a transducer of the sensor to a temperature conditioning device is less than the thermal resistance of a second heat flow path from the transducer to the immersion liquid. Thus, heat flow is preferentially towards the temperature conditioning device and not the immersion liquid so that temperature-induced disturbance in the immersion liquid is reduced or minimized. | 03-19-2015 |
20150074622 | OPTIMIZATION OF SOURCE, MASK AND PROJECTION OPTICS - Embodiments of the present invention provide methods for optimizing a lithographic projection apparatus including optimizing projection optics therein, and preferably including optimizing a source, a mask, and the projection optics. The projection optics is sometimes broadly referred to as “lens”, and therefore the joint optimization process may be termed source mask lens optimization (SMLO). SMLO is desirable over existing source mask optimization process (SMO), partially because including the projection optics in the optimization can lead to a larger process window by introducing a plurality of adjustable characteristics of the projection optics. The projection optics can be used to shape wavefront in the lithographic projection apparatus, enabling aberration control of the overall imaging process. According to the embodiments herein, the optimization can be accelerated by iteratively using linear fitting algorithm or using Taylor series expansion using partial derivatives of transmission cross coefficients (TCCs). | 03-12-2015 |
20150074619 | METHODS AND SYSTEM FOR MODEL-BASED GENERIC MATCHING AND TUNING - The present invention relates to a method for tuning lithography systems so as to allow different lithography systems to image different patterns utilizing a known process that does not require a trial and error process to be performed to optimize the process and lithography system settings for each individual lithography system. According to some aspects, the present invention relates to a method for a generic model-based matching and tuning which works for any pattern. Thus it eliminates the requirements for CD measurements or gauge selection. According to further aspects, the invention is also versatile in that it can be combined with certain conventional techniques to deliver excellent performance for certain important patterns while achieving universal pattern coverage at the same time. | 03-12-2015 |
20150070678 | LITHOGRAPHIC APPARATUS COMPRISING AN ACTUATOR, AND METHOD FOR PROTECTING SUCH ACTUATOR - A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap. | 03-12-2015 |
20150070675 | Fuel System for Lithographic Apparatus, EUV Source, Lithographic Apparatus and Fuel Filtering Method - A fuel supply for an EUV radiation source is disclosed. The fuel supply comprises a reservoir ( | 03-12-2015 |
20150070668 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus comprises a temperature controller configured to adjust a temperature of a projection system, a substrate and a liquid towards a common target temperature. Controlling the temperature of these elements and reducing temperature gradients may improve imaging consistency and general lithographic performance. Measures to control the temperature may include controlling the immersion liquid flow rate and liquid temperature, for example, via a feedback circuit. | 03-12-2015 |
20150070666 | THERMAL CONDITIONING UNIT, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - A thermal conditioning unit to thermally condition a substrate, the thermal conditioning unit including: a thermal conditioning element having a first layer, in use, facing the substrate and including a material having a thermal conductivity of 100 W/mK or more, a second layer and a heat transfer component positioned between the first and second layers; and a stiffening member which is stiffer than the thermal conditioning element and configured to support the thermal conditioning element so as to reduce mechanical deformation thereof, wherein the thermal conditioning element is thermally isolated from the stiffening member. | 03-12-2015 |
20150064915 | METHODS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - A method is disclosed for forming a row of mutually spaced lithography features on a substrate, such as contact electrodes for a NAND device. The method involves forming and/or using a narrow slot over the substrate defined between the edge of a hard mask layer and a side wall of a trench in a resist layer overlying the edge and the substrate. A self-assemblable block copolymer is deposited and ordered in the trench for use as a further resist for patterning the substrate along the slot. The method allows for a sub-resolution contact array to be formed using UV lithography by overlapping the trench with the hard mask edge to provide the narrow slot in which the contact electrodes may be formed. | 03-05-2015 |
20150064630 | METHODS AND COMPOSITIONS FOR PROVIDING SPACED LITHOGRAPHY FEATURES ON A SUBSTRATE BY SELF-ASSEMBLY OF BLOCK COPOLYMERS - A method is disclosed to form a row of mutually spaced elongate lithography features along an axis on a substrate, for instance for use as contact electrodes for a NAND device. The method involves directing alignment of self-assemblable block copolymer (BCP) composition in a trench in a resist layer on the substrate, having the substrate as base, with an epitaxy feature in the trench to cause the ordered BCP layer to have elongate domains stretching across the trench width, substantially parallel to each other and to the substrate. The ordered BCP layer is then used as a resist to pattern the substrate. A BCP composition adapted to assemble with spaced discontinuous elongate elliptical domains is disclosed. The method may allow for sub-resolution contact arrays to be formed using UV lithography. | 03-05-2015 |
20150062554 | MULTI-STAGE SYSTEM, A CONTROL METHOD THEREFOR, AND A LITHOGRAPHIC APPARATUS - A multi-stage system includes a stator including a plurality of electric coils; a first stage including a first magnet assembly, the first stage moveable relative to the stator; a second stage including a second magnet assembly, the second stage moveable relative to the stator; a controller configured to position the first and the second stage relative to the stator by activating, respectively, a first subset of the plurality of electric coils to interact with the first magnet assembly and a second subset of the plurality of electric coils to interact with the second magnet assembly, the controller adapted to prevent at least one electric coil, to be simultaneously shared by the first and the second subset to position the first and the second stage on the stator, from activating. | 03-05-2015 |
20150062548 | Lithographic Apparatus, Sensor and Method - A lithographic apparatus comprises an illumination system configured to condition a radiation beam, a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate, a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a sensor. The sensor (S) comprises a photodiode ( | 03-05-2015 |
20150062547 | Lithography Apparatus, a Device Manufacturing Method, a Method Of Manufacturing an Attenuator - There is disclosed an exposure apparatus, a device manufacturing method and a method of manufacturing an attenuator. According to an embodiment, the exposure apparatus includes a programmable patterning device configured to provide a plurality of individually controllable radiation beams; a projection system configured to project each of the radiation beams onto a respective location on a target; and an attenuator configured to reduce a standard deviation in maximum radiation flux or background exposure level that can be applied to the target by the radiation beams as a function of position on the target. | 03-05-2015 |
20150058815 | CORRECTION FOR FLARE EFFECTS IN LITHOGRAPHY SYSTEM - A method for reducing an effect of flare produced by a lithographic apparatus for imaging a design layout onto a substrate is described. A flare map in an exposure field of the lithographic apparatus is simulated by mathematically combining a density map of the design layout at the exposure field with a point spread function (PSF), wherein system-specific effects on the flare map may be incorporated in the simulation. Location-dependent flare corrections for the design layout are calculated by using the determined flare map, thereby reducing the effect of flare. | 02-26-2015 |
20150056559 | IMMERSION LIQUID, EXPOSURE APPARATUS, AND EXPOSURE PROCESS - An immersion liquid is provided comprising an ion-forming component, e.g. an acid or a base, which has a relatively high vapor pressure. Also provided are lithography processes and lithography systems using the immersion liquid. | 02-26-2015 |
20150055127 | Particulate Contamination Measurement Method and Apparatus - A particulate contamination measurement method and apparatus are discussed. The method, for example, comprises pressing a measurement surface ( | 02-26-2015 |
20150055106 | Radiation Source and Lithographic Apparatus - The present invention provides methods and apparatus for facilitating the start up of a fuel droplet stream generator. During a start-up phase the fuel droplet stream generator is positioned so that the fuel droplets re emitted downwardly whereby gravity assists in the establishment of the stream. The droplets are monitored using a visualization system and once the stream is determined to have the desired characteristics the stream generator is moved to a second position of steady state use in which the droplet stream is emitted in a horizontal direction. | 02-26-2015 |
20150055104 | LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD - An immersion lithography apparatus is disclosed in which liquid is supplied to a space between a projection system and a substrate, and a plate structure is provided to divide the space into two parts. The plate structure has an aperture to allow transmission of the projection beam, has through holes in it to reduce the damping effect of the presence of the plate and optionally has one or more inlets and outlets to provide various flows around the aperture in the plate. An embodiment of the invention may reduce the transportation of contaminants, stray light, temperature gradients, and/or the effect of bubbles on the imaging quality. | 02-26-2015 |
20150055103 | FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD - A fluid handling structure for a lithographic apparatus, the fluid handling structure having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; a gas supply opening radially outward of the meniscus pinning feature; and a gas recovery opening radially outward of the meniscus pinning feature and at least partly surrounding the gas supply opening. | 02-26-2015 |
20150055102 | LITHOGRAPHIC APPARATUS AND A METHOD OF OPERATING THE APPARATUS - A lithographic projection apparatus is disclosed which includes a cleaning station. Several embodiments of the cleaning station are disclosed. In an embodiment, measures are taken to avoid contact of a cleaning fluid with the final element of the projection system. In an embodiment, measures are taken to avoid foaming of the cleaning fluid. The use of a thermally isolated island is also disclosed as well as its optimal position. | 02-26-2015 |
20150050599 | METHODS OF PROVIDING PATTERNED EPITAXY TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY - A method is disclosed to form a patterned epitaxy template, on a substrate, to direct self-assembly of block copolymer for device lithography. A resist layer on a substrate is selectively exposed with actinic (e.g. UV or DUV) radiation by photolithography to provide exposed portions in a regular lattice pattern of touching or overlapping shapes arranged to leave unexposed resist portions between the shapes. Exposed or unexposed resist is removed with remaining resist portions providing the basis for a patterned epitaxy template for the orientation of the self-assemblable block copolymer as a hexagonal or square array. The method allows for simple, direct UV lithography to form patterned epitaxy templates with sub-resolution features. | 02-19-2015 |
20150049323 | Lithographic Apparatus - A lithographic apparatus injects gas between a reticle (MA) and reticle blades (REB-X, REB-Y) to protect the reticle from contamination. The gas may be injected either into the space defined between the reticle and the closest pair of reticle blades, or into the space defined between the two pairs of reticle blades. | 02-19-2015 |
20150045935 | MODEL-BASED SCANNER TUNING SYSTEMS AND METHODS - Systems and methods for tuning photolithographic processes are described. A model of a target scanner is maintained defining sensitivity of the target scanner with reference to a set of tunable parameters. A differential model represents deviations of the target scanner from the reference. The target scanner may be tuned based on the settings of the reference scanner and the differential model. Performance of a family of related scanners may be characterized relative to the performance of a reference scanner. Differential models may include information such as parametric offsets and other differences that may be used to simulate the difference in imaging behavior. | 02-12-2015 |
20150042999 | Illumination Source for use in Inspection Methods and/or Lithography; Inspection and Lithographic Apparatus and Inspection Method - An illumination system for a lithographic or inspection apparatus. A plurality of optical waveguides transmit radiation from the illumination source to an output. A switching system enables selective control of one or more subsets of the optical waveguides. An inspection method uses an illumination system and inspection and lithographic apparatuses comprise an illumination system. In one example, the optical waveguides and switching system are replaced by a plurality of parallel optical bandpass filter elements. The optical bandpass filter elements each only transmit a predetermined wavelength or a band of wavelengths of radiation. At least two of the parallel optical bandpass filter elements each being operable to transmit a different wavelength or band of wavelengths. | 02-12-2015 |
20150037595 | COATINGS - A coating is disclosed. The coating may be used in an apparatus having a radiation source, e.g. a lithographic apparatus. The coating comprises the elements Si, O, F and, optionally, C and H. An article is also disclosed. The article may be any one of the group consisting of a substrate table, an optical element, a shutter member, a sensor, a projection system, and a confinement structure. At least a portion of a surface of the article is coated with a coating. The coating comprises the elements Si, O, F and, optionally, C and H. The coating may comprise the elements Si, O, C and H. | 02-05-2015 |
20150034594 | METHODS OF PROVIDING PATTERNED TEMPLATES FOR SELF-ASSEMBLABLE BLOCK COPOLYMERS FOR USE IN DEVICE LITHOGRAPHY - A method is disclosed to form a patterned template on a substrate, to direct orientation of a self-assemblable block copolymer. The method involves providing a resist layer of a positive tone resist on the substrate and overexposing the resist with actinic (e.g. UV) radiation by photolithography to expose a continuous region of the resist layer with a sub-resolution unexposed resist portion at the interface between the resist and the substrate. The resist portion remaining at the interface, after removal of the exposed region, provides a basis for a chemical epitaxy template. The method may allow for simple, direct photolithography to form a patterned chemical epitaxy template and optionally include an accurately co-aligned graphoepitaxy feature and/or a substrate alignment feature. | 02-05-2015 |
20150029485 | SUBSTRATE HOLDER AND METHOD OF MANUFACTURING A SUBSTRATE HOLDER - An object holder ( | 01-29-2015 |
20150029481 | METHOD OF OPERATING A PATTERNING DEVICE AND LITHOGRAPHIC APPARATUS - A lithographic reticle is illuminated to transfer a pattern to a substrate, inducing distortions due to heating. The distortions are calculated using reference marks in a peripheral portion of the reticle and measuring changes in their relative positions over time. A plurality of cells are defined for which a system of equations can be solved to calculate a dilation of each cell. In an embodiment, each equation relates positions of pairs of marks to dilations of the cells along a line (s, s1, s2) connecting each pair. Local positional deviations can be calculated for a position by combining calculated dilations for cells between at least one measured peripheral mark and the position. Corrections can be applied in accordance with the result of the calculation. Energy may be applied to the patterning device (for example by thermal input or mechanical actuators) to modify a distribution of the local positional deviations. | 01-29-2015 |